{"id":"https://openalex.org/W3047401615","doi":"https://doi.org/10.1109/ectc32862.2020.00308","title":"Autocatalytic tin - how to overcome process limitations to introduce a new solution for thick tin plating","display_name":"Autocatalytic tin - how to overcome process limitations to introduce a new solution for thick tin plating","publication_year":2020,"publication_date":"2020-06-01","ids":{"openalex":"https://openalex.org/W3047401615","doi":"https://doi.org/10.1109/ectc32862.2020.00308","mag":"3047401615"},"language":"en","primary_location":{"id":"doi:10.1109/ectc32862.2020.00308","doi":"https://doi.org/10.1109/ectc32862.2020.00308","is_oa":false,"landing_page_url":"https://doi.org/10.1109/ectc32862.2020.00308","pdf_url":null,"source":{"id":"https://openalex.org/S4363608088","display_name":"IEEE Electronic Components and Technology Conference (ECTC)","issn_l":"2766-8401","issn":["2766-8401"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2020 IEEE 70th Electronic Components and Technology Conference (ECTC)","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5067124393","display_name":"Kuldip Johal","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210098619","display_name":"Atotech (Germany)","ror":"https://ror.org/014cg2q58","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210098619"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"K. Johal","raw_affiliation_strings":["Atotech Deutschland GmbH, Berlin, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Atotech Deutschland GmbH, Berlin, Germany","institution_ids":["https://openalex.org/I4210098619"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5059431360","display_name":"Britta Schafsteller","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210098619","display_name":"Atotech (Germany)","ror":"https://ror.org/014cg2q58","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210098619"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"B. Schafsteller","raw_affiliation_strings":["Atotech Deutschland GmbH, Berlin, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Atotech Deutschland GmbH, Berlin, Germany","institution_ids":["https://openalex.org/I4210098619"]}]},{"author_position":"middle","author":{"id":null,"display_name":"G. Ramos","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210098619","display_name":"Atotech (Germany)","ror":"https://ror.org/014cg2q58","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210098619"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"G. Ramos","raw_affiliation_strings":["Atotech Deutschland GmbH, Berlin, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Atotech Deutschland GmbH, Berlin, Germany","institution_ids":["https://openalex.org/I4210098619"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5020468546","display_name":"K Tuna","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210098619","display_name":"Atotech (Germany)","ror":"https://ror.org/014cg2q58","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210098619"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"K. Tuna","raw_affiliation_strings":["Atotech Deutschland GmbH, Berlin, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Atotech Deutschland GmbH, Berlin, Germany","institution_ids":["https://openalex.org/I4210098619"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5054503340","display_name":"Sandra Nelle","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210098619","display_name":"Atotech (Germany)","ror":"https://ror.org/014cg2q58","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210098619"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"S. Nelle","raw_affiliation_strings":["Atotech Deutschland GmbH, Berlin, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Atotech Deutschland GmbH, Berlin, Germany","institution_ids":["https://openalex.org/I4210098619"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I4210098619"],"apc_list":null,"apc_paid":null,"fwci":1.1861,"has_fulltext":false,"cited_by_count":3,"citation_normalized_percentile":{"value":0.73424658,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":95},"biblio":{"volume":null,"issue":null,"first_page":"1979","last_page":"1985"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11200","display_name":"Electrodeposition and Electroless Coatings","score":0.9976000189781189,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11200","display_name":"Electrodeposition and Electroless Coatings","score":0.9976000189781189,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10460","display_name":"Electronic Packaging and Soldering Technologies","score":0.0024999999441206455,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T14382","display_name":"Electrophoretic Deposition in Materials Science","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/electrolyte-formulation","display_name":"electrolyte formulation","score":0.8740000128746033},{"id":"https://openalex.org/keywords/immersion-tin","display_name":"immersion tin","score":0.4429999887943268},{"id":"https://openalex.org/keywords/electroless-nickel-immersion-gold","display_name":"electroless nickel immersion gold","score":0.9179999828338623},{"id":"https://openalex.org/keywords/solder-wetting","display_name":"solder wetting","score":0.9520000219345093},{"id":"https://openalex.org/keywords/solder-joint-reliability","display_name":"solder joint reliability","score":0.9990000128746033},{"id":"https://openalex.org/keywords/layer-roughness","display_name":"layer roughness","score":0.8220000267028809},{"id":"https://openalex.org/keywords/ic-substrates","display_name":"IC substrates","score":0.8489999771118164}],"concepts":[{"id":"https://openalex.org/C525849907","wikidata":"https://www.wikidata.org/wiki/Q1096","display_name":"Tin","level":2,"score":0.9125975370407104},{"id":"https://openalex.org/C37263863","wikidata":"https://www.wikidata.org/wiki/Q786897","display_name":"Autocatalysis","level":3,"score":0.6915532946586609},{"id":"https://openalex.org/C2776985018","wikidata":"https://www.wikidata.org/wiki/Q7202314","display_name":"Plating (geology)","level":2,"score":0.6756232976913452},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6310766935348511},{"id":"https://openalex.org/C68801617","wikidata":"https://www.wikidata.org/wiki/Q162908","display_name":"Electrolyte","level":3,"score":0.5407097935676575},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.5141916275024414},{"id":"https://openalex.org/C52859227","wikidata":"https://www.wikidata.org/wiki/Q7877","display_name":"Electrochemistry","level":3,"score":0.4725610613822937},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.4598056375980377},{"id":"https://openalex.org/C29216876","wikidata":"https://www.wikidata.org/wiki/Q1769505","display_name":"Copper plating","level":4,"score":0.457777202129364},{"id":"https://openalex.org/C2781448156","wikidata":"https://www.wikidata.org/wiki/Q1570182","display_name":"Coating","level":2,"score":0.4442089796066284},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.3531941771507263},{"id":"https://openalex.org/C17525397","wikidata":"https://www.wikidata.org/wiki/Q176140","display_name":"Electrode","level":2,"score":0.3528498411178589},{"id":"https://openalex.org/C51807945","wikidata":"https://www.wikidata.org/wiki/Q3503392","display_name":"Electroplating","level":3,"score":0.2950623035430908},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.2789537310600281},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.25361722707748413},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.24592038989067078},{"id":"https://openalex.org/C161790260","wikidata":"https://www.wikidata.org/wiki/Q82264","display_name":"Catalysis","level":2,"score":0.08204197883605957},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.07743030786514282},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C8058405","wikidata":"https://www.wikidata.org/wiki/Q46255","display_name":"Geophysics","level":1,"score":0.0},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C55493867","wikidata":"https://www.wikidata.org/wiki/Q7094","display_name":"Biochemistry","level":1,"score":0.0},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/ectc32862.2020.00308","doi":"https://doi.org/10.1109/ectc32862.2020.00308","is_oa":false,"landing_page_url":"https://doi.org/10.1109/ectc32862.2020.00308","pdf_url":null,"source":{"id":"https://openalex.org/S4363608088","display_name":"IEEE Electronic Components and Technology Conference (ECTC)","issn_l":"2766-8401","issn":["2766-8401"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2020 IEEE 70th Electronic Components and Technology Conference (ECTC)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":6,"referenced_works":["https://openalex.org/W1963826761","https://openalex.org/W1969974962","https://openalex.org/W1991976649","https://openalex.org/W2023705561","https://openalex.org/W2084059794","https://openalex.org/W2899298279"],"related_works":["https://openalex.org/W2013446407","https://openalex.org/W2330595554","https://openalex.org/W3008665989","https://openalex.org/W2127390877","https://openalex.org/W2613618825","https://openalex.org/W2368802796","https://openalex.org/W1976474633","https://openalex.org/W2899298279","https://openalex.org/W2584043300","https://openalex.org/W2359551462"],"abstract_inverted_index":{"The":[0,317],"autocatalytic":[1,182,246,325],"deposition":[2,47,147,327],"of":[3,36,39,48,95,102,113,127,132,145,203,254,270,314],"tin":[4,41,49,183,204,237,261,326],"is":[5,32,79,106,116,175,205,217,286],"gaining":[6],"increasing":[7],"interest":[8],"as":[9,118,177,305,328],"it":[10,43,58,119],"offers":[11],"several":[12],"benefits":[13],"compared":[14],"to":[15,26,121,140,152,162,190,197,219,252,301,322],"the":[16,21,27,37,40,46,92,110,114,133,142,154,164,172,191,200,231,268,271,290,310,324,337],"immersion":[17,28,260],"type":[18],"deposition.":[19],"Despite":[20],"fact":[22],"that":[23,89,109,171,195,198,289],"in":[24,136,180,296,335],"contrast":[25],"plating":[29,66,74,111,201,228,299,313],"process":[30,97,115],"there":[31,78,86],"no":[33],"technical":[34],"limitation":[35,101],"thickness":[38],"deposit,":[42],"also":[44,287],"allows":[45],"on":[50,208],"different":[51,157],"materials":[52],"other":[53,255],"than":[54],"copper.":[55],"With":[56],"this,":[57],"can":[59,293],"open":[60],"up":[61],"new":[62],"application":[63],"fields":[64],"for":[65,72,83,107,312,332],"deposits,":[67],"which":[68,174,216,241],"are":[69,87,239],"not":[70],"considered":[71],"electroless":[73,263],"yet.":[75],"Even":[76],"though":[77],"a":[80,211,226,329],"great":[81],"potential":[82,330],"this":[84,96,137,146,209,221,234],"technology,":[85],"limitations":[88],"have":[90],"prevented":[91],"successful":[93],"introduction":[94],"so":[98],"far.":[99],"One":[100,130],"possible":[103],"electrolyte":[104,247,291],"formulations":[105],"example,":[108],"rate":[112,148],"instable":[117],"tends":[120],"drop":[122],"already":[123],"after":[124],"few":[125],"minutes":[126],"dwell":[128],"time.":[129],"target":[131],"investigations":[134],"presented":[135,240,318],"paper":[138,235],"was":[139,214],"understand":[141],"root":[143],"cause":[144],"drop.":[149],"In":[150],"order":[151],"clarify":[153],"reaction":[155,202],"mechanisms":[156],"electrochemical":[158],"approaches":[159],"were":[160,242,281],"used":[161,176],"determine":[163],"chemical":[165],"background.":[166],"It":[167,285],"could":[168],"be":[169,294],"proven,":[170],"Pyrophosphate":[173],"complexing":[178],"agent":[179],"many":[181],"solutions":[184],"[1],":[185],"[2],":[186],"[3],":[187],"[4]":[188],"adsorbs":[189],"electrode":[192],"surface":[193],"and":[194,224,277,283,298,340],"due":[196],"adsorption,":[199],"inhibited.":[206],"Based":[207],"finding":[210],"bath":[212],"formulation":[213],"created,":[215],"able":[218],"overcome":[220],"inhibiting":[222],"effect":[223],"providing":[225],"stable":[227],"performance":[229,269],"over":[230],"entire":[232],"bathlife.In":[233],"exemplary":[236],"deposits":[238],"plated":[243],"with":[244],"an":[245],"comparing":[248],"their":[249],"layer":[250,307],"properties":[251],"those":[253],"conventional":[256],"final":[257,272],"finishes":[258],"like":[259],"or":[262,309],"nickel/immersion":[264],"gold.":[265],"To":[266],"judge":[267],"finish,":[273],"solder":[274,278],"wetting":[275],"behavior":[276],"joint":[279],"reliability":[280],"rated":[282],"compared.":[284],"shown,":[288],"solution":[292,331],"tailored":[295],"composition":[297],"parameters":[300],"fulfill":[302],"requirements":[303],"such":[304],"defined":[306],"roughness":[308],"capability":[311],"fine":[315],"patterns.":[316],"results":[319],"will":[320],"allow":[321],"consider":[323],"specific":[333],"applications":[334],"e.g.":[336],"IC":[338],"substrate":[339],"\u03bc-LED":[341],"market.":[342]},"counts_by_year":[{"year":2025,"cited_by_count":2},{"year":2021,"cited_by_count":1}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2020-08-10T00:00:00"}
