{"id":"https://openalex.org/W31099599","doi":"https://doi.org/10.1016/b978-0-444-81991-8.50139-4","title":"Influence of Halogen impurities in Powder on High Temperature Properties of Silicon Nitride","display_name":"Influence of Halogen impurities in Powder on High Temperature Properties of Silicon Nitride","publication_year":1994,"publication_date":"1994-01-01","ids":{"openalex":"https://openalex.org/W31099599","doi":"https://doi.org/10.1016/b978-0-444-81991-8.50139-4","mag":"31099599"},"language":"en","primary_location":{"id":"doi:10.1016/b978-0-444-81991-8.50139-4","doi":"https://doi.org/10.1016/b978-0-444-81991-8.50139-4","is_oa":false,"landing_page_url":"https://doi.org/10.1016/b978-0-444-81991-8.50139-4","pdf_url":null,"source":{"id":"https://openalex.org/S4306463230","display_name":"Elsevier eBooks","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"ebook platform"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Advanced Materials '93","raw_type":"book-chapter"},"volume":{"id":"https://openalex.org/W4230177950","display_name":"Advanced Materials '93"},"type":"book-chapter","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5014643186","display_name":"Kei ISOZAKI","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210129202","display_name":"Denka (Japan)","ror":"https://ror.org/03jaff633","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210129202"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Isozaki","raw_affiliation_strings":["Research and Development Division, Omuta Plant, Denki Kagaku Kogyo K. K., Shinkai-machi, Omuta-shi, Fukuoka, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Research and Development Division, Omuta Plant, Denki Kagaku Kogyo K. K., Shinkai-machi, Omuta-shi, Fukuoka, Japan","institution_ids":["https://openalex.org/I4210129202"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5045005270","display_name":"Hideki Hirotsuru","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210129202","display_name":"Denka (Japan)","ror":"https://ror.org/03jaff633","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210129202"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"H. Hirotsuru","raw_affiliation_strings":["Research and Development Division, Omuta Plant, Denki Kagaku Kogyo K. K., Shinkai-machi, Omuta-shi, Fukuoka, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Research and Development Division, Omuta Plant, Denki Kagaku Kogyo K. K., Shinkai-machi, Omuta-shi, Fukuoka, Japan","institution_ids":["https://openalex.org/I4210129202"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5079366862","display_name":"Akira Yoshida","orcid":"https://orcid.org/0000-0003-0280-9674","observed_orcids":["https://orcid.org/0000-0003-0280-9674"]},"institutions":[{"id":"https://openalex.org/I4210129202","display_name":"Denka (Japan)","ror":"https://ror.org/03jaff633","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210129202"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"A. Yoshida","raw_affiliation_strings":["Research and Development Division, Omuta Plant, Denki Kagaku Kogyo K. K., Shinkai-machi, Omuta-shi, Fukuoka, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Research and Development Division, Omuta Plant, Denki Kagaku Kogyo K. K., Shinkai-machi, Omuta-shi, Fukuoka, Japan","institution_ids":["https://openalex.org/I4210129202"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5040448285","display_name":"Isamu Sugimoto","orcid":"https://orcid.org/0000-0003-3786-8228","observed_orcids":["https://orcid.org/0000-0003-3786-8228"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"I. Sugimoto","raw_affiliation_strings":["Research Center, Denki Kagaku Kogyo K. K., Asahi-cho, Machidashi, Tokyo, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Research Center, Denki Kagaku Kogyo K. K., Asahi-cho, Machidashi, Tokyo, Japan","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.08115942,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"565","last_page":"568"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10132","display_name":"Advanced ceramic materials synthesis","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2503","display_name":"Ceramics and Composites"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10132","display_name":"Advanced ceramic materials synthesis","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2503","display_name":"Ceramics and Composites"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13251","display_name":"Electrical and Thermal Properties of Materials","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10544","display_name":"Glass properties and applications","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2503","display_name":"Ceramics and Composites"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/silicon-nitride","display_name":"silicon nitride","score":0.996999979019165},{"id":"https://openalex.org/keywords/halogen-impurities","display_name":"halogen impurities","score":0.996999979019165},{"id":"https://openalex.org/keywords/fluorine","display_name":"fluorine","score":0.8600000143051147},{"id":"https://openalex.org/keywords/chlorine","display_name":"chlorine","score":0.996999979019165},{"id":"https://openalex.org/keywords/powder-purity","display_name":"powder purity","score":0.8339999914169312},{"id":"https://openalex.org/keywords/high-temperature-strength","display_name":"high-temperature strength","score":0.8140000104904175},{"id":"https://openalex.org/keywords/grain-boundary-phases","display_name":"grain boundary phases","score":0.8130000233650208},{"id":"https://openalex.org/keywords/amorphous-phase","display_name":"amorphous phase","score":0.8209999799728394},{"id":"https://openalex.org/keywords/triple-point","display_name":"triple point","score":0.46799999475479126},{"id":"https://openalex.org/keywords/electron-probe-microanalysis","display_name":"electron probe microanalysis","score":0.5759999752044678},{"id":"https://openalex.org/keywords/sintered-bodies","display_name":"sintered bodies","score":0.8420000076293945}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8045710325241089},{"id":"https://openalex.org/C71987851","wikidata":"https://www.wikidata.org/wiki/Q7216430","display_name":"Impurity","level":2,"score":0.701924204826355},{"id":"https://openalex.org/C2777431650","wikidata":"https://www.wikidata.org/wiki/Q413828","display_name":"Silicon nitride","level":3,"score":0.6898404359817505},{"id":"https://openalex.org/C47908070","wikidata":"https://www.wikidata.org/wiki/Q900515","display_name":"Grain boundary","level":3,"score":0.6742208003997803},{"id":"https://openalex.org/C46062151","wikidata":"https://www.wikidata.org/wiki/Q19605","display_name":"Halogen","level":3,"score":0.6320146918296814},{"id":"https://openalex.org/C56052488","wikidata":"https://www.wikidata.org/wiki/Q103382","display_name":"Amorphous solid","level":2,"score":0.6151420474052429},{"id":"https://openalex.org/C505241676","wikidata":"https://www.wikidata.org/wiki/Q688","display_name":"Chlorine","level":2,"score":0.6065601110458374},{"id":"https://openalex.org/C194760766","wikidata":"https://www.wikidata.org/wiki/Q410851","display_name":"Nitride","level":3,"score":0.5731509327888489},{"id":"https://openalex.org/C506198293","wikidata":"https://www.wikidata.org/wiki/Q650","display_name":"Fluorine","level":2,"score":0.5691086649894714},{"id":"https://openalex.org/C44280652","wikidata":"https://www.wikidata.org/wiki/Q104837","display_name":"Phase (matter)","level":2,"score":0.4955037832260132},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.48578551411628723},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.4762808680534363},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.3929024338722229},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.32064491510391235},{"id":"https://openalex.org/C87976508","wikidata":"https://www.wikidata.org/wiki/Q1498213","display_name":"Microstructure","level":2,"score":0.2798450291156769},{"id":"https://openalex.org/C8010536","wikidata":"https://www.wikidata.org/wiki/Q160398","display_name":"Crystallography","level":1,"score":0.2115381360054016},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.12418657541275024},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.07168930768966675},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.05153840780258179},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C2780263894","wikidata":"https://www.wikidata.org/wiki/Q335268","display_name":"Alkyl","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/b978-0-444-81991-8.50139-4","doi":"https://doi.org/10.1016/b978-0-444-81991-8.50139-4","is_oa":false,"landing_page_url":"https://doi.org/10.1016/b978-0-444-81991-8.50139-4","pdf_url":null,"source":{"id":"https://openalex.org/S4306463230","display_name":"Elsevier eBooks","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"ebook platform"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Advanced Materials '93","raw_type":"book-chapter"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":2,"referenced_works":["https://openalex.org/W1975379847","https://openalex.org/W1992517491"],"related_works":["https://openalex.org/W80842240","https://openalex.org/W2039858393","https://openalex.org/W1975379847","https://openalex.org/W1517239569","https://openalex.org/W1991838608","https://openalex.org/W2095181623","https://openalex.org/W2323067786","https://openalex.org/W2043492284","https://openalex.org/W2317991389","https://openalex.org/W2027554607"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-10-10T09:11:00.788812","created_date":"2016-06-24T00:00:00"}