{"id":"https://openalex.org/W347328754","doi":"https://doi.org/10.12693/aphyspola.116.560","title":"Thermodynamic Temperature and Density of Ar(I) for 4S'[1/2]0 State in a Facing Target Sputtering System","display_name":"Thermodynamic Temperature and Density of Ar(I) for 4S'[1/2]0 State in a Facing Target Sputtering System","publication_year":2009,"publication_date":"2009-10-01","ids":{"openalex":"https://openalex.org/W347328754","doi":"https://doi.org/10.12693/aphyspola.116.560","mag":"347328754"},"language":"en","primary_location":{"id":"doi:10.12693/aphyspola.116.560","doi":"https://doi.org/10.12693/aphyspola.116.560","is_oa":true,"landing_page_url":"https://doi.org/10.12693/aphyspola.116.560","pdf_url":"https://doi.org/10.12693/aphyspola.116.560","source":{"id":"https://openalex.org/S63733671","display_name":"Acta Physica Polonica A","issn_l":"0587-4246","issn":["0587-4246","1898-794X"],"is_oa":true,"is_in_doaj":true,"is_core":true,"listed_in":["cwts-core","ddh","doaj","dongbi-c","jufo-1","norway-1","poland-70","russia-white-list-3","vabb-shw"],"host_organization":"https://openalex.org/P4310317485","host_organization_name":"Polish Academy of Sciences","host_organization_lineage":["https://openalex.org/P4310317485"],"host_organization_lineage_names":["Polish Academy of Sciences"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Acta Physica Polonica A","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref","doaj"],"open_access":{"is_oa":true,"oa_status":"diamond","oa_url":"https://doi.org/10.12693/aphyspola.116.560","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5037595390","display_name":"Yoji Yasuda","orcid":"https://orcid.org/0000-0001-9548-4041","observed_orcids":["https://orcid.org/0000-0001-9548-4041"]},"institutions":[{"id":"https://openalex.org/I31618427","display_name":"Tokyo Polytechnic University","ror":"https://ror.org/035kpke84","country_code":"JP","type":"education","lineage":["https://openalex.org/I31618427"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Y. Yasuda","raw_affiliation_strings":["Department of Electronics and Information Technology, Tokyo Polytechnic University, Kanagawa, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electronics and Information Technology, Tokyo Polytechnic University, Kanagawa, Japan","institution_ids":["https://openalex.org/I31618427"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5002241544","display_name":"Nobuo Nishimiya","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I31618427","display_name":"Tokyo Polytechnic University","ror":"https://ror.org/035kpke84","country_code":"JP","type":"education","lineage":["https://openalex.org/I31618427"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"N. Nishimiya","raw_affiliation_strings":["Department of Electronics and Information Technology, Tokyo Polytechnic University, Kanagawa, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electronics and Information Technology, Tokyo Polytechnic University, Kanagawa, Japan","institution_ids":["https://openalex.org/I31618427"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111814196","display_name":"Y. Hoshi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I31618427","display_name":"Tokyo Polytechnic University","ror":"https://ror.org/035kpke84","country_code":"JP","type":"education","lineage":["https://openalex.org/I31618427"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Y. Hoshi","raw_affiliation_strings":["Department of Electronics and Information Technology, Tokyo Polytechnic University, Kanagawa, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electronics and Information Technology, Tokyo Polytechnic University, Kanagawa, Japan","institution_ids":["https://openalex.org/I31618427"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5110145915","display_name":"Masao Suzuki","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I31618427","display_name":"Tokyo Polytechnic University","ror":"https://ror.org/035kpke84","country_code":"JP","type":"education","lineage":["https://openalex.org/I31618427"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"M. Suzuki","raw_affiliation_strings":["Department of Electronics and Information Technology, Tokyo Polytechnic University, Kanagawa, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electronics and Information Technology, Tokyo Polytechnic University, Kanagawa, Japan","institution_ids":["https://openalex.org/I31618427"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I31618427"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":true,"cited_by_count":3,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"116","issue":"4","first_page":"560","last_page":"562"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.8047000169754028,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.8047000169754028,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10523","display_name":"Atomic and Molecular Physics","score":0.10050000250339508,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11854","display_name":"Laser-induced spectroscopy and plasma","score":0.01860000006854534,"subfield":{"id":"https://openalex.org/subfields/1607","display_name":"Spectroscopy"},"field":{"id":"https://openalex.org/fields/16","display_name":"Chemistry"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/argon-ions","display_name":"argon ions","score":0.5189999938011169},{"id":"https://openalex.org/keywords/thermodynamic-temperature","display_name":"thermodynamic temperature","score":0.8389999866485596},{"id":"https://openalex.org/keywords/population-density","display_name":"population density","score":0.6079999804496765},{"id":"https://openalex.org/keywords/doppler-width","display_name":"Doppler width","score":0.7680000066757202},{"id":"https://openalex.org/keywords/voigt-function","display_name":"Voigt function","score":0.8830000162124634},{"id":"https://openalex.org/keywords/facing-target-sputtering","display_name":"facing targets sputtering","score":0.8629999756813049},{"id":"https://openalex.org/keywords/gas-pressure","display_name":"gas pressure","score":0.5059999823570251},{"id":"https://openalex.org/keywords/discharge-current","display_name":"discharge current","score":0.847000002861023},{"id":"https://openalex.org/keywords/line-intensity","display_name":"line intensities","score":0.6990000009536743}],"concepts":[{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.7135205268859863},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5757492184638977},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.473995566368103},{"id":"https://openalex.org/C48103436","wikidata":"https://www.wikidata.org/wiki/Q599031","display_name":"State (computer science)","level":2,"score":0.4590446352958679},{"id":"https://openalex.org/C184779094","wikidata":"https://www.wikidata.org/wiki/Q26383","display_name":"Atomic physics","level":1,"score":0.3835229277610779},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.22630321979522705},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.17585450410842896},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.16923874616622925},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.10985234379768372},{"id":"https://openalex.org/C11413529","wikidata":"https://www.wikidata.org/wiki/Q8366","display_name":"Algorithm","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.12693/aphyspola.116.560","doi":"https://doi.org/10.12693/aphyspola.116.560","is_oa":true,"landing_page_url":"https://doi.org/10.12693/aphyspola.116.560","pdf_url":"https://doi.org/10.12693/aphyspola.116.560","source":{"id":"https://openalex.org/S63733671","display_name":"Acta Physica Polonica A","issn_l":"0587-4246","issn":["0587-4246","1898-794X"],"is_oa":true,"is_in_doaj":true,"is_core":true,"listed_in":["cwts-core","ddh","doaj","dongbi-c","jufo-1","norway-1","poland-70","russia-white-list-3","vabb-shw"],"host_organization":"https://openalex.org/P4310317485","host_organization_name":"Polish Academy of Sciences","host_organization_lineage":["https://openalex.org/P4310317485"],"host_organization_lineage_names":["Polish Academy of Sciences"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Acta Physica Polonica A","raw_type":"journal-article"}],"best_oa_location":{"id":"doi:10.12693/aphyspola.116.560","doi":"https://doi.org/10.12693/aphyspola.116.560","is_oa":true,"landing_page_url":"https://doi.org/10.12693/aphyspola.116.560","pdf_url":"https://doi.org/10.12693/aphyspola.116.560","source":{"id":"https://openalex.org/S63733671","display_name":"Acta Physica Polonica A","issn_l":"0587-4246","issn":["0587-4246","1898-794X"],"is_oa":true,"is_in_doaj":true,"is_core":true,"listed_in":["cwts-core","ddh","doaj","dongbi-c","jufo-1","norway-1","poland-70","russia-white-list-3","vabb-shw"],"host_organization":"https://openalex.org/P4310317485","host_organization_name":"Polish Academy of Sciences","host_organization_lineage":["https://openalex.org/P4310317485"],"host_organization_lineage_names":["Polish Academy of Sciences"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Acta Physica Polonica A","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":true,"grobid_xml":true},"content_urls":{"pdf":"https://content.openalex.org/works/W347328754.pdf","grobid_xml":"https://content.openalex.org/works/W347328754.grobid-xml"},"referenced_works_count":8,"referenced_works":["https://openalex.org/W1985516068","https://openalex.org/W2041055595","https://openalex.org/W2046577640","https://openalex.org/W2073640126","https://openalex.org/W2140682665","https://openalex.org/W2167436994","https://openalex.org/W4246804725","https://openalex.org/W6740994493"],"related_works":["https://openalex.org/W2142940522","https://openalex.org/W2107900879","https://openalex.org/W1609763325","https://openalex.org/W1992337910","https://openalex.org/W2026302340","https://openalex.org/W2029980345","https://openalex.org/W1998652152","https://openalex.org/W3165641972","https://openalex.org/W2011378086","https://openalex.org/W2897866083"],"abstract_inverted_index":{"The":[0],"4S":[1],"[1/2]0":[2],"\u2192":[3],"4P":[4],"[3/2]1":[5],"transition":[6],"of":[7],"Ar(I)":[8],"in":[9],"a":[10,18,80,84],"facing":[11],"target":[12],"sputtering":[13],"chamber":[14],"is":[15,59,87],"measured":[16],"using":[17,34],"Ti:sapphire":[19],"ring":[20],"laser":[21],"at":[22,79],"several":[23],"operating":[24],"conditions.Doppler":[25],"width":[26,44],"and":[27,50,83],"line":[28,57],"intensity":[29,58],"are":[30],"determined":[31,40],"by":[32,66],"analysis":[33],"the":[35,42,56,62,68],"Voigt":[36],"function.The":[37],"thermodynamic":[38],"temperature":[39,64],"from":[41,55],"Doppler":[43],"increases":[45],"linearly":[46],"with":[47],"discharge":[48,69,81],"current":[49,70,82],"gas":[51,85],"pressure.The":[52],"population":[53,77],"density":[54,78],"reduced":[60],"to":[61,71,75],"reference":[63],"obtained":[65],"interpolating":[67],"zero.The":[72],"empirical":[73],"relationship":[74],"describe":[76],"pressure":[86],"discussed.":[88]},"counts_by_year":[{"year":2015,"cited_by_count":1},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":1}],"updated_date":"2026-09-07T09:17:50.787605","created_date":"2016-06-24T00:00:00"}