{"id":"https://openalex.org/W4221089340","doi":"https://doi.org/10.1038/s41598-022-09054-7","title":"Influence of growth temperature on dielectric strength of Al2O3 thin films prepared via atomic layer deposition at low temperature","display_name":"Influence of growth temperature on dielectric strength of Al2O3 thin films prepared via atomic layer deposition at low temperature","publication_year":2022,"publication_date":"2022-03-24","ids":{"openalex":"https://openalex.org/W4221089340","doi":"https://doi.org/10.1038/s41598-022-09054-7","pmid":"https://pubmed.ncbi.nlm.nih.gov/35332219","pmcid":"https://www.ncbi.nlm.nih.gov/pmc/articles/8948174"},"language":"en","primary_location":{"id":"doi:10.1038/s41598-022-09054-7","doi":"https://doi.org/10.1038/s41598-022-09054-7","is_oa":true,"landing_page_url":"https://doi.org/10.1038/s41598-022-09054-7","pdf_url":"https://www.nature.com/articles/s41598-022-09054-7.pdf","source":{"id":"https://openalex.org/S196734849","display_name":"Scientific Reports","issn_l":"2045-2322","issn":["2045-2322"],"is_oa":true,"is_in_doaj":true,"is_core":true,"listed_in":["anvur-class-a","anvur-scientific","cwts-core","doaj","dongbi-c","doyens","jufo-1","ki-jl-1","medline","norway-1","poland-140","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310319908","host_organization_name":"Nature Portfolio","host_organization_lineage":["https://openalex.org/P4310319908","https://openalex.org/P4310319965"],"host_organization_lineage_names":["Nature Portfolio","Springer Nature"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Scientific Reports","raw_type":"journal-article"},"parent_works":[],"lineage":["https://openalex.org/W4221089340"],"child_works_count":0,"type":"article","is_traditional":true,"indexed_in":["crossref","doaj","pubmed"],"open_access":{"is_oa":true,"oa_status":"gold","oa_url":"https://www.nature.com/articles/s41598-022-09054-7.pdf","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5100365910","display_name":"Suyeon Kim","orcid":"https://orcid.org/0000-0001-8579-6586","observed_orcids":["https://orcid.org/0000-0001-8579-6586"]},"institutions":[{"id":"https://openalex.org/I145808223","display_name":"Hanbat National University","ror":"https://ror.org/00x514t95","country_code":"KR","type":"education","lineage":["https://openalex.org/I145808223"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Suyeon Kim","raw_affiliation_strings":["Department of Materials Science and Engineering, Hanbat National University, Daejeon, 34158, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science and Engineering, Hanbat National University, Daejeon, 34158, Republic of Korea","institution_ids":["https://openalex.org/I145808223"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100428040","display_name":"Seunghun Lee","orcid":"https://orcid.org/0000-0002-1356-2331","observed_orcids":["https://orcid.org/0000-0002-1356-2331","https://orcid.org/0009-0002-1138-4348"]},"institutions":[{"id":"https://openalex.org/I145808223","display_name":"Hanbat National University","ror":"https://ror.org/00x514t95","country_code":"KR","type":"education","lineage":["https://openalex.org/I145808223"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Seung-Hun Lee","raw_affiliation_strings":["Department of Materials Science and Engineering, Hanbat National University, Daejeon, 34158, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science and Engineering, Hanbat National University, Daejeon, 34158, Republic of Korea","institution_ids":["https://openalex.org/I145808223"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5067623220","display_name":"In Ho Jo","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I145808223","display_name":"Hanbat National University","ror":"https://ror.org/00x514t95","country_code":"KR","type":"education","lineage":["https://openalex.org/I145808223"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"In Ho Jo","raw_affiliation_strings":["Department of Materials Science and Engineering, Hanbat National University, Daejeon, 34158, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science and Engineering, Hanbat National University, Daejeon, 34158, Republic of Korea","institution_ids":["https://openalex.org/I145808223"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5011018618","display_name":"Jongsu Seo","orcid":"https://orcid.org/0000-0003-1391-3944","observed_orcids":["https://orcid.org/0000-0003-1391-3944"]},"institutions":[{"id":"https://openalex.org/I157485424","display_name":"Korea Advanced Institute of Science and Technology","ror":"https://ror.org/05apxxy63","country_code":"KR","type":"education","lineage":["https://openalex.org/I157485424"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jongsu Seo","raw_affiliation_strings":["Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea","institution_ids":["https://openalex.org/I157485424"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5067466693","display_name":"Yeong\u2010Eun Yoo","orcid":"https://orcid.org/0000-0003-4941-2121","observed_orcids":["https://orcid.org/0000-0003-4941-2121"]},"institutions":[{"id":"https://openalex.org/I4210111434","display_name":"Korea Institute of Machinery & Materials","ror":"https://ror.org/01qcq9d74","country_code":"KR","type":"facility","lineage":["https://openalex.org/I2801339556","https://openalex.org/I4210111434","https://openalex.org/I4210144908","https://openalex.org/I4387152098"]}],"countries":["KR"],"is_corresponding":true,"raw_author_name":"Yeong-Eun Yoo","raw_affiliation_strings":["Department of Nano Manufacturing Technology, Korea Institute of Machinery and Materials (KIMM), Daejeon, 34103, Republic of Korea. yeyoo@kimm.re.kr","Department of Nano Manufacturing Technology, Korea Institute of Machinery and Materials (KIMM), Daejeon, 34103, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Nano Manufacturing Technology, Korea Institute of Machinery and Materials (KIMM), Daejeon, 34103, Republic of Korea. yeyoo@kimm.re.kr","institution_ids":["https://openalex.org/I4210111434"]},{"raw_affiliation_string":"Department of Nano Manufacturing Technology, Korea Institute of Machinery and Materials (KIMM), Daejeon, 34103, Republic of Korea","institution_ids":["https://openalex.org/I4210111434"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5110288277","display_name":"Jeong Hwan Kim","orcid":"https://orcid.org/0000-0002-1814-1739","observed_orcids":["https://orcid.org/0000-0002-1814-1739"]},"institutions":[{"id":"https://openalex.org/I145808223","display_name":"Hanbat National University","ror":"https://ror.org/00x514t95","country_code":"KR","type":"education","lineage":["https://openalex.org/I145808223"]}],"countries":["KR"],"is_corresponding":true,"raw_author_name":"Jeong Hwan Kim","raw_affiliation_strings":["Department of Materials Science and Engineering, Hanbat National University, Daejeon, 34158, Republic of Korea. jkim@hanbat.ac.kr","Department of Materials Science and Engineering, Hanbat National University, Daejeon, 34158, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science and Engineering, Hanbat National University, Daejeon, 34158, Republic of Korea. jkim@hanbat.ac.kr","institution_ids":["https://openalex.org/I145808223"]},{"raw_affiliation_string":"Department of Materials Science and Engineering, Hanbat National University, Daejeon, 34158, Republic of Korea","institution_ids":["https://openalex.org/I145808223"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5067466693","https://openalex.org/A5110288277"],"corresponding_institution_ids":["https://openalex.org/I145808223","https://openalex.org/I4210111434"],"apc_list":{"value":2190,"currency":"USD","value_usd":2190},"apc_paid":{"value":2190,"currency":"USD","value_usd":2190},"fwci":4.4961,"has_fulltext":true,"cited_by_count":100,"citation_normalized_percentile":{"value":0.96244053,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":93,"max":100},"biblio":{"volume":"12","issue":"1","first_page":"5124","last_page":"5124"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9976000189781189,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9976000189781189,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","score":0.0013000000035390258,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/aluminum-oxide-thin-films","display_name":"Al2O3 thin films","score":0.9390000104904175},{"id":"https://openalex.org/keywords/atomic-layer-deposition","display_name":"atomic layer deposition","score":0.828000009059906},{"id":"https://openalex.org/keywords/low-temperature-deposition","display_name":"low-temperature deposition","score":0.7329999804496765},{"id":"https://openalex.org/keywords/growth-temperature","display_name":"growth temperature","score":0.828000009059906},{"id":"https://openalex.org/keywords/dielectric-strength","display_name":"dielectric strength","score":0.9769999980926514},{"id":"https://openalex.org/keywords/growth-rate-crystal-and-thin-film-growth","display_name":"growth rate (crystal and thin-film growth)","score":0.9039999842643738},{"id":"https://openalex.org/keywords/carbon-impurity","display_name":"carbon impurities","score":0.8989999890327454},{"id":"https://openalex.org/keywords/oxygen-defects","display_name":"oxygen defects","score":0.8650000095367432},{"id":"https://openalex.org/keywords/amorphous-structure","display_name":"amorphous structure","score":0.7409999966621399},{"id":"https://openalex.org/keywords/surface-smoothness","display_name":"surface smoothness","score":0.8610000014305115},{"id":"https://openalex.org/keywords/flexible-electronics","display_name":"flexible electronics","score":0.953000009059906}],"concepts":[{"id":"https://openalex.org/C69544855","wikidata":"https://www.wikidata.org/wiki/Q757625","display_name":"Atomic layer deposition","level":3,"score":0.8870800137519836},{"id":"https://openalex.org/C175708663","wikidata":"https://www.wikidata.org/wiki/Q899559","display_name":"X-ray photoelectron spectroscopy","level":2,"score":0.7808512449264526},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6850223541259766},{"id":"https://openalex.org/C56052488","wikidata":"https://www.wikidata.org/wiki/Q103382","display_name":"Amorphous solid","level":2,"score":0.6423016786575317},{"id":"https://openalex.org/C133386390","wikidata":"https://www.wikidata.org/wiki/Q184996","display_name":"Dielectric","level":2,"score":0.6325109601020813},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.6010295152664185},{"id":"https://openalex.org/C71987851","wikidata":"https://www.wikidata.org/wiki/Q7216430","display_name":"Impurity","level":2,"score":0.5623353719711304},{"id":"https://openalex.org/C2778312390","wikidata":"https://www.wikidata.org/wiki/Q4139973","display_name":"Growth rate","level":2,"score":0.4713135361671448},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.4706116318702698},{"id":"https://openalex.org/C70401718","wikidata":"https://www.wikidata.org/wiki/Q343241","display_name":"Dielectric strength","level":3,"score":0.46962857246398926},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.4437016546726227},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.4272153973579407},{"id":"https://openalex.org/C540031477","wikidata":"https://www.wikidata.org/wiki/Q629","display_name":"Oxygen","level":2,"score":0.4236515164375305},{"id":"https://openalex.org/C140205800","wikidata":"https://www.wikidata.org/wiki/Q5860","display_name":"Carbon fibers","level":3,"score":0.41252601146698},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.40679365396499634},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.2838535010814667},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.2812716066837311},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.20978426933288574},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.17026439309120178},{"id":"https://openalex.org/C8010536","wikidata":"https://www.wikidata.org/wiki/Q160398","display_name":"Crystallography","level":1,"score":0.11416396498680115},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.05674561858177185},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C104779481","wikidata":"https://www.wikidata.org/wiki/Q50707","display_name":"Composite number","level":2,"score":0.0},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.0},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0}],"mesh":[],"locations_count":4,"locations":[{"id":"doi:10.1038/s41598-022-09054-7","doi":"https://doi.org/10.1038/s41598-022-09054-7","is_oa":true,"landing_page_url":"https://doi.org/10.1038/s41598-022-09054-7","pdf_url":"https://www.nature.com/articles/s41598-022-09054-7.pdf","source":{"id":"https://openalex.org/S196734849","display_name":"Scientific Reports","issn_l":"2045-2322","issn":["2045-2322"],"is_oa":true,"is_in_doaj":true,"is_core":true,"listed_in":["anvur-class-a","anvur-scientific","cwts-core","doaj","dongbi-c","doyens","jufo-1","ki-jl-1","medline","norway-1","poland-140","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310319908","host_organization_name":"Nature Portfolio","host_organization_lineage":["https://openalex.org/P4310319908","https://openalex.org/P4310319965"],"host_organization_lineage_names":["Nature Portfolio","Springer Nature"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Scientific Reports","raw_type":"journal-article"},{"id":"pmid:35332219","doi":null,"is_oa":false,"landing_page_url":"https://pubmed.ncbi.nlm.nih.gov/35332219","pdf_url":null,"source":{"id":"https://openalex.org/S4306525036","display_name":"PubMed","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I1299303238","host_organization_name":"National Institutes of Health","host_organization_lineage":["https://openalex.org/I1299303238"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Scientific reports","raw_type":"Journal Article"},{"id":"pmh:oai:pubmedcentral.nih.gov:8948174","doi":null,"is_oa":true,"landing_page_url":"https://pmc.ncbi.nlm.nih.gov/articles/PMC8948174/","pdf_url":null,"source":{"id":"https://openalex.org/S2764455111","display_name":"PubMed Central","issn_l":null,"issn":null,"is_oa":true,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I1299303238","host_organization_name":"National Institutes of Health","host_organization_lineage":["https://openalex.org/I1299303238"],"host_organization_lineage_names":[],"type":"repository"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Sci Rep","raw_type":"Text"},{"id":"pmh:oai:doaj.org/article:0a397b271e0b484cb9f91b90c3c005fc","doi":null,"is_oa":false,"landing_page_url":"https://doaj.org/article/0a397b271e0b484cb9f91b90c3c005fc","pdf_url":null,"source":{"id":"https://openalex.org/S4306401280","display_name":"DOAJ (DOAJ: Directory of Open Access Journals)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Scientific Reports, Vol 12, Iss 1, Pp 1-6 (2022)","raw_type":"article"}],"best_oa_location":{"id":"doi:10.1038/s41598-022-09054-7","doi":"https://doi.org/10.1038/s41598-022-09054-7","is_oa":true,"landing_page_url":"https://doi.org/10.1038/s41598-022-09054-7","pdf_url":"https://www.nature.com/articles/s41598-022-09054-7.pdf","source":{"id":"https://openalex.org/S196734849","display_name":"Scientific Reports","issn_l":"2045-2322","issn":["2045-2322"],"is_oa":true,"is_in_doaj":true,"is_core":true,"listed_in":["anvur-class-a","anvur-scientific","cwts-core","doaj","dongbi-c","doyens","jufo-1","ki-jl-1","medline","norway-1","poland-140","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310319908","host_organization_name":"Nature Portfolio","host_organization_lineage":["https://openalex.org/P4310319908","https://openalex.org/P4310319965"],"host_organization_lineage_names":["Nature Portfolio","Springer Nature"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Scientific Reports","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[{"id":"https://openalex.org/G3333469349","display_name":null,"funder_award_id":"2017M3A7B4049547","funder_id":"https://openalex.org/F4320322030","funder_display_name":"Ministry of Science, ICT and Future Planning"},{"id":"https://openalex.org/G4668211060","display_name":null,"funder_award_id":"NK238E","funder_id":"https://openalex.org/F4320322098","funder_display_name":"Korea Institute of Machinery and Materials"},{"id":"https://openalex.org/G5066681206","display_name":null,"funder_award_id":"2017M3A7B4049547","funder_id":"https://openalex.org/F4320322120","funder_display_name":"National Research Foundation of Korea"},{"id":"https://openalex.org/G5661831604","display_name":null,"funder_award_id":"P0002019","funder_id":"https://openalex.org/F4320322064","funder_display_name":"Korea Institute for Advancement of Technology"},{"id":"https://openalex.org/G8022923564","display_name":null,"funder_award_id":"2021R1I1A3058840","funder_id":"https://openalex.org/F4320322120","funder_display_name":"National Research Foundation of Korea"}],"funders":[{"id":"https://openalex.org/F4320320671","display_name":"National Research Foundation","ror":"https://ror.org/05s0g1g46"},{"id":"https://openalex.org/F4320321224","display_name":"Hanbat National University","ror":"https://ror.org/00x514t95"},{"id":"https://openalex.org/F4320322030","display_name":"Ministry of Science, ICT and Future Planning","ror":"https://ror.org/032e49973"},{"id":"https://openalex.org/F4320322064","display_name":"Korea Institute for Advancement of Technology","ror":"https://ror.org/015w1qa96"},{"id":"https://openalex.org/F4320322098","display_name":"Korea Institute of Machinery and Materials","ror":"https://ror.org/01qcq9d74"},{"id":"https://openalex.org/F4320322120","display_name":"National Research Foundation of Korea","ror":"https://ror.org/013aysd81"}],"has_content":{"pdf":true,"grobid_xml":true},"content_urls":{"pdf":"https://content.openalex.org/works/W4221089340.pdf","grobid_xml":"https://content.openalex.org/works/W4221089340.grobid-xml"},"referenced_works_count":23,"referenced_works":["https://openalex.org/W1655635229","https://openalex.org/W1952951874","https://openalex.org/W1987062290","https://openalex.org/W2053183864","https://openalex.org/W2061892592","https://openalex.org/W2083672128","https://openalex.org/W2107127173","https://openalex.org/W2151212164","https://openalex.org/W2163861557","https://openalex.org/W2167694012","https://openalex.org/W2470357878","https://openalex.org/W2597381831","https://openalex.org/W2739389383","https://openalex.org/W2798566080","https://openalex.org/W2799817872","https://openalex.org/W2809357425","https://openalex.org/W2900006623","https://openalex.org/W2906351057","https://openalex.org/W2950544996","https://openalex.org/W2963820526","https://openalex.org/W2989537977","https://openalex.org/W2998251746","https://openalex.org/W3138316878"],"related_works":["https://openalex.org/W2151212164","https://openalex.org/W4382204889","https://openalex.org/W2470357878","https://openalex.org/W2089317954","https://openalex.org/W2579902150","https://openalex.org/W2118467013","https://openalex.org/W3010602960","https://openalex.org/W2507220302","https://openalex.org/W2000399637","https://openalex.org/W2044244200"],"abstract_inverted_index":{"Abstract":[0],"Thin":[1],"films":[2,34,55,97,138],"grown":[3,35,98],"via":[4],"atomic":[5],"layer":[6],"deposition":[7],"(ALD)":[8],"suffer":[9],"from":[10,57],"insufficient":[11],"growth":[12,26,50,68,93,131,151],"rate":[13,51],"and":[14,28,65,95,119,144],"unreliability":[15],"for":[16,42],"temperature-sensitive":[17],"electronic":[18,47],"substrates.":[19],"This":[20],"study":[21],"aimed":[22],"to":[23,59,112],"examine":[24],"the":[25,53,75,96,113,116,150],"characteristics":[27],"dielectric":[29,86],"strength":[30,87,107],"of":[31,52,149],"ALD":[32,136],"Al2O3":[33,54,137],"at":[36,67,78,99,129],"low":[37,130],"temperatures":[38,69,132],"(\u2264":[39,133],"150":[40,71,100,134],"\u00b0C)":[41],"potential":[43],"application":[44],"in":[45,115],"flexible":[46],"devices.":[48],"The":[49,85],"increased":[56],"0.9":[58],"1.1":[60],"\u00c5/cycle":[61],"with":[62,91],"increasing":[63,92],"temperature":[64,77],"saturated":[66],"\u2265":[70],"\u00b0C,":[72],"which":[73,79],"is":[74],"critical":[76],"a":[80,103],"complete":[81],"oxidation":[82],"reaction":[83],"occurred.":[84],"was":[88],"also":[89],"improved":[90],"temperature,":[94],"\u00b0C":[101],"showed":[102,139],"high":[104],"breakdown":[105],"field":[106],"(~":[108],"8.3":[109],"MV/cm),":[110],"attributable":[111],"decrease":[114],"carbon":[117],"impurities":[118],"oxygen":[120],"defects,":[121],"as":[122],"confirmed":[123],"by":[124],"X-ray":[125],"photoelectron":[126],"spectroscopy.":[127],"Even":[128],"\u00b0C),":[135],"an":[140],"overall":[141],"amorphous":[142],"structure":[143],"extremely":[145],"smooth":[146],"surfaces":[147],"regardless":[148],"temperature.":[152]},"counts_by_year":[{"year":2026,"cited_by_count":34},{"year":2025,"cited_by_count":34},{"year":2024,"cited_by_count":18},{"year":2023,"cited_by_count":12},{"year":2022,"cited_by_count":2}],"updated_date":"2026-11-10T11:39:43.021295","created_date":"2022-04-03T00:00:00"}