{"id":"https://openalex.org/W2903662073","doi":"https://doi.org/10.1016/j.ijleo.2018.12.067","title":"SSD evolution model in HF etching of fused silica optics","display_name":"SSD evolution model in HF etching of fused silica optics","publication_year":2018,"publication_date":"2018-12-18","ids":{"openalex":"https://openalex.org/W2903662073","doi":"https://doi.org/10.1016/j.ijleo.2018.12.067","mag":"2903662073"},"language":"en","primary_location":{"id":"doi:10.1016/j.ijleo.2018.12.067","doi":"https://doi.org/10.1016/j.ijleo.2018.12.067","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.ijleo.2018.12.067","pdf_url":null,"source":{"id":"https://openalex.org/S201441698","display_name":"Optik","issn_l":"0030-4026","issn":["0030-4026","1618-1336"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","poland-40","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Optik","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5113689695","display_name":"Yong Shu","orcid":"https://orcid.org/0000-0002-8063-573X","observed_orcids":["https://orcid.org/0000-0002-8063-573X"]},"institutions":[{"id":"https://openalex.org/I4210104252","display_name":"Air Force Engineering University","ror":"https://ror.org/00seraz22","country_code":"CN","type":"education","lineage":["https://openalex.org/I4210104252"]}],"countries":["CN"],"is_corresponding":true,"raw_author_name":"Yong Shu","raw_affiliation_strings":["Aviation Maintenance NCO Academy, Air Force Engineering University, No. 23 Hangkong Road, Xinyang, Henan Province, 464000, PR China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Aviation Maintenance NCO Academy, Air Force Engineering University, No. 23 Hangkong Road, Xinyang, Henan Province, 464000, PR China","institution_ids":["https://openalex.org/I4210104252"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5064482912","display_name":"Weiran Duan","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210163363","display_name":"PLA Army Engineering University","ror":"https://ror.org/05mgp8x93","country_code":"CN","type":"education","lineage":["https://openalex.org/I4210163363"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Weiran Duan","raw_affiliation_strings":["Artillery Engineering Department, Shijiazhuang Campus, Army Engineering University, No. 97 Heping West Road, Shijiazhuang, Hebei Province, 050003, PR China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Artillery Engineering Department, Shijiazhuang Campus, Army Engineering University, No. 97 Heping West Road, Shijiazhuang, Hebei Province, 050003, PR China","institution_ids":["https://openalex.org/I4210163363"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5000830822","display_name":"Changjun Jiao","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Changjun Jiao","raw_affiliation_strings":["Nanjing Astronomical Instruments Co., LTD, Chinese Academy of Sciences, No. 6-10 Huayuan Road, Nanjing, Jiangsu Province, 210014, PR China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Nanjing Astronomical Instruments Co., LTD, Chinese Academy of Sciences, No. 6-10 Huayuan Road, Nanjing, Jiangsu Province, 210014, PR China","institution_ids":["https://openalex.org/I19820366"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5113689695"],"corresponding_institution_ids":["https://openalex.org/I4210104252"],"apc_list":{"value":2650,"currency":"USD","value_usd":2650},"apc_paid":null,"fwci":0.4972,"has_fulltext":false,"cited_by_count":14,"citation_normalized_percentile":{"value":0.69177449,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":97},"biblio":{"volume":"181","issue":null,"first_page":"372","last_page":"377"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","score":0.9688000082969666,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","score":0.9688000082969666,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.026799999177455902,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13049","display_name":"Surface Roughness and Optical Measurements","score":0.0015999999595806003,"subfield":{"id":"https://openalex.org/subfields/3105","display_name":"Instrumentation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/subsurface-damage","display_name":"subsurface damage","score":0.9929999709129333},{"id":"https://openalex.org/keywords/hydrofluoric-acid-etching","display_name":"hydrofluoric acid etching","score":0.8379999995231628},{"id":"https://openalex.org/keywords/fused-silica-optics","display_name":"fused silica optics","score":0.9649999737739563},{"id":"https://openalex.org/keywords/magnetorheological-finishing","display_name":"magnetorheological finishing","score":0.7260000109672546},{"id":"https://openalex.org/keywords/optical-polishing","display_name":"optical polishing","score":0.5230000019073486}],"concepts":[{"id":"https://openalex.org/C138113353","wikidata":"https://www.wikidata.org/wiki/Q611639","display_name":"Polishing","level":2,"score":0.9139253497123718},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.8370072841644287},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.692122220993042},{"id":"https://openalex.org/C2777571299","wikidata":"https://www.wikidata.org/wiki/Q3680646","display_name":"Grinding","level":2,"score":0.6571189165115356},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.5254884362220764},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.2124931514263153},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.10097578167915344},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/j.ijleo.2018.12.067","doi":"https://doi.org/10.1016/j.ijleo.2018.12.067","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.ijleo.2018.12.067","pdf_url":null,"source":{"id":"https://openalex.org/S201441698","display_name":"Optik","issn_l":"0030-4026","issn":["0030-4026","1618-1336"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","poland-40","russia-white-list-2"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Optik","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":12,"referenced_works":["https://openalex.org/W1994367242","https://openalex.org/W2025448468","https://openalex.org/W2026783636","https://openalex.org/W2034374764","https://openalex.org/W2034489287","https://openalex.org/W2054070391","https://openalex.org/W2069576608","https://openalex.org/W2082311409","https://openalex.org/W2095311261","https://openalex.org/W2112138015","https://openalex.org/W2747276570","https://openalex.org/W2894899336"],"related_works":["https://openalex.org/W2002108905","https://openalex.org/W2894899336","https://openalex.org/W1744120711","https://openalex.org/W2932995192","https://openalex.org/W2544960712","https://openalex.org/W2074963166","https://openalex.org/W3196516708","https://openalex.org/W2390052108","https://openalex.org/W4212795014","https://openalex.org/W2793052264"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":2},{"year":2025,"cited_by_count":3},{"year":2024,"cited_by_count":2},{"year":2023,"cited_by_count":3},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":2},{"year":2019,"cited_by_count":1}],"updated_date":"2026-10-16T09:59:22.235173","created_date":"2018-12-22T00:00:00"}