{"id":"https://openalex.org/W3131004316","doi":"https://doi.org/10.1117/12.2581800","title":"Spectroscopy: a new route towards critical-dimension metrology of the cavity etch of nanosheet transistors","display_name":"Spectroscopy: a new route towards critical-dimension metrology of the cavity etch of nanosheet transistors","publication_year":2021,"publication_date":"2021-02-19","ids":{"openalex":"https://openalex.org/W3131004316","doi":"https://doi.org/10.1117/12.2581800","mag":"3131004316"},"language":"en","primary_location":{"id":"doi:10.1117/12.2581800","doi":"https://doi.org/10.1117/12.2581800","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2581800","pdf_url":null,"source":{"id":"https://openalex.org/S4306519846","display_name":"Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5103150061","display_name":"Janusz Bogdanowicz","orcid":"https://orcid.org/0000-0002-7503-8922","observed_orcids":["https://orcid.org/0000-0002-7503-8922"]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Janusz Bogdanowicz","raw_affiliation_strings":["imec (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"imec (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5065941151","display_name":"Yusuke Oniki","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Yusuke Oniki","raw_affiliation_strings":["imec (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"imec (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5061145610","display_name":"Karine Kenis","orcid":"https://orcid.org/0000-0001-7116-7498","observed_orcids":["https://orcid.org/0000-0001-7116-7498"]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Karine Kenis","raw_affiliation_strings":["imec (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"imec (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Yusuke Muraki","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I114132059","display_name":"Tokyo Electron (Japan)","ror":"https://ror.org/05gd76j39","country_code":"JP","type":"company","lineage":["https://openalex.org/I114132059"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yusuke Muraki","raw_affiliation_strings":["TEL Technology Solutions Ltd. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"TEL Technology Solutions Ltd. (Japan)","institution_ids":["https://openalex.org/I114132059"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5041866423","display_name":"Thomas Nuytten","orcid":"https://orcid.org/0000-0002-5921-6928","observed_orcids":["https://orcid.org/0000-0002-5921-6928"]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Thomas Nuytten","raw_affiliation_strings":["imec (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"imec (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5020950364","display_name":"Stefanie Sergeant","orcid":"https://orcid.org/0000-0001-9923-0903","observed_orcids":["https://orcid.org/0000-0001-9923-0903"]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Stefanie Sergeant","raw_affiliation_strings":["imec (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"imec (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5055367643","display_name":"Alexis Franquet","orcid":"https://orcid.org/0000-0002-7371-8852","observed_orcids":["https://orcid.org/0000-0002-7371-8852"]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Alexis Franquet","raw_affiliation_strings":["imec (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"imec (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5025917420","display_name":"Valentina Spampinato","orcid":"https://orcid.org/0000-0003-3225-6740","observed_orcids":["https://orcid.org/0000-0003-3225-6740"]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Valentina Spampinato","raw_affiliation_strings":["imec (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"imec (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5043844856","display_name":"Thierry S. Conard","orcid":"https://orcid.org/0000-0002-4298-5851","observed_orcids":["https://orcid.org/0000-0002-4298-5851"]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Thierry Conard","raw_affiliation_strings":["imec (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"imec (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5037919272","display_name":"Ilse Hoflijk","orcid":"https://orcid.org/0000-0002-8351-3340","observed_orcids":["https://orcid.org/0000-0002-8351-3340"]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Ilse Hoflijk","raw_affiliation_strings":["imec (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"imec (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5017263117","display_name":"Johan Meersschaut","orcid":"https://orcid.org/0000-0003-2467-1784","observed_orcids":["https://orcid.org/0000-0003-2467-1784"]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Johan Meersschaut","raw_affiliation_strings":["imec (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"imec (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5021653681","display_name":"Niels Claessens","orcid":"https://orcid.org/0000-0002-8863-9532","observed_orcids":["https://orcid.org/0000-0002-8863-9532"]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]},{"id":"https://openalex.org/I99464096","display_name":"KU Leuven","ror":"https://ror.org/05f950310","country_code":"BE","type":"education","lineage":["https://openalex.org/I99464096"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Niels Claessens","raw_affiliation_strings":["KULueven (Belgium)","imec (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"KULueven (Belgium)","institution_ids":["https://openalex.org/I99464096"]},{"raw_affiliation_string":"imec (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5052932976","display_name":"Alain Moussa","orcid":"https://orcid.org/0000-0002-6377-4199","observed_orcids":["https://orcid.org/0000-0002-6377-4199"]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Alain Moussa","raw_affiliation_strings":["imec (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"imec (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5023378717","display_name":"Dieter Van den Heuvel","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Dieter Van den Heuvel","raw_affiliation_strings":["imec (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"imec (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102060552","display_name":"Joey Hung","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210125236","display_name":"Nova Measuring Instruments (Israel)","ror":"https://ror.org/02afhmq71","country_code":"IL","type":"company","lineage":["https://openalex.org/I4210125236"]}],"countries":["IL"],"is_corresponding":false,"raw_author_name":"Joey Hung","raw_affiliation_strings":["NOVA Measuring Instruments Ltd. (Israel)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NOVA Measuring Instruments Ltd. (Israel)","institution_ids":["https://openalex.org/I4210125236"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5061204269","display_name":"Roy Koret","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210125236","display_name":"Nova Measuring Instruments (Israel)","ror":"https://ror.org/02afhmq71","country_code":"IL","type":"company","lineage":["https://openalex.org/I4210125236"]}],"countries":["IL"],"is_corresponding":false,"raw_author_name":"Roy Koret","raw_affiliation_strings":["NOVA Measuring Instruments Ltd. (Israel)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NOVA Measuring Instruments Ltd. (Israel)","institution_ids":["https://openalex.org/I4210125236"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5049106739","display_name":"Anne-Laure Charley","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Anne-Laure Charley","raw_affiliation_strings":["imec (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"imec (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5090160531","display_name":"Philippe J. Leray","orcid":"https://orcid.org/0000-0002-1086-270X","observed_orcids":["https://orcid.org/0000-0002-1086-270X"]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Philippe Leray","raw_affiliation_strings":["imec (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"imec (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]}],"institutions":[],"countries_distinct_count":3,"institutions_distinct_count":4,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":1.5475,"has_fulltext":false,"cited_by_count":6,"citation_normalized_percentile":{"value":0.78390139,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":95},"biblio":{"volume":null,"issue":null,"first_page":"54","last_page":"54"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.3433000147342682,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.3433000147342682,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":0.17749999463558197,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.061000000685453415,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/nanosheet-transistors","display_name":"nanosheet transistors","score":0.9139999747276306},{"id":"https://openalex.org/keywords/critical-dimension-metrology","display_name":"critical dimension measurement","score":0.9190000295639038},{"id":"https://openalex.org/keywords/si-sige-superlattices","display_name":"Si/SiGe superlattices","score":0.9120000004768372},{"id":"https://openalex.org/keywords/raman-spectroscopy","display_name":"Raman spectroscopy","score":0.8820000290870667},{"id":"https://openalex.org/keywords/energy-dispersive-x-ray-spectroscopy","display_name":"energy-dispersive X-ray spectroscopy","score":0.996999979019165},{"id":"https://openalex.org/keywords/online-process-monitoring","display_name":"real-time process monitoring","score":0.7080000042915344}],"concepts":[{"id":"https://openalex.org/C51967427","wikidata":"https://www.wikidata.org/wiki/Q17148232","display_name":"Nanosheet","level":2,"score":0.8147395849227905},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7516472339630127},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.7134448289871216},{"id":"https://openalex.org/C207789793","wikidata":"https://www.wikidata.org/wiki/Q3028070","display_name":"Critical dimension","level":2,"score":0.6471551656723022},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.643048882484436},{"id":"https://openalex.org/C40003534","wikidata":"https://www.wikidata.org/wiki/Q862228","display_name":"Raman spectroscopy","level":2,"score":0.6169297099113464},{"id":"https://openalex.org/C132943942","wikidata":"https://www.wikidata.org/wiki/Q2562511","display_name":"Footprint","level":2,"score":0.5520463585853577},{"id":"https://openalex.org/C172385210","wikidata":"https://www.wikidata.org/wiki/Q5339","display_name":"Transistor","level":3,"score":0.5490272045135498},{"id":"https://openalex.org/C195766429","wikidata":"https://www.wikidata.org/wiki/Q394","display_name":"Metrology","level":2,"score":0.5249307751655579},{"id":"https://openalex.org/C145598152","wikidata":"https://www.wikidata.org/wiki/Q176097","display_name":"Field-effect transistor","level":4,"score":0.4938827157020569},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.4708903431892395},{"id":"https://openalex.org/C105382558","wikidata":"https://www.wikidata.org/wiki/Q332431","display_name":"Superlattice","level":2,"score":0.44956088066101074},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.16953030228614807},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.1570454239845276},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.10170900821685791},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.08428657054901123},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.06612616777420044},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.2581800","doi":"https://doi.org/10.1117/12.2581800","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2581800","pdf_url":null,"source":{"id":"https://openalex.org/S4306519846","display_name":"Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W4281564827","https://openalex.org/W3011216783","https://openalex.org/W4415583233","https://openalex.org/W4410084398","https://openalex.org/W3083445817","https://openalex.org/W4366254140","https://openalex.org/W3129198313","https://openalex.org/W6889689826","https://openalex.org/W4405588738","https://openalex.org/W4410820068"],"abstract_inverted_index":{"Nanosheet":[0],"Field-Effect":[1],"Transistors":[2],"(FETs)":[3],"are":[4,86],"candidates":[5],"to":[6,45],"replace":[7],"today\u2019s":[8],"finFETs":[9],"as":[10],"they":[11],"offer":[12],"both":[13],"an":[14],"enhanced":[15],"electrostatic":[16],"control":[17],"and":[18,66,82],"a":[19,41,75],"reduced":[20],"footprint.":[21],"The":[22],"processing":[23],"of":[24,36,40,60,74],"these":[25],"devices":[26],"involves":[27],"the":[28,37,47,58],"selective":[29],"lateral":[30],"etching,":[31],"also":[32],"called":[33],"cavity":[34,93],"etch,":[35],"SiGe":[38],"layers":[39],"vertical":[42],"Si/SiGe":[43],"superlattice,":[44],"isolate":[46],"future":[48],"vertically":[49],"stacked":[50],"Si":[51],"channels.":[52],"In":[53],"this":[54,71],"work,":[55],"we":[56],"evaluate":[57],"capabilities":[59],"various":[61],"conventional":[62],"Critical":[63],"Dimension":[64],"(CD)":[65],"alternative":[67],"spectroscopic":[68],"techniques":[69,89],"for":[70,90],"challenging":[72],"measurement":[73],"buried":[76],"CD.":[77],"We":[78],"conclude":[79],"that":[80],"Raman":[81],"energy-dispersive":[83],"X-ray":[84],"spectroscopies":[85],"very":[87],"promising":[88],"fast":[91],"inline":[92],"depth":[94],"measurements.":[95]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":2},{"year":2023,"cited_by_count":1},{"year":2022,"cited_by_count":1}],"updated_date":"2026-10-06T10:28:23.643775","created_date":"2021-03-01T00:00:00"}
