{"id":"https://openalex.org/W2905588985","doi":"https://doi.org/10.1201/9781315140810-42","title":"Comparison between studies of photoluminescence mapping and etching on LEC-InP material. Developing of a non destructive quality control procedure of InP wafers","display_name":"Comparison between studies of photoluminescence mapping and etching on LEC-InP material. Developing of a non destructive quality control procedure of InP wafers","publication_year":2017,"publication_date":"2017-11-22","ids":{"openalex":"https://openalex.org/W2905588985","doi":"https://doi.org/10.1201/9781315140810-42","mag":"2905588985"},"language":"en","primary_location":{"id":"doi:10.1201/9781315140810-42","doi":"https://doi.org/10.1201/9781315140810-42","is_oa":false,"landing_page_url":"https://doi.org/10.1201/9781315140810-42","pdf_url":null,"source":{"id":"https://openalex.org/S4306463855","display_name":"Routledge eBooks","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310319847","host_organization_name":"Routledge","host_organization_lineage":["https://openalex.org/P4310319847","https://openalex.org/P4310320547"],"host_organization_lineage_names":["Routledge","Taylor & Francis"],"type":"ebook platform"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Defect Recognition and Image Processing in Semiconductors 1997","raw_type":"book-chapter"},"volume":{"id":"https://openalex.org/W2892824282","display_name":"Defect Recognition and Image Processing in Semiconductors 1997"},"type":"book-chapter","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5036285019","display_name":"E. Gilioli","orcid":"https://orcid.org/0000-0001-6973-2179","observed_orcids":["https://orcid.org/0000-0001-6973-2179"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"E. Gilioli","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5034144780","display_name":"G.M. Guadalupi","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"G. M. Guadalupi","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5019744155","display_name":"Letizia Meregalli","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"L. Meregalli","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5015307961","display_name":"B. Molinas","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"B. Molinas(+)","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"last","author":{"id":"https://openalex.org/A5048606589","display_name":"Andrea Zappettini","orcid":"https://orcid.org/0000-0002-6916-2716","observed_orcids":["https://orcid.org/0000-0002-6916-2716"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"A. Zappettini","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.06329114,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"209","last_page":"212"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.25099998712539673,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.25099998712539673,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10624","display_name":"Silicon and Solar Cell Technologies","score":0.18479999899864197,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11637","display_name":"Advanced Semiconductor Detectors and Materials","score":0.12359999865293503,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/indium-phosphide","display_name":"indium phosphide","score":0.9070000052452087},{"id":"https://openalex.org/keywords/photoluminescence-mapping","display_name":"photoluminescence mapping","score":0.8320000171661377},{"id":"https://openalex.org/keywords/etching","display_name":"etching","score":0.6190000176429749},{"id":"https://openalex.org/keywords/crystal-defects","display_name":"crystal defects","score":0.6589999794960022},{"id":"https://openalex.org/keywords/non-destructive-testing","display_name":"non-destructive testing","score":0.593999981880188}],"concepts":[{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.8404499888420105},{"id":"https://openalex.org/C85080765","wikidata":"https://www.wikidata.org/wiki/Q614893","display_name":"Photoluminescence","level":2,"score":0.7231653332710266},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6147838830947876},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5992664098739624},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.5840837359428406},{"id":"https://openalex.org/C2779530757","wikidata":"https://www.wikidata.org/wiki/Q1207505","display_name":"Quality (philosophy)","level":2,"score":0.4499911367893219},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.29214149713516235},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0898282527923584},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1201/9781315140810-42","doi":"https://doi.org/10.1201/9781315140810-42","is_oa":false,"landing_page_url":"https://doi.org/10.1201/9781315140810-42","pdf_url":null,"source":{"id":"https://openalex.org/S4306463855","display_name":"Routledge eBooks","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310319847","host_organization_name":"Routledge","host_organization_lineage":["https://openalex.org/P4310319847","https://openalex.org/P4310320547"],"host_organization_lineage_names":["Routledge","Taylor & Francis"],"type":"ebook platform"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Defect Recognition and Image Processing in Semiconductors 1997","raw_type":"book-chapter"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2046420061","https://openalex.org/W2002975045","https://openalex.org/W2060055206","https://openalex.org/W2143117438","https://openalex.org/W2008403625","https://openalex.org/W261604409","https://openalex.org/W1967366454","https://openalex.org/W2013096560","https://openalex.org/W2074529391","https://openalex.org/W2027341219"],"abstract_inverted_index":{"Different":[0],"aspects":[1],"of":[2,7,42,84,99],"the":[3,23,40,48,71,96],"structure":[4],"and":[5,16,59,68,81,89],"morphology":[6],"InP":[8,18],"were":[9,62],"studied":[10],"in":[11,30,45],"samples":[12],"cut":[13],"from":[14],"S-doped":[15],"Zn-doped":[17],"2\u201d":[19],"ingots":[20,44],"grown":[21],"by":[22],"LEC":[24],"technique":[25],"at":[26],"Centro":[27],"Ricerche":[28],"Venezia":[29],"an":[31],"industrial":[32],"reactor.":[33],"The":[34],"general":[35],"aim":[36],"was":[37],"to":[38,47,64],"compare":[39],"quality":[41,97],"different":[43],"relation":[46],"growth":[49],"station":[50],"configuration.":[51],"A":[52],"Fourier":[53],"Transform":[54],"Photoluminescence":[55],"(PL)":[56],"mapping":[57],"system":[58],"etching":[60],"techniques":[61],"used":[63,94],"reveal":[65],"morphological":[66],"details":[67],"defects":[69],"on":[70],"wafers.":[72,101],"It":[73],"is":[74],"demonstrated":[75],"that":[76,90],"PL":[77],"gives":[78],"a":[79],"quick":[80],"accurate":[82],"value":[83],"dislocation":[85],"free":[86],"area":[87],"(DFA)":[88],"it":[91],"can":[92],"be":[93],"for":[95],"control":[98],"commercial":[100]},"counts_by_year":[],"updated_date":"2026-10-10T09:11:00.788812","created_date":"2018-12-22T00:00:00"}