{"id":"https://openalex.org/W2921936596","doi":"https://doi.org/10.1117/12.2515503","title":"Impact of sequential infiltration synthesis (SIS) on roughness and stochastic nano-failures for EUVL patterning","display_name":"Impact of sequential infiltration synthesis (SIS) on roughness and stochastic nano-failures for EUVL patterning","publication_year":2019,"publication_date":"2019-03-14","ids":{"openalex":"https://openalex.org/W2921936596","doi":"https://doi.org/10.1117/12.2515503","mag":"2921936596"},"language":"en","primary_location":{"id":"doi:10.1117/12.2515503","doi":"https://doi.org/10.1117/12.2515503","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2515503","pdf_url":null,"source":{"id":"https://openalex.org/S7407107024","display_name":"Extreme Ultraviolet (EUV) Lithography","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Extreme Ultraviolet (EUV) Lithography X","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5030438911","display_name":"Pieter Vanelderen","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Pieter Vanelderen","raw_affiliation_strings":["IMEC (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IMEC (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Victor Blanco","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Victor Blanco","raw_affiliation_strings":["IMEC (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IMEC (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5075909513","display_name":"Ming Mao","orcid":"https://orcid.org/0000-0002-1787-7218","observed_orcids":["https://orcid.org/0000-0002-1787-7218"]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Ming Mao","raw_affiliation_strings":["IMEC (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IMEC (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5090253402","display_name":"Yoann Tomczak","orcid":"https://orcid.org/0009-0003-0560-1809","observed_orcids":["https://orcid.org/0009-0003-0560-1809"]},"institutions":[{"id":"https://openalex.org/I4210132699","display_name":"ASM International (Belgium)","ror":"https://ror.org/03ajjdx52","country_code":"BE","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I4210132699"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Yoann Tomczak","raw_affiliation_strings":["ASM (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASM (Belgium)","institution_ids":["https://openalex.org/I4210132699"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5054766373","display_name":"David De Roest","orcid":"https://orcid.org/0009-0001-5125-3169","observed_orcids":["https://orcid.org/0009-0001-5125-3169"]},"institutions":[{"id":"https://openalex.org/I4210132699","display_name":"ASM International (Belgium)","ror":"https://ror.org/03ajjdx52","country_code":"BE","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I4210132699"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"David de Roest","raw_affiliation_strings":["ASM (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASM (Belgium)","institution_ids":["https://openalex.org/I4210132699"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5012403412","display_name":"Nicola N. Kissoon","orcid":"https://orcid.org/0000-0002-6287-8957","observed_orcids":["https://orcid.org/0000-0002-6287-8957"]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Nicola Kissoon","raw_affiliation_strings":["ASML (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML (Netherlands)","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5088545994","display_name":"Paulina Rincon Delgadillo","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Paulina Rincon Delgadillo","raw_affiliation_strings":["IMEC (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IMEC (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5086670367","display_name":"Gijsbert Rispens","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Gijsbert Rispens","raw_affiliation_strings":["ASML (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML (Netherlands)","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5019657501","display_name":"Guido Schiffelers","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Guido Schiffelers","raw_affiliation_strings":["ASML (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML (Netherlands)","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Abhinav Pathak","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Abhinav Pathak","raw_affiliation_strings":["IMEC (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IMEC (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113477939","display_name":"F. Lazzarino","orcid":"https://orcid.org/0000-0001-7961-9727","observed_orcids":["https://orcid.org/0000-0001-7961-9727"]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Frederic Lazzarino","raw_affiliation_strings":["IMEC (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IMEC (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5042828154","display_name":"Danilo D. Simone","orcid":"https://orcid.org/0000-0003-3927-5207","observed_orcids":["https://orcid.org/0000-0003-3927-5207"]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Danilo De Simone","raw_affiliation_strings":["IMEC (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IMEC (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5033780675","display_name":"Etienne P. De Poortere","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Etienne de Poortere","raw_affiliation_strings":["ASML (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML (Netherlands)","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5043279108","display_name":"Moyra McManus","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Moyra McManus","raw_affiliation_strings":["ASML (Netherlands)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML (Netherlands)","institution_ids":["https://openalex.org/I927257375"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5083493286","display_name":"Daniele Piumi","orcid":"https://orcid.org/0009-0005-6160-9316","observed_orcids":["https://orcid.org/0009-0005-6160-9316"]},"institutions":[{"id":"https://openalex.org/I4210132699","display_name":"ASM International (Belgium)","ror":"https://ror.org/03ajjdx52","country_code":"BE","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I4210132699"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Daniele Piumi","raw_affiliation_strings":["ASM (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASM (Belgium)","institution_ids":["https://openalex.org/I4210132699"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5059513127","display_name":"Eric Hendrickx","orcid":"https://orcid.org/0000-0003-2516-0417","observed_orcids":["https://orcid.org/0000-0003-2516-0417"]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Eric Hendrickx","raw_affiliation_strings":["IMEC (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IMEC (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5018621003","display_name":"Geert Vandenberghe","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210114974","display_name":"IMEC","ror":"https://ror.org/02kcbn207","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Geert Vandenberghe","raw_affiliation_strings":["IMEC (Belgium)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IMEC (Belgium)","institution_ids":["https://openalex.org/I4210114974"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":1.5842,"has_fulltext":false,"cited_by_count":7,"citation_normalized_percentile":{"value":0.79382532,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":95},"biblio":{"volume":null,"issue":null,"first_page":"23","last_page":"23"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11471","display_name":"Block Copolymer Self-Assembly","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/sequential-infiltration-synthesis","display_name":"sequential infiltration synthesis","score":0.9980000257492065},{"id":"https://openalex.org/keywords/euv-lithography","display_name":"EUV lithography","score":0.9860000014305115},{"id":"https://openalex.org/keywords/line-roughness","display_name":"line roughness","score":0.6489999890327454},{"id":"https://openalex.org/keywords/chemically-amplified-resists","display_name":"chemically amplified resists","score":0.8259999752044678},{"id":"https://openalex.org/keywords/pattern-transfer","display_name":"pattern transfer","score":0.6240000128746033},{"id":"https://openalex.org/keywords/tin","display_name":"tin","score":0.5410000085830688},{"id":"https://openalex.org/keywords/power-spectral-density","display_name":"power spectral density","score":0.7749999761581421},{"id":"https://openalex.org/keywords/exposure-latitude","display_name":"exposure latitude","score":0.9359999895095825}],"concepts":[{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.9667822122573853},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.7110742330551147},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.6901880502700806},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.669893741607666},{"id":"https://openalex.org/C177409738","wikidata":"https://www.wikidata.org/wiki/Q1917460","display_name":"Multiple patterning","level":4,"score":0.6307500004768372},{"id":"https://openalex.org/C163581340","wikidata":"https://www.wikidata.org/wiki/Q1983848","display_name":"Next-generation lithography","level":5,"score":0.6087791919708252},{"id":"https://openalex.org/C2777441419","wikidata":"https://www.wikidata.org/wiki/Q16969460","display_name":"Process window","level":3,"score":0.5680316090583801},{"id":"https://openalex.org/C94263209","wikidata":"https://www.wikidata.org/wiki/Q1076175","display_name":"Immersion lithography","level":4,"score":0.5607758164405823},{"id":"https://openalex.org/C71039073","wikidata":"https://www.wikidata.org/wiki/Q3439090","display_name":"Surface finish","level":2,"score":0.4603320062160492},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.45657825469970703},{"id":"https://openalex.org/C107365816","wikidata":"https://www.wikidata.org/wiki/Q114817","display_name":"Surface roughness","level":2,"score":0.43200114369392395},{"id":"https://openalex.org/C2776628375","wikidata":"https://www.wikidata.org/wiki/Q4839229","display_name":"Back end of line","level":3,"score":0.4186418950557709},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.35398370027542114},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3436783254146576},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.1879829466342926},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.13138213753700256},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.1268545389175415}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.2515503","doi":"https://doi.org/10.1117/12.2515503","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2515503","pdf_url":null,"source":{"id":"https://openalex.org/S7407107024","display_name":"Extreme Ultraviolet (EUV) Lithography","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Extreme Ultraviolet (EUV) Lithography X","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":12,"referenced_works":["https://openalex.org/W1995857886","https://openalex.org/W2016769486","https://openalex.org/W2024112705","https://openalex.org/W2214558717","https://openalex.org/W2603648025","https://openalex.org/W2613306844","https://openalex.org/W2744249241","https://openalex.org/W2789891023","https://openalex.org/W2803258498","https://openalex.org/W2889800447","https://openalex.org/W2892656911","https://openalex.org/W2895462113"],"related_works":["https://openalex.org/W2782570915","https://openalex.org/W2792990107","https://openalex.org/W4283216871","https://openalex.org/W1971603697","https://openalex.org/W2016792083","https://openalex.org/W2923607180","https://openalex.org/W2181352828","https://openalex.org/W2891433489","https://openalex.org/W4299128241","https://openalex.org/W2016769486"],"abstract_inverted_index":{"Enhanced":[0],"EUV":[1,59,108],"lithography":[2,36,60,77,234],"(EUVL)":[3],"resist":[4],"performance,":[5,249],"combined":[6,131],"with":[7,146,236],"optimized":[8,140,238],"post":[9,35],"processing":[10],"techniques,":[11],"are":[12,124],"vital":[13],"to":[14,42,94,228,243,251],"ensure":[15],"continued":[16],"scaling":[17],"and":[18,27,52,90,120,134,165,180,190,209,247],"meet":[19],"the":[20,23,40,45,76,84,87,102,156,172,192,211,214,232],"requirements":[21],"for":[22,49,106,141,155],"industry":[24,143,253],"N5":[25],"node":[26],"beyond.":[28],"Sequential":[29],"infiltration":[30],"synthesis":[31],"(SIS)":[32],"is":[33,63,199],"a":[34,72,80,135,150,159,163,166,220,244],"technique":[37,66],"that":[38,67,123],"has":[39],"potential":[41],"significantly":[43],"improve":[44],"EUVL":[46,168],"patterning":[47,169,222],"process":[48,133,138,235],"stochastic":[50],"nano-failures":[51],"line":[53],"roughness,":[54,177],"both":[55],"major":[56],"topics":[57],"in":[58],"research.":[61],"SIS":[62,105,175,239],"an":[64,107,142,237],"ALD-like":[65],"infiltrates":[68],"polymeric":[69],"photoresists,":[70],"forming":[71],"metal":[73],"framework":[74],"using":[75],"pattern":[78,88,96,147],"as":[79],"template.":[81],"Hardening":[82],"of":[83,104,126,174,194,213],"photoresist":[85],"improves":[86],"quality":[89],"gives":[91],"more":[92],"flexibility":[93],"subsequent":[95],"transfer":[97,148],"steps.":[98],"We":[99,224],"have":[100],"evaluated":[101],"performance":[103],"Chemically":[109],"Amplified":[110],"Resist":[111],"(CAR)":[112],"platform":[113],"printing":[114],"32":[115],"nm":[116],"pitch":[117],"line/space":[118],"patterns":[119],"ultimately":[121],"structures":[122],"representative":[125],"standard":[127,136,167],"semiconductor":[128],"manufacturing.":[129],"A":[130],"lithography-SIS-etch":[132],"lithography-etch":[137],"were":[139],"relevant":[144],"stack":[145],"into":[149],"TiN":[151],"layer.":[152],"This":[153],"allows":[154],"first":[157],"time":[158],"justified":[160],"comparison":[161],"between":[162],"EUVL-SIS":[164,221],"process,":[170],"showing":[171],"benefits":[173],"regarding":[176],"exposure":[178,207],"latitude":[179],"nano-failure":[181,215,248],"mitigation.":[182],"Power":[183],"Spectral":[184],"Density":[185],"(PSD)":[186],"analysis":[187,198],"accurately":[188],"demonstrates":[189],"explains":[191],"type":[193],"roughness":[195,246],"improvement.":[196],"Nano-failure":[197],"done":[200],"by":[201,226],"measuring":[202],"large":[203],"areas":[204],"at":[205],"different":[206],"doses":[208],"shows":[210],"improvement":[212],"free":[216],"window":[217],"when":[218],"applying":[219],"process.":[223],"conclude":[225],"examining":[227],"which":[229],"extent":[230],"combining":[231],"best":[233],"step":[240],"will":[241],"lead":[242],"better":[245],"essential":[250],"meeting":[252],"requirements.":[254]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":1},{"year":2023,"cited_by_count":1},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":1},{"year":2019,"cited_by_count":1}],"updated_date":"2026-10-27T15:51:10.671819","created_date":"2019-03-22T00:00:00"}