{"id":"https://openalex.org/W3217545366","doi":"https://doi.org/10.3390/mi12121441","title":"Low Subthreshold Slope AlGaN/GaN MOS-HEMT with Spike-Annealed HfO2 Gate Dielectric","display_name":"Low Subthreshold Slope AlGaN/GaN MOS-HEMT with Spike-Annealed HfO2 Gate Dielectric","publication_year":2021,"publication_date":"2021-11-25","ids":{"openalex":"https://openalex.org/W3217545366","doi":"https://doi.org/10.3390/mi12121441","mag":"3217545366","pmid":"https://pubmed.ncbi.nlm.nih.gov/34945290","pmcid":"https://www.ncbi.nlm.nih.gov/pmc/articles/8709384"},"language":"en","primary_location":{"id":"doi:10.3390/mi12121441","doi":"https://doi.org/10.3390/mi12121441","is_oa":true,"landing_page_url":"https://doi.org/10.3390/mi12121441","pdf_url":"https://www.mdpi.com/2072-666X/12/12/1441/pdf?version=1637844733","source":{"id":"https://openalex.org/S96702057","display_name":"Micromachines","issn_l":"2072-666X","issn":["2072-666X"],"is_oa":true,"is_in_doaj":true,"is_core":true,"listed_in":["cwts-core","doaj","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310310987","host_organization_name":"Multidisciplinary Digital Publishing Institute","host_organization_lineage":["https://openalex.org/P4310310987"],"host_organization_lineage_names":["Multidisciplinary Digital Publishing Institute"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Micromachines","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref","doaj","pubmed"],"open_access":{"is_oa":true,"oa_status":"gold","oa_url":"https://www.mdpi.com/2072-666X/12/12/1441/pdf?version=1637844733","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5030435759","display_name":"Min Jae Yeom","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I141371507","display_name":"Soongsil University","ror":"https://ror.org/017xnm587","country_code":"KR","type":"education","lineage":["https://openalex.org/I141371507"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Min Jae Yeom","raw_affiliation_strings":["School of Electronic Engineering, Soongsil University, Seoul 06938, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of Electronic Engineering, Soongsil University, Seoul 06938, Korea","institution_ids":["https://openalex.org/I141371507"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5089878294","display_name":"Jeong Yong Yang","orcid":"https://orcid.org/0000-0002-8887-5295","observed_orcids":["https://orcid.org/0000-0002-8887-5295"]},"institutions":[{"id":"https://openalex.org/I141371507","display_name":"Soongsil University","ror":"https://ror.org/017xnm587","country_code":"KR","type":"education","lineage":["https://openalex.org/I141371507"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jeong Yong Yang","raw_affiliation_strings":["School of Electronic Engineering, Soongsil University, Seoul 06938, Korea"],"raw_orcid":"https://orcid.org/0000-0002-8887-5295","affiliations":[{"raw_affiliation_string":"School of Electronic Engineering, Soongsil University, Seoul 06938, Korea","institution_ids":["https://openalex.org/I141371507"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101954961","display_name":"Chan Ho Lee","orcid":"https://orcid.org/0000-0003-2065-7379","observed_orcids":["https://orcid.org/0000-0003-2065-7379"]},"institutions":[{"id":"https://openalex.org/I141371507","display_name":"Soongsil University","ror":"https://ror.org/017xnm587","country_code":"KR","type":"education","lineage":["https://openalex.org/I141371507"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Chan Ho Lee","raw_affiliation_strings":["School of Electronic Engineering, Soongsil University, Seoul 06938, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of Electronic Engineering, Soongsil University, Seoul 06938, Korea","institution_ids":["https://openalex.org/I141371507"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5077052263","display_name":"Junseok Heo","orcid":"https://orcid.org/0000-0002-8125-6141","observed_orcids":["https://orcid.org/0000-0002-8125-6141"]},"institutions":[{"id":"https://openalex.org/I57664883","display_name":"Ajou University","ror":"https://ror.org/03tzb2h73","country_code":"KR","type":"education","lineage":["https://openalex.org/I57664883"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Junseok Heo","raw_affiliation_strings":["Department of Electrical and Computer Engineering, Ajou University, Suwon 16499, Korea"],"raw_orcid":"https://orcid.org/0000-0002-8125-6141","affiliations":[{"raw_affiliation_string":"Department of Electrical and Computer Engineering, Ajou University, Suwon 16499, Korea","institution_ids":["https://openalex.org/I57664883"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5084578964","display_name":"Roy B. Chung","orcid":"https://orcid.org/0000-0002-1599-5034","observed_orcids":["https://orcid.org/0000-0002-1599-5034"]},"institutions":[{"id":"https://openalex.org/I31419693","display_name":"Kyungpook National University","ror":"https://ror.org/040c17130","country_code":"KR","type":"education","lineage":["https://openalex.org/I31419693"]}],"countries":["KR"],"is_corresponding":true,"raw_author_name":"Roy Byung Kyu Chung","raw_affiliation_strings":["Department of Electronic Materials Science and Engineering, Kyungpook National University, Daegu 41566, Korea"],"raw_orcid":"https://orcid.org/0000-0002-1599-5034","affiliations":[{"raw_affiliation_string":"Department of Electronic Materials Science and Engineering, Kyungpook National University, Daegu 41566, Korea","institution_ids":["https://openalex.org/I31419693"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5060246416","display_name":"Geonwook Yoo","orcid":"https://orcid.org/0000-0002-7826-9005","observed_orcids":["https://orcid.org/0000-0002-7826-9005"]},"institutions":[{"id":"https://openalex.org/I141371507","display_name":"Soongsil University","ror":"https://ror.org/017xnm587","country_code":"KR","type":"education","lineage":["https://openalex.org/I141371507"]}],"countries":["KR"],"is_corresponding":true,"raw_author_name":"Geonwook Yoo","raw_affiliation_strings":["School of Electronic Engineering, Soongsil University, Seoul 06938, Korea"],"raw_orcid":"https://orcid.org/0000-0002-7826-9005","affiliations":[{"raw_affiliation_string":"School of Electronic Engineering, Soongsil University, Seoul 06938, Korea","institution_ids":["https://openalex.org/I141371507"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5060246416","https://openalex.org/A5084578964"],"corresponding_institution_ids":["https://openalex.org/I141371507","https://openalex.org/I31419693"],"apc_list":{"value":1800,"currency":"CHF","value_usd":1944},"apc_paid":{"value":1800,"currency":"CHF","value_usd":1944},"fwci":0.6718,"has_fulltext":true,"cited_by_count":16,"citation_normalized_percentile":{"value":0.6122756,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":98},"biblio":{"volume":"12","issue":"12","first_page":"1441","last_page":"1441"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10099","display_name":"GaN-based semiconductor devices and materials","score":0.9829000234603882,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10099","display_name":"GaN-based semiconductor devices and materials","score":0.9829000234603882,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12808","display_name":"Ferroelectric and Negative Capacitance Devices","score":0.008899999782443047,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.004999999888241291,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/algan-gan-mos-hemt","display_name":"AlGaN/GaN MOS-HEMT","score":0.9710000157356262},{"id":"https://openalex.org/keywords/hfo2-gate-dielectric","display_name":"HfO2 gate dielectric","score":0.8759999871253967},{"id":"https://openalex.org/keywords/spike-annealing","display_name":"spike annealing","score":0.9089999794960022},{"id":"https://openalex.org/keywords/ferroelectricity","display_name":"ferroelectricity","score":0.8389999866485596},{"id":"https://openalex.org/keywords/on-off-ratio","display_name":"on/off current ratio","score":0.8199999928474426},{"id":"https://openalex.org/keywords/high-power-switching-devices","display_name":"high-power switching devices","score":0.7760000228881836},{"id":"https://openalex.org/keywords/atomic-layer-deposition","display_name":"atomic layer deposition","score":0.7509999871253967}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7795995473861694},{"id":"https://openalex.org/C162057924","wikidata":"https://www.wikidata.org/wiki/Q1617706","display_name":"High-electron-mobility transistor","level":4,"score":0.7553284764289856},{"id":"https://openalex.org/C156465305","wikidata":"https://www.wikidata.org/wiki/Q1658601","display_name":"Subthreshold conduction","level":4,"score":0.7259084582328796},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.6596726179122925},{"id":"https://openalex.org/C103566474","wikidata":"https://www.wikidata.org/wiki/Q7632226","display_name":"Subthreshold slope","level":5,"score":0.6496708393096924},{"id":"https://openalex.org/C166972891","wikidata":"https://www.wikidata.org/wiki/Q5527011","display_name":"Gate dielectric","level":4,"score":0.5989280939102173},{"id":"https://openalex.org/C133386390","wikidata":"https://www.wikidata.org/wiki/Q184996","display_name":"Dielectric","level":2,"score":0.4946388900279999},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.4793761074542999},{"id":"https://openalex.org/C195370968","wikidata":"https://www.wikidata.org/wiki/Q1754002","display_name":"Threshold voltage","level":4,"score":0.451764851808548},{"id":"https://openalex.org/C172385210","wikidata":"https://www.wikidata.org/wiki/Q5339","display_name":"Transistor","level":3,"score":0.3026965856552124},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.23335695266723633},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.15432468056678772},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.14290842413902283},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0}],"mesh":[],"locations_count":4,"locations":[{"id":"doi:10.3390/mi12121441","doi":"https://doi.org/10.3390/mi12121441","is_oa":true,"landing_page_url":"https://doi.org/10.3390/mi12121441","pdf_url":"https://www.mdpi.com/2072-666X/12/12/1441/pdf?version=1637844733","source":{"id":"https://openalex.org/S96702057","display_name":"Micromachines","issn_l":"2072-666X","issn":["2072-666X"],"is_oa":true,"is_in_doaj":true,"is_core":true,"listed_in":["cwts-core","doaj","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310310987","host_organization_name":"Multidisciplinary Digital Publishing Institute","host_organization_lineage":["https://openalex.org/P4310310987"],"host_organization_lineage_names":["Multidisciplinary Digital Publishing Institute"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Micromachines","raw_type":"journal-article"},{"id":"pmid:34945290","doi":null,"is_oa":false,"landing_page_url":"https://pubmed.ncbi.nlm.nih.gov/34945290","pdf_url":null,"source":{"id":"https://openalex.org/S4306525036","display_name":"PubMed","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I1299303238","host_organization_name":"National Institutes of Health","host_organization_lineage":["https://openalex.org/I1299303238"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Micromachines","raw_type":"Journal Article"},{"id":"pmh:oai:pubmedcentral.nih.gov:8709384","doi":null,"is_oa":true,"landing_page_url":"https://pmc.ncbi.nlm.nih.gov/articles/PMC8709384/","pdf_url":null,"source":{"id":"https://openalex.org/S2764455111","display_name":"PubMed Central","issn_l":null,"issn":null,"is_oa":true,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I1299303238","host_organization_name":"National Institutes of Health","host_organization_lineage":["https://openalex.org/I1299303238"],"host_organization_lineage_names":[],"type":"repository"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Micromachines (Basel)","raw_type":"Text"},{"id":"pmh:oai:doaj.org/article:d5656ace5b044824aed7fb9559748f74","doi":null,"is_oa":true,"landing_page_url":"https://doaj.org/article/d5656ace5b044824aed7fb9559748f74","pdf_url":null,"source":{"id":"https://openalex.org/S4306401280","display_name":"DOAJ (DOAJ: Directory of Open Access Journals)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":"cc-by-sa","license_id":"https://openalex.org/licenses/cc-by-sa","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Micromachines, Vol 12, Iss 12, p 1441 (2021)","raw_type":"article"}],"best_oa_location":{"id":"doi:10.3390/mi12121441","doi":"https://doi.org/10.3390/mi12121441","is_oa":true,"landing_page_url":"https://doi.org/10.3390/mi12121441","pdf_url":"https://www.mdpi.com/2072-666X/12/12/1441/pdf?version=1637844733","source":{"id":"https://openalex.org/S96702057","display_name":"Micromachines","issn_l":"2072-666X","issn":["2072-666X"],"is_oa":true,"is_in_doaj":true,"is_core":true,"listed_in":["cwts-core","doaj","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310310987","host_organization_name":"Multidisciplinary Digital Publishing Institute","host_organization_lineage":["https://openalex.org/P4310310987"],"host_organization_lineage_names":["Multidisciplinary Digital Publishing Institute"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Micromachines","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[{"id":"https://openalex.org/G325833619","display_name":null,"funder_award_id":"NRF-2021R1I1A3054907","funder_id":"https://openalex.org/F4320322120","funder_display_name":"National Research Foundation of Korea"},{"id":"https://openalex.org/G718554409","display_name":null,"funder_award_id":"2021R1F1A1058006","funder_id":"https://openalex.org/F4320322120","funder_display_name":"National Research Foundation of Korea"},{"id":"https://openalex.org/G9000209184","display_name":null,"funder_award_id":"2021R1A4A1033155","funder_id":"https://openalex.org/F4320322120","funder_display_name":"National Research Foundation of Korea"}],"funders":[{"id":"https://openalex.org/F4320322120","display_name":"National Research Foundation of Korea","ror":"https://ror.org/013aysd81"}],"has_content":{"pdf":true,"grobid_xml":true},"content_urls":{"pdf":"https://content.openalex.org/works/W3217545366.pdf","grobid_xml":"https://content.openalex.org/works/W3217545366.grobid-xml"},"referenced_works_count":24,"referenced_works":["https://openalex.org/W597886269","https://openalex.org/W1984934977","https://openalex.org/W1993932557","https://openalex.org/W2024600253","https://openalex.org/W2024861134","https://openalex.org/W2063946385","https://openalex.org/W2069325331","https://openalex.org/W2086103622","https://openalex.org/W2143753340","https://openalex.org/W2147973136","https://openalex.org/W2209714492","https://openalex.org/W2275031710","https://openalex.org/W2593495332","https://openalex.org/W2750640809","https://openalex.org/W2765270875","https://openalex.org/W2788013722","https://openalex.org/W2908557318","https://openalex.org/W2972234587","https://openalex.org/W2991994266","https://openalex.org/W3000289161","https://openalex.org/W3049661070","https://openalex.org/W3127253772","https://openalex.org/W3130459262","https://openalex.org/W4237116062"],"related_works":["https://openalex.org/W4400843438","https://openalex.org/W2991994266","https://openalex.org/W2071095895","https://openalex.org/W2739063235","https://openalex.org/W3138161297","https://openalex.org/W2952119914","https://openalex.org/W1497509279","https://openalex.org/W2905682772","https://openalex.org/W2573633661","https://openalex.org/W2025704411"],"abstract_inverted_index":{"AlGaN/GaN":[0,88],"metal-oxide":[1],"semiconductor":[2],"high":[3],"electron":[4],"mobility":[5],"transistors":[6],"(MOS-HEMTs)":[7],"with":[8],"undoped":[9,55],"ferroelectric":[10],"HfO2":[11,33,56],"have":[12],"been":[13],"investigated.":[14],"Annealing":[15],"is":[16,37],"often":[17],"a":[18,82,108,112],"critical":[19,109],"step":[20,110],"for":[21],"improving":[22],"the":[23,41,46,54,65,75,79,84,103],"quality":[24],"of":[25,32,48,87],"as-deposited":[26],"amorphous":[27],"gate":[28,34,57],"oxides.":[29],"Thermal":[30],"treatment":[31],"dielectric,":[35],"however,":[36],"known":[38],"to":[39,45,73,91],"degrade":[40],"oxide/nitride":[42],"interface":[43,105],"due":[44],"formation":[47],"Ga-containing":[49],"oxide.":[50],"In":[51],"this":[52],"work,":[53],"dielectric":[58],"was":[59,67],"spike-annealed":[60],"at":[61],"600":[62],"\u00b0C":[63],"after":[64],"film":[66],"deposited":[68],"by":[69],"atomic":[70],"layer":[71],"deposition":[72],"improve":[74],"ferroelectricity":[76],"without":[77],"degrading":[78],"interface.":[80],"As":[81],"result,":[83],"subthreshold":[85],"slope":[86],"MOS-HEMTs":[89],"close":[90],"60":[92],"mV/dec":[93],"and":[94],"on/off":[95],"ratio>109":[96],"were":[97],"achieved.":[98],"These":[99],"results":[100],"suggest":[101],"optimizing":[102],"HfO2/nitride":[104],"can":[106],"be":[107],"towards":[111],"low-loss":[113],"high-power":[114],"switching":[115],"device.":[116]},"counts_by_year":[{"year":2026,"cited_by_count":4},{"year":2025,"cited_by_count":5},{"year":2024,"cited_by_count":3},{"year":2023,"cited_by_count":3},{"year":2022,"cited_by_count":1}],"updated_date":"2026-11-13T13:42:25.865203","created_date":"2021-12-06T00:00:00"}