{"id":"https://openalex.org/W2920525501","doi":"https://doi.org/10.1109/issm.2018.8651166","title":"Characterization of Self-Contamination from PVA Roll Brush with Atomic Force Microscopy and Fluorescent Microscopy","display_name":"Characterization of Self-Contamination from PVA Roll Brush with Atomic Force Microscopy and Fluorescent Microscopy","publication_year":2018,"publication_date":"2018-12-01","ids":{"openalex":"https://openalex.org/W2920525501","doi":"https://doi.org/10.1109/issm.2018.8651166","mag":"2920525501"},"language":"en","primary_location":{"id":"doi:10.1109/issm.2018.8651166","doi":"https://doi.org/10.1109/issm.2018.8651166","is_oa":false,"landing_page_url":"https://doi.org/10.1109/issm.2018.8651166","pdf_url":null,"source":{"id":"https://openalex.org/S4210217557","display_name":"IEEE International Symposium on Semiconductor Manufacturing conference proceedings","issn_l":"1523-553X","issn":["1523-553X"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2018 International Symposium on Semiconductor Manufacturing (ISSM)","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5112293268","display_name":"Shohei Shima","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I74894318","display_name":"Ebara (Japan)","ror":"https://ror.org/02yemx219","country_code":"JP","type":"company","lineage":["https://openalex.org/I74894318"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Shohei Shima","raw_affiliation_strings":["Ebara Corporation 4-2-1 Honfujisawa, Fujisawa-shi, Kanagawa-ken, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ebara Corporation 4-2-1 Honfujisawa, Fujisawa-shi, Kanagawa-ken, Japan","institution_ids":["https://openalex.org/I74894318"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101931146","display_name":"Satomi Hamada","orcid":"https://orcid.org/0000-0002-6419-9587","observed_orcids":["https://orcid.org/0000-0002-6419-9587"]},"institutions":[{"id":"https://openalex.org/I74894318","display_name":"Ebara (Japan)","ror":"https://ror.org/02yemx219","country_code":"JP","type":"company","lineage":["https://openalex.org/I74894318"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Satomi Hamada","raw_affiliation_strings":["Ebara Corporation 4-2-1 Honfujisawa, Fujisawa-shi, Kanagawa-ken, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ebara Corporation 4-2-1 Honfujisawa, Fujisawa-shi, Kanagawa-ken, Japan","institution_ids":["https://openalex.org/I74894318"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5004194132","display_name":"Chikako Takatoh","orcid":"https://orcid.org/0000-0001-5666-6037","observed_orcids":["https://orcid.org/0000-0001-5666-6037"]},"institutions":[{"id":"https://openalex.org/I74894318","display_name":"Ebara (Japan)","ror":"https://ror.org/02yemx219","country_code":"JP","type":"company","lineage":["https://openalex.org/I74894318"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Chikako Takatoh","raw_affiliation_strings":["Ebara Corporation 4-2-1 Honfujisawa, Fujisawa-shi, Kanagawa-ken, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ebara Corporation 4-2-1 Honfujisawa, Fujisawa-shi, Kanagawa-ken, Japan","institution_ids":["https://openalex.org/I74894318"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5006643526","display_name":"Yutaka Wada","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I74894318","display_name":"Ebara (Japan)","ror":"https://ror.org/02yemx219","country_code":"JP","type":"company","lineage":["https://openalex.org/I74894318"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yutaka Wada","raw_affiliation_strings":["Ebara Corporation 4-2-1 Honfujisawa, Fujisawa-shi, Kanagawa-ken, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ebara Corporation 4-2-1 Honfujisawa, Fujisawa-shi, Kanagawa-ken, Japan","institution_ids":["https://openalex.org/I74894318"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111566332","display_name":"Akira Fukunaga","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I74894318","display_name":"Ebara (Japan)","ror":"https://ror.org/02yemx219","country_code":"JP","type":"company","lineage":["https://openalex.org/I74894318"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Akira Fukunaga","raw_affiliation_strings":["Ebara Corporation 4-2-1 Honfujisawa, Fujisawa-shi, Kanagawa-ken, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ebara Corporation 4-2-1 Honfujisawa, Fujisawa-shi, Kanagawa-ken, Japan","institution_ids":["https://openalex.org/I74894318"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5051827088","display_name":"Hiroshi Sobukawa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I74894318","display_name":"Ebara (Japan)","ror":"https://ror.org/02yemx219","country_code":"JP","type":"company","lineage":["https://openalex.org/I74894318"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Hiroshi Sobukawa","raw_affiliation_strings":["Ebara Corporation 4-2-1 Honfujisawa, Fujisawa-shi, Kanagawa-ken, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ebara Corporation 4-2-1 Honfujisawa, Fujisawa-shi, Kanagawa-ken, Japan","institution_ids":["https://openalex.org/I74894318"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I74894318"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.48073006,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"3"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10923","display_name":"Force Microscopy Techniques and Applications","score":0.9199000000953674,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10923","display_name":"Force Microscopy Techniques and Applications","score":0.9199000000953674,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10859","display_name":"Polymer Surface Interaction Studies","score":0.061900001019239426,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.0026000000070780516,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/self-contamination","display_name":"self-contamination","score":0.9760000109672546},{"id":"https://openalex.org/keywords/surface-contamination","display_name":"surface contamination","score":0.5789999961853027},{"id":"https://openalex.org/keywords/brush-wear","display_name":"brush wear","score":0.48399999737739563},{"id":"https://openalex.org/keywords/embedded-particles","display_name":"embedded particles","score":0.7599999904632568},{"id":"https://openalex.org/keywords/surface-layer","display_name":"surface layer","score":0.49300000071525574},{"id":"https://openalex.org/keywords/nanostructures","display_name":"nanostructures","score":0.5270000100135803}],"concepts":[{"id":"https://openalex.org/C16108499","wikidata":"https://www.wikidata.org/wiki/Q1713927","display_name":"Brush","level":2,"score":0.9382461309432983},{"id":"https://openalex.org/C112570922","wikidata":"https://www.wikidata.org/wiki/Q60528603","display_name":"Contamination","level":2,"score":0.6705123782157898},{"id":"https://openalex.org/C2780841128","wikidata":"https://www.wikidata.org/wiki/Q5073781","display_name":"Characterization (materials science)","level":2,"score":0.6633844971656799},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.65775465965271},{"id":"https://openalex.org/C102951782","wikidata":"https://www.wikidata.org/wiki/Q49295","display_name":"Atomic force microscopy","level":2,"score":0.6350429654121399},{"id":"https://openalex.org/C147080431","wikidata":"https://www.wikidata.org/wiki/Q1074953","display_name":"Microscopy","level":2,"score":0.6328679919242859},{"id":"https://openalex.org/C169274487","wikidata":"https://www.wikidata.org/wiki/Q840211","display_name":"Fluorescence microscope","level":3,"score":0.5378664135932922},{"id":"https://openalex.org/C91881484","wikidata":"https://www.wikidata.org/wiki/Q191807","display_name":"Fluorescence","level":2,"score":0.4724816679954529},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.4706251621246338},{"id":"https://openalex.org/C138268822","wikidata":"https://www.wikidata.org/wiki/Q1051925","display_name":"Resolution (logic)","level":2,"score":0.4376845359802246},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.29679057002067566},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.2927398085594177},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.07792770862579346},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.06821945309638977},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.0},{"id":"https://openalex.org/C18903297","wikidata":"https://www.wikidata.org/wiki/Q7150","display_name":"Ecology","level":1,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/issm.2018.8651166","doi":"https://doi.org/10.1109/issm.2018.8651166","is_oa":false,"landing_page_url":"https://doi.org/10.1109/issm.2018.8651166","pdf_url":null,"source":{"id":"https://openalex.org/S4210217557","display_name":"IEEE International Symposium on Semiconductor Manufacturing conference proceedings","issn_l":"1523-553X","issn":["1523-553X"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2018 International Symposium on Semiconductor Manufacturing (ISSM)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":1,"referenced_works":["https://openalex.org/W2088528296"],"related_works":["https://openalex.org/W2990449136","https://openalex.org/W3035077898","https://openalex.org/W4241939975","https://openalex.org/W2884894632","https://openalex.org/W109688492","https://openalex.org/W2948161605","https://openalex.org/W4416307493","https://openalex.org/W2975597667","https://openalex.org/W3216661663","https://openalex.org/W2996879921"],"abstract_inverted_index":{"We":[0,63,98],"have":[1,64],"found":[2],"three":[3],"suspected":[4],"self-contamination":[5],"sources":[6],"from":[7],"PVA":[8,32,87],"brushes":[9],"using":[10],"high":[11],"resolution":[12],"AFM":[13,91],"imaging":[14],"and":[15,94],"fluorescence":[16],"microscopy.":[17],"The":[18,34,48],"first":[19],"source":[20,36,50,70],"is":[21,37,51,79],"thin":[22],"layers":[23],"on":[24],"the":[25,28,41,45,52,56,61,68,75,83],"surface":[26,43],"of":[27,40,60,71,86],"fresh":[29],"(not":[30],"used)":[31],"brushes.":[33,62],"second":[35],"a":[38],"weariness":[39],"brush":[42,88],"during":[44,109],"cleaning":[46],"process.":[47],"third":[49],"particles":[53],"embedded":[54],"in":[55,82],"bulk":[57,84],"region":[58,85],"(inside)":[59],"not":[65],"yet":[66],"identified":[67],"right":[69],"contamination.":[72],"In":[73],"addition,":[74],"stripe":[76],"like":[77],"nano-structure":[78],"firstly":[80],"observed":[81],"both":[89],"with":[90],"lateral":[92],"force":[93],"viscoelastic":[95],"measuring":[96],"mode.":[97],"need":[99],"to":[100,105],"perform":[101],"further":[102],"precise":[103],"studies":[104],"comprehend":[106],"contamination":[107],"phenomena":[108],"cleaning.":[110]},"counts_by_year":[],"updated_date":"2026-10-06T10:28:23.643775","created_date":"2019-03-11T00:00:00"}