{"id":"https://openalex.org/W3203098910","doi":"https://doi.org/10.1002/adfm.202106830","title":"Ultrasensitive Molecular Sensors Based on Real\u2010Time Impedance Spectroscopy in Solution\u2010Processed 2D Materials","display_name":"Ultrasensitive Molecular Sensors Based on Real\u2010Time Impedance Spectroscopy in Solution\u2010Processed 2D Materials","publication_year":2021,"publication_date":"2021-10-03","ids":{"openalex":"https://openalex.org/W3203098910","doi":"https://doi.org/10.1002/adfm.202106830","mag":"3203098910"},"language":"en","primary_location":{"id":"doi:10.1002/adfm.202106830","doi":"https://doi.org/10.1002/adfm.202106830","is_oa":false,"landing_page_url":"https://doi.org/10.1002/adfm.202106830","pdf_url":null,"source":{"id":"https://openalex.org/S135204980","display_name":"Advanced Functional Materials","issn_l":"1616-301X","issn":["1616-301X","1616-3028"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-3","ki-jl-3","norway-2","poland-200","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Advanced Functional Materials","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5101916041","display_name":"David C. Moore","orcid":"https://orcid.org/0009-0004-9496-6427","observed_orcids":["https://orcid.org/0009-0004-9496-6427"]},"institutions":[{"id":"https://openalex.org/I1280414376","display_name":"United States Air Force Research Laboratory","ror":"https://ror.org/02e2egq70","country_code":"US","type":"facility","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4389425425"]},{"id":"https://openalex.org/I4210158237","display_name":"UES (United States)","ror":"https://ror.org/05rpnj507","country_code":"US","type":"company","lineage":["https://openalex.org/I4210158237","https://openalex.org/I4405259804"]},{"id":"https://openalex.org/I4388482708","display_name":"U.S. Air Force Research Laboratory Materials and Manufacturing Directorate","ror":"https://ror.org/0584m4844","country_code":"US","type":"government","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4388482708","https://openalex.org/I4389425425"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"David C. Moore","raw_affiliation_strings":["Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","UES Inc., Dayton, OH, 45432 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I4388482708"]},{"raw_affiliation_string":"UES Inc., Dayton, OH, 45432 USA","institution_ids":["https://openalex.org/I4210158237"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5033746104","display_name":"Ali M. Jawaid","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1280414376","display_name":"United States Air Force Research Laboratory","ror":"https://ror.org/02e2egq70","country_code":"US","type":"facility","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4389425425"]},{"id":"https://openalex.org/I4210158237","display_name":"UES (United States)","ror":"https://ror.org/05rpnj507","country_code":"US","type":"company","lineage":["https://openalex.org/I4210158237","https://openalex.org/I4405259804"]},{"id":"https://openalex.org/I4388482708","display_name":"U.S. Air Force Research Laboratory Materials and Manufacturing Directorate","ror":"https://ror.org/0584m4844","country_code":"US","type":"government","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4388482708","https://openalex.org/I4389425425"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Ali Jawaid","raw_affiliation_strings":["Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","UES Inc., Dayton, OH, 45432 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I4388482708"]},{"raw_affiliation_string":"UES Inc., Dayton, OH, 45432 USA","institution_ids":["https://openalex.org/I4210158237"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5025417159","display_name":"Robert Busch","orcid":"https://orcid.org/0000-0001-5037-4017","observed_orcids":["https://orcid.org/0000-0001-5037-4017"]},"institutions":[{"id":"https://openalex.org/I1280414376","display_name":"United States Air Force Research Laboratory","ror":"https://ror.org/02e2egq70","country_code":"US","type":"facility","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4389425425"]},{"id":"https://openalex.org/I4210158237","display_name":"UES (United States)","ror":"https://ror.org/05rpnj507","country_code":"US","type":"company","lineage":["https://openalex.org/I4210158237","https://openalex.org/I4405259804"]},{"id":"https://openalex.org/I4388482708","display_name":"U.S. Air Force Research Laboratory Materials and Manufacturing Directorate","ror":"https://ror.org/0584m4844","country_code":"US","type":"government","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4388482708","https://openalex.org/I4389425425"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Robert Busch","raw_affiliation_strings":["Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","UES Inc., Dayton, OH, 45432 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I4388482708"]},{"raw_affiliation_string":"UES Inc., Dayton, OH, 45432 USA","institution_ids":["https://openalex.org/I4210158237"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5082450658","display_name":"Michael C. Brothers","orcid":"https://orcid.org/0000-0002-8239-2399","observed_orcids":["https://orcid.org/0000-0002-8239-2399"]},"institutions":[{"id":"https://openalex.org/I1280414376","display_name":"United States Air Force Research Laboratory","ror":"https://ror.org/02e2egq70","country_code":"US","type":"facility","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4389425425"]},{"id":"https://openalex.org/I2799950915","display_name":"Wright-Patterson Air Force Base","ror":"https://ror.org/0097e1k27","country_code":"US","type":"other","lineage":["https://openalex.org/I1330347796","https://openalex.org/I2799950915","https://openalex.org/I4210089612","https://openalex.org/I4210102105"]},{"id":"https://openalex.org/I4210158237","display_name":"UES (United States)","ror":"https://ror.org/05rpnj507","country_code":"US","type":"company","lineage":["https://openalex.org/I4210158237","https://openalex.org/I4405259804"]},{"id":"https://openalex.org/I4388482649","display_name":"711th Human Performance Wing","ror":"https://ror.org/04d0hsa39","country_code":"US","type":"government","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4388482649","https://openalex.org/I4389425425"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Michael Brothers","raw_affiliation_strings":["711th Human Performance Wing, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","UES Inc., Dayton, OH, 45432 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"711th Human Performance Wing, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I2799950915","https://openalex.org/I4388482649"]},{"raw_affiliation_string":"UES Inc., Dayton, OH, 45432 USA","institution_ids":["https://openalex.org/I4210158237"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108297697","display_name":"Paige Miesle","orcid":"https://orcid.org/0000-0001-5579-1266","observed_orcids":["https://orcid.org/0000-0001-5579-1266"]},"institutions":[{"id":"https://openalex.org/I1280414376","display_name":"United States Air Force Research Laboratory","ror":"https://ror.org/02e2egq70","country_code":"US","type":"facility","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4389425425"]},{"id":"https://openalex.org/I4210158237","display_name":"UES (United States)","ror":"https://ror.org/05rpnj507","country_code":"US","type":"company","lineage":["https://openalex.org/I4210158237","https://openalex.org/I4405259804"]},{"id":"https://openalex.org/I4388482708","display_name":"U.S. Air Force Research Laboratory Materials and Manufacturing Directorate","ror":"https://ror.org/0584m4844","country_code":"US","type":"government","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4388482708","https://openalex.org/I4389425425"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Paige Miesle","raw_affiliation_strings":["Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","UES Inc., Dayton, OH, 45432 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I4388482708"]},{"raw_affiliation_string":"UES Inc., Dayton, OH, 45432 USA","institution_ids":["https://openalex.org/I4210158237"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5085874259","display_name":"Adam T. Miesle","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1280414376","display_name":"United States Air Force Research Laboratory","ror":"https://ror.org/02e2egq70","country_code":"US","type":"facility","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4389425425"]},{"id":"https://openalex.org/I4210158237","display_name":"UES (United States)","ror":"https://ror.org/05rpnj507","country_code":"US","type":"company","lineage":["https://openalex.org/I4210158237","https://openalex.org/I4405259804"]},{"id":"https://openalex.org/I4388482708","display_name":"U.S. Air Force Research Laboratory Materials and Manufacturing Directorate","ror":"https://ror.org/0584m4844","country_code":"US","type":"government","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4388482708","https://openalex.org/I4389425425"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Adam Miesle","raw_affiliation_strings":["Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","UES Inc., Dayton, OH, 45432 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I4388482708"]},{"raw_affiliation_string":"UES Inc., Dayton, OH, 45432 USA","institution_ids":["https://openalex.org/I4210158237"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5003586421","display_name":"Rahul S. Rao","orcid":"https://orcid.org/0000-0002-6415-0185","observed_orcids":["https://orcid.org/0000-0002-6415-0185"]},"institutions":[{"id":"https://openalex.org/I1280414376","display_name":"United States Air Force Research Laboratory","ror":"https://ror.org/02e2egq70","country_code":"US","type":"facility","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4389425425"]},{"id":"https://openalex.org/I4388482708","display_name":"U.S. Air Force Research Laboratory Materials and Manufacturing Directorate","ror":"https://ror.org/0584m4844","country_code":"US","type":"government","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4388482708","https://openalex.org/I4389425425"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Rahul Rao","raw_affiliation_strings":["Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I4388482708"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5070990802","display_name":"Jonghoon Lee","orcid":"https://orcid.org/0000-0002-5144-2488","observed_orcids":["https://orcid.org/0000-0002-5144-2488"]},"institutions":[{"id":"https://openalex.org/I1280414376","display_name":"United States Air Force Research Laboratory","ror":"https://ror.org/02e2egq70","country_code":"US","type":"facility","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4389425425"]},{"id":"https://openalex.org/I4210159399","display_name":"Universal Technology Corporation (United States)","ror":"https://ror.org/04bssxt85","country_code":"US","type":"company","lineage":["https://openalex.org/I4210159399"]},{"id":"https://openalex.org/I4388482708","display_name":"U.S. Air Force Research Laboratory Materials and Manufacturing Directorate","ror":"https://ror.org/0584m4844","country_code":"US","type":"government","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4388482708","https://openalex.org/I4389425425"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Jonghoon Lee","raw_affiliation_strings":["Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","Universal Technology Corporation, Dayton, OH, 45432 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I4388482708"]},{"raw_affiliation_string":"Universal Technology Corporation, Dayton, OH, 45432 USA","institution_ids":["https://openalex.org/I4210159399"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5089903978","display_name":"Lucas K. Beagle","orcid":"https://orcid.org/0000-0001-9557-5461","observed_orcids":["https://orcid.org/0000-0001-9557-5461"]},"institutions":[{"id":"https://openalex.org/I1280414376","display_name":"United States Air Force Research Laboratory","ror":"https://ror.org/02e2egq70","country_code":"US","type":"facility","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4389425425"]},{"id":"https://openalex.org/I4210158237","display_name":"UES (United States)","ror":"https://ror.org/05rpnj507","country_code":"US","type":"company","lineage":["https://openalex.org/I4210158237","https://openalex.org/I4405259804"]},{"id":"https://openalex.org/I4388482708","display_name":"U.S. Air Force Research Laboratory Materials and Manufacturing Directorate","ror":"https://ror.org/0584m4844","country_code":"US","type":"government","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4388482708","https://openalex.org/I4389425425"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Lucas K. Beagle","raw_affiliation_strings":["Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","UES Inc., Dayton, OH, 45432 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I4388482708"]},{"raw_affiliation_string":"UES Inc., Dayton, OH, 45432 USA","institution_ids":["https://openalex.org/I4210158237"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5053492678","display_name":"Michael J. Motala","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1280414376","display_name":"United States Air Force Research Laboratory","ror":"https://ror.org/02e2egq70","country_code":"US","type":"facility","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4389425425"]},{"id":"https://openalex.org/I4210158237","display_name":"UES (United States)","ror":"https://ror.org/05rpnj507","country_code":"US","type":"company","lineage":["https://openalex.org/I4210158237","https://openalex.org/I4405259804"]},{"id":"https://openalex.org/I4388482708","display_name":"U.S. Air Force Research Laboratory Materials and Manufacturing Directorate","ror":"https://ror.org/0584m4844","country_code":"US","type":"government","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4388482708","https://openalex.org/I4389425425"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Michael Motala","raw_affiliation_strings":["Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","UES Inc., Dayton, OH, 45432 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I4388482708"]},{"raw_affiliation_string":"UES Inc., Dayton, OH, 45432 USA","institution_ids":["https://openalex.org/I4210158237"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5018739187","display_name":"Shay Goff Wallace","orcid":"https://orcid.org/0000-0002-7535-6138","observed_orcids":["https://orcid.org/0000-0002-7535-6138"]},"institutions":[{"id":"https://openalex.org/I111979921","display_name":"Northwestern University","ror":"https://ror.org/000e0be47","country_code":"US","type":"education","lineage":["https://openalex.org/I111979921"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Shay Goff Wallace","raw_affiliation_strings":["Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208 USA","institution_ids":["https://openalex.org/I111979921"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5016094974","display_name":"Julia R. Downing","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I111979921","display_name":"Northwestern University","ror":"https://ror.org/000e0be47","country_code":"US","type":"education","lineage":["https://openalex.org/I111979921"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Julia R. Downing","raw_affiliation_strings":["Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208 USA","institution_ids":["https://openalex.org/I111979921"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5008990793","display_name":"Ajit Kumar Roy","orcid":"https://orcid.org/0000-0002-3344-7437","observed_orcids":["https://orcid.org/0000-0002-3344-7437"]},"institutions":[{"id":"https://openalex.org/I1280414376","display_name":"United States Air Force Research Laboratory","ror":"https://ror.org/02e2egq70","country_code":"US","type":"facility","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4389425425"]},{"id":"https://openalex.org/I4388482708","display_name":"U.S. Air Force Research Laboratory Materials and Manufacturing Directorate","ror":"https://ror.org/0584m4844","country_code":"US","type":"government","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4388482708","https://openalex.org/I4389425425"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Ajit Roy","raw_affiliation_strings":["Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I4388482708"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5002618408","display_name":"Christopher Muratore","orcid":"https://orcid.org/0000-0002-5555-9261","observed_orcids":["https://orcid.org/0000-0002-5555-9261"]},"institutions":[{"id":"https://openalex.org/I127591826","display_name":"University of Dayton","ror":"https://ror.org/021v3qy27","country_code":"US","type":"education","lineage":["https://openalex.org/I127591826"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Christopher Muratore","raw_affiliation_strings":["Department of Chemical and Materials Engineering, University of Dayton, Dayton, OH, 45469 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Chemical and Materials Engineering, University of Dayton, Dayton, OH, 45469 USA","institution_ids":["https://openalex.org/I127591826"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5020649130","display_name":"Mark C. Hersam","orcid":"https://orcid.org/0000-0003-4120-1426","observed_orcids":["https://orcid.org/0000-0003-4120-1426"]},"institutions":[{"id":"https://openalex.org/I111979921","display_name":"Northwestern University","ror":"https://ror.org/000e0be47","country_code":"US","type":"education","lineage":["https://openalex.org/I111979921"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Mark C. Hersam","raw_affiliation_strings":["Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208 USA","institution_ids":["https://openalex.org/I111979921"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5002684335","display_name":"Richard A. Vaia","orcid":"https://orcid.org/0000-0003-4589-3423","observed_orcids":["https://orcid.org/0000-0003-4589-3423"]},"institutions":[{"id":"https://openalex.org/I1280414376","display_name":"United States Air Force Research Laboratory","ror":"https://ror.org/02e2egq70","country_code":"US","type":"facility","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4389425425"]},{"id":"https://openalex.org/I4388482708","display_name":"U.S. Air Force Research Laboratory Materials and Manufacturing Directorate","ror":"https://ror.org/0584m4844","country_code":"US","type":"government","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4388482708","https://openalex.org/I4389425425"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Richard Vaia","raw_affiliation_strings":["Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I4388482708"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5073109886","display_name":"Steve S. Kim","orcid":"https://orcid.org/0000-0002-9519-077X","observed_orcids":["https://orcid.org/0000-0002-9519-077X"]},"institutions":[{"id":"https://openalex.org/I1280414376","display_name":"United States Air Force Research Laboratory","ror":"https://ror.org/02e2egq70","country_code":"US","type":"facility","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4389425425"]},{"id":"https://openalex.org/I2799950915","display_name":"Wright-Patterson Air Force Base","ror":"https://ror.org/0097e1k27","country_code":"US","type":"other","lineage":["https://openalex.org/I1330347796","https://openalex.org/I2799950915","https://openalex.org/I4210089612","https://openalex.org/I4210102105"]},{"id":"https://openalex.org/I4388482649","display_name":"711th Human Performance Wing","ror":"https://ror.org/04d0hsa39","country_code":"US","type":"government","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4388482649","https://openalex.org/I4389425425"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Steve Kim","raw_affiliation_strings":["711th Human Performance Wing, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"711th Human Performance Wing, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I2799950915","https://openalex.org/I4388482649"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5044388112","display_name":"Nicholas R. Glavin","orcid":"https://orcid.org/0000-0002-9447-7509","observed_orcids":["https://orcid.org/0000-0002-9447-7509"]},"institutions":[{"id":"https://openalex.org/I1280414376","display_name":"United States Air Force Research Laboratory","ror":"https://ror.org/02e2egq70","country_code":"US","type":"facility","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4389425425"]},{"id":"https://openalex.org/I4388482708","display_name":"U.S. Air Force Research Laboratory Materials and Manufacturing Directorate","ror":"https://ror.org/0584m4844","country_code":"US","type":"government","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4388482708","https://openalex.org/I4389425425"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Nicholas R. Glavin","raw_affiliation_strings":["Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA"],"raw_orcid":"https://orcid.org/0000-0002-9447-7509","affiliations":[{"raw_affiliation_string":"Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, OH, 45433 USA","institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I4388482708"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":8,"corresponding_author_ids":["https://openalex.org/A5044388112"],"corresponding_institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I4388482708"],"apc_list":{"value":5000,"currency":"USD","value_usd":5000},"apc_paid":null,"fwci":1.3145,"has_fulltext":false,"cited_by_count":28,"citation_normalized_percentile":{"value":0.77965975,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":95,"max":99},"biblio":{"volume":"32","issue":"12","first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10461","display_name":"Gas Sensing Nanomaterials and Sensors","score":0.9672999978065491,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10461","display_name":"Gas Sensing Nanomaterials and Sensors","score":0.9672999978065491,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10275","display_name":"2D Materials and Applications","score":0.012900000438094139,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10212","display_name":"Electrochemical sensors and biosensors","score":0.006399999838322401,"subfield":{"id":"https://openalex.org/subfields/1602","display_name":"Analytical Chemistry"},"field":{"id":"https://openalex.org/fields/16","display_name":"Chemistry"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/gas-sensors","display_name":"gas sensors","score":0.6579999923706055},{"id":"https://openalex.org/keywords/no2-sensing","display_name":"NO2 gas sensing","score":0.7760000228881836},{"id":"https://openalex.org/keywords/mos2-nanoflakes","display_name":"MoS2 nanoflakes","score":0.9399999976158142},{"id":"https://openalex.org/keywords/solution-processed-2d-materials","display_name":"solution-processed 2D materials","score":0.8550000190734863},{"id":"https://openalex.org/keywords/detection-limit","display_name":"detection limit","score":0.777999997138977},{"id":"https://openalex.org/keywords/flexible-sensors","display_name":"flexible sensors","score":0.7480000257492065},{"id":"https://openalex.org/keywords/graphene-contacts","display_name":"graphene contacts","score":0.8130000233650208},{"id":"https://openalex.org/keywords/polyimide-substrate","display_name":"polyimide substrate","score":0.9229999780654907},{"id":"https://openalex.org/keywords/annealing","display_name":"annealing","score":0.9819999933242798}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.864944577217102},{"id":"https://openalex.org/C119128265","wikidata":"https://www.wikidata.org/wiki/Q900165","display_name":"Detection limit","level":2,"score":0.7709872126579285},{"id":"https://openalex.org/C7040849","wikidata":"https://www.wikidata.org/wiki/Q899580","display_name":"Dielectric spectroscopy","level":4,"score":0.7358752489089966},{"id":"https://openalex.org/C2780965675","wikidata":"https://www.wikidata.org/wiki/Q145958","display_name":"Polyimide","level":3,"score":0.5767179727554321},{"id":"https://openalex.org/C10390740","wikidata":"https://www.wikidata.org/wiki/Q2282401","display_name":"Analyte","level":2,"score":0.5509912371635437},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.5056648254394531},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5004456043243408},{"id":"https://openalex.org/C17829176","wikidata":"https://www.wikidata.org/wiki/Q179043","display_name":"Electrical impedance","level":2,"score":0.5004160404205322},{"id":"https://openalex.org/C138631740","wikidata":"https://www.wikidata.org/wiki/Q967847","display_name":"Nanomaterials","level":2,"score":0.49495619535446167},{"id":"https://openalex.org/C30080830","wikidata":"https://www.wikidata.org/wiki/Q169917","display_name":"Graphene","level":2,"score":0.4881818890571594},{"id":"https://openalex.org/C137488568","wikidata":"https://www.wikidata.org/wiki/Q5321","display_name":"Resistor","level":3,"score":0.4496203660964966},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.4346351623535156},{"id":"https://openalex.org/C17525397","wikidata":"https://www.wikidata.org/wiki/Q176140","display_name":"Electrode","level":2,"score":0.21339574456214905},{"id":"https://openalex.org/C52859227","wikidata":"https://www.wikidata.org/wiki/Q7877","display_name":"Electrochemistry","level":3,"score":0.19665288925170898},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.17371144890785217},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.09929001331329346},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.0842319130897522},{"id":"https://openalex.org/C105795698","wikidata":"https://www.wikidata.org/wiki/Q12483","display_name":"Statistics","level":1,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.0},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1002/adfm.202106830","doi":"https://doi.org/10.1002/adfm.202106830","is_oa":false,"landing_page_url":"https://doi.org/10.1002/adfm.202106830","pdf_url":null,"source":{"id":"https://openalex.org/S135204980","display_name":"Advanced Functional Materials","issn_l":"1616-301X","issn":["1616-301X","1616-3028"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-3","ki-jl-3","norway-2","poland-200","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Advanced Functional Materials","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[{"id":"https://openalex.org/G1718091610","display_name":"SNM: Customized Inkjet Printing of Graphene-Based Real-time Water Sensors","funder_award_id":"1727846","funder_id":"https://openalex.org/F4320306076","funder_display_name":"National Science Foundation"},{"id":"https://openalex.org/G4715748872","display_name":null,"funder_award_id":"FA9550\u201020RXCOR057","funder_id":"https://openalex.org/F4320338279","funder_display_name":"Air Force Office of Scientific Research"},{"id":"https://openalex.org/G5113020744","display_name":"SNM: Customized Inkjet Printing of Graphene-Based Real-time Water Sensors","funder_award_id":"2039268","funder_id":"https://openalex.org/F4320306076","funder_display_name":"National Science Foundation"},{"id":"https://openalex.org/G5317869797","display_name":"FMRG: Manufacturing ADvanced Electronics through Printing Using Bio-based and Locally Identifiable Compounds (MADE-PUBLIC)","funder_award_id":"2037026","funder_id":"https://openalex.org/F4320306076","funder_display_name":"National Science Foundation"},{"id":"https://openalex.org/G7823767878","display_name":"ADVANCED MATERIALS CENTER FOR EXCELLENCE: CENTER FOR HIERARCHICAL MATERIALS DESIGN (CHIMAD)","funder_award_id":"70NANB19H005","funder_id":"https://openalex.org/F4320332178","funder_display_name":"National Institute of Standards and Technology"},{"id":"https://openalex.org/G816086920","display_name":null,"funder_award_id":"FA9550-20RHCOR040","funder_id":"https://openalex.org/F4320338279","funder_display_name":"Air Force Office of Scientific Research"}],"funders":[{"id":"https://openalex.org/F4320306076","display_name":"National Science Foundation","ror":"https://ror.org/021nxhr62"},{"id":"https://openalex.org/F4320332178","display_name":"National Institute of Standards and Technology","ror":"https://ror.org/05xpvk416"},{"id":"https://openalex.org/F4320338279","display_name":"Air Force Office of Scientific Research","ror":"https://ror.org/011e9bt93"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":83,"referenced_works":["https://openalex.org/W319904816","https://openalex.org/W1497024601","https://openalex.org/W1843260193","https://openalex.org/W1884277102","https://openalex.org/W1919644140","https://openalex.org/W1966760661","https://openalex.org/W2018437741","https://openalex.org/W2025413591","https://openalex.org/W2031853665","https://openalex.org/W2033477654","https://openalex.org/W2040153588","https://openalex.org/W2055987562","https://openalex.org/W2067550802","https://openalex.org/W2070029819","https://openalex.org/W2074992136","https://openalex.org/W2081795781","https://openalex.org/W2090141424","https://openalex.org/W2101606767","https://openalex.org/W2116996624","https://openalex.org/W2156162873","https://openalex.org/W2160576536","https://openalex.org/W2166788126","https://openalex.org/W2171779263","https://openalex.org/W2221637804","https://openalex.org/W2260512632","https://openalex.org/W2284566726","https://openalex.org/W2322767323","https://openalex.org/W2322923573","https://openalex.org/W2333187132","https://openalex.org/W2406732376","https://openalex.org/W2472394768","https://openalex.org/W2552148893","https://openalex.org/W2565217453","https://openalex.org/W2566734799","https://openalex.org/W2593935978","https://openalex.org/W2603658301","https://openalex.org/W2612018831","https://openalex.org/W2616420111","https://openalex.org/W2616686898","https://openalex.org/W2736512930","https://openalex.org/W2741313534","https://openalex.org/W2746340470","https://openalex.org/W2749143500","https://openalex.org/W2751506818","https://openalex.org/W2765441459","https://openalex.org/W2889740355","https://openalex.org/W2896924240","https://openalex.org/W2902996045","https://openalex.org/W2903943586","https://openalex.org/W2904240834","https://openalex.org/W2907619868","https://openalex.org/W2908641577","https://openalex.org/W2916829776","https://openalex.org/W2943925338","https://openalex.org/W2962855310","https://openalex.org/W2969828704","https://openalex.org/W2973059067","https://openalex.org/W2979575564","https://openalex.org/W2982205428","https://openalex.org/W2990386121","https://openalex.org/W2993654509","https://openalex.org/W2999677012","https://openalex.org/W3009634276","https://openalex.org/W3012151070","https://openalex.org/W3012239088","https://openalex.org/W3014478554","https://openalex.org/W3024685267","https://openalex.org/W3043080304","https://openalex.org/W3044542194","https://openalex.org/W3070776282","https://openalex.org/W3084277405","https://openalex.org/W3085672664","https://openalex.org/W3087762521","https://openalex.org/W3092005944","https://openalex.org/W3096571677","https://openalex.org/W3101717303","https://openalex.org/W3110699924","https://openalex.org/W3120394818","https://openalex.org/W3127443947","https://openalex.org/W3133761597","https://openalex.org/W3149729898","https://openalex.org/W3172642824","https://openalex.org/W3182486342"],"related_works":["https://openalex.org/W4220916774","https://openalex.org/W3202626908","https://openalex.org/W4406822981","https://openalex.org/W2885967548","https://openalex.org/W4310330387","https://openalex.org/W3014478554","https://openalex.org/W2765441459","https://openalex.org/W4285113573","https://openalex.org/W2943925338","https://openalex.org/W3175826287"],"abstract_inverted_index":{"Abstract":[0],"Chemical":[1],"sensors":[2],"based":[3],"on":[4,105],"solution\u2010processed":[5],"2D":[6,100],"nanomaterials":[7],"represent":[8],"an":[9,37,49,96],"extremely":[10],"attractive":[11],"approach":[12,93],"toward":[13],"scalable":[14],"and":[15,25,115,138],"low\u2010cost":[16],"devices.":[17],"Through":[18],"the":[19,76,132,135],"implementation":[20],"of":[21,27,42,66,85,112,134,148],"real\u2010time":[22],"impedance":[23],"spectroscopy":[24],"development":[26],"a":[28,61,106,110,124,144],"three\u2010element":[29],"circuit":[30,140],"model,":[31],"redox":[32],"exfoliated":[33],"MoS2":[34,117],"nanoflakes":[35],"demonstrate":[36],"ultrasensitive":[38],"empirical":[39],"detection":[40,52],"limit":[41,53],"NO2":[43],"gas":[44],"at":[45,153],"1":[46],"ppb,":[47],"with":[48,143,150],"extrapolated":[50],"ultimate":[51],"approaching":[54],"63":[55],"ppt.":[56],"This":[57,91],"sensor":[58,101],"construct":[59],"reveals":[60],"more":[62],"than":[63],"three":[64],"orders":[65],"magnitude":[67],"improvement":[68,147],"from":[69],"conventional":[70],"direct":[71],"current":[72],"sensing":[73],"approaches":[74],"as":[75],"traditionally":[77],"dominant":[78],"interflake":[79],"interactions":[80,137],"are":[81],"bypassed":[82],"in":[83],"favor":[84],"selectively":[86],"extracting":[87],"intraflake":[88],"doping":[89],"effects.":[90],"same":[92],"allows":[94],"for":[95],"all":[97],"solution\u2010processed,":[98],"flexible":[99],"to":[102,130],"be":[103],"fabricated":[104],"polyimide":[107],"substrate":[108],"using":[109],"combination":[111],"graphene":[113],"contacts":[114],"drop\u2010casted":[116],"nanoflakes,":[118],"exhibiting":[119],"similar":[120],"sensitivity":[121,146],"limits.":[122],"Finally,":[123],"thermal":[125,151],"annealing":[126,152],"strategy":[127],"is":[128],"used":[129],"explore":[131],"tunability":[133],"nanoflake":[136],"subsequent":[139],"model":[141],"fit,":[142],"demonstrated":[145],"2\u00d7":[149],"200":[154],"\u00b0C.":[155]},"counts_by_year":[{"year":2026,"cited_by_count":7},{"year":2025,"cited_by_count":3},{"year":2024,"cited_by_count":5},{"year":2023,"cited_by_count":7},{"year":2022,"cited_by_count":6}],"updated_date":"2026-11-10T11:39:43.021295","created_date":"2021-10-11T00:00:00"}