{"id":"https://openalex.org/W3014264366","doi":"https://doi.org/10.1117/12.2559059","title":"Development of integrated photonics based on SiO2:TiO2 sol-gel derived waveguide layers: state of the art, perspectives, prospective applications","display_name":"Development of integrated photonics based on SiO2:TiO2 sol-gel derived waveguide layers: state of the art, perspectives, prospective applications","publication_year":2020,"publication_date":"2020-04-02","ids":{"openalex":"https://openalex.org/W3014264366","doi":"https://doi.org/10.1117/12.2559059","mag":"3014264366"},"language":"en","primary_location":{"id":"doi:10.1117/12.2559059","doi":"https://doi.org/10.1117/12.2559059","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2559059","pdf_url":null,"source":{"id":"https://openalex.org/S7407105291","display_name":"Integrated Photonics Platforms","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Integrated Photonics Platforms: Fundamental Research, Manufacturing and Applications","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5044644919","display_name":"Pawe\u0142 Karasi\u0144ski","orcid":"https://orcid.org/0000-0002-5436-9212","observed_orcids":["https://orcid.org/0000-0002-5436-9212"]},"institutions":[{"id":"https://openalex.org/I119004910","display_name":"Silesian University of Technology","ror":"https://ror.org/02dyjk442","country_code":"PL","type":"education","lineage":["https://openalex.org/I119004910"]}],"countries":["PL"],"is_corresponding":false,"raw_author_name":"Pawel Karasinski","raw_affiliation_strings":["Silesian Univ. of Technology (Poland)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Silesian Univ. of Technology (Poland)","institution_ids":["https://openalex.org/I119004910"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5044931343","display_name":"Cuma Tyszkiewicz","orcid":"https://orcid.org/0000-0001-9724-5183","observed_orcids":["https://orcid.org/0000-0001-9724-5183"]},"institutions":[{"id":"https://openalex.org/I119004910","display_name":"Silesian University of Technology","ror":"https://ror.org/02dyjk442","country_code":"PL","type":"education","lineage":["https://openalex.org/I119004910"]}],"countries":["PL"],"is_corresponding":false,"raw_author_name":"Cuma Tyszkiewicz","raw_affiliation_strings":["Silesian Univ. of Technology (Poland)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Silesian Univ. of Technology (Poland)","institution_ids":["https://openalex.org/I119004910"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5011495535","display_name":"Ryszard Piramidowicz","orcid":"https://orcid.org/0000-0002-2529-8814","observed_orcids":["https://orcid.org/0000-0002-2529-8814"]},"institutions":[{"id":"https://openalex.org/I108403487","display_name":"Warsaw University of Technology","ror":"https://ror.org/00y0xnp53","country_code":"PL","type":"education","lineage":["https://openalex.org/I108403487"]}],"countries":["PL"],"is_corresponding":false,"raw_author_name":"Ryszard Piramidowicz","raw_affiliation_strings":["Warsaw Univ. of Technology (Poland)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Warsaw Univ. of Technology (Poland)","institution_ids":["https://openalex.org/I108403487"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5007285010","display_name":"Andrzej Ka\u017amierczak","orcid":"https://orcid.org/0000-0003-3606-3516","observed_orcids":["https://orcid.org/0000-0003-3606-3516"]},"institutions":[{"id":"https://openalex.org/I108403487","display_name":"Warsaw University of Technology","ror":"https://ror.org/00y0xnp53","country_code":"PL","type":"education","lineage":["https://openalex.org/I108403487"]}],"countries":["PL"],"is_corresponding":false,"raw_author_name":"Andrzej Kazmierczak","raw_affiliation_strings":["Warsaw Univ. of Technology (Poland)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Warsaw Univ. of Technology (Poland)","institution_ids":["https://openalex.org/I108403487"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":1.7578,"has_fulltext":false,"cited_by_count":7,"citation_normalized_percentile":{"value":0.82447232,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":97},"biblio":{"volume":null,"issue":null,"first_page":"41","last_page":"41"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10299","display_name":"Photonic and Optical Devices","score":0.9951000213623047,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10299","display_name":"Photonic and Optical Devices","score":0.9951000213623047,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11050","display_name":"Photorefractive and Nonlinear Optics","score":0.0019000000320374966,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.00039999998989515007,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/integrated-photonics","display_name":"integrated photonics","score":0.8949999809265137},{"id":"https://openalex.org/keywords/sol-gel-deposition","display_name":"sol-gel deposition","score":0.7590000033378601},{"id":"https://openalex.org/keywords/dip-coating","display_name":"dip coating","score":0.8339999914169312},{"id":"https://openalex.org/keywords/strip-waveguides","display_name":"strip waveguides","score":0.7480000257492065},{"id":"https://openalex.org/keywords/nanoimprint-lithography","display_name":"nanoimprint lithography","score":0.8429999947547913},{"id":"https://openalex.org/keywords/electron-beam-lithography","display_name":"electron beam lithography","score":0.9649999737739563},{"id":"https://openalex.org/keywords/plasma-etching","display_name":"plasma etching","score":0.7649999856948853},{"id":"https://openalex.org/keywords/photolithography","display_name":"photolithography","score":0.8019999861717224},{"id":"https://openalex.org/keywords/wet-etching","display_name":"wet etching","score":0.9409999847412109},{"id":"https://openalex.org/keywords/rare-earth-doping","display_name":"rare-earth doping","score":0.7400000095367432},{"id":"https://openalex.org/keywords/refractive-index-tuning","display_name":"refractive index tuning","score":0.7419999837875366},{"id":"https://openalex.org/keywords/path-loss","display_name":"path loss","score":0.7839999794960022}],"concepts":[{"id":"https://openalex.org/C20788544","wikidata":"https://www.wikidata.org/wiki/Q467054","display_name":"Photonics","level":2,"score":0.655621349811554},{"id":"https://openalex.org/C200687136","wikidata":"https://www.wikidata.org/wiki/Q11233438","display_name":"Waveguide","level":2,"score":0.5718172788619995},{"id":"https://openalex.org/C48103436","wikidata":"https://www.wikidata.org/wiki/Q599031","display_name":"State (computer science)","level":2,"score":0.549509584903717},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.46858733892440796},{"id":"https://openalex.org/C2984692560","wikidata":"https://www.wikidata.org/wiki/Q523846","display_name":"Integrated optics","level":2,"score":0.43712812662124634},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4250735342502594},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.4105924069881439},{"id":"https://openalex.org/C61696701","wikidata":"https://www.wikidata.org/wiki/Q770766","display_name":"Engineering physics","level":1,"score":0.340410053730011},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.3347809910774231},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.2108915150165558},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.07753559947013855}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.2559059","doi":"https://doi.org/10.1117/12.2559059","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2559059","pdf_url":null,"source":{"id":"https://openalex.org/S7407105291","display_name":"Integrated Photonics Platforms","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Integrated Photonics Platforms: Fundamental Research, Manufacturing and Applications","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W4387230164","https://openalex.org/W2055875885","https://openalex.org/W2040921226","https://openalex.org/W2386935015","https://openalex.org/W2046843717","https://openalex.org/W4283456821","https://openalex.org/W2021014510","https://openalex.org/W4237989186","https://openalex.org/W2078222969","https://openalex.org/W1155131975"],"abstract_inverted_index":{"In":[0],"this":[1,61],"paper":[2],"we":[3],"discuss":[4],"the":[5,109,127,158],"technology":[6,25,73,110,132],"of":[7,22,28,58,76,104,117,161,181],"SiO2:TiO2":[8],"waveguide":[9,32,53,87,118,128,146,151,162,184],"films":[10,33,54,88],"produced":[11],"via":[12],"sol-gel":[13],"method":[14],"and":[15,39,121,143,175],"dip-coating":[16],"technique,":[17],"mastered":[18],"at":[19],"Silesian":[20],"University":[21],"Technology.":[23],"The":[24,50,71,84,130,148,179],"allows":[26,74],"fabrication":[27,75,180],"150\u2013300":[29],"nm":[30,43],"thick":[31,44],"in":[34,98,102,136,165],"single":[35],"step":[36,47],"deposition":[37,48],"process":[38],"up":[40],"to":[41,69,90],"500":[42],"with":[45,157,198],"multiple":[46],"process.":[49],"typically":[51],"fabricated":[52,86,155],"have":[55],"refractive":[56],"index":[57],"~1.8,":[59],"however":[60],"value":[62],"can":[63],"be":[64,91,134,154,187],"arbitrary":[65],"altered":[66],"from":[67],"1.45":[68],"1.94.":[70],"developed":[72,112,135],"waveguides":[77],"having":[78],"propagation":[79],"losses":[80],"below":[81],"0.2":[82],"dB/cm.":[83],"up-to-now":[85],"seem":[89],"very":[92],"promising.":[93],"However":[94],"biggest":[95],"stumbling":[96],"block":[97],"their":[99],"application":[100],"lays":[101],"elaboration":[103],"efficient":[105,115],"patterning":[106,120,131],"techniques.":[107],"Currently":[108],"is":[111],"towards":[113],"an":[114],"way":[116,169],"layers":[119],"introducing":[122],"rare":[123],"earth":[124],"ions":[125],"into":[126],"layers.":[129],"will":[133,153,186],"a":[137,166],"twofold":[138],"way,":[139],"including":[140],"mainly":[141],"deep":[142],"shallow":[144],"strip":[145],"structures.":[147],"deeply":[149],"patterned":[150,183],"structures":[152,185],"either":[156],"direct":[159,192],"nanoimprint":[160,193],"layer":[163],"or":[164,194],"more":[167],"conventional":[168],"by":[170],"using":[171,190],"electron":[172],"beam":[173],"lithography":[174],"dry":[176],"plasma":[177],"etching.":[178,201],"shallowly":[182],"carried":[188],"out":[189],"also":[191],"alternatively":[195],"photolithography":[196],"combined":[197],"wet":[199],"chemical":[200]},"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":1},{"year":2022,"cited_by_count":4},{"year":2021,"cited_by_count":1}],"updated_date":"2026-10-28T10:33:24.094632","created_date":"2020-04-10T00:00:00"}