{"id":"https://openalex.org/W2903786872","doi":"https://doi.org/10.1002/sia.6594","title":"XPS study of silicon spheres as a density standard","display_name":"XPS study of silicon spheres as a density standard","publication_year":2018,"publication_date":"2018-12-13","ids":{"openalex":"https://openalex.org/W2903786872","doi":"https://doi.org/10.1002/sia.6594","mag":"2903786872"},"language":"en","primary_location":{"id":"doi:10.1002/sia.6594","doi":"https://doi.org/10.1002/sia.6594","is_oa":false,"landing_page_url":"https://doi.org/10.1002/sia.6594","pdf_url":null,"source":{"id":"https://openalex.org/S114406758","display_name":"Surface and Interface Analysis","issn_l":"0142-2421","issn":["0142-2421","1096-9918"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-c","jufo-1","norway-1","poland-40","russia-white-list-3","vabb-shw"],"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Surface and Interface Analysis","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5100431557","display_name":"Lulu Zhang","orcid":"https://orcid.org/0000-0002-7753-7426","observed_orcids":["https://orcid.org/0000-0002-7753-7426"]},"institutions":[{"id":"https://openalex.org/I4405273829","display_name":"National Metrology Institute of Japan","ror":"https://ror.org/00j3eeb74","country_code":"JP","type":"government","lineage":["https://openalex.org/I4405273829","https://openalex.org/I73613424"]},{"id":"https://openalex.org/I73613424","display_name":"National Institute of Advanced Industrial Science and Technology","ror":"https://ror.org/01703db54","country_code":"JP","type":"government","lineage":["https://openalex.org/I73613424"]}],"countries":["JP"],"is_corresponding":true,"raw_author_name":"Lulu Zhang","raw_affiliation_strings":["National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology, Ibaraki, Japan"],"raw_orcid":"https://orcid.org/0000-0002-7753-7426","affiliations":[{"raw_affiliation_string":"National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology, Ibaraki, Japan","institution_ids":["https://openalex.org/I4405273829","https://openalex.org/I73613424"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5007242339","display_name":"Naoki Kuramoto","orcid":"https://orcid.org/0000-0002-4375-5214","observed_orcids":["https://orcid.org/0000-0002-4375-5214"]},"institutions":[{"id":"https://openalex.org/I4405273829","display_name":"National Metrology Institute of Japan","ror":"https://ror.org/00j3eeb74","country_code":"JP","type":"government","lineage":["https://openalex.org/I4405273829","https://openalex.org/I73613424"]},{"id":"https://openalex.org/I73613424","display_name":"National Institute of Advanced Industrial Science and Technology","ror":"https://ror.org/01703db54","country_code":"JP","type":"government","lineage":["https://openalex.org/I73613424"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Naoki Kuramoto","raw_affiliation_strings":["National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology, Ibaraki, Japan"],"raw_orcid":"https://orcid.org/0000-0002-4375-5214","affiliations":[{"raw_affiliation_string":"National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology, Ibaraki, Japan","institution_ids":["https://openalex.org/I4405273829","https://openalex.org/I73613424"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5050368012","display_name":"Akira Kurokawa","orcid":"https://orcid.org/0000-0003-2953-0593","observed_orcids":["https://orcid.org/0000-0003-2953-0593"]},"institutions":[{"id":"https://openalex.org/I4405273829","display_name":"National Metrology Institute of Japan","ror":"https://ror.org/00j3eeb74","country_code":"JP","type":"government","lineage":["https://openalex.org/I4405273829","https://openalex.org/I73613424"]},{"id":"https://openalex.org/I73613424","display_name":"National Institute of Advanced Industrial Science and Technology","ror":"https://ror.org/01703db54","country_code":"JP","type":"government","lineage":["https://openalex.org/I73613424"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Akira Kurokawa","raw_affiliation_strings":["National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology, Ibaraki, Japan"],"raw_orcid":"https://orcid.org/0000-0003-2953-0593","affiliations":[{"raw_affiliation_string":"National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology, Ibaraki, Japan","institution_ids":["https://openalex.org/I4405273829","https://openalex.org/I73613424"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5101954354","display_name":"Kenichi Fujii","orcid":"https://orcid.org/0000-0002-5578-0038","observed_orcids":["https://orcid.org/0000-0002-5578-0038"]},"institutions":[{"id":"https://openalex.org/I4405273829","display_name":"National Metrology Institute of Japan","ror":"https://ror.org/00j3eeb74","country_code":"JP","type":"government","lineage":["https://openalex.org/I4405273829","https://openalex.org/I73613424"]},{"id":"https://openalex.org/I73613424","display_name":"National Institute of Advanced Industrial Science and Technology","ror":"https://ror.org/01703db54","country_code":"JP","type":"government","lineage":["https://openalex.org/I73613424"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kenichi Fujii","raw_affiliation_strings":["National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology, Ibaraki, Japan"],"raw_orcid":"https://orcid.org/0000-0002-5578-0038","affiliations":[{"raw_affiliation_string":"National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology, Ibaraki, Japan","institution_ids":["https://openalex.org/I4405273829","https://openalex.org/I73613424"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5100431557"],"corresponding_institution_ids":["https://openalex.org/I4405273829","https://openalex.org/I73613424"],"apc_list":{"value":3580,"currency":"USD","value_usd":3580},"apc_paid":null,"fwci":0.7604,"has_fulltext":false,"cited_by_count":6,"citation_normalized_percentile":{"value":0.77582175,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":96},"biblio":{"volume":"51","issue":"4","first_page":"400","last_page":"407"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11890","display_name":"Scientific Measurement and Uncertainty Evaluation","score":0.9800000190734863,"subfield":{"id":"https://openalex.org/subfields/1804","display_name":"Statistics, Probability and Uncertainty"},"field":{"id":"https://openalex.org/fields/18","display_name":"Decision Sciences"},"domain":{"id":"https://openalex.org/domains/2","display_name":"Social Sciences"}},"topics":[{"id":"https://openalex.org/T11890","display_name":"Scientific Measurement and Uncertainty Evaluation","score":0.9800000190734863,"subfield":{"id":"https://openalex.org/subfields/1804","display_name":"Statistics, Probability and Uncertainty"},"field":{"id":"https://openalex.org/fields/18","display_name":"Decision Sciences"},"domain":{"id":"https://openalex.org/domains/2","display_name":"Social Sciences"}},{"id":"https://openalex.org/T12039","display_name":"Electron and X-Ray Spectroscopy Techniques","score":0.016599999740719795,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11583","display_name":"Advanced Measurement and Metrology Techniques","score":0.0012000000569969416,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/silicon-spheres","display_name":"silicon spheres","score":0.7360000014305115},{"id":"https://openalex.org/keywords/density-standards","display_name":"density standards","score":0.9110000133514404},{"id":"https://openalex.org/keywords/primary-standard","display_name":"primary standard","score":0.5759999752044678},{"id":"https://openalex.org/keywords/single-crystal-silicon","display_name":"monocrystalline silicon","score":0.8379999995231628},{"id":"https://openalex.org/keywords/surface-layer-model","display_name":"surface layer model","score":0.7979999780654907},{"id":"https://openalex.org/keywords/surface-layer-thickness","display_name":"surface layer thickness","score":0.9330000281333923},{"id":"https://openalex.org/keywords/uncertainty-budget","display_name":"uncertainty budget","score":0.7260000109672546}],"concepts":[{"id":"https://openalex.org/C195766429","wikidata":"https://www.wikidata.org/wiki/Q394","display_name":"Metrology","level":2,"score":0.8741410970687866},{"id":"https://openalex.org/C175708663","wikidata":"https://www.wikidata.org/wiki/Q899559","display_name":"X-ray photoelectron spectroscopy","level":2,"score":0.7350023984909058},{"id":"https://openalex.org/C72422203","wikidata":"https://www.wikidata.org/wiki/Q7392545","display_name":"SPHERES","level":2,"score":0.7107657790184021},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.65025794506073},{"id":"https://openalex.org/C2994224358","wikidata":"https://www.wikidata.org/wiki/Q13649246","display_name":"Standard uncertainty","level":3,"score":0.5107810497283936},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.45324862003326416},{"id":"https://openalex.org/C111219384","wikidata":"https://www.wikidata.org/wiki/Q6954384","display_name":"NIST","level":2,"score":0.4266047775745392},{"id":"https://openalex.org/C165838908","wikidata":"https://www.wikidata.org/wiki/Q736777","display_name":"Calibration","level":2,"score":0.42137300968170166},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.41024649143218994},{"id":"https://openalex.org/C137209882","wikidata":"https://www.wikidata.org/wiki/Q1403517","display_name":"Measurement uncertainty","level":2,"score":0.3575138449668884},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.2631620168685913},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.2597082853317261},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.2115900218486786},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.17190328240394592},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.09706899523735046},{"id":"https://openalex.org/C46141821","wikidata":"https://www.wikidata.org/wiki/Q209402","display_name":"Nuclear magnetic resonance","level":1,"score":0.07997786998748779},{"id":"https://openalex.org/C1276947","wikidata":"https://www.wikidata.org/wiki/Q333","display_name":"Astronomy","level":1,"score":0.0},{"id":"https://openalex.org/C204321447","wikidata":"https://www.wikidata.org/wiki/Q30642","display_name":"Natural language processing","level":1,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1002/sia.6594","doi":"https://doi.org/10.1002/sia.6594","is_oa":false,"landing_page_url":"https://doi.org/10.1002/sia.6594","pdf_url":null,"source":{"id":"https://openalex.org/S114406758","display_name":"Surface and Interface Analysis","issn_l":"0142-2421","issn":["0142-2421","1096-9918"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-c","jufo-1","norway-1","poland-40","russia-white-list-3","vabb-shw"],"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Surface and Interface Analysis","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[{"id":"https://openalex.org/G7034612457","display_name":"Research to realize the definition of the kilogram based on the fundamental constants","funder_award_id":"16H03901","funder_id":"https://openalex.org/F4320334764","funder_display_name":"Japan Society for the Promotion of Science"}],"funders":[{"id":"https://openalex.org/F4320334764","display_name":"Japan Society for the Promotion of Science","ror":"https://ror.org/00hhkn466"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":25,"referenced_works":["https://openalex.org/W1657388620","https://openalex.org/W1965475698","https://openalex.org/W1986335080","https://openalex.org/W1992214743","https://openalex.org/W1996258274","https://openalex.org/W2011433163","https://openalex.org/W2039040988","https://openalex.org/W2044138521","https://openalex.org/W2046731239","https://openalex.org/W2052461464","https://openalex.org/W2063860936","https://openalex.org/W2070316926","https://openalex.org/W2070348018","https://openalex.org/W2075450889","https://openalex.org/W2095507762","https://openalex.org/W2108602430","https://openalex.org/W2117441547","https://openalex.org/W2123037222","https://openalex.org/W2176325089","https://openalex.org/W2318451528","https://openalex.org/W2327056996","https://openalex.org/W2525236096","https://openalex.org/W2566241552","https://openalex.org/W2622398772","https://openalex.org/W2622724175"],"related_works":["https://openalex.org/W3008464885","https://openalex.org/W2011433163","https://openalex.org/W2108602430","https://openalex.org/W2171199915","https://openalex.org/W2105586849","https://openalex.org/W2178620909","https://openalex.org/W2318451528","https://openalex.org/W2513925079","https://openalex.org/W2044915613","https://openalex.org/W1992751219"],"abstract_inverted_index":{"As":[0],"density":[1,13,20,107],"is":[2,15,100],"one":[3],"of":[4,9,45,51,56,62,77,86,105],"the":[5,37,41,48,52,57,60,63,84,106],"basic":[6],"physical":[7],"properties":[8],"materials,":[10],"an":[11],"accurate":[12,49],"standard":[14,39],"absolutely":[16],"essential.":[17],"To":[18],"determine":[19],"with":[21],"high":[22],"accuracy":[23],"and":[24,32,54,79,83],"precision,":[25],"two":[26],"1\u2010kg":[27],"single\u2010crystal":[28],"silicon":[29,58],"spheres":[30],"(NMIJ\u2010S4":[31],"NMIJ\u2010S5)":[33],"are":[34],"used":[35],"as":[36],"primary":[38],"at":[40],"National":[42],"Metrology":[43],"Institute":[44],"Japan.":[46],"For":[47],"measurement":[50],"mass":[53],"volume":[55],"spheres,":[59],"effects":[61],"surface":[64,74,88],"layer":[65,75,89],"must":[66],"be":[67],"carefully":[68],"considered.":[69],"In":[70],"this":[71],"work,":[72],"a":[73],"model":[76],"NMIJ\u2010S4":[78],"NMIJ\u2010S5":[80],"was":[81],"proposed":[82],"thicknesses":[85],"each":[87],"were":[90],"determined":[91],"using":[92],"X\u2010ray":[93],"photoelectron":[94],"spectroscopy.":[95],"A":[96],"detailed":[97],"uncertainty":[98],"budget":[99],"presented":[101],"to":[102],"aid":[103],"use":[104],"standard.":[108]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":3},{"year":2020,"cited_by_count":1}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2018-12-22T00:00:00"}