{"id":"https://openalex.org/W2808212401","doi":"https://doi.org/10.1109/asmc.2018.8373222","title":"Application of scatterometry-based machine learning to control multiple electron beam lithography: AM: Advanced metrology","display_name":"Application of scatterometry-based machine learning to control multiple electron beam lithography: AM: Advanced metrology","publication_year":2018,"publication_date":"2018-04-01","ids":{"openalex":"https://openalex.org/W2808212401","doi":"https://doi.org/10.1109/asmc.2018.8373222","mag":"2808212401"},"language":"en","primary_location":{"id":"doi:10.1109/asmc.2018.8373222","doi":"https://doi.org/10.1109/asmc.2018.8373222","is_oa":false,"landing_page_url":"https://doi.org/10.1109/asmc.2018.8373222","pdf_url":null,"source":{"id":"https://openalex.org/S4210195742","display_name":"ASMC proceedings","issn_l":"1078-8743","issn":["1078-8743","2376-6697"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core"],"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5036786506","display_name":"Nivea Figueir\u00f3","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210125236","display_name":"Nova Measuring Instruments (Israel)","ror":"https://ror.org/02afhmq71","country_code":"IL","type":"company","lineage":["https://openalex.org/I4210125236"]}],"countries":["IL"],"is_corresponding":false,"raw_author_name":"Nivea Figueiro","raw_affiliation_strings":["Nova Measuring Instruments, Rehovot, Israel"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Nova Measuring Instruments, Rehovot, Israel","institution_ids":["https://openalex.org/I4210125236"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Francisco Sanchez","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210125236","display_name":"Nova Measuring Instruments (Israel)","ror":"https://ror.org/02afhmq71","country_code":"IL","type":"company","lineage":["https://openalex.org/I4210125236"]}],"countries":["IL"],"is_corresponding":false,"raw_author_name":"Francisco Sanchez","raw_affiliation_strings":["Nova Measuring Instruments, Rehovot, Israel"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Nova Measuring Instruments, Rehovot, Israel","institution_ids":["https://openalex.org/I4210125236"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5061204269","display_name":"Roy Koret","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210125236","display_name":"Nova Measuring Instruments (Israel)","ror":"https://ror.org/02afhmq71","country_code":"IL","type":"company","lineage":["https://openalex.org/I4210125236"]}],"countries":["IL"],"is_corresponding":false,"raw_author_name":"Roy Koret","raw_affiliation_strings":["Nova Measuring Instruments, Rehovot, Israel"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Nova Measuring Instruments, Rehovot, Israel","institution_ids":["https://openalex.org/I4210125236"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Michael Shifrin","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210125236","display_name":"Nova Measuring Instruments (Israel)","ror":"https://ror.org/02afhmq71","country_code":"IL","type":"company","lineage":["https://openalex.org/I4210125236"]}],"countries":["IL"],"is_corresponding":false,"raw_author_name":"Michael Shifrin","raw_affiliation_strings":["Nova Measuring Instruments, Rehovot, Israel"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Nova Measuring Instruments, Rehovot, Israel","institution_ids":["https://openalex.org/I4210125236"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5052445328","display_name":"Yoav Etzioni","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210125236","display_name":"Nova Measuring Instruments (Israel)","ror":"https://ror.org/02afhmq71","country_code":"IL","type":"company","lineage":["https://openalex.org/I4210125236"]}],"countries":["IL"],"is_corresponding":false,"raw_author_name":"Yoav Etzioni","raw_affiliation_strings":["Nova Measuring Instruments, Rehovot, Israel"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Nova Measuring Instruments, Rehovot, Israel","institution_ids":["https://openalex.org/I4210125236"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5051126732","display_name":"Shay Wolfling","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210125236","display_name":"Nova Measuring Instruments (Israel)","ror":"https://ror.org/02afhmq71","country_code":"IL","type":"company","lineage":["https://openalex.org/I4210125236"]}],"countries":["IL"],"is_corresponding":false,"raw_author_name":"Shay Wolfling","raw_affiliation_strings":["Nova Measuring Instruments, Rehovot, Israel"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Nova Measuring Instruments, Rehovot, Israel","institution_ids":["https://openalex.org/I4210125236"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5083136782","display_name":"Matthew J. Sendelbach","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210125236","display_name":"Nova Measuring Instruments (Israel)","ror":"https://ror.org/02afhmq71","country_code":"IL","type":"company","lineage":["https://openalex.org/I4210125236"]}],"countries":["IL"],"is_corresponding":false,"raw_author_name":"Matthew Sendelbach","raw_affiliation_strings":["Nova Measuring Instruments, Rehovot, Israel"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Nova Measuring Instruments, Rehovot, Israel","institution_ids":["https://openalex.org/I4210125236"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5005583879","display_name":"Yoann Blancquaert","orcid":"https://orcid.org/0000-0001-9914-6306","observed_orcids":["https://orcid.org/0000-0001-9914-6306"]},"institutions":[{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I4210150049","display_name":"Laboratoire d'\u00c9lectronique des Technologies de l'Information","ror":"https://ror.org/04mf0wv34","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I4210150049"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Yoann Blancquaert","raw_affiliation_strings":["CEA-LETI, Minatec Campus, Grenoble, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CEA-LETI, Minatec Campus, Grenoble, France","institution_ids":["https://openalex.org/I2738703131","https://openalex.org/I4210150049"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5034128360","display_name":"Thibault Labbaye","orcid":"https://orcid.org/0000-0002-2920-2031","observed_orcids":["https://orcid.org/0000-0002-2920-2031"]},"institutions":[{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I4210150049","display_name":"Laboratoire d'\u00c9lectronique des Technologies de l'Information","ror":"https://ror.org/04mf0wv34","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I4210150049"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Thibault Labbaye","raw_affiliation_strings":["CEA-LETI, Minatec Campus, Grenoble, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CEA-LETI, Minatec Campus, Grenoble, France","institution_ids":["https://openalex.org/I2738703131","https://openalex.org/I4210150049"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5016318359","display_name":"Guido Rademaker","orcid":"https://orcid.org/0000-0002-9113-4113","observed_orcids":["https://orcid.org/0000-0002-9113-4113"]},"institutions":[{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I4210150049","display_name":"Laboratoire d'\u00c9lectronique des Technologies de l'Information","ror":"https://ror.org/04mf0wv34","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I4210150049"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Guido Rademaker","raw_affiliation_strings":["CEA-LETI, Minatec Campus, Grenoble, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CEA-LETI, Minatec Campus, Grenoble, France","institution_ids":["https://openalex.org/I2738703131","https://openalex.org/I4210150049"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5039665252","display_name":"Jonathan Pradelles","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I4210150049","display_name":"Laboratoire d'\u00c9lectronique des Technologies de l'Information","ror":"https://ror.org/04mf0wv34","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I4210150049"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Jonathan Pradelles","raw_affiliation_strings":["CEA-LETI, Minatec Campus, Grenoble, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CEA-LETI, Minatec Campus, Grenoble, France","institution_ids":["https://openalex.org/I2738703131","https://openalex.org/I4210150049"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5077307687","display_name":"Lucie Mourier","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I4210150049","display_name":"Laboratoire d'\u00c9lectronique des Technologies de l'Information","ror":"https://ror.org/04mf0wv34","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I4210150049"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Lucie Mourier","raw_affiliation_strings":["CEA-LETI, Minatec Campus, Grenoble, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CEA-LETI, Minatec Campus, Grenoble, France","institution_ids":["https://openalex.org/I2738703131","https://openalex.org/I4210150049"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Stephane Rey","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I4210150049","display_name":"Laboratoire d'\u00c9lectronique des Technologies de l'Information","ror":"https://ror.org/04mf0wv34","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I4210150049"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Stephane Rey","raw_affiliation_strings":["CEA-LETI, Minatec Campus, Grenoble, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CEA-LETI, Minatec Campus, Grenoble, France","institution_ids":["https://openalex.org/I2738703131","https://openalex.org/I4210150049"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5103742285","display_name":"Laurent Pain","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I4210150049","display_name":"Laboratoire d'\u00c9lectronique des Technologies de l'Information","ror":"https://ror.org/04mf0wv34","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I4210150049"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Laurent Pain","raw_affiliation_strings":["CEA-LETI, Minatec Campus, Grenoble, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CEA-LETI, Minatec Campus, Grenoble, France","institution_ids":["https://openalex.org/I2738703131","https://openalex.org/I4210150049"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.8007,"has_fulltext":false,"cited_by_count":7,"citation_normalized_percentile":{"value":0.61905283,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":95},"biblio":{"volume":null,"issue":null,"first_page":"328","last_page":"333"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9775000214576721,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9775000214576721,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.00430000014603138,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13049","display_name":"Surface Roughness and Optical Measurements","score":0.002199999988079071,"subfield":{"id":"https://openalex.org/subfields/3105","display_name":"Instrumentation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/scatterometry","display_name":"scatterometry","score":0.9819999933242798},{"id":"https://openalex.org/keywords/machine-learning","display_name":"machine learning","score":0.9890000224113464},{"id":"https://openalex.org/keywords/electron-beam-lithography","display_name":"electron beam lithography","score":0.9459999799728394},{"id":"https://openalex.org/keywords/maskless-lithography","display_name":"maskless lithography","score":0.9440000057220459},{"id":"https://openalex.org/keywords/critical-dimension-variation","display_name":"critical dimension variation","score":0.7749999761581421},{"id":"https://openalex.org/keywords/metrology","display_name":"metrology","score":0.5559999942779541}],"concepts":[{"id":"https://openalex.org/C195766429","wikidata":"https://www.wikidata.org/wiki/Q394","display_name":"Metrology","level":2,"score":0.7068386077880859},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.6846479177474976},{"id":"https://openalex.org/C207789793","wikidata":"https://www.wikidata.org/wiki/Q3028070","display_name":"Critical dimension","level":2,"score":0.6673100590705872},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.6106586456298828},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.5515090823173523},{"id":"https://openalex.org/C137905882","wikidata":"https://www.wikidata.org/wiki/Q6783445","display_name":"Maskless lithography","level":5,"score":0.5028933882713318},{"id":"https://openalex.org/C190475519","wikidata":"https://www.wikidata.org/wiki/Q544384","display_name":"Massively parallel","level":2,"score":0.46915093064308167},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.3907289505004883},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.300795316696167},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.2343849241733551},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.21378454566001892},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.19719824194908142},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.18713325262069702},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C173608175","wikidata":"https://www.wikidata.org/wiki/Q232661","display_name":"Parallel computing","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/asmc.2018.8373222","doi":"https://doi.org/10.1109/asmc.2018.8373222","is_oa":false,"landing_page_url":"https://doi.org/10.1109/asmc.2018.8373222","pdf_url":null,"source":{"id":"https://openalex.org/S4210195742","display_name":"ASMC proceedings","issn_l":"1078-8743","issn":["1078-8743","2376-6697"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core"],"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":12,"referenced_works":["https://openalex.org/W1554944419","https://openalex.org/W1983853848","https://openalex.org/W1987940488","https://openalex.org/W2026245320","https://openalex.org/W2037193881","https://openalex.org/W2054790804","https://openalex.org/W2063220571","https://openalex.org/W2065370362","https://openalex.org/W2171033594","https://openalex.org/W2598940454","https://openalex.org/W2890729692","https://openalex.org/W6754197169"],"related_works":["https://openalex.org/W2598940454","https://openalex.org/W2890947436","https://openalex.org/W4399396063","https://openalex.org/W2024582625","https://openalex.org/W2057082011","https://openalex.org/W2135173932","https://openalex.org/W2074757263","https://openalex.org/W2624868238","https://openalex.org/W4321259796","https://openalex.org/W4409759260"],"abstract_inverted_index":{"The":[0],"evaluation":[1],"of":[2,10,56,86],"scatterometry":[3,17,63,67],"and":[4],"machine":[5,58,89],"learning":[6,59,90],"for":[7],"the":[8,49,54,61,84],"monitoring":[9],"intended":[11],"critical":[12],"dimension":[13],"(CD)":[14],"variations":[15,22],"within":[16],"targets":[18],"is":[19],"presented.":[20],"Such":[21],"mimic":[23],"non-uniformities":[24],"potentially":[25],"caused":[26],"by":[27],"massively":[28],"parallel":[29],"e-beam":[30],"Maskless":[31],"Lithography":[32],"(ML2).":[33],"Although":[34],"previous":[35],"results":[36],"[1]":[37],"demonstrate":[38],"that":[39,53],"traditional":[40],"model-based":[41,62,66],"scatter-ometry":[42],"can":[43,68,75],"properly":[44],"quantify":[45],"these":[46],"within-target":[47],"variations,":[48],"current":[50],"work":[51],"shows":[52],"application":[55],"scatterometry-based":[57],"complements":[60],"results.":[64],"While":[65],"provide":[69],"information":[70],"about":[71],"structure":[72],"profile,":[73],"which":[74],"be":[76],"used":[77],"to":[78,94],"detect":[79],"parameter":[80],"shifts":[81],"even":[82],"in":[83],"absence":[85],"a":[87,95],"reference,":[88],"provides":[91],"superb":[92],"correlation":[93],"defined":[96],"reference.":[97]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":1},{"year":2023,"cited_by_count":2},{"year":2019,"cited_by_count":1},{"year":2018,"cited_by_count":1}],"updated_date":"2026-10-29T09:56:32.521200","created_date":"2018-06-21T00:00:00"}