{"id":"https://openalex.org/W3033713277","doi":"https://doi.org/10.1063/5.0003855","title":"Impact of fluorine doping on solution-processed In\u2013Ga\u2013Zn\u2013O thin-film transistors using an efficient aqueous route","display_name":"Impact of fluorine doping on solution-processed In\u2013Ga\u2013Zn\u2013O thin-film transistors using an efficient aqueous route","publication_year":2020,"publication_date":"2020-06-01","ids":{"openalex":"https://openalex.org/W3033713277","doi":"https://doi.org/10.1063/5.0003855","mag":"3033713277"},"language":"en","primary_location":{"id":"doi:10.1063/5.0003855","doi":"https://doi.org/10.1063/5.0003855","is_oa":true,"landing_page_url":"https://doi.org/10.1063/5.0003855","pdf_url":null,"source":{"id":"https://openalex.org/S189917590","display_name":"AIP Advances","issn_l":"2158-3226","issn":["2158-3226"],"is_oa":true,"is_in_doaj":true,"is_core":true,"listed_in":["cwts-core","doaj","dongbi-d","jufo-1","ki-jl-1","norway-1","oarl","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"AIP Advances","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref","doaj"],"open_access":{"is_oa":true,"oa_status":"gold","oa_url":"https://doi.org/10.1063/5.0003855","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5103001698","display_name":"Masashi Miyakawa","orcid":"https://orcid.org/0000-0003-3494-4301","observed_orcids":["https://orcid.org/0000-0003-3494-4301"]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]},{"id":"https://openalex.org/I4210107548","display_name":"Japan Broadcasting Corporation (Japan)","ror":"https://ror.org/01s8tz949","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210107548"]}],"countries":["JP"],"is_corresponding":true,"raw_author_name":"Masashi Miyakawa","raw_affiliation_strings":["Imaging Science and Engineering Research Center, Tokyo Institute of Technology 2 , 4259-J1-2, Nagatsuta Midori-ku, Yokohama 226-8503, Japan","NHK Science & Technology Research Laboratories 1 , 1-10-11 Kinuta, Setagaya-ku, Tokyo 157-8510, Japan"],"raw_orcid":"https://orcid.org/0000-0003-3494-4301","affiliations":[{"raw_affiliation_string":"Imaging Science and Engineering Research Center, Tokyo Institute of Technology 2 , 4259-J1-2, Nagatsuta Midori-ku, Yokohama 226-8503, Japan","institution_ids":["https://openalex.org/I114531698"]},{"raw_affiliation_string":"NHK Science & Technology Research Laboratories 1 , 1-10-11 Kinuta, Setagaya-ku, Tokyo 157-8510, Japan","institution_ids":["https://openalex.org/I4210107548"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5088253217","display_name":"Mitsuru Nakata","orcid":"https://orcid.org/0000-0002-9065-5494","observed_orcids":["https://orcid.org/0000-0002-9065-5494"]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]},{"id":"https://openalex.org/I4210107548","display_name":"Japan Broadcasting Corporation (Japan)","ror":"https://ror.org/01s8tz949","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210107548"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Mitsuru Nakata","raw_affiliation_strings":["NHK Science & Technology Research Laboratories 1 , 1-10-11 Kinuta, Setagaya-ku, Tokyo 157-8510, Japan","2Imaging Science and Engineering Research Center, Tokyo Institute of Technology, 4259-J1-2, Nagatsuta Midori-ku, Yokohama 226-8503, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NHK Science & Technology Research Laboratories 1 , 1-10-11 Kinuta, Setagaya-ku, Tokyo 157-8510, Japan","institution_ids":["https://openalex.org/I4210107548"]},{"raw_affiliation_string":"2Imaging Science and Engineering Research Center, Tokyo Institute of Technology, 4259-J1-2, Nagatsuta Midori-ku, Yokohama 226-8503, Japan","institution_ids":["https://openalex.org/I114531698"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5007157665","display_name":"Hiroshi Tsuji","orcid":"https://orcid.org/0000-0001-9104-601X","observed_orcids":["https://orcid.org/0000-0001-9104-601X"]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]},{"id":"https://openalex.org/I4210107548","display_name":"Japan Broadcasting Corporation (Japan)","ror":"https://ror.org/01s8tz949","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210107548"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Hiroshi Tsuji","raw_affiliation_strings":["NHK Science & Technology Research Laboratories 1 , 1-10-11 Kinuta, Setagaya-ku, Tokyo 157-8510, Japan","2Imaging Science and Engineering Research Center, Tokyo Institute of Technology, 4259-J1-2, Nagatsuta Midori-ku, Yokohama 226-8503, Japan"],"raw_orcid":"https://orcid.org/0000-0001-9104-601X","affiliations":[{"raw_affiliation_string":"NHK Science & Technology Research Laboratories 1 , 1-10-11 Kinuta, Setagaya-ku, Tokyo 157-8510, Japan","institution_ids":["https://openalex.org/I4210107548"]},{"raw_affiliation_string":"2Imaging Science and Engineering Research Center, Tokyo Institute of Technology, 4259-J1-2, Nagatsuta Midori-ku, Yokohama 226-8503, Japan","institution_ids":["https://openalex.org/I114531698"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5084224981","display_name":"Hiroaki Iino","orcid":"https://orcid.org/0000-0003-0193-5118","observed_orcids":["https://orcid.org/0000-0003-0193-5118"]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]},{"id":"https://openalex.org/I4210107548","display_name":"Japan Broadcasting Corporation (Japan)","ror":"https://ror.org/01s8tz949","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210107548"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Hiroaki Iino","raw_affiliation_strings":["Imaging Science and Engineering Research Center, Tokyo Institute of Technology 2 , 4259-J1-2, Nagatsuta Midori-ku, Yokohama 226-8503, Japan","1NHK Science & Technology Research Laboratories, 1-10-11 Kinuta, Setagaya-ku, Tokyo 157-8510, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Imaging Science and Engineering Research Center, Tokyo Institute of Technology 2 , 4259-J1-2, Nagatsuta Midori-ku, Yokohama 226-8503, Japan","institution_ids":["https://openalex.org/I114531698"]},{"raw_affiliation_string":"1NHK Science & Technology Research Laboratories, 1-10-11 Kinuta, Setagaya-ku, Tokyo 157-8510, Japan","institution_ids":["https://openalex.org/I4210107548"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5112298189","display_name":"Yoshihide Fujisaki","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]},{"id":"https://openalex.org/I4210107548","display_name":"Japan Broadcasting Corporation (Japan)","ror":"https://ror.org/01s8tz949","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210107548"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yoshihide Fujisaki","raw_affiliation_strings":["NHK Science & Technology Research Laboratories 1 , 1-10-11 Kinuta, Setagaya-ku, Tokyo 157-8510, Japan","2Imaging Science and Engineering Research Center, Tokyo Institute of Technology, 4259-J1-2, Nagatsuta Midori-ku, Yokohama 226-8503, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NHK Science & Technology Research Laboratories 1 , 1-10-11 Kinuta, Setagaya-ku, Tokyo 157-8510, Japan","institution_ids":["https://openalex.org/I4210107548"]},{"raw_affiliation_string":"2Imaging Science and Engineering Research Center, Tokyo Institute of Technology, 4259-J1-2, Nagatsuta Midori-ku, Yokohama 226-8503, Japan","institution_ids":["https://openalex.org/I114531698"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5103001698"],"corresponding_institution_ids":["https://openalex.org/I114531698","https://openalex.org/I4210107548"],"apc_list":{"value":1350,"currency":"USD","value_usd":1350},"apc_paid":{"value":1350,"currency":"USD","value_usd":1350},"fwci":0.8597,"has_fulltext":false,"cited_by_count":24,"citation_normalized_percentile":{"value":0.69944428,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":99},"biblio":{"volume":"10","issue":"6","first_page":"065004","last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10090","display_name":"ZnO doping and properties","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11523","display_name":"Nanomaterials and Printing Technologies","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/fluorine-doping","display_name":"fluorine doping","score":0.9380000233650208},{"id":"https://openalex.org/keywords/indium-gallium-zinc-oxide","display_name":"indium gallium zinc oxide","score":0.7919999957084656},{"id":"https://openalex.org/keywords/thin-film-transistors","display_name":"thin-film transistors","score":0.8960000276565552},{"id":"https://openalex.org/keywords/solution-processing","display_name":"solution processing","score":0.7680000066757202},{"id":"https://openalex.org/keywords/metal-oxide-semiconductors","display_name":"metal oxide semiconductors","score":0.9369999766349792},{"id":"https://openalex.org/keywords/low-temperature-processing","display_name":"low-temperature processing","score":0.8169999718666077},{"id":"https://openalex.org/keywords/charge-carrier-mobility","display_name":"carrier mobility","score":0.847000002861023},{"id":"https://openalex.org/keywords/switching-characteristics","display_name":"switching characteristics","score":0.8730000257492065}],"concepts":[{"id":"https://openalex.org/C87359718","wikidata":"https://www.wikidata.org/wiki/Q1271916","display_name":"Thin-film transistor","level":3,"score":0.9472509622573853},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8402979373931885},{"id":"https://openalex.org/C57863236","wikidata":"https://www.wikidata.org/wiki/Q1130571","display_name":"Doping","level":2,"score":0.7507333755493164},{"id":"https://openalex.org/C506198293","wikidata":"https://www.wikidata.org/wiki/Q650","display_name":"Fluorine","level":2,"score":0.6543578505516052},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.6429510712623596},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.5499890446662903},{"id":"https://openalex.org/C162743726","wikidata":"https://www.wikidata.org/wiki/Q7115642","display_name":"Oxide thin-film transistor","level":4,"score":0.5336074829101562},{"id":"https://openalex.org/C172385210","wikidata":"https://www.wikidata.org/wiki/Q5339","display_name":"Transistor","level":3,"score":0.5329509973526001},{"id":"https://openalex.org/C184651966","wikidata":"https://www.wikidata.org/wiki/Q906356","display_name":"Aqueous solution","level":2,"score":0.46194252371788025},{"id":"https://openalex.org/C108225325","wikidata":"https://www.wikidata.org/wiki/Q11456","display_name":"Semiconductor","level":2,"score":0.4278866946697235},{"id":"https://openalex.org/C544153396","wikidata":"https://www.wikidata.org/wiki/Q11426","display_name":"Metal","level":2,"score":0.41859734058380127},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3456132709980011},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.13530346751213074},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.13442054390907288},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.08841773867607117},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.07773345708847046},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.05828678607940674},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0}],"mesh":[],"locations_count":4,"locations":[{"id":"doi:10.1063/5.0003855","doi":"https://doi.org/10.1063/5.0003855","is_oa":true,"landing_page_url":"https://doi.org/10.1063/5.0003855","pdf_url":null,"source":{"id":"https://openalex.org/S189917590","display_name":"AIP Advances","issn_l":"2158-3226","issn":["2158-3226"],"is_oa":true,"is_in_doaj":true,"is_core":true,"listed_in":["cwts-core","doaj","dongbi-d","jufo-1","ki-jl-1","norway-1","oarl","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"AIP Advances","raw_type":"journal-article"},{"id":"pmh:oai:doaj.org/article:77dd3c0848c04246a728155be72fe081","doi":null,"is_oa":true,"landing_page_url":"https://doaj.org/article/77dd3c0848c04246a728155be72fe081","pdf_url":null,"source":{"id":"https://openalex.org/S4306401280","display_name":"DOAJ (DOAJ: Directory of Open Access Journals)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":"cc-by-sa","license_id":"https://openalex.org/licenses/cc-by-sa","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"AIP Advances, Vol 10, Iss 6, Pp 065004-065004-7 (2020)","raw_type":"article"},{"id":"pmh:oai:irdb.nii.ac.jp:00897:0004849148","doi":null,"is_oa":false,"landing_page_url":"http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100846261","pdf_url":null,"source":{"id":"https://openalex.org/S7407056385","display_name":"Institutional Repositories DataBase (IRDB)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I184597095","host_organization_name":"National Institute of Informatics","host_organization_lineage":["https://openalex.org/I184597095"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"AIP Advances","raw_type":"journal article"},{"id":"pmh:oai:t2r2.star.titech.ac.jp:50569918","doi":null,"is_oa":false,"landing_page_url":"http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100846261","pdf_url":null,"source":{"id":"https://openalex.org/S4377196385","display_name":"Tokyo Tech Research Repository (Tokyo Institute of Technology)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I114531698","host_organization_name":"Tokyo Institute of Technology","host_organization_lineage":["https://openalex.org/I114531698"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"Journal Article"}],"best_oa_location":{"id":"doi:10.1063/5.0003855","doi":"https://doi.org/10.1063/5.0003855","is_oa":true,"landing_page_url":"https://doi.org/10.1063/5.0003855","pdf_url":null,"source":{"id":"https://openalex.org/S189917590","display_name":"AIP Advances","issn_l":"2158-3226","issn":["2158-3226"],"is_oa":true,"is_in_doaj":true,"is_core":true,"listed_in":["cwts-core","doaj","dongbi-d","jufo-1","ki-jl-1","norway-1","oarl","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"AIP Advances","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":27,"referenced_works":["https://openalex.org/W1975835369","https://openalex.org/W1982968328","https://openalex.org/W1994277498","https://openalex.org/W1998760812","https://openalex.org/W1999589524","https://openalex.org/W2011504035","https://openalex.org/W2051828351","https://openalex.org/W2055146671","https://openalex.org/W2056636591","https://openalex.org/W2062808336","https://openalex.org/W2065855069","https://openalex.org/W2072571566","https://openalex.org/W2076372432","https://openalex.org/W2080762898","https://openalex.org/W2093334606","https://openalex.org/W2094893034","https://openalex.org/W2102210059","https://openalex.org/W2116892170","https://openalex.org/W2125444603","https://openalex.org/W2135920497","https://openalex.org/W2159820115","https://openalex.org/W2297996967","https://openalex.org/W2510510955","https://openalex.org/W2514667578","https://openalex.org/W2792548866","https://openalex.org/W2808128092","https://openalex.org/W4292157017"],"related_works":["https://openalex.org/W2887396229","https://openalex.org/W2116892170","https://openalex.org/W2135920497","https://openalex.org/W2329572751","https://openalex.org/W2052641675","https://openalex.org/W1998760812","https://openalex.org/W2037193816","https://openalex.org/W2159820115","https://openalex.org/W2094893034","https://openalex.org/W2141170334"],"abstract_inverted_index":{"Simple":[0],"and":[1,50,67,85],"facile":[2],"solution-processed":[3,20,36,80],"thin-film":[4],"transistors":[5],"(TFTs)":[6],"using":[7,47],"metal-oxide":[8,21,37],"semiconductors":[9],"are":[10],"promising":[11],"for":[12,33,82],"producing":[13],"large-area":[14],"electronics.":[15],"To":[16],"achieve":[17],"a":[18,24,35],"high-performance":[19],"TFT":[22,60,70,81],"at":[23],"low":[25],"processing":[26],"temperature,":[27],"simple":[28],"fluorine":[29,75],"doping":[30,76],"was":[31],"performed":[32],"obtaining":[34],"semiconductor":[38],"through":[39],"efficient":[40],"metal":[41],"aqua":[42],"complexation.":[43],"The":[44,57],"TFTs":[45],"fabricated":[46,59],"conventional":[48],"IGZO":[49,52],"fluorine-doped":[51],"(IGZO:F)":[53],"precursors":[54],"were":[55],"evaluated.":[56],"IGZO:F":[58],"demonstrated":[61],"higher":[62],"mobility,":[63],"better":[64],"switching":[65],"characteristics,":[66],"enhanced":[68],"overall":[69],"performance.":[71],"This":[72],"simple,":[73],"low-temperature":[74],"technique":[77],"improved":[78],"the":[79],"future":[83],"scalable":[84],"low-cost":[86],"TFTs.":[87]},"counts_by_year":[{"year":2026,"cited_by_count":3},{"year":2025,"cited_by_count":10},{"year":2024,"cited_by_count":1},{"year":2023,"cited_by_count":3},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":6}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2020-06-12T00:00:00"}