{"id":"https://openalex.org/W3022720589","doi":"https://doi.org/10.1117/12.2552125","title":"How we are making the 0.5-NA Berkeley mirco-field exposure tool stable and productive","display_name":"How we are making the 0.5-NA Berkeley mirco-field exposure tool stable and productive","publication_year":2020,"publication_date":"2020-03-23","ids":{"openalex":"https://openalex.org/W3022720589","doi":"https://doi.org/10.1117/12.2552125","mag":"3022720589"},"language":"en","primary_location":{"id":"doi:10.1117/12.2552125","doi":"https://doi.org/10.1117/12.2552125","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2552125","pdf_url":null,"source":{"id":"https://openalex.org/S7407107150","display_name":"SPIE Conference on Extreme Ultraviolet (EUV) Lithography","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Extreme Ultraviolet (EUV) Lithography XI","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"green","oa_url":"https://escholarship.org/content/qt494616gs/qt494616gs.pdf","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5085683353","display_name":"Christopher N. Anderson","orcid":"https://orcid.org/0000-0001-9641-853X","observed_orcids":["https://orcid.org/0000-0001-9641-853X"]},"institutions":[{"id":"https://openalex.org/I148283060","display_name":"Lawrence Berkeley National Laboratory","ror":"https://ror.org/02jbv0t02","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I148283060","https://openalex.org/I39565521"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Christopher Neil Anderson","raw_affiliation_strings":["Lawrence Berkeley National Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Lawrence Berkeley National Lab. (United States)","institution_ids":["https://openalex.org/I148283060"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5033733658","display_name":"Arnaud P. Allezy","orcid":"https://orcid.org/0000-0003-0983-7619","observed_orcids":["https://orcid.org/0000-0003-0983-7619"]},"institutions":[{"id":"https://openalex.org/I148283060","display_name":"Lawrence Berkeley National Laboratory","ror":"https://ror.org/02jbv0t02","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I148283060","https://openalex.org/I39565521"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Arnaud Allezy","raw_affiliation_strings":["Lawrence Berkeley National Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Lawrence Berkeley National Lab. (United States)","institution_ids":["https://openalex.org/I148283060"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5018066903","display_name":"Weilun L. Chao","orcid":"https://orcid.org/0000-0002-9752-370X","observed_orcids":["https://orcid.org/0000-0002-9752-370X"]},"institutions":[{"id":"https://openalex.org/I148283060","display_name":"Lawrence Berkeley National Laboratory","ror":"https://ror.org/02jbv0t02","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I148283060","https://openalex.org/I39565521"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Weilun Chao","raw_affiliation_strings":["Lawrence Berkeley National Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Lawrence Berkeley National Lab. (United States)","institution_ids":["https://openalex.org/I148283060"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5030510496","display_name":"Lucas Conley","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210119074","display_name":"Inpria (United States)","ror":"https://ror.org/02k784406","country_code":"US","type":"company","lineage":["https://openalex.org/I4210119074"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Lucas Conley","raw_affiliation_strings":["Inpria Corp. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Inpria Corp. (United States)","institution_ids":["https://openalex.org/I4210119074"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5059462213","display_name":"Carl W. Cork","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I148283060","display_name":"Lawrence Berkeley National Laboratory","ror":"https://ror.org/02jbv0t02","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I148283060","https://openalex.org/I39565521"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Carl Cork","raw_affiliation_strings":["Lawrence Berkeley National Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Lawrence Berkeley National Lab. (United States)","institution_ids":["https://openalex.org/I148283060"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5037680773","display_name":"William Cork","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I148283060","display_name":"Lawrence Berkeley National Laboratory","ror":"https://ror.org/02jbv0t02","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I148283060","https://openalex.org/I39565521"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Will Cork","raw_affiliation_strings":["Lawrence Berkeley National Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Lawrence Berkeley National Lab. (United States)","institution_ids":["https://openalex.org/I148283060"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5059045791","display_name":"Rene Delano","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I148283060","display_name":"Lawrence Berkeley National Laboratory","ror":"https://ror.org/02jbv0t02","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I148283060","https://openalex.org/I39565521"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Rene Delano","raw_affiliation_strings":["Lawrence Berkeley National Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Lawrence Berkeley National Lab. (United States)","institution_ids":["https://openalex.org/I148283060"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5088615411","display_name":"Jason DePonte","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I148283060","display_name":"Lawrence Berkeley National Laboratory","ror":"https://ror.org/02jbv0t02","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I148283060","https://openalex.org/I39565521"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Jason DePonte","raw_affiliation_strings":["Lawrence Berkeley National Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Lawrence Berkeley National Lab. (United States)","institution_ids":["https://openalex.org/I148283060"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5112293042","display_name":"Michael R. Dickinson","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I148283060","display_name":"Lawrence Berkeley National Laboratory","ror":"https://ror.org/02jbv0t02","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I148283060","https://openalex.org/I39565521"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Michael Dickinson","raw_affiliation_strings":["Lawrence Berkeley National Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Lawrence Berkeley National Lab. (United States)","institution_ids":["https://openalex.org/I148283060"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5033968493","display_name":"Geoff Gaines","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I148283060","display_name":"Lawrence Berkeley National Laboratory","ror":"https://ror.org/02jbv0t02","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I148283060","https://openalex.org/I39565521"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Geoff Gaines","raw_affiliation_strings":["Lawrence Berkeley National Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Lawrence Berkeley National Lab. (United States)","institution_ids":["https://openalex.org/I148283060"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5047268397","display_name":"Jeff Gamsby","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I148283060","display_name":"Lawrence Berkeley National Laboratory","ror":"https://ror.org/02jbv0t02","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I148283060","https://openalex.org/I39565521"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Jeff Gamsby","raw_affiliation_strings":["Lawrence Berkeley National Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Lawrence Berkeley National Lab. (United States)","institution_ids":["https://openalex.org/I148283060"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110700822","display_name":"Eric M. Gullikson","orcid":"https://orcid.org/0000-0003-0337-7674","observed_orcids":["https://orcid.org/0000-0003-0337-7674"]},"institutions":[{"id":"https://openalex.org/I148283060","display_name":"Lawrence Berkeley National Laboratory","ror":"https://ror.org/02jbv0t02","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I148283060","https://openalex.org/I39565521"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Eric Gullikson","raw_affiliation_strings":["Lawrence Berkeley National Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Lawrence Berkeley National Lab. (United States)","institution_ids":["https://openalex.org/I148283060"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5083447769","display_name":"Gideon Jones","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I148283060","display_name":"Lawrence Berkeley National Laboratory","ror":"https://ror.org/02jbv0t02","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I148283060","https://openalex.org/I39565521"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Gideon Jones","raw_affiliation_strings":["Lawrence Berkeley National Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Lawrence Berkeley National Lab. (United States)","institution_ids":["https://openalex.org/I148283060"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5008416212","display_name":"Lauren McQuade","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210119074","display_name":"Inpria (United States)","ror":"https://ror.org/02k784406","country_code":"US","type":"company","lineage":["https://openalex.org/I4210119074"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Lauren McQuade","raw_affiliation_strings":["Inpria Corp. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Inpria Corp. (United States)","institution_ids":["https://openalex.org/I4210119074"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5057866893","display_name":"Ryan H. Miyakawa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I148283060","display_name":"Lawrence Berkeley National Laboratory","ror":"https://ror.org/02jbv0t02","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I148283060","https://openalex.org/I39565521"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Ryan Miyakawa","raw_affiliation_strings":["Lawrence Berkeley National Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Lawrence Berkeley National Lab. (United States)","institution_ids":["https://openalex.org/I148283060"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5003343236","display_name":"Patrick P Naulleau","orcid":"https://orcid.org/0000-0001-6242-1837","observed_orcids":["https://orcid.org/0000-0001-6242-1837"]},"institutions":[{"id":"https://openalex.org/I148283060","display_name":"Lawrence Berkeley National Laboratory","ror":"https://ror.org/02jbv0t02","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I148283060","https://openalex.org/I39565521"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Patrick Naulleau","raw_affiliation_strings":["Lawrence Berkeley National Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Lawrence Berkeley National Lab. (United States)","institution_ids":["https://openalex.org/I148283060"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109812960","display_name":"Senajith B. Rekawa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I148283060","display_name":"Lawrence Berkeley National Laboratory","ror":"https://ror.org/02jbv0t02","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I148283060","https://openalex.org/I39565521"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Senajith Rekawa","raw_affiliation_strings":["Lawrence Berkeley National Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Lawrence Berkeley National Lab. (United States)","institution_ids":["https://openalex.org/I148283060"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108759980","display_name":"Farhad H. Salmassi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I148283060","display_name":"Lawrence Berkeley National Laboratory","ror":"https://ror.org/02jbv0t02","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I148283060","https://openalex.org/I39565521"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Farhad Salmassi","raw_affiliation_strings":["Lawrence Berkeley National Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Lawrence Berkeley National Lab. (United States)","institution_ids":["https://openalex.org/I148283060"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5062126041","display_name":"Brandon Vollmer","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I148283060","display_name":"Lawrence Berkeley National Laboratory","ror":"https://ror.org/02jbv0t02","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I148283060","https://openalex.org/I39565521"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Brandon Vollmer","raw_affiliation_strings":["Lawrence Berkeley National Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Lawrence Berkeley National Lab. (United States)","institution_ids":["https://openalex.org/I148283060"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5054093797","display_name":"Daniel Zehm","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I148283060","display_name":"Lawrence Berkeley National Laboratory","ror":"https://ror.org/02jbv0t02","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I148283060","https://openalex.org/I39565521"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Daniel Zehm","raw_affiliation_strings":["Lawrence Berkeley National Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Lawrence Berkeley National Lab. (United States)","institution_ids":["https://openalex.org/I148283060"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5001152869","display_name":"Wenhua Zhu","orcid":"https://orcid.org/0000-0002-2820-2427","observed_orcids":["https://orcid.org/0000-0002-2820-2427"]},"institutions":[{"id":"https://openalex.org/I148283060","display_name":"Lawrence Berkeley National Laboratory","ror":"https://ror.org/02jbv0t02","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I148283060","https://openalex.org/I39565521"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Wenhua Zhu","raw_affiliation_strings":["Lawrence Berkeley National Lab. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Lawrence Berkeley National Lab. (United States)","institution_ids":["https://openalex.org/I148283060"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.7011,"has_fulltext":true,"cited_by_count":7,"citation_normalized_percentile":{"value":0.5801164,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":98},"biblio":{"volume":null,"issue":null,"first_page":"7","last_page":"7"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9951000213623047,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9951000213623047,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","score":0.0003000000142492354,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.00019999999494757503,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/vibration-isolation","display_name":"vibration isolation","score":0.6669999957084656},{"id":"https://openalex.org/keywords/second-harmonic-generation","display_name":"second harmonic generation","score":0.44600000977516174},{"id":"https://openalex.org/keywords/focus-exposure-matrix","display_name":"focus exposure matrix","score":0.7110000252723694}],"concepts":[{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.5752375721931458},{"id":"https://openalex.org/C45799244","wikidata":"https://www.wikidata.org/wiki/Q109968206","display_name":"Vibration isolation","level":3,"score":0.5729498267173767},{"id":"https://openalex.org/C102519508","wikidata":"https://www.wikidata.org/wiki/Q6520159","display_name":"Fourier transform","level":2,"score":0.5118655562400818},{"id":"https://openalex.org/C2779751349","wikidata":"https://www.wikidata.org/wiki/Q1474480","display_name":"Scanner","level":2,"score":0.5071792602539062},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.499377965927124},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.4681340157985687},{"id":"https://openalex.org/C192209626","wikidata":"https://www.wikidata.org/wiki/Q190909","display_name":"Focus (optics)","level":2,"score":0.45919787883758545},{"id":"https://openalex.org/C198394728","wikidata":"https://www.wikidata.org/wiki/Q3695508","display_name":"Vibration","level":2,"score":0.436349481344223},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.4311926066875458},{"id":"https://openalex.org/C2777904410","wikidata":"https://www.wikidata.org/wiki/Q7397","display_name":"Software","level":2,"score":0.4188215732574463},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.4140617251396179},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3219967484474182},{"id":"https://openalex.org/C24890656","wikidata":"https://www.wikidata.org/wiki/Q82811","display_name":"Acoustics","level":1,"score":0.32042038440704346},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.16604885458946228},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1117/12.2552125","doi":"https://doi.org/10.1117/12.2552125","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2552125","pdf_url":null,"source":{"id":"https://openalex.org/S7407107150","display_name":"SPIE Conference on Extreme Ultraviolet (EUV) Lithography","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Extreme Ultraviolet (EUV) Lithography XI","raw_type":"proceedings-article"},{"id":"pmh:oai:escholarship.org:ark:/13030/qt494616gs","doi":null,"is_oa":true,"landing_page_url":"https://escholarship.org/uc/item/494616gs","pdf_url":"https://escholarship.org/content/qt494616gs/qt494616gs.pdf","source":{"id":"https://openalex.org/S4306400115","display_name":"eScholarship (California Digital Library)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I2801248553","host_organization_name":"California Digital Library","host_organization_lineage":["https://openalex.org/I2801248553"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Proceedings of SPIE--the International Society for Optical Engineering, vol 11323","raw_type":"article"}],"best_oa_location":{"id":"pmh:oai:escholarship.org:ark:/13030/qt494616gs","doi":null,"is_oa":true,"landing_page_url":"https://escholarship.org/uc/item/494616gs","pdf_url":"https://escholarship.org/content/qt494616gs/qt494616gs.pdf","source":{"id":"https://openalex.org/S4306400115","display_name":"eScholarship (California Digital Library)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I2801248553","host_organization_name":"California Digital Library","host_organization_lineage":["https://openalex.org/I2801248553"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Proceedings of SPIE--the International Society for Optical Engineering, vol 11323","raw_type":"article"},"sustainable_development_goals":[],"study_designs":[],"awards":[{"id":"https://openalex.org/G1079818582","display_name":null,"funder_award_id":"AC02\u201005CH11231","funder_id":"https://openalex.org/F4320338292","funder_display_name":"Lawrence Berkeley National Laboratory"},{"id":"https://openalex.org/G1143651532","display_name":null,"funder_award_id":"DE-AC02-05CH11231","funder_id":"https://openalex.org/F4320338292","funder_display_name":"Lawrence Berkeley National Laboratory"},{"id":"https://openalex.org/G1286236842","display_name":null,"funder_award_id":"-AC02-05CH11231","funder_id":"https://openalex.org/F4320306084","funder_display_name":"U.S. Department of Energy"},{"id":"https://openalex.org/G42916606","display_name":null,"funder_award_id":"DE AC02 05CH11231","funder_id":"https://openalex.org/F4320306084","funder_display_name":"U.S. Department of Energy"},{"id":"https://openalex.org/G7354628648","display_name":null,"funder_award_id":"05CH11231","funder_id":"https://openalex.org/F4320338292","funder_display_name":"Lawrence Berkeley National Laboratory"}],"funders":[{"id":"https://openalex.org/F4320306084","display_name":"U.S. Department of Energy","ror":"https://ror.org/01bj3aw27"},{"id":"https://openalex.org/F4320332195","display_name":"Samsung","ror":"https://ror.org/04w3jy968"},{"id":"https://openalex.org/F4320338292","display_name":"Lawrence Berkeley National Laboratory","ror":"https://ror.org/02jbv0t02"}],"has_content":{"grobid_xml":true,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W3022720589.pdf","grobid_xml":"https://content.openalex.org/works/W3022720589.grobid-xml"},"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2922426573","https://openalex.org/W1567790516","https://openalex.org/W2050634967","https://openalex.org/W2981300417","https://openalex.org/W2165086676","https://openalex.org/W2602896028","https://openalex.org/W2055638483","https://openalex.org/W2085126953","https://openalex.org/W2004660340","https://openalex.org/W2098143869"],"abstract_inverted_index":{"Vibration":[0],"levels":[1],"in":[2,47,62],"MET5":[3],"exposures":[4,27],"were":[5,28,60],"reduced":[6],"from":[7],"1.5":[8],"nm":[9,13,52,57,64],"RMS":[10,14],"to":[11],"0.8":[12],"by":[15,30,43],"tuning":[16],"the":[17,32,48],"vibration":[18],"isolation":[19],"system":[20],"and":[21,55],"removing":[22],"non-compliant":[23],"hardware.":[24],"Frequency":[25],"doubling":[26],"improved":[29],"replacing":[31],"Fourier":[33],"synthesis":[34],"pupil":[35],"scanner":[36],"mirror.":[37],"Focus-exposure-matrix":[38],"outliers":[39],"have":[40],"been":[41],"solved":[42],"patching":[44],"a":[45],"bug":[46],"control":[49],"software.":[50],"9":[51],"half-pitch":[53,58],"lines":[54,59],"8":[56],"printed":[61],"11":[63],"thick":[65],"MOx":[66],"resist.":[67]},"counts_by_year":[{"year":2025,"cited_by_count":5},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":1}],"updated_date":"2026-10-27T15:51:10.671819","created_date":"2020-05-13T00:00:00"}