{"id":"https://openalex.org/W3204723757","doi":"https://doi.org/10.1117/12.2605516","title":"New metrology technique for measuring wafer geometry on a full 300mm silicon wafer","display_name":"New metrology technique for measuring wafer geometry on a full 300mm silicon wafer","publication_year":2021,"publication_date":"2021-09-28","ids":{"openalex":"https://openalex.org/W3204723757","doi":"https://doi.org/10.1117/12.2605516","mag":"3204723757"},"language":"en","primary_location":{"id":"doi:10.1117/12.2605516","doi":"https://doi.org/10.1117/12.2605516","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2605516","pdf_url":null,"source":{"id":"https://openalex.org/S7407088434","display_name":"International Conference on Extreme Ultraviolet Lithography","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"International Conference on Extreme Ultraviolet Lithography 2021","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5085391592","display_name":"Juan M. Trujillo-Sevilla","orcid":"https://orcid.org/0000-0002-7785-0746","observed_orcids":["https://orcid.org/0000-0002-7785-0746"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Juan M. Trujillo-Sevilla","raw_affiliation_strings":["Wooptix SL (Spain)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Wooptix SL (Spain)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5009497968","display_name":"\u00d3scar Casanova-Gonz\u00e1lez","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Oscar Casanova-Gonz\u00e1lez","raw_affiliation_strings":["Wooptix SL (Spain)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Wooptix SL (Spain)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5000585590","display_name":"Miriam Velasco\u2010Oca\u00f1a","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Miriam Velasco-Oca\u00f1a","raw_affiliation_strings":["Wooptix SL (Spain)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Wooptix SL (Spain)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5021814503","display_name":"Sabato Ceruso","orcid":"https://orcid.org/0000-0002-3989-9573","observed_orcids":["https://orcid.org/0000-0002-3989-9573"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Sabato Ceruso","raw_affiliation_strings":["Wooptix SL (Spain)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Wooptix SL (Spain)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5072767012","display_name":"Ricardo Oliva-Garc\u00eda","orcid":"https://orcid.org/0000-0002-2093-5423","observed_orcids":["https://orcid.org/0000-0002-2093-5423"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Ricardo Oliva-Garc\u00eda","raw_affiliation_strings":["Wooptix SL (Spain)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Wooptix SL (Spain)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5083202836","display_name":"\u00d3scar G\u00f3mez-C\u00e1rdenes","orcid":"https://orcid.org/0000-0002-7951-982X","observed_orcids":["https://orcid.org/0000-0002-7951-982X"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u00d3scar G\u00f3mez-C\u00e1rdenes","raw_affiliation_strings":["Wooptix SL (Spain)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Wooptix SL (Spain)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5103548918","display_name":"Javier Mart\u00edn Hern\u00e1ndez","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Javier Mart\u00edn-Hern\u00e1ndez","raw_affiliation_strings":["Wooptix SL (Spain)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Wooptix SL (Spain)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5041176365","display_name":"Alex Roqu\u00e9-Velasco","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Alex Roqu\u00e9-Velasco","raw_affiliation_strings":["Wooptix SL (Spain)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Wooptix SL (Spain)","institution_ids":[]}]},{"author_position":"middle","author":{"id":null,"display_name":"\u00c1lvaro P\u00e9rez-Garc\u00eda","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u00c1lvaro P\u00e9rez-Garc\u00eda","raw_affiliation_strings":["Wooptix SL (Spain)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Wooptix SL (Spain)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108416589","display_name":"Jos\u00e9 Manuel Rodr\u00edguez-Ramos","orcid":"https://orcid.org/0000-0003-2021-8034","observed_orcids":["https://orcid.org/0000-0003-2021-8034"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Jos\u00e9 Manuel Ramos","raw_affiliation_strings":["Wooptix SL (Spain)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Wooptix SL (Spain)","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5019808670","display_name":"Jan O. Gaudestad","orcid":"https://orcid.org/0009-0008-1777-3073","observed_orcids":["https://orcid.org/0009-0008-1777-3073"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Jan O. Gaudestad","raw_affiliation_strings":["Wooptix SL (Spain)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Wooptix SL (Spain)","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.4622,"has_fulltext":false,"cited_by_count":7,"citation_normalized_percentile":{"value":0.6965049,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":91,"max":95},"biblio":{"volume":null,"issue":null,"first_page":"57","last_page":"57"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10638","display_name":"Optical measurement and interference techniques","score":0.8119999766349792,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10638","display_name":"Optical measurement and interference techniques","score":0.8119999766349792,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.08609999716281891,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11583","display_name":"Advanced Measurement and Metrology Techniques","score":0.03959999978542328,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/wafer-flatness","display_name":"wafer flatness","score":0.9210000038146973},{"id":"https://openalex.org/keywords/back-end-of-line","display_name":"back-end-of-line","score":0.6610000133514404},{"id":"https://openalex.org/keywords/depth-of-focus","display_name":"depth of focus","score":0.5860000252723694},{"id":"https://openalex.org/keywords/overlay-error","display_name":"overlay error","score":0.7229999899864197},{"id":"https://openalex.org/keywords/in-line-process-control","display_name":"in-line process control","score":0.597000002861023},{"id":"https://openalex.org/keywords/high-volume-manufacturing","display_name":"high-volume manufacturing","score":0.4090000092983246}],"concepts":[{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.9140458106994629},{"id":"https://openalex.org/C195766429","wikidata":"https://www.wikidata.org/wiki/Q394","display_name":"Metrology","level":2,"score":0.8270546197891235},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5252675414085388},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.5056130886077881},{"id":"https://openalex.org/C165880335","wikidata":"https://www.wikidata.org/wiki/Q5277273","display_name":"Dimensional metrology","level":3,"score":0.4283289313316345},{"id":"https://openalex.org/C199639397","wikidata":"https://www.wikidata.org/wiki/Q1788588","display_name":"Engineering drawing","level":1,"score":0.3968921899795532},{"id":"https://openalex.org/C78519656","wikidata":"https://www.wikidata.org/wiki/Q101333","display_name":"Mechanical engineering","level":1,"score":0.3540840148925781},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.32616809010505676},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.31608206033706665},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.3104797899723053},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.3099125027656555},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.1636071801185608}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.2605516","doi":"https://doi.org/10.1117/12.2605516","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2605516","pdf_url":null,"source":{"id":"https://openalex.org/S7407088434","display_name":"International Conference on Extreme Ultraviolet Lithography","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"International Conference on Extreme Ultraviolet Lithography 2021","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":6,"referenced_works":["https://openalex.org/W2074142178","https://openalex.org/W2597475122","https://openalex.org/W2903906416","https://openalex.org/W2966907912","https://openalex.org/W3009254860","https://openalex.org/W3011847190"],"related_works":["https://openalex.org/W4283777880","https://openalex.org/W4292387027","https://openalex.org/W4281564209","https://openalex.org/W4298064613","https://openalex.org/W3114061344","https://openalex.org/W4392639407","https://openalex.org/W4282831045","https://openalex.org/W4381683621","https://openalex.org/W4323538534","https://openalex.org/W2967173905"],"abstract_inverted_index":{"The":[0,71],"flatness":[1],"of":[2,38,53,61,142,180],"the":[3,21,39,77,100,105,122,143],"silicon":[4],"wafers":[5,97],"used":[6],"to":[7,14,17,42,64,98,108],"manufacture":[8],"integrated":[9],"circuits":[10],"(IC)":[11],"is":[12,24,82,136],"controlled":[13],"tight":[15],"tolerances":[16],"help":[18],"ensure":[19,65,109],"that":[20],"full":[22,173],"wafer":[23,40,144,158,175],"sufficiently":[25],"flat":[26],"for":[27,68,76,114,140],"lithographic":[28,31],"processing.":[29],"Advanced":[30],"patterning":[32],"processes":[33],"require":[34],"a":[35,156,172,177],"detailed":[36],"map":[37],"shape":[41],"avoid":[43],"overlay":[44],"errors":[45],"caused":[46],"by":[47],"depth-of-focus":[48],"issues.":[49],"A":[50],"large":[51],"variety":[52],"new":[54,69,157],"materials":[55],"are":[56],"being":[57],"introduced":[58],"in":[59,168],"Back-End":[60],"Lines":[62],"(BEOL)":[63],"innovative":[66],"architecture":[67,130],"applications.":[70],"standard":[72],"in-line":[73],"control":[74,113],"plan":[75],"BEOL":[78],"layer":[79],"deposition":[80],"steps":[81],"based":[83],"on":[84,95,171],"film":[85],"thickness":[86],"and":[87,127,129,132],"global":[88],"stress":[89],"measurements":[90],"which":[91],"can":[92],"be":[93],"performed":[94],"blanket":[96],"check":[99],"process":[101,115],"equipment":[102,116],"performance.":[103],"However,":[104],"challenge":[106],"remains":[107],"high":[110,118],"performance":[111],"metrology":[112],"during":[117],"volume":[119],"manufacturing.":[120],"With":[121],"product":[123],"tolerance":[124],"getting":[125],"tighter":[126,128],"more":[131,133],"complex,":[134],"there":[135],"an":[137],"increasing":[138],"demand":[139],"knowledge":[141],"shape.":[145],"In":[146],"this":[147],"paper":[148],"we":[149],"present":[150],"Wave":[151],"Front":[152],"Phase":[153],"Imaging":[154],"(WFPI),":[155],"geometry":[159],"technique,":[160],"where":[161],"7.65":[162],"million":[163],"data":[164],"points":[165],"were":[166],"acquired":[167],"5":[169],"seconds":[170],"300mm":[174],"enabling":[176],"lateral":[178],"resolution":[179],"96\u03bcm.":[181]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2024,"cited_by_count":2},{"year":2023,"cited_by_count":2},{"year":2022,"cited_by_count":2}],"updated_date":"2026-10-16T09:59:22.235173","created_date":"2021-10-11T00:00:00"}