{"id":"https://openalex.org/W303249232","doi":null,"title":"Study of High Quality GaN Template by Nano-channel FIELO Using UV Nanoimprint","display_name":"Study of High Quality GaN Template by Nano-channel FIELO Using UV Nanoimprint","publication_year":2013,"publication_date":"2013-04-11","ids":{"openalex":"https://openalex.org/W303249232","mag":"303249232"},"language":"en","primary_location":{"id":"mag:2596033740","doi":null,"is_oa":false,"landing_page_url":"https://www.ieice.org/ken/paper/20130418QBDv/eng/","pdf_url":null,"source":{"id":"https://openalex.org/S4306512848","display_name":"IEICE Technical Report; IEICE Tech. Rep.","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core"],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":"IEICE Technical Report; IEICE Tech. Rep.","raw_type":null},"volume":null,"type":"article","is_traditional":true,"indexed_in":[],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5005039937","display_name":"\u6f64 \u6c34\u91ce","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Mizuno Jun","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5034286664","display_name":"\u611b\u59eb\u5b50 \u5ca1\u7530","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Akiko Okada","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5054481389","display_name":"\u7fd2\u4e00 \u5e84\u5b50","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Shuichi Shoji","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5010500282","display_name":"\u6566\u53f2 \u5c71\u53e3","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Atsushi YAMAGUCHI","raw_affiliation_strings":[],"raw_orcid":"https://orcid.org/0000-0002-8749-5215","affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5071788188","display_name":"\u88d5\u8f1d \u5f8c\u85e4","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Hiroki Goto","raw_affiliation_strings":[],"raw_orcid":"https://orcid.org/0000-0002-3897-5204","affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5014661958","display_name":"\u6674\u592b \u7802\u5ddd","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Haruo Sunakawa","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5052973716","display_name":"\u654f\u6674 \u677e\u679d","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Toshiharu Matsueda","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5019490262","display_name":"\u79c0\u654f \u7be0\u539f","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Hidetoshi Shinohara","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069388803","display_name":"\u6d69\u5df3 \u897f\u539f","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Hiromi Nishihara","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":null,"display_name":"Hiroshi Goto","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Hiroshi Goto","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"last","author":{"id":"https://openalex.org/A5034070493","display_name":"\u5f70 \u7893\u4e95","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Usui Akira","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.0198595,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"113","issue":"9","first_page":"27","last_page":"29"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10099","display_name":"GaN-based semiconductor devices and materials","score":0.8467000126838684,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10099","display_name":"GaN-based semiconductor devices and materials","score":0.8467000126838684,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.1387999951839447,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11272","display_name":"Nanowire Synthesis and Applications","score":0.0006000000284984708,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/gan","display_name":"GaN","score":0.621999979019165},{"id":"https://openalex.org/keywords/nanochannels","display_name":"nanochannels","score":0.4860000014305115},{"id":"https://openalex.org/keywords/focused-ion-beam-etching","display_name":"focused ion beam etching","score":0.6110000014305115},{"id":"https://openalex.org/keywords/uv-nanoimprint","display_name":"UV nanoimprint","score":0.8799999952316284},{"id":"https://openalex.org/keywords/template-fabrication","display_name":"template fabrication","score":0.6589999794960022}],"concepts":[{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.40260428190231323},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.35400354862213135},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.33764320611953735},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.33680421113967896}],"mesh":[],"locations_count":2,"locations":[{"id":"mag:2596033740","doi":null,"is_oa":false,"landing_page_url":"https://www.ieice.org/ken/paper/20130418QBDv/eng/","pdf_url":null,"source":{"id":"https://openalex.org/S4306512848","display_name":"IEICE Technical Report; IEICE Tech. Rep.","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core"],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":"IEICE Technical Report; IEICE Tech. Rep.","raw_type":null},{"id":"mag:303249232","doi":null,"is_oa":false,"landing_page_url":"http://ci.nii.ac.jp/naid/110009770653","pdf_url":null,"source":{"id":"https://openalex.org/S4306559716","display_name":"\u96fb\u5b50\u60c5\u5831\u901a\u4fe1\u5b66\u4f1a\u6280\u8853\u7814\u7a76\u5831\u544a. ED, \u96fb\u5b50\u30c7\u30d0\u30a4\u30b9","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":"\u96fb\u5b50\u60c5\u5831\u901a\u4fe1\u5b66\u4f1a\u6280\u8853\u7814\u7a76\u5831\u544a. ED, \u96fb\u5b50\u30c7\u30d0\u30a4\u30b9","raw_type":null}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W3213815616","https://openalex.org/W569445990","https://openalex.org/W2293129877","https://openalex.org/W641610617","https://openalex.org/W2596033740","https://openalex.org/W2734440211","https://openalex.org/W1555276150","https://openalex.org/W1966029119","https://openalex.org/W2311180068","https://openalex.org/W1606311637"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-11-08T12:12:28.789561","created_date":"2016-06-24T00:00:00"}