{"id":"https://openalex.org/W2807614486","doi":"https://doi.org/10.1117/12.2313429","title":"Influence of substrate cleaning on the laser resistance of antireflective coatings","display_name":"Influence of substrate cleaning on the laser resistance of antireflective coatings","publication_year":2018,"publication_date":"2018-06-05","ids":{"openalex":"https://openalex.org/W2807614486","doi":"https://doi.org/10.1117/12.2313429","mag":"2807614486"},"language":"en","primary_location":{"id":"doi:10.1117/12.2313429","doi":"https://doi.org/10.1117/12.2313429","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2313429","pdf_url":null,"source":{"id":"https://openalex.org/S7407105213","display_name":"Advances in Optical Thin Films","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Advances in Optical Thin Films VI","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5027531331","display_name":"Thomas Gischkat","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210130695","display_name":"RhySearch (Switzerland)","ror":"https://ror.org/035ded219","country_code":"CH","type":"company","lineage":["https://openalex.org/I4210130695"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"Thomas Gischkat","raw_affiliation_strings":["Rhysearch (Switzerland)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Rhysearch (Switzerland)","institution_ids":["https://openalex.org/I4210130695"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5105889736","display_name":"Roelene Botha","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210130695","display_name":"RhySearch (Switzerland)","ror":"https://ror.org/035ded219","country_code":"CH","type":"company","lineage":["https://openalex.org/I4210130695"]},{"id":"https://openalex.org/I4210143180","display_name":"Interstate University of Applied Sciences of Technology Buchs","ror":"https://ror.org/03mg0ce08","country_code":"CH","type":"education","lineage":["https://openalex.org/I4210129390","https://openalex.org/I4210143180"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"Roelene Botha","raw_affiliation_strings":["NTB Interstaatliche Hochschule f\u00fcr Technik Buchs (Switzerland)","Rhysearch (Switzerland)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NTB Interstaatliche Hochschule f\u00fcr Technik Buchs (Switzerland)","institution_ids":["https://openalex.org/I4210143180"]},{"raw_affiliation_string":"Rhysearch (Switzerland)","institution_ids":["https://openalex.org/I4210130695"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5012918791","display_name":"Igor Stevanovic","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210130695","display_name":"RhySearch (Switzerland)","ror":"https://ror.org/035ded219","country_code":"CH","type":"company","lineage":["https://openalex.org/I4210130695"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"Igor Stevanovic","raw_affiliation_strings":["Rhysearch (Switzerland)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Rhysearch (Switzerland)","institution_ids":["https://openalex.org/I4210130695"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5008755442","display_name":"Marco Cucinelli","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210143180","display_name":"Interstate University of Applied Sciences of Technology Buchs","ror":"https://ror.org/03mg0ce08","country_code":"CH","type":"education","lineage":["https://openalex.org/I4210129390","https://openalex.org/I4210143180"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"Marco Cucinelli","raw_affiliation_strings":["NTB Interstaatliche Hochschule f\u00fcr Technik Buchs (Switzerland)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NTB Interstaatliche Hochschule f\u00fcr Technik Buchs (Switzerland)","institution_ids":["https://openalex.org/I4210143180"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5067651186","display_name":"Andreas B\u00e4chli","orcid":"https://orcid.org/0000-0002-6695-6449","observed_orcids":["https://orcid.org/0000-0002-6695-6449"]},"institutions":[{"id":"https://openalex.org/I4210130695","display_name":"RhySearch (Switzerland)","ror":"https://ror.org/035ded219","country_code":"CH","type":"company","lineage":["https://openalex.org/I4210130695"]}],"countries":["CH"],"is_corresponding":false,"raw_author_name":"Andreas B\u00e4chli","raw_affiliation_strings":["Rhysearch (Switzerland)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Rhysearch (Switzerland)","institution_ids":["https://openalex.org/I4210130695"]}]},{"author_position":"last","author":{"id":null,"display_name":"Sven G\u00fcnther","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Sven G\u00fcnther","raw_affiliation_strings":["Ultrasonic Cleaning Machines AG (Switzerland)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ultrasonic Cleaning Machines AG (Switzerland)","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":1.3693,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.75462392,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":94},"biblio":{"volume":"5273","issue":null,"first_page":"66","last_page":"66"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.0008999999845400453,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13049","display_name":"Surface Roughness and Optical Measurements","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/substrate-cleaning","display_name":"substrate cleaning","score":0.972000002861023},{"id":"https://openalex.org/keywords/antireflection-coatings","display_name":"antireflection coatings","score":0.9369999766349792},{"id":"https://openalex.org/keywords/laser-induced-damage-threshold","display_name":"laser-induced damage threshold","score":0.8840000033378601},{"id":"https://openalex.org/keywords/ion-beam-sputtering","display_name":"ion beam sputtering","score":0.8980000019073486},{"id":"https://openalex.org/keywords/fused-silica-substrate","display_name":"fused silica substrate","score":0.9660000205039978},{"id":"https://openalex.org/keywords/1064-nm-pulsed-laser","display_name":"1064 nm pulsed laser","score":0.7480000257492065},{"id":"https://openalex.org/keywords/surface-contaminants","display_name":"surface contaminants","score":0.6159999966621399},{"id":"https://openalex.org/keywords/surface-roughness","display_name":"surface roughness","score":0.8539999723434448},{"id":"https://openalex.org/keywords/optical-coatings","display_name":"optical coatings","score":0.3100000023841858}],"concepts":[{"id":"https://openalex.org/C108406538","wikidata":"https://www.wikidata.org/wiki/Q583040","display_name":"Anti-reflective coating","level":3,"score":0.9318748712539673},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7758399248123169},{"id":"https://openalex.org/C2781448156","wikidata":"https://www.wikidata.org/wiki/Q1570182","display_name":"Coating","level":2,"score":0.6319146752357483},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.6211581230163574},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.6050023436546326},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.5581592917442322},{"id":"https://openalex.org/C107365816","wikidata":"https://www.wikidata.org/wiki/Q114817","display_name":"Surface roughness","level":2,"score":0.5212867259979248},{"id":"https://openalex.org/C71597924","wikidata":"https://www.wikidata.org/wiki/Q2890543","display_name":"Optical coating","level":3,"score":0.48975062370300293},{"id":"https://openalex.org/C71039073","wikidata":"https://www.wikidata.org/wiki/Q3439090","display_name":"Surface finish","level":2,"score":0.48325520753860474},{"id":"https://openalex.org/C2780710336","wikidata":"https://www.wikidata.org/wiki/Q1966035","display_name":"Wet cleaning","level":2,"score":0.4459119439125061},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.3665180206298828},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3524302840232849},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.34911245107650757},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.09385925531387329},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.2313429","doi":"https://doi.org/10.1117/12.2313429","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2313429","pdf_url":null,"source":{"id":"https://openalex.org/S7407105213","display_name":"Advances in Optical Thin Films","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Advances in Optical Thin Films VI","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":7,"referenced_works":["https://openalex.org/W1466874085","https://openalex.org/W1649092860","https://openalex.org/W1932246826","https://openalex.org/W1987739503","https://openalex.org/W2013711534","https://openalex.org/W2021650097","https://openalex.org/W2060368009"],"related_works":["https://openalex.org/W3110255171","https://openalex.org/W2980417492","https://openalex.org/W2991347509","https://openalex.org/W7203904066","https://openalex.org/W2013711534","https://openalex.org/W2498911629","https://openalex.org/W2112254540","https://openalex.org/W2347620939","https://openalex.org/W6989864378","https://openalex.org/W2464732344"],"abstract_inverted_index":{"Several":[0],"studies":[1],"have":[2,53,95],"reported":[3],"on":[4,11,32,98,119],"the":[5,12,29,33,58,69,85,99,120,156,201,204,209,212,216,222],"detrimental":[6],"effects":[7],"of":[8,14,49,68,101,107,123,142,163,181,203,211],"inadequate":[9],"cleaning":[10,51,71,103,114,164,213,224],"performance":[13,220],"optical":[15],"components":[16],"exposed":[17],"to":[18,78,83,111,154,199],"laser":[19,38,121,183,218],"radiation.":[20],"The":[21,105],"remaining":[22],"particulates,":[23],"contaminants":[24],"or":[25,31],"residue":[26],"located":[27],"in":[28,56,179,197],"coating":[30,137],"substrate":[34],"surface":[35,172],"can":[36],"absorb":[37],"energy":[39],"and":[40,60,66,91,116,166,168,171,193,215,228],"consequently":[41],"induce":[42],"damage.":[43,205],"To":[44],"minimize":[45],"these":[46],"contaminants,":[47],"investigations":[48],"various":[50],"processes":[52,72,225],"been":[54],"performed":[55],"both":[57],"research":[59],"industry":[61],"communities.":[62],"Transparent":[63],"published":[64],"results":[65],"comparisons":[67],"different":[70,113,223],"considered,":[73],"however,":[74],"are":[75,226],"limited":[76],"due":[77],"proprietary":[79],"considerations.":[80],"In":[81,206],"addition":[82],"this,":[84],"manufacturing":[86],"environment,":[87],"deposition":[88,92],"processes,":[89],"substrate-":[90],"materials":[93],"all":[94],"an":[96],"influence":[97,118],"effectiveness":[100],"a":[102,131,139,161,187],"process.":[104],"purpose":[106],"this":[108,129,207],"study":[109],"was":[110,147],"investigate":[112],"procedures":[115,167],"their":[117,169,182],"resistance":[122],"ion-beam":[124],"sputtered":[125],"antireflective":[126,136],"coatings.":[127],"For":[128],"purpose,":[130],"SiO2":[132],"/":[133],"Ta2O5":[134],"multilayer":[135],"for":[138,221],"normal":[140],"angle":[141],"incidence":[143],"at":[144],"1064":[145,188],"nm":[146,189],"deposited":[148],"onto":[149],"fused":[150],"silica":[151],"substrates.":[152],"Prior":[153],"deposition,":[155],"substrates":[157],"were":[158,177],"cleaned":[159],"with":[160],"variety":[162],"solutions":[165],"roughness":[170],"quality":[173],"inspected.":[174],"All":[175],"samples":[176],"characterized":[178],"terms":[180],"damage":[184,219],"threshold":[185],"using":[186],"ns-pulsed":[190],"test":[191],"bench":[192],"subsequently":[194],"visually":[195],"inspected":[196],"order":[198],"understand":[200],"cause":[202],"work,":[208],"details":[210],"steps":[214],"corresponding":[217],"presented":[227],"compared.":[229]},"counts_by_year":[{"year":2019,"cited_by_count":1}],"updated_date":"2026-10-28T10:33:24.094632","created_date":"2018-06-13T00:00:00"}