{"id":"https://openalex.org/W3036729492","doi":"https://doi.org/10.1007/s00339-020-03732-x","title":"Deep reactive ion etching of silicon using non-ICP-based equipment","display_name":"Deep reactive ion etching of silicon using non-ICP-based equipment","publication_year":2020,"publication_date":"2020-06-19","ids":{"openalex":"https://openalex.org/W3036729492","doi":"https://doi.org/10.1007/s00339-020-03732-x","mag":"3036729492"},"language":"en","primary_location":{"id":"doi:10.1007/s00339-020-03732-x","doi":"https://doi.org/10.1007/s00339-020-03732-x","is_oa":false,"landing_page_url":"https://doi.org/10.1007/s00339-020-03732-x","pdf_url":null,"source":{"id":"https://openalex.org/S52123058","display_name":"Applied Physics A","issn_l":"0947-8396","issn":["0947-8396","1432-0630"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-class-a","anvur-scientific","cwts-core","dongbi-d","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310319900","host_organization_name":"Springer Science+Business Media","host_organization_lineage":["https://openalex.org/P4310319900","https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Science+Business Media","Springer Nature"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Physics A","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5018544423","display_name":"Zaifa Du","orcid":"https://orcid.org/0000-0002-4269-5504","observed_orcids":["https://orcid.org/0000-0002-4269-5504"]},"institutions":[{"id":"https://openalex.org/I37796252","display_name":"Beijing University of Technology","ror":"https://ror.org/037b1pp87","country_code":"CN","type":"education","lineage":["https://openalex.org/I37796252"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Zaifa Du","raw_affiliation_strings":["Laboratory of Optoelectronic Technology, Beijing University of Technology, Beijing, 100124, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laboratory of Optoelectronic Technology, Beijing University of Technology, Beijing, 100124, China","institution_ids":["https://openalex.org/I37796252"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5018851368","display_name":"Junyang Nie","orcid":"https://orcid.org/0009-0003-5018-8451","observed_orcids":["https://orcid.org/0009-0003-5018-8451"]},"institutions":[{"id":"https://openalex.org/I4405272605","display_name":"Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China","ror":"https://ror.org/04dtz2k95","country_code":"CN","type":"facility","lineage":["https://openalex.org/I4405272605"]},{"id":"https://openalex.org/I80947539","display_name":"Fuzhou University","ror":"https://ror.org/011xvna82","country_code":"CN","type":"education","lineage":["https://openalex.org/I80947539"]},{"id":"https://openalex.org/I87445476","display_name":"Xi'an Jiaotong University","ror":"https://ror.org/017zhmm22","country_code":"CN","type":"education","lineage":["https://openalex.org/I87445476"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Junyang Nie","raw_affiliation_strings":["Faculty of Electronic and Information Engineering, Xi\u2019an Jiaotong University, Xi\u2019an, 710049, China","Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China","National and Local Joint Engineering Laboratory for Flat Panel Display Technology, Fuzhou University, and Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350108, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Faculty of Electronic and Information Engineering, Xi\u2019an Jiaotong University, Xi\u2019an, 710049, China","institution_ids":["https://openalex.org/I87445476"]},{"raw_affiliation_string":"Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China","institution_ids":["https://openalex.org/I4405272605"]},{"raw_affiliation_string":"National and Local Joint Engineering Laboratory for Flat Panel Display Technology, Fuzhou University, and Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350108, China","institution_ids":["https://openalex.org/I4405272605","https://openalex.org/I80947539"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5014412168","display_name":"Dianlun Li","orcid":"https://orcid.org/0000-0003-0073-9457","observed_orcids":["https://orcid.org/0000-0003-0073-9457"]},"institutions":[{"id":"https://openalex.org/I4405272605","display_name":"Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China","ror":"https://ror.org/04dtz2k95","country_code":"CN","type":"facility","lineage":["https://openalex.org/I4405272605"]},{"id":"https://openalex.org/I80947539","display_name":"Fuzhou University","ror":"https://ror.org/011xvna82","country_code":"CN","type":"education","lineage":["https://openalex.org/I80947539"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Dianlun Li","raw_affiliation_strings":["Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China","National and Local Joint Engineering Laboratory for Flat Panel Display Technology, Fuzhou University, and Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350108, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China","institution_ids":["https://openalex.org/I4405272605"]},{"raw_affiliation_string":"National and Local Joint Engineering Laboratory for Flat Panel Display Technology, Fuzhou University, and Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350108, China","institution_ids":["https://openalex.org/I4405272605","https://openalex.org/I80947539"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5001382579","display_name":"Weiling Guo","orcid":"https://orcid.org/0009-0009-4954-909X","observed_orcids":["https://orcid.org/0009-0009-4954-909X","https://orcid.org/0009-0006-1414-6272"]},"institutions":[{"id":"https://openalex.org/I37796252","display_name":"Beijing University of Technology","ror":"https://ror.org/037b1pp87","country_code":"CN","type":"education","lineage":["https://openalex.org/I37796252"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Weiling Guo","raw_affiliation_strings":["Laboratory of Optoelectronic Technology, Beijing University of Technology, Beijing, 100124, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laboratory of Optoelectronic Technology, Beijing University of Technology, Beijing, 100124, China","institution_ids":["https://openalex.org/I37796252"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5039773952","display_name":"Qun Frank Yan","orcid":"https://orcid.org/0000-0002-7057-2755","observed_orcids":["https://orcid.org/0000-0002-7057-2755"]},"institutions":[{"id":"https://openalex.org/I4405272605","display_name":"Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China","ror":"https://ror.org/04dtz2k95","country_code":"CN","type":"facility","lineage":["https://openalex.org/I4405272605"]},{"id":"https://openalex.org/I80947539","display_name":"Fuzhou University","ror":"https://ror.org/011xvna82","country_code":"CN","type":"education","lineage":["https://openalex.org/I80947539"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Qun Yan","raw_affiliation_strings":["Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China","National and Local Joint Engineering Laboratory for Flat Panel Display Technology, Fuzhou University, and Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350108, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China","institution_ids":["https://openalex.org/I4405272605"]},{"raw_affiliation_string":"National and Local Joint Engineering Laboratory for Flat Panel Display Technology, Fuzhou University, and Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350108, China","institution_ids":["https://openalex.org/I4405272605","https://openalex.org/I80947539"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100350808","display_name":"Le Wang","orcid":"https://orcid.org/0000-0002-8509-272X","observed_orcids":["https://orcid.org/0000-0002-8509-272X"]},"institutions":[{"id":"https://openalex.org/I37796252","display_name":"Beijing University of Technology","ror":"https://ror.org/037b1pp87","country_code":"CN","type":"education","lineage":["https://openalex.org/I37796252"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Le Wang","raw_affiliation_strings":["Laboratory of Optoelectronic Technology, Beijing University of Technology, Beijing, 100124, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laboratory of Optoelectronic Technology, Beijing University of Technology, Beijing, 100124, China","institution_ids":["https://openalex.org/I37796252"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108219890","display_name":"Tailiang Guo","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405272605","display_name":"Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China","ror":"https://ror.org/04dtz2k95","country_code":"CN","type":"facility","lineage":["https://openalex.org/I4405272605"]},{"id":"https://openalex.org/I80947539","display_name":"Fuzhou University","ror":"https://ror.org/011xvna82","country_code":"CN","type":"education","lineage":["https://openalex.org/I80947539"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Tailiang Guo","raw_affiliation_strings":["Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China","National and Local Joint Engineering Laboratory for Flat Panel Display Technology, Fuzhou University, and Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350108, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China","institution_ids":["https://openalex.org/I4405272605"]},{"raw_affiliation_string":"National and Local Joint Engineering Laboratory for Flat Panel Display Technology, Fuzhou University, and Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350108, China","institution_ids":["https://openalex.org/I4405272605","https://openalex.org/I80947539"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5027853785","display_name":"Jie Sun","orcid":"https://orcid.org/0000-0002-6479-7771","observed_orcids":["https://orcid.org/0000-0002-6479-7771","https://orcid.org/0009-0003-5018-8451","https://orcid.org/0000-0002-0161-9986","https://orcid.org/0000-0001-8350-8712"]},"institutions":[{"id":"https://openalex.org/I4405272605","display_name":"Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China","ror":"https://ror.org/04dtz2k95","country_code":"CN","type":"facility","lineage":["https://openalex.org/I4405272605"]},{"id":"https://openalex.org/I80947539","display_name":"Fuzhou University","ror":"https://ror.org/011xvna82","country_code":"CN","type":"education","lineage":["https://openalex.org/I80947539"]}],"countries":["CN"],"is_corresponding":true,"raw_author_name":"Jie Sun","raw_affiliation_strings":["Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China","National and Local Joint Engineering Laboratory for Flat Panel Display Technology, Fuzhou University, and Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350108, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China","institution_ids":["https://openalex.org/I4405272605"]},{"raw_affiliation_string":"National and Local Joint Engineering Laboratory for Flat Panel Display Technology, Fuzhou University, and Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350108, China","institution_ids":["https://openalex.org/I4405272605","https://openalex.org/I80947539"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":4,"corresponding_author_ids":["https://openalex.org/A5027853785"],"corresponding_institution_ids":["https://openalex.org/I4405272605","https://openalex.org/I80947539"],"apc_list":{"value":3260,"currency":"USD","value_usd":3260},"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.0504027,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"126","issue":"7","first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.948199987411499,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.948199987411499,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10369","display_name":"Advanced MEMS and NEMS Technologies","score":0.02590000070631504,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.0038999998942017555,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/deep-reactive-ion-etching","display_name":"deep reactive ion etching","score":0.9990000128746033},{"id":"https://openalex.org/keywords/silicon-etching","display_name":"silicon etching","score":0.9789999723434448},{"id":"https://openalex.org/keywords/parallel-plate-reactor","display_name":"parallel plate reactor","score":0.7940000295639038},{"id":"https://openalex.org/keywords/inductively-coupled-plasma","display_name":"inductively coupled plasma","score":0.7720000147819519},{"id":"https://openalex.org/keywords/high-aspect-ratio-trenches","display_name":"high aspect ratio trenches","score":0.8669999837875366},{"id":"https://openalex.org/keywords/etch-rate","display_name":"etch rate","score":0.656000018119812},{"id":"https://openalex.org/keywords/microelectromechanical-systems","display_name":"microelectromechanical systems","score":0.7559999823570251},{"id":"https://openalex.org/keywords/microelectronics-manufacturing","display_name":"microelectronics manufacturing","score":0.5590000152587891}],"concepts":[{"id":"https://openalex.org/C124634506","wikidata":"https://www.wikidata.org/wiki/Q486936","display_name":"Deep reactive-ion etching","level":5,"score":0.9642149209976196},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.766681969165802},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.6664908528327942},{"id":"https://openalex.org/C95974651","wikidata":"https://www.wikidata.org/wiki/Q2454436","display_name":"Inductively coupled plasma","level":3,"score":0.6518683433532715},{"id":"https://openalex.org/C130472188","wikidata":"https://www.wikidata.org/wiki/Q1640159","display_name":"Reactive-ion etching","level":4,"score":0.6452316641807556},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6147987842559814},{"id":"https://openalex.org/C155310634","wikidata":"https://www.wikidata.org/wiki/Q1852785","display_name":"Trench","level":3,"score":0.5528343915939331},{"id":"https://openalex.org/C187937830","wikidata":"https://www.wikidata.org/wiki/Q175403","display_name":"Microelectronics","level":2,"score":0.5342589616775513},{"id":"https://openalex.org/C37977207","wikidata":"https://www.wikidata.org/wiki/Q175561","display_name":"Microelectromechanical systems","level":2,"score":0.5233644247055054},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5198312401771545},{"id":"https://openalex.org/C107187091","wikidata":"https://www.wikidata.org/wiki/Q2392011","display_name":"Plasma etching","level":4,"score":0.4808705449104309},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.43213406205177307},{"id":"https://openalex.org/C1291036","wikidata":"https://www.wikidata.org/wiki/Q1191918","display_name":"Dry etching","level":4,"score":0.41954949498176575},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.34780487418174744},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1007/s00339-020-03732-x","doi":"https://doi.org/10.1007/s00339-020-03732-x","is_oa":false,"landing_page_url":"https://doi.org/10.1007/s00339-020-03732-x","pdf_url":null,"source":{"id":"https://openalex.org/S52123058","display_name":"Applied Physics A","issn_l":"0947-8396","issn":["0947-8396","1432-0630"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-class-a","anvur-scientific","cwts-core","dongbi-d","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310319900","host_organization_name":"Springer Science+Business Media","host_organization_lineage":["https://openalex.org/P4310319900","https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Science+Business Media","Springer Nature"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Physics A","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[{"id":"https://openalex.org/G8286539620","display_name":null,"funder_award_id":"11674016","funder_id":"https://openalex.org/F4320321001","funder_display_name":"National Natural Science Foundation of China"}],"funders":[{"id":"https://openalex.org/F4320321001","display_name":"National Natural Science Foundation of China","ror":"https://ror.org/01h0zpd94"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":27,"referenced_works":["https://openalex.org/W1791724880","https://openalex.org/W1966548041","https://openalex.org/W1969677956","https://openalex.org/W1970819096","https://openalex.org/W1972840313","https://openalex.org/W1982090735","https://openalex.org/W1995419937","https://openalex.org/W1997463426","https://openalex.org/W2009539304","https://openalex.org/W2022028280","https://openalex.org/W2025698258","https://openalex.org/W2039211454","https://openalex.org/W2039568062","https://openalex.org/W2055386313","https://openalex.org/W2056252270","https://openalex.org/W2063043033","https://openalex.org/W2063443947","https://openalex.org/W2071020071","https://openalex.org/W2085388621","https://openalex.org/W2088565749","https://openalex.org/W2127217117","https://openalex.org/W2137983525","https://openalex.org/W2144025468","https://openalex.org/W2157321441","https://openalex.org/W2166814506","https://openalex.org/W2168102100","https://openalex.org/W2181138547"],"related_works":["https://openalex.org/W2360464821","https://openalex.org/W2069970537","https://openalex.org/W2601172683","https://openalex.org/W2046152865","https://openalex.org/W2550291337","https://openalex.org/W4211057652","https://openalex.org/W3022783991","https://openalex.org/W3044696598","https://openalex.org/W2808846666","https://openalex.org/W1590457988"],"abstract_inverted_index":null,"counts_by_year":[{"year":2024,"cited_by_count":1}],"updated_date":"2026-11-05T12:25:35.769452","created_date":"2020-06-25T00:00:00"}