{"id":"https://openalex.org/W2954551206","doi":"https://doi.org/10.1093/oso/9780198562870.001.0001","title":"Plasma Etching Fundamentals and Applications","display_name":"Plasma Etching Fundamentals and Applications","publication_year":1998,"publication_date":"1998-05-28","ids":{"openalex":"https://openalex.org/W2954551206","doi":"https://doi.org/10.1093/oso/9780198562870.001.0001","mag":"2954551206"},"language":"en","primary_location":{"id":"doi:10.1093/oso/9780198562870.001.0001","doi":"https://doi.org/10.1093/oso/9780198562870.001.0001","is_oa":false,"landing_page_url":"https://doi.org/10.1093/oso/9780198562870.001.0001","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":null,"raw_type":"book"},"volume":null,"type":"book","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5081284897","display_name":"Mitsuru Sugawara","orcid":"https://orcid.org/0000-0001-5350-2950","observed_orcids":["https://orcid.org/0000-0001-5350-2950"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"M Sugawara","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5093200523","display_name":"Barry L Stansficld","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Barry L Stansficld","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5112271235","display_name":"S Handa","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"S Handa","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":null,"display_name":"K Fujita","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"K Fujita","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5057421021","display_name":"Satiro Watanabe","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"S Watanabe","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"last","author":{"id":null,"display_name":"T Tsukamoto","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I114132059","display_name":"Tokyo Electron (Japan)","ror":"https://ror.org/05gd76j39","country_code":"JP","type":"company","lineage":["https://openalex.org/I114132059"]},{"id":"https://openalex.org/I168636783","display_name":"Hachinohe Institute of Technology","ror":"https://ror.org/05wj18248","country_code":"JP","type":"education","lineage":["https://openalex.org/I168636783"]},{"id":"https://openalex.org/I177136067","display_name":"Saga University","ror":"https://ror.org/04f4wg107","country_code":"JP","type":"education","lineage":["https://openalex.org/I177136067"]},{"id":"https://openalex.org/I39481719","display_name":"Institut National de la Recherche Scientifique","ror":"https://ror.org/04td37d32","country_code":"CA","type":"education","lineage":["https://openalex.org/I39481719","https://openalex.org/I49663120"]}],"countries":["CA","JP"],"is_corresponding":false,"raw_author_name":"T Tsukamoto","raw_affiliation_strings":["Aneiua Corporation, Tokyo, Japan","Hachinohe Institute of Technology, Japan","Hitachin Ltd., Yamaguchi, Japan","INRS-Energie et Materiaux, Quebec, Canada","Saga University, Japan","Tokyo Electron Ltd., Tokyo, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Aneiua Corporation, Tokyo, Japan","institution_ids":[]},{"raw_affiliation_string":"Hachinohe Institute of Technology, Japan","institution_ids":["https://openalex.org/I168636783"]},{"raw_affiliation_string":"Hitachin Ltd., Yamaguchi, Japan","institution_ids":[]},{"raw_affiliation_string":"INRS-Energie et Materiaux, Quebec, Canada","institution_ids":["https://openalex.org/I39481719"]},{"raw_affiliation_string":"Saga University, Japan","institution_ids":["https://openalex.org/I177136067"]},{"raw_affiliation_string":"Tokyo Electron Ltd., Tokyo, Japan","institution_ids":["https://openalex.org/I114132059"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":4,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":1.4063,"has_fulltext":false,"cited_by_count":181,"citation_normalized_percentile":{"value":0.8623298,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":93,"max":99},"biblio":{"volume":null,"issue":null,"first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.9970999956130981,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.9970999956130981,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10642","display_name":"Atmospheric-Pressure Plasma Applications","score":0.0017999999690800905,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12077","display_name":"Vacuum and Plasma Arcs","score":0.0007999999797903001,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/plasma-etching","display_name":"plasma etching","score":0.996999979019165},{"id":"https://openalex.org/keywords/radio-frequency-discharge","display_name":"RF discharge","score":0.7829999923706055},{"id":"https://openalex.org/keywords/plasma-physics","display_name":"plasma physics","score":0.8889999985694885},{"id":"https://openalex.org/keywords/plasma-diagnostics","display_name":"plasma diagnostics","score":0.8830000162124634}],"concepts":[{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.623317539691925},{"id":"https://openalex.org/C107187091","wikidata":"https://www.wikidata.org/wiki/Q2392011","display_name":"Plasma etching","level":4,"score":0.5398015975952148},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.521252453327179},{"id":"https://openalex.org/C74064498","wikidata":"https://www.wikidata.org/wiki/Q3396184","display_name":"Radio frequency","level":2,"score":0.4757363796234131},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.4360154867172241},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3815712630748749},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.3624209761619568},{"id":"https://openalex.org/C61696701","wikidata":"https://www.wikidata.org/wiki/Q770766","display_name":"Engineering physics","level":1,"score":0.35059183835983276},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.34743744134902954},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.2306976318359375},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.1634671986103058},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.14323627948760986},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1093/oso/9780198562870.001.0001","doi":"https://doi.org/10.1093/oso/9780198562870.001.0001","is_oa":false,"landing_page_url":"https://doi.org/10.1093/oso/9780198562870.001.0001","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":null,"raw_type":"book"},{"id":"mag:612680286","doi":null,"is_oa":false,"landing_page_url":"https://ci.nii.ac.jp/ncid/BA37045123","pdf_url":null,"source":{"id":"https://openalex.org/S4306463708","display_name":"Oxford University Press eBooks","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310311648","host_organization_name":"Oxford University Press","host_organization_lineage":["https://openalex.org/P4310311648","https://openalex.org/P4310311647"],"host_organization_lineage_names":["Oxford University Press","University of Oxford"],"type":"ebook platform"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":"Oxford University Press eBooks","raw_type":null}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W7061579335","https://openalex.org/W2010183630","https://openalex.org/W3034508367","https://openalex.org/W4210383615","https://openalex.org/W2247091651","https://openalex.org/W2493238207","https://openalex.org/W7061205370","https://openalex.org/W192219068","https://openalex.org/W2101369954","https://openalex.org/W4239120543"],"abstract_inverted_index":{"Abstract":[0],"The":[1],"focus":[2],"of":[3,12,37],"this":[4],"book":[5],"is":[6],"the":[7,35],"remarkable":[8],"advances":[9],"in":[10],"understanding":[11],"low":[13],"pressure":[14],"RF":[15],"(radio":[16],"frequency)":[17],"glow":[18],"discharges.":[19],"A":[20],"basic":[21],"analytical":[22],"theory":[23],"and":[24],"plasma":[25],"physics":[26],"are":[27,31,40],"explained.":[28],"Plasma":[29],"diagnostics":[30],"also":[32],"covered":[33],"before":[34],"practicalities":[36],"etcher":[38],"use":[39],"explored.":[41]},"counts_by_year":[{"year":2026,"cited_by_count":4},{"year":2025,"cited_by_count":2},{"year":2024,"cited_by_count":3},{"year":2023,"cited_by_count":2},{"year":2022,"cited_by_count":3},{"year":2021,"cited_by_count":5},{"year":2020,"cited_by_count":8},{"year":2019,"cited_by_count":8},{"year":2018,"cited_by_count":10},{"year":2017,"cited_by_count":9},{"year":2016,"cited_by_count":9},{"year":2015,"cited_by_count":12},{"year":2014,"cited_by_count":6},{"year":2013,"cited_by_count":7},{"year":2012,"cited_by_count":9}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2019-07-12T00:00:00"}