{"id":"https://openalex.org/W2971134824","doi":"https://doi.org/10.1063/1.5123836","title":"Comparison of low damage sputter deposition techniques to enable the application of very thin a-Si passivation films","display_name":"Comparison of low damage sputter deposition techniques to enable the application of very thin a-Si passivation films","publication_year":2019,"publication_date":"2019-01-01","ids":{"openalex":"https://openalex.org/W2971134824","doi":"https://doi.org/10.1063/1.5123836","mag":"2971134824"},"language":"en","primary_location":{"id":"doi:10.1063/1.5123836","doi":"https://doi.org/10.1063/1.5123836","is_oa":false,"landing_page_url":"https://doi.org/10.1063/1.5123836","pdf_url":null,"source":{"id":"https://openalex.org/S2764696622","display_name":"AIP conference proceedings","issn_l":"0094-243X","issn":["0094-243X","1551-7616","1935-0465"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"AIP Conference Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5061523169","display_name":"Volker Lin\u00df","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210117272","display_name":"Fraunhofer Institute for Solar Energy Systems","ror":"https://ror.org/02kfzvh91","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210117272","https://openalex.org/I4923324"]},{"id":"https://openalex.org/I4210149217","display_name":"Fraunhofer Institute for Surface Engineering and Thin Films","ror":"https://ror.org/048vzmn57","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210149217","https://openalex.org/I4923324"]},{"id":"https://openalex.org/I4210150531","display_name":"Von Ardenne (Germany)","ror":"https://ror.org/04kmayk86","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210150531"]},{"id":"https://openalex.org/I912014387","display_name":"Keihin (Japan)","ror":"https://ror.org/03jvjps27","country_code":"JP","type":"company","lineage":["https://openalex.org/I912014387"]}],"countries":["DE","JP"],"is_corresponding":true,"raw_author_name":"Volker Linss","raw_affiliation_strings":["VON ARDENNE GmbH, Am Hahnweg 8, D-01328 Dresden, Germany","1VON ARDENNE GmbH, Am Hahnweg 8, D-01328 Dresden, Germany","2Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstrasse 2, D-79110 Freiburg, Germany","3KEIHIN RAMTECH Co.,LTD., Shin-Yokohama AK Bldg.3F, 3-23-3 Shin-Yokohama, Kouhoku-ku, Yokohama, 222-0033 Kanagawa, Japan","4Fraunhofer Institute for Surface Engineering and Thin Films IST, Bienroder Weg 54 E, D-38108 Braunschweig, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"VON ARDENNE GmbH, Am Hahnweg 8, D-01328 Dresden, Germany","institution_ids":["https://openalex.org/I4210150531"]},{"raw_affiliation_string":"1VON ARDENNE GmbH, Am Hahnweg 8, D-01328 Dresden, Germany","institution_ids":["https://openalex.org/I4210150531"]},{"raw_affiliation_string":"2Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstrasse 2, D-79110 Freiburg, Germany","institution_ids":["https://openalex.org/I4210117272"]},{"raw_affiliation_string":"3KEIHIN RAMTECH Co.,LTD., Shin-Yokohama AK Bldg.3F, 3-23-3 Shin-Yokohama, Kouhoku-ku, Yokohama, 222-0033 Kanagawa, Japan","institution_ids":["https://openalex.org/I912014387"]},{"raw_affiliation_string":"4Fraunhofer Institute for Surface Engineering and Thin Films IST, Bienroder Weg 54 E, D-38108 Braunschweig, Germany","institution_ids":["https://openalex.org/I4210149217"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5048748769","display_name":"Martin Bivour","orcid":"https://orcid.org/0009-0008-0980-8774","observed_orcids":["https://orcid.org/0009-0008-0980-8774"]},"institutions":[{"id":"https://openalex.org/I4210117272","display_name":"Fraunhofer Institute for Solar Energy Systems","ror":"https://ror.org/02kfzvh91","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210117272","https://openalex.org/I4923324"]},{"id":"https://openalex.org/I4210149217","display_name":"Fraunhofer Institute for Surface Engineering and Thin Films","ror":"https://ror.org/048vzmn57","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210149217","https://openalex.org/I4923324"]},{"id":"https://openalex.org/I4210150531","display_name":"Von Ardenne (Germany)","ror":"https://ror.org/04kmayk86","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210150531"]},{"id":"https://openalex.org/I912014387","display_name":"Keihin (Japan)","ror":"https://ror.org/03jvjps27","country_code":"JP","type":"company","lineage":["https://openalex.org/I912014387"]}],"countries":["DE","JP"],"is_corresponding":false,"raw_author_name":"Martin Bivour","raw_affiliation_strings":["Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstrasse 2, D-79110 Freiburg, Germany","1VON ARDENNE GmbH, Am Hahnweg 8, D-01328 Dresden, Germany","2Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstrasse 2, D-79110 Freiburg, Germany","3KEIHIN RAMTECH Co.,LTD., Shin-Yokohama AK Bldg.3F, 3-23-3 Shin-Yokohama, Kouhoku-ku, Yokohama, 222-0033 Kanagawa, Japan","4Fraunhofer Institute for Surface Engineering and Thin Films IST, Bienroder Weg 54 E, D-38108 Braunschweig, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstrasse 2, D-79110 Freiburg, Germany","institution_ids":["https://openalex.org/I4210117272"]},{"raw_affiliation_string":"1VON ARDENNE GmbH, Am Hahnweg 8, D-01328 Dresden, Germany","institution_ids":["https://openalex.org/I4210150531"]},{"raw_affiliation_string":"2Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstrasse 2, D-79110 Freiburg, Germany","institution_ids":["https://openalex.org/I4210117272"]},{"raw_affiliation_string":"3KEIHIN RAMTECH Co.,LTD., Shin-Yokohama AK Bldg.3F, 3-23-3 Shin-Yokohama, Kouhoku-ku, Yokohama, 222-0033 Kanagawa, Japan","institution_ids":["https://openalex.org/I912014387"]},{"raw_affiliation_string":"4Fraunhofer Institute for Surface Engineering and Thin Films IST, Bienroder Weg 54 E, D-38108 Braunschweig, Germany","institution_ids":["https://openalex.org/I4210149217"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5105286571","display_name":"Hiroshi Iwata","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210117272","display_name":"Fraunhofer Institute for Solar Energy Systems","ror":"https://ror.org/02kfzvh91","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210117272","https://openalex.org/I4923324"]},{"id":"https://openalex.org/I4210149217","display_name":"Fraunhofer Institute for Surface Engineering and Thin Films","ror":"https://ror.org/048vzmn57","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210149217","https://openalex.org/I4923324"]},{"id":"https://openalex.org/I4210150531","display_name":"Von Ardenne (Germany)","ror":"https://ror.org/04kmayk86","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210150531"]},{"id":"https://openalex.org/I912014387","display_name":"Keihin (Japan)","ror":"https://ror.org/03jvjps27","country_code":"JP","type":"company","lineage":["https://openalex.org/I912014387"]}],"countries":["DE","JP"],"is_corresponding":false,"raw_author_name":"Hiroshi Iwata","raw_affiliation_strings":["KEIHIN RAMTECH Co.,LTD., Shin-Yokohama AK Bldg.3F, 3-23-3 Shin-Yokohama, Kouhoku-ku, Yokohama, 222-0033 Kanagawa, Japan","1VON ARDENNE GmbH, Am Hahnweg 8, D-01328 Dresden, Germany","2Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstrasse 2, D-79110 Freiburg, Germany","3KEIHIN RAMTECH Co.,LTD., Shin-Yokohama AK Bldg.3F, 3-23-3 Shin-Yokohama, Kouhoku-ku, Yokohama, 222-0033 Kanagawa, Japan","4Fraunhofer Institute for Surface Engineering and Thin Films IST, Bienroder Weg 54 E, D-38108 Braunschweig, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"KEIHIN RAMTECH Co.,LTD., Shin-Yokohama AK Bldg.3F, 3-23-3 Shin-Yokohama, Kouhoku-ku, Yokohama, 222-0033 Kanagawa, Japan","institution_ids":[]},{"raw_affiliation_string":"1VON ARDENNE GmbH, Am Hahnweg 8, D-01328 Dresden, Germany","institution_ids":["https://openalex.org/I4210150531"]},{"raw_affiliation_string":"2Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstrasse 2, D-79110 Freiburg, Germany","institution_ids":["https://openalex.org/I4210117272"]},{"raw_affiliation_string":"3KEIHIN RAMTECH Co.,LTD., Shin-Yokohama AK Bldg.3F, 3-23-3 Shin-Yokohama, Kouhoku-ku, Yokohama, 222-0033 Kanagawa, Japan","institution_ids":["https://openalex.org/I912014387"]},{"raw_affiliation_string":"4Fraunhofer Institute for Surface Engineering and Thin Films IST, Bienroder Weg 54 E, D-38108 Braunschweig, Germany","institution_ids":["https://openalex.org/I4210149217"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5035727836","display_name":"K. Ortner","orcid":"https://orcid.org/0000-0002-1874-6981","observed_orcids":["https://orcid.org/0000-0002-1874-6981"]},"institutions":[{"id":"https://openalex.org/I4210117272","display_name":"Fraunhofer Institute for Solar Energy Systems","ror":"https://ror.org/02kfzvh91","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210117272","https://openalex.org/I4923324"]},{"id":"https://openalex.org/I4210149217","display_name":"Fraunhofer Institute for Surface Engineering and Thin Films","ror":"https://ror.org/048vzmn57","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210149217","https://openalex.org/I4923324"]},{"id":"https://openalex.org/I4210150531","display_name":"Von Ardenne (Germany)","ror":"https://ror.org/04kmayk86","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210150531"]},{"id":"https://openalex.org/I912014387","display_name":"Keihin (Japan)","ror":"https://ror.org/03jvjps27","country_code":"JP","type":"company","lineage":["https://openalex.org/I912014387"]}],"countries":["DE","JP"],"is_corresponding":false,"raw_author_name":"Kai Ortner","raw_affiliation_strings":["Fraunhofer Institute for Surface Engineering and Thin Films IST, Bienroder Weg 54 E, D-38108 Braunschweig, Germany","1VON ARDENNE GmbH, Am Hahnweg 8, D-01328 Dresden, Germany","2Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstrasse 2, D-79110 Freiburg, Germany","3KEIHIN RAMTECH Co.,LTD., Shin-Yokohama AK Bldg.3F, 3-23-3 Shin-Yokohama, Kouhoku-ku, Yokohama, 222-0033 Kanagawa, Japan","4Fraunhofer Institute for Surface Engineering and Thin Films IST, Bienroder Weg 54 E, D-38108 Braunschweig, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Fraunhofer Institute for Surface Engineering and Thin Films IST, Bienroder Weg 54 E, D-38108 Braunschweig, Germany","institution_ids":["https://openalex.org/I4210149217"]},{"raw_affiliation_string":"1VON ARDENNE GmbH, Am Hahnweg 8, D-01328 Dresden, Germany","institution_ids":["https://openalex.org/I4210150531"]},{"raw_affiliation_string":"2Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstrasse 2, D-79110 Freiburg, Germany","institution_ids":["https://openalex.org/I4210117272"]},{"raw_affiliation_string":"3KEIHIN RAMTECH Co.,LTD., Shin-Yokohama AK Bldg.3F, 3-23-3 Shin-Yokohama, Kouhoku-ku, Yokohama, 222-0033 Kanagawa, Japan","institution_ids":["https://openalex.org/I912014387"]},{"raw_affiliation_string":"4Fraunhofer Institute for Surface Engineering and Thin Films IST, Bienroder Weg 54 E, D-38108 Braunschweig, Germany","institution_ids":["https://openalex.org/I4210149217"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":4,"corresponding_author_ids":["https://openalex.org/A5061523169"],"corresponding_institution_ids":["https://openalex.org/I4210117272","https://openalex.org/I4210149217","https://openalex.org/I4210150531","https://openalex.org/I912014387"],"apc_list":null,"apc_paid":null,"fwci":3.1683,"has_fulltext":false,"cited_by_count":16,"citation_normalized_percentile":{"value":0.9279135,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":88,"max":97},"biblio":{"volume":"2149","issue":null,"first_page":"040009","last_page":"040009"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10624","display_name":"Silicon and Solar Cell Technologies","score":0.9980000257492065,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10624","display_name":"Silicon and Solar Cell Technologies","score":0.9980000257492065,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.0010000000474974513,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/sputter-damage","display_name":"sputter damage","score":0.8349999785423279},{"id":"https://openalex.org/keywords/silicon-solar-cells","display_name":"silicon solar cells","score":0.8799999952316284},{"id":"https://openalex.org/keywords/minority-carrier-lifetime","display_name":"minority carrier lifetime","score":0.8880000114440918},{"id":"https://openalex.org/keywords/open-circuit-voltage","display_name":"open-circuit voltage","score":0.8450000286102295},{"id":"https://openalex.org/keywords/gas-flow-sputtering","display_name":"gas flow sputtering","score":0.859000027179718},{"id":"https://openalex.org/keywords/dc-sputtering","display_name":"DC sputtering","score":0.7979999780654907},{"id":"https://openalex.org/keywords/annealing","display_name":"annealing","score":0.5839999914169312}],"concepts":[{"id":"https://openalex.org/C33574316","wikidata":"https://www.wikidata.org/wiki/Q917260","display_name":"Passivation","level":3,"score":0.9192521572113037},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.8758291602134705},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7906638383865356},{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.7085433602333069},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.6499887704849243},{"id":"https://openalex.org/C97892325","wikidata":"https://www.wikidata.org/wiki/Q1621956","display_name":"High-power impulse magnetron sputtering","level":5,"score":0.6271177530288696},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.6119682192802429},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.5797749757766724},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.5268049240112305},{"id":"https://openalex.org/C198865614","wikidata":"https://www.wikidata.org/wiki/Q5046374","display_name":"Carrier lifetime","level":3,"score":0.49469348788261414},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.46238747239112854},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.4439533054828644},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.2327890694141388},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.22711676359176636}],"mesh":[],"locations_count":3,"locations":[{"id":"doi:10.1063/1.5123836","doi":"https://doi.org/10.1063/1.5123836","is_oa":false,"landing_page_url":"https://doi.org/10.1063/1.5123836","pdf_url":null,"source":{"id":"https://openalex.org/S2764696622","display_name":"AIP conference proceedings","issn_l":"0094-243X","issn":["0094-243X","1551-7616","1935-0465"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"AIP Conference Proceedings","raw_type":"proceedings-article"},{"id":"pmh:oai:fraunhofer.de:N-555782","doi":null,"is_oa":false,"landing_page_url":"http://publica.fraunhofer.de/documents/N-555782.html","pdf_url":null,"source":{"id":"https://openalex.org/S4306400801","display_name":"Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I4923324","host_organization_name":"Fraunhofer-Gesellschaft","host_organization_lineage":["https://openalex.org/I4923324"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Fraunhofer IST","raw_type":"Conference Paper"},{"id":"pmh:oai:publica.fraunhofer.de:publica/405142","doi":null,"is_oa":false,"landing_page_url":"https://publica.fraunhofer.de/handle/publica/405142","pdf_url":null,"source":{"id":"https://openalex.org/S4306400318","display_name":"Fraunhofer-Publica (Fraunhofer-Gesellschaft)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I4923324","host_organization_name":"Fraunhofer-Gesellschaft","host_organization_lineage":["https://openalex.org/I4923324"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"conference paper"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":11,"referenced_works":["https://openalex.org/W1010567038","https://openalex.org/W1539695312","https://openalex.org/W1799138036","https://openalex.org/W1989999686","https://openalex.org/W2001961118","https://openalex.org/W2090760021","https://openalex.org/W2097284631","https://openalex.org/W2150665030","https://openalex.org/W2159496500","https://openalex.org/W6948001733","https://openalex.org/W7018356592"],"related_works":["https://openalex.org/W2390838881","https://openalex.org/W59715603","https://openalex.org/W7043565185","https://openalex.org/W2341013161","https://openalex.org/W2121847264","https://openalex.org/W2970495045","https://openalex.org/W3034132588","https://openalex.org/W4400332722","https://openalex.org/W2905554498","https://openalex.org/W4391972395"],"abstract_inverted_index":{"Sputtering":[0],"on":[1,185,294],"passivating":[2,61,142],"layers":[3],"of":[4,24,38,59,135,237,282],"silicon":[5,50],"solar":[6],"cells":[7],"is":[8,54,69,109,298,307],"often":[9,70],"reported":[10],"as":[11,52,171,173],"a":[12,35,130,165,175,180,209,234],"process":[13],"that":[14,56,303],"can":[15,94,221],"harm":[16],"the":[17,39,46,49,57,60,77,82,110,123,186,219,225,243,250,254,264,267,283,301,312],"c-Si":[18],"surface":[19],"passivation":[20,40,133],"quality.":[21],"The":[22,67,139,154,205,228,279],"loss":[23],"minority":[25],"carrier":[26],"lifetime":[27,127],"and":[28,79,147,199,263],"decrease":[29],"in":[30,97,141,191,211,218,272],"iVoc":[31,236,304],"are":[32,258],"related":[33],"to":[34,45,48,72,81,260,287,311],"\u201csputter":[36],"damage\u201d":[37],"layer":[41,62,134],"or":[42],"more":[43,238],"probably":[44],"interface":[47],"wafer":[51],"it":[53],"known":[55],"thickness":[58],"plays":[63,208],"an":[64,149],"important":[65],"role.":[66],"\u201cdamage\u201d":[68,220],"attributed":[71],"fast":[73],"particles":[74],"generated":[75],"at":[76],"cathode":[78,270],"directed":[80],"substrate.":[83],"Damage":[84],"by":[85,300],"UV":[86],"radiation":[87],"might":[88],"be":[89,95,222],"another":[90],"reason.":[91],"However,":[92,215],"sputtering":[93,108,146,163,202,231,257,265],"done":[96],"different":[98,101,117,226],"set-ups":[99],"with":[100,129,164,174,266],"discharge":[102,206],"excitation":[103],"forms":[104],"where":[105],"direct":[106],"current":[107,169],"most":[111],"industrially":[112],"applicable.":[113],"Within":[114],"this":[115],"work,":[116],"sputter":[118,156,292],"setups":[119,157],"were":[120,152,158],"investigated":[121,155],"using":[122],"same":[124],"a-Si:H(i)":[125],"passivated":[126],"samples":[128],"very":[131],"thin":[132,244],"only":[136],"8":[137,245],"nm.":[138],"change":[140],"properties":[143],"directly":[144],"after":[145,148,305],"annealing":[150,306],"step":[151],"quantified.":[153],"industrial":[159],"size":[160],"tube":[161,167,177],"magnetron":[162,182,230],"single":[166],"(direct":[168,197,203],"discharge)":[170],"well":[172],"double":[176],"(alternating":[178],"current),":[179,198],"special":[181],"setup":[183],"based":[184],"facing":[187,268],"target":[188],"principle":[189],"developed":[190],"particular":[192],"for":[193,224,242,253],"low":[194,289],"damage":[195,290],"processes":[196],"gas":[200,255],"flow":[201,256],"current).":[204],"power":[207],"role":[210],"all":[212],"three":[213],"setups.":[214],"clear":[216],"differences":[217],"seen":[223],"methods.":[227],"rotatable":[229],"yields":[232],"already":[233],"good":[235],"than":[239,276],"715":[240],"mV":[241,262],"nm":[246],"thick":[247],"a-Si:H":[248],"film,":[249],"best":[251],"values":[252,273],"close":[259],"730":[261,277],"targets":[269],"results":[271],"even":[274,308],"higher":[275,309],"mV.":[278],"excellent":[280],"suitability":[281],"latter":[284],"two":[285],"approaches":[286],"provide":[288],"during":[291],"deposition":[293],"ultra-thin":[295],"a-Si":[296],"films":[297],"substantiated":[299],"fact":[302],"compared":[310],"unsputtered":[313],"references.":[314]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2024,"cited_by_count":3},{"year":2023,"cited_by_count":4},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":4},{"year":2020,"cited_by_count":2},{"year":2019,"cited_by_count":1}],"updated_date":"2026-09-21T07:43:02.447757","created_date":"2019-09-05T00:00:00"}