{"id":"https://openalex.org/W2901936268","doi":"https://doi.org/10.1166/nnl.2018.2679","title":"Effect of Sputtering Power on the Properties of RF-Sputtered SnS Thin Films","display_name":"Effect of Sputtering Power on the Properties of RF-Sputtered SnS Thin Films","publication_year":2018,"publication_date":"2018-10-01","ids":{"openalex":"https://openalex.org/W2901936268","doi":"https://doi.org/10.1166/nnl.2018.2679","mag":"2901936268"},"language":"en","primary_location":{"id":"doi:10.1166/nnl.2018.2679","doi":"https://doi.org/10.1166/nnl.2018.2679","is_oa":false,"landing_page_url":"https://doi.org/10.1166/nnl.2018.2679","pdf_url":null,"source":{"id":"https://openalex.org/S2486803449","display_name":"Nanoscience and Nanotechnology Letters","issn_l":"1941-4900","issn":["1941-4900","1941-4919"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":["poland-70"],"host_organization":"https://openalex.org/P4310321646","host_organization_name":"American Scientific Publishers","host_organization_lineage":["https://openalex.org/P4310321646"],"host_organization_lineage_names":["American Scientific Publishers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Nanoscience and Nanotechnology Letters","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":null,"display_name":"Kun Tae Park","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Kun Tae Park","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111867453","display_name":"Young-Guk Son","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Young Guk Son","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5063553716","display_name":"Chang\u2010Sik Son","orcid":"https://orcid.org/0000-0001-5682-1770","observed_orcids":["https://orcid.org/0000-0001-5682-1770"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Chang-Sik Son","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"last","author":{"id":"https://openalex.org/A5011937760","display_name":"Donghyun Hwang","orcid":"https://orcid.org/0000-0001-5634-6463","observed_orcids":["https://orcid.org/0000-0001-5634-6463"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Donghyun Hwang","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":2,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":93,"max":95},"biblio":{"volume":"10","issue":"10","first_page":"1412","last_page":"1415"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10590","display_name":"Chalcogenide Semiconductor Thin Films","score":0.9678000211715698,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10590","display_name":"Chalcogenide Semiconductor Thin Films","score":0.9678000211715698,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13889","display_name":"Advanced Materials and Semiconductor Technologies","score":0.01360000018030405,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11315","display_name":"Phase-change materials and chalcogenides","score":0.0038999998942017555,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/tin-sulfide","display_name":"tin sulfide","score":0.878000020980835},{"id":"https://openalex.org/keywords/sns-thin-films","display_name":"SnS thin films","score":0.9819999933242798},{"id":"https://openalex.org/keywords/rf-sputtering","display_name":"RF sputtering","score":0.9679999947547913},{"id":"https://openalex.org/keywords/sputtering-power","display_name":"sputtering power","score":0.9990000128746033},{"id":"https://openalex.org/keywords/thin-film-properties","display_name":"thin film properties","score":0.9620000123977661}],"concepts":[{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.8308277726173401},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.757767915725708},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.5520445108413696},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5213931202888489},{"id":"https://openalex.org/C196054291","wikidata":"https://www.wikidata.org/wiki/Q7276624","display_name":"RF power amplifier","level":4,"score":0.45378491282463074},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.20223620533943176},{"id":"https://openalex.org/C46362747","wikidata":"https://www.wikidata.org/wiki/Q173431","display_name":"CMOS","level":2,"score":0.0},{"id":"https://openalex.org/C194257627","wikidata":"https://www.wikidata.org/wiki/Q211554","display_name":"Amplifier","level":3,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1166/nnl.2018.2679","doi":"https://doi.org/10.1166/nnl.2018.2679","is_oa":false,"landing_page_url":"https://doi.org/10.1166/nnl.2018.2679","pdf_url":null,"source":{"id":"https://openalex.org/S2486803449","display_name":"Nanoscience and Nanotechnology Letters","issn_l":"1941-4900","issn":["1941-4900","1941-4919"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":["poland-70"],"host_organization":"https://openalex.org/P4310321646","host_organization_name":"American Scientific Publishers","host_organization_lineage":["https://openalex.org/P4310321646"],"host_organization_lineage_names":["American Scientific Publishers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Nanoscience and Nanotechnology Letters","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2889347898","https://openalex.org/W3192557869","https://openalex.org/W4406124859","https://openalex.org/W2316231827","https://openalex.org/W4239333358","https://openalex.org/W4250004415","https://openalex.org/W4400026704","https://openalex.org/W2374610095","https://openalex.org/W1954480975","https://openalex.org/W2573052789"],"abstract_inverted_index":null,"counts_by_year":[{"year":2024,"cited_by_count":2}],"updated_date":"2026-09-27T08:07:27.782135","created_date":"2018-11-29T00:00:00"}
