{"id":"https://openalex.org/W3203088458","doi":"https://doi.org/10.1021/acsanm.1c02267","title":"Nanoscale-Thick Thin Films of High-Density HfO 2 for Bulk-like Optical Responses","display_name":"Nanoscale-Thick Thin Films of High-Density HfO 2 for Bulk-like Optical Responses","publication_year":2021,"publication_date":"2021-09-30","ids":{"openalex":"https://openalex.org/W3203088458","doi":"https://doi.org/10.1021/acsanm.1c02267","mag":"3203088458"},"language":"en","primary_location":{"id":"doi:10.1021/acsanm.1c02267","doi":"https://doi.org/10.1021/acsanm.1c02267","is_oa":false,"landing_page_url":"https://doi.org/10.1021/acsanm.1c02267","pdf_url":null,"source":{"id":"https://openalex.org/S4210191493","display_name":"ACS Applied Nano Materials","issn_l":"2574-0970","issn":["2574-0970"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-20","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320006","host_organization_name":"American Chemical Society","host_organization_lineage":["https://openalex.org/P4310320006"],"host_organization_lineage_names":["American Chemical Society"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"ACS Applied Nano Materials","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5102101551","display_name":"Lirong Sun","orcid":"https://orcid.org/0000-0002-5035-7601","observed_orcids":["https://orcid.org/0000-0002-5035-7601"]},"institutions":[{"id":"https://openalex.org/I1280414376","display_name":"United States Air Force Research Laboratory","ror":"https://ror.org/02e2egq70","country_code":"US","type":"facility","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4389425425"]},{"id":"https://openalex.org/I2799950915","display_name":"Wright-Patterson Air Force Base","ror":"https://ror.org/0097e1k27","country_code":"US","type":"other","lineage":["https://openalex.org/I1330347796","https://openalex.org/I2799950915","https://openalex.org/I4210089612","https://openalex.org/I4210102105"]},{"id":"https://openalex.org/I4210108613","display_name":"Azimuth (United States)","ror":"https://ror.org/01r5ta105","country_code":"US","type":"company","lineage":["https://openalex.org/I4210108613"]},{"id":"https://openalex.org/I4388482708","display_name":"U.S. Air Force Research Laboratory Materials and Manufacturing Directorate","ror":"https://ror.org/0584m4844","country_code":"US","type":"funder","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4388482708","https://openalex.org/I4389425425"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Lirong Sun","raw_affiliation_strings":["Azimuth Corporation, 2970 Presidential Drive, Suite 200, Beavercreek, Ohio 45324, United States","Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio 45433, United States"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Azimuth Corporation, 2970 Presidential Drive, Suite 200, Beavercreek, Ohio 45324, United States","institution_ids":["https://openalex.org/I4210108613"]},{"raw_affiliation_string":"Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio 45433, United States","institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I2799950915","https://openalex.org/I4388482708"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5039061050","display_name":"John G. Jones","orcid":"https://orcid.org/0000-0001-8271-0038","observed_orcids":["https://orcid.org/0000-0001-8271-0038"]},"institutions":[{"id":"https://openalex.org/I1280414376","display_name":"United States Air Force Research Laboratory","ror":"https://ror.org/02e2egq70","country_code":"US","type":"facility","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4389425425"]},{"id":"https://openalex.org/I2799950915","display_name":"Wright-Patterson Air Force Base","ror":"https://ror.org/0097e1k27","country_code":"US","type":"other","lineage":["https://openalex.org/I1330347796","https://openalex.org/I2799950915","https://openalex.org/I4210089612","https://openalex.org/I4210102105"]},{"id":"https://openalex.org/I4388482708","display_name":"U.S. Air Force Research Laboratory Materials and Manufacturing Directorate","ror":"https://ror.org/0584m4844","country_code":"US","type":"funder","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4388482708","https://openalex.org/I4389425425"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"John G. Jones","raw_affiliation_strings":["Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio 45433, United States"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio 45433, United States","institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I2799950915","https://openalex.org/I4388482708"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5047743130","display_name":"John T. Grant","orcid":"https://orcid.org/0000-0001-5243-4095","observed_orcids":["https://orcid.org/0000-0001-5243-4095"]},"institutions":[{"id":"https://openalex.org/I1280414376","display_name":"United States Air Force Research Laboratory","ror":"https://ror.org/02e2egq70","country_code":"US","type":"facility","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4389425425"]},{"id":"https://openalex.org/I2799950915","display_name":"Wright-Patterson Air Force Base","ror":"https://ror.org/0097e1k27","country_code":"US","type":"other","lineage":["https://openalex.org/I1330347796","https://openalex.org/I2799950915","https://openalex.org/I4210089612","https://openalex.org/I4210102105"]},{"id":"https://openalex.org/I4210108613","display_name":"Azimuth (United States)","ror":"https://ror.org/01r5ta105","country_code":"US","type":"company","lineage":["https://openalex.org/I4210108613"]},{"id":"https://openalex.org/I4388482708","display_name":"U.S. Air Force Research Laboratory Materials and Manufacturing Directorate","ror":"https://ror.org/0584m4844","country_code":"US","type":"funder","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4388482708","https://openalex.org/I4389425425"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"John T. Grant","raw_affiliation_strings":["Azimuth Corporation, 2970 Presidential Drive, Suite 200, Beavercreek, Ohio 45324, United States","Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio 45433, United States"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Azimuth Corporation, 2970 Presidential Drive, Suite 200, Beavercreek, Ohio 45324, United States","institution_ids":["https://openalex.org/I4210108613"]},{"raw_affiliation_string":"Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio 45433, United States","institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I2799950915","https://openalex.org/I4388482708"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5039967181","display_name":"Neil R. Murphy","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1280414376","display_name":"United States Air Force Research Laboratory","ror":"https://ror.org/02e2egq70","country_code":"US","type":"facility","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4389425425"]},{"id":"https://openalex.org/I2799950915","display_name":"Wright-Patterson Air Force Base","ror":"https://ror.org/0097e1k27","country_code":"US","type":"other","lineage":["https://openalex.org/I1330347796","https://openalex.org/I2799950915","https://openalex.org/I4210089612","https://openalex.org/I4210102105"]},{"id":"https://openalex.org/I4388482708","display_name":"U.S. Air Force Research Laboratory Materials and Manufacturing Directorate","ror":"https://ror.org/0584m4844","country_code":"US","type":"funder","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4388482708","https://openalex.org/I4389425425"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Neil R. Murphy","raw_affiliation_strings":["Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio 45433, United States"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio 45433, United States","institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I2799950915","https://openalex.org/I4388482708"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5038919702","display_name":"Chintalapalle V. Ramana","orcid":"https://orcid.org/0000-0002-5286-3065","observed_orcids":["https://orcid.org/0000-0002-5286-3065"]},"institutions":[{"id":"https://openalex.org/I164936912","display_name":"The University of Texas at El Paso","ror":"https://ror.org/04d5vba33","country_code":"US","type":"education","lineage":["https://openalex.org/I164936912"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"C. V. Ramana","raw_affiliation_strings":["Center for Advanced Materials Research (CMR), University of Texas at El Paso, El Paso, Texas 79968, United States"],"raw_orcid":"https://orcid.org/0000-0002-5286-3065","affiliations":[{"raw_affiliation_string":"Center for Advanced Materials Research (CMR), University of Texas at El Paso, El Paso, Texas 79968, United States","institution_ids":["https://openalex.org/I164936912"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5067599189","display_name":"Kurt G. Eyink","orcid":"https://orcid.org/0000-0002-8503-620X","observed_orcids":["https://orcid.org/0000-0002-8503-620X"]},"institutions":[{"id":"https://openalex.org/I1280414376","display_name":"United States Air Force Research Laboratory","ror":"https://ror.org/02e2egq70","country_code":"US","type":"facility","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4389425425"]},{"id":"https://openalex.org/I2799950915","display_name":"Wright-Patterson Air Force Base","ror":"https://ror.org/0097e1k27","country_code":"US","type":"other","lineage":["https://openalex.org/I1330347796","https://openalex.org/I2799950915","https://openalex.org/I4210089612","https://openalex.org/I4210102105"]},{"id":"https://openalex.org/I4388482708","display_name":"U.S. Air Force Research Laboratory Materials and Manufacturing Directorate","ror":"https://ror.org/0584m4844","country_code":"US","type":"funder","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4388482708","https://openalex.org/I4389425425"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Kurt G. Eyink","raw_affiliation_strings":["Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio 45433, United States"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio 45433, United States","institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I2799950915","https://openalex.org/I4388482708"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5002089647","display_name":"Jonathan P. Vernon","orcid":"https://orcid.org/0000-0001-6397-4353","observed_orcids":["https://orcid.org/0000-0001-6397-4353"]},"institutions":[{"id":"https://openalex.org/I1280414376","display_name":"United States Air Force Research Laboratory","ror":"https://ror.org/02e2egq70","country_code":"US","type":"facility","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4389425425"]},{"id":"https://openalex.org/I2799950915","display_name":"Wright-Patterson Air Force Base","ror":"https://ror.org/0097e1k27","country_code":"US","type":"other","lineage":["https://openalex.org/I1330347796","https://openalex.org/I2799950915","https://openalex.org/I4210089612","https://openalex.org/I4210102105"]},{"id":"https://openalex.org/I4388482708","display_name":"U.S. Air Force Research Laboratory Materials and Manufacturing Directorate","ror":"https://ror.org/0584m4844","country_code":"US","type":"funder","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4388482708","https://openalex.org/I4389425425"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Jonathan P. Vernon","raw_affiliation_strings":["Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio 45433, United States"],"raw_orcid":"https://orcid.org/0000-0001-6397-4353","affiliations":[{"raw_affiliation_string":"Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio 45433, United States","institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I2799950915","https://openalex.org/I4388482708"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5025570070","display_name":"Peter R. Stevenson","orcid":"https://orcid.org/0000-0003-3731-1630","observed_orcids":["https://orcid.org/0000-0003-3731-1630"]},"institutions":[{"id":"https://openalex.org/I1280414376","display_name":"United States Air Force Research Laboratory","ror":"https://ror.org/02e2egq70","country_code":"US","type":"facility","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4389425425"]},{"id":"https://openalex.org/I2799950915","display_name":"Wright-Patterson Air Force Base","ror":"https://ror.org/0097e1k27","country_code":"US","type":"other","lineage":["https://openalex.org/I1330347796","https://openalex.org/I2799950915","https://openalex.org/I4210089612","https://openalex.org/I4210102105"]},{"id":"https://openalex.org/I4388482708","display_name":"U.S. Air Force Research Laboratory Materials and Manufacturing Directorate","ror":"https://ror.org/0584m4844","country_code":"US","type":"funder","lineage":["https://openalex.org/I1280414376","https://openalex.org/I1330347796","https://openalex.org/I4210102105","https://openalex.org/I4388482708","https://openalex.org/I4389425425"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Peter R. Stevenson","raw_affiliation_strings":["Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio 45433, United States"],"raw_orcid":"https://orcid.org/0000-0003-3731-1630","affiliations":[{"raw_affiliation_string":"Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio 45433, United States","institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I2799950915","https://openalex.org/I4388482708"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":5,"corresponding_author_ids":["https://openalex.org/A5025570070"],"corresponding_institution_ids":["https://openalex.org/I1280414376","https://openalex.org/I2799950915","https://openalex.org/I4388482708"],"apc_list":{"value":5000,"currency":"USD","value_usd":5000},"apc_paid":null,"fwci":0.8852,"has_fulltext":false,"cited_by_count":15,"citation_normalized_percentile":{"value":0.67118319,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":93,"max":98},"biblio":{"volume":"4","issue":"10","first_page":"10836","last_page":"10844"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.9520999789237976,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.9520999789237976,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11128","display_name":"Transition Metal Oxide Nanomaterials","score":0.018400000408291817,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.012600000016391277,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/hafnium-oxide","display_name":"hafnium oxide","score":0.8629999756813049},{"id":"https://openalex.org/keywords/hfo2-thin-films","display_name":"HfO2 thin films","score":0.9789999723434448},{"id":"https://openalex.org/keywords/pulsed-laser-deposition","display_name":"pulsed laser deposition","score":0.9089999794960022},{"id":"https://openalex.org/keywords/substrate-temperature","display_name":"substrate temperature","score":0.9390000104904175},{"id":"https://openalex.org/keywords/monoclinic-hfo2","display_name":"monoclinic HfO2","score":0.9139999747276306},{"id":"https://openalex.org/keywords/complex-refractive-index","display_name":"complex refractive index","score":0.8309999704360962},{"id":"https://openalex.org/keywords/stoichiometric-films","display_name":"stoichiometric films","score":0.609000027179718},{"id":"https://openalex.org/keywords/optical-filters","display_name":"optical filters","score":0.5270000100135803},{"id":"https://openalex.org/keywords/antireflection-coatings","display_name":"antireflection coatings","score":0.9869999885559082}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.9075053930282593},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.748779833316803},{"id":"https://openalex.org/C56052488","wikidata":"https://www.wikidata.org/wiki/Q103382","display_name":"Amorphous solid","level":2,"score":0.6822771430015564},{"id":"https://openalex.org/C140676511","wikidata":"https://www.wikidata.org/wiki/Q6964018","display_name":"Nanocrystalline material","level":2,"score":0.6239404678344727},{"id":"https://openalex.org/C37982897","wikidata":"https://www.wikidata.org/wiki/Q901321","display_name":"Pulsed laser deposition","level":3,"score":0.578528642654419},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.5631186962127686},{"id":"https://openalex.org/C45206210","wikidata":"https://www.wikidata.org/wiki/Q2415817","display_name":"Nanoscopic scale","level":2,"score":0.5606786012649536},{"id":"https://openalex.org/C46275449","wikidata":"https://www.wikidata.org/wiki/Q2458815","display_name":"Crystallinity","level":2,"score":0.539695680141449},{"id":"https://openalex.org/C42067758","wikidata":"https://www.wikidata.org/wiki/Q174102","display_name":"Refractive index","level":2,"score":0.483762264251709},{"id":"https://openalex.org/C137637335","wikidata":"https://www.wikidata.org/wiki/Q899604","display_name":"Crystallite","level":2,"score":0.4707382619380951},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.45409128069877625},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.2956646680831909},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.22842296957969666},{"id":"https://openalex.org/C8010536","wikidata":"https://www.wikidata.org/wiki/Q160398","display_name":"Crystallography","level":1,"score":0.10689225792884827},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.0},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1021/acsanm.1c02267","doi":"https://doi.org/10.1021/acsanm.1c02267","is_oa":false,"landing_page_url":"https://doi.org/10.1021/acsanm.1c02267","pdf_url":null,"source":{"id":"https://openalex.org/S4210191493","display_name":"ACS Applied Nano Materials","issn_l":"2574-0970","issn":["2574-0970"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-20","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320006","host_organization_name":"American Chemical Society","host_organization_lineage":["https://openalex.org/P4310320006"],"host_organization_lineage_names":["American Chemical Society"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"ACS Applied Nano Materials","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[{"id":"https://openalex.org/G1469550069","display_name":null,"funder_award_id":"FA9550-18-1-0387","funder_id":"https://openalex.org/F4320338279","funder_display_name":"Air Force Office of Scientific Research"},{"id":"https://openalex.org/G4013340503","display_name":null,"funder_award_id":"FA8650-16-D-5404-0013","funder_id":"https://openalex.org/F4320338294","funder_display_name":"Air Force Research Laboratory"}],"funders":[{"id":"https://openalex.org/F4320338279","display_name":"Air Force Office of Scientific Research","ror":"https://ror.org/011e9bt93"},{"id":"https://openalex.org/F4320338294","display_name":"Air Force Research Laboratory","ror":"https://ror.org/02e2egq70"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":54,"referenced_works":["https://openalex.org/W1178710848","https://openalex.org/W1557681670","https://openalex.org/W1625170149","https://openalex.org/W1964927911","https://openalex.org/W1965145270","https://openalex.org/W1966674069","https://openalex.org/W1973342752","https://openalex.org/W1978221763","https://openalex.org/W1994243805","https://openalex.org/W2000123927","https://openalex.org/W2003645630","https://openalex.org/W2019691449","https://openalex.org/W2027704399","https://openalex.org/W2030710562","https://openalex.org/W2032329031","https://openalex.org/W2035704307","https://openalex.org/W2055476823","https://openalex.org/W2057725187","https://openalex.org/W2061539777","https://openalex.org/W2070767213","https://openalex.org/W2076485547","https://openalex.org/W2077564126","https://openalex.org/W2083672128","https://openalex.org/W2098967159","https://openalex.org/W2100223835","https://openalex.org/W2102041266","https://openalex.org/W2132565634","https://openalex.org/W2152800303","https://openalex.org/W2214129742","https://openalex.org/W2259854149","https://openalex.org/W2327038069","https://openalex.org/W2334220755","https://openalex.org/W2335512798","https://openalex.org/W2346143700","https://openalex.org/W2558489281","https://openalex.org/W2744870274","https://openalex.org/W2761644466","https://openalex.org/W2766858241","https://openalex.org/W2791216457","https://openalex.org/W2811044401","https://openalex.org/W2889470051","https://openalex.org/W2898145457","https://openalex.org/W2921396330","https://openalex.org/W2926983620","https://openalex.org/W2947742537","https://openalex.org/W2966743705","https://openalex.org/W2977942115","https://openalex.org/W3005979585","https://openalex.org/W3017794264","https://openalex.org/W3044826828","https://openalex.org/W3138861219","https://openalex.org/W3161104851","https://openalex.org/W3176774900","https://openalex.org/W3198522616"],"related_works":["https://openalex.org/W2469242669","https://openalex.org/W2910081177","https://openalex.org/W2067717369","https://openalex.org/W1971954423","https://openalex.org/W2100223835","https://openalex.org/W2117346005","https://openalex.org/W2252514194","https://openalex.org/W2076666978","https://openalex.org/W2044996740","https://openalex.org/W3013125090"],"abstract_inverted_index":{"The":[0,232],"high":[1],"refractive":[2,209],"index,":[3],"broadband":[4,197],"transparency,":[5],"and":[6,27,52,81,86,186,258],"low":[7],"spectral":[8],"absorption":[9],"of":[10,35,99,153,211,227,234],"HfO":[11,36,61,100,126,180,215,229,239],"2":[12,37,62,101,127,181,216,230,240],"(hafnia)":[13],"make":[14],"it":[15],"a":[16,44],"suitable":[17],"choice":[18],"for":[19],"thermally":[20,248],"stable":[21],"nanoscale":[22,56,250],"optical":[23,40,87,198,257],"filters,":[24],"UV":[25],"mirrors,":[26],"antireflection":[28],"coatings.":[29],"However,":[30],"achieving":[31],"dense":[32],"thin":[33,63,97],"films":[34,64,98,118,131],"with":[38,114,146],"bulk-like":[39],"properties":[41,88,199],"has":[42],"been":[43],"challenge":[45],"due":[46],"to":[47,158,245],"differences":[48,176],"in":[49,177],"film":[50],"stoichiometric":[51],"spatial":[53],"uniformity":[54],"at":[55,75,103,163,171,218],"thicknesses.":[57],"Here,":[58],"we":[59,204],"assess":[60],"(i.e.,":[65],"<200":[66],"nm":[67],"thicknesses)":[68],"prepared":[69,217],"using":[70,110,223],"pulsed":[71],"laser":[72],"deposition":[73],"(PLD)":[74],"different":[76],"substrate":[77,106,148,173,221],"temperatures":[78],"(20\u2013675":[79],"\u00b0C)":[80,109],"the":[82,130,140,151,154,167,195,207],"associated":[83],"chemical,":[84],"structural,":[85],"are":[89,112,123],"reported.":[90],"X-ray":[91],"diffraction":[92],"analysis":[93,137],"reveals":[94],"that":[95,139,206,226],"nanoscale-thick":[96,178,213],"deposited":[102,119,132],"an":[104,219],"ambient":[105,172,220],"temperature":[107,222],"(20":[108],"PLD":[111,182,224,242],"amorphous":[113],"embedded":[115],"nanocrystallites,":[116],"whereas":[117],"on":[120,133,194],"heated":[121,134],"substrates":[122],"polycrystalline":[124],"monoclinic":[125],".":[128],"For":[129],"substrates,":[135],"further":[136,246],"shows":[138],"nanocrystalline":[141],"phase":[142],"does":[143],"not":[144],"change":[145],"increasing":[147],"temperatures;":[149],"however,":[150],"texture":[152],"crystalline":[155],"orientation":[156,170],"changes":[157],"favor":[159],"(":[160],"1":[161],"11)":[162],"300\u2013675":[164],"\u00b0C":[165],"from":[166,241],"initial":[168],"(002)":[169],"temperature.":[174],"Such":[175],"thin-film":[179,214,238],"process-dependent":[183],"amorphousness,":[184],"crystallinity,":[185],"surface":[187],"textures":[188],"discussed":[189],"here":[190],"exhibit":[191],"minimal":[192],"influence":[193],"resulting":[196],"(250":[200],"nm\u201330":[201],"\u03bcm).":[202],"Furthermore,":[203],"show":[205],"complex":[208],"index":[210],"high-density":[212],"resembles":[225],"bulk":[228],"responses.":[231],"achievement":[233],"fully":[235],"stoichiometric,":[236],"high-density,":[237],"is":[243],"expected":[244],"enable":[247],"robust":[249],"photonic":[251],"device":[252],"integration":[253],"involving":[254],"low-dimensional":[255],"high-performance":[256],"optoelectronic":[259],"applications.":[260]},"counts_by_year":[{"year":2026,"cited_by_count":3},{"year":2025,"cited_by_count":2},{"year":2024,"cited_by_count":2},{"year":2023,"cited_by_count":3},{"year":2022,"cited_by_count":5}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2021-10-11T00:00:00"}