{"id":"https://openalex.org/W2791486576","doi":"https://doi.org/10.7567/jjap.57.04fs01","title":"BaSi 2 formation mechanism in thermally evaporated films and its application to reducing oxygen impurity concentration","display_name":"BaSi 2 formation mechanism in thermally evaporated films and its application to reducing oxygen impurity concentration","publication_year":2018,"publication_date":"2018-02-23","ids":{"openalex":"https://openalex.org/W2791486576","doi":"https://doi.org/10.7567/jjap.57.04fs01","mag":"2791486576"},"language":"en","primary_location":{"id":"doi:10.7567/jjap.57.04fs01","doi":"https://doi.org/10.7567/jjap.57.04fs01","is_oa":true,"landing_page_url":"https://doi.org/10.7567/jjap.57.04fs01","pdf_url":"https://iopscience.iop.org/article/10.7567/JJAP.57.04FS01/pdf","source":{"id":"https://openalex.org/S143744711","display_name":"Japanese Journal of Applied Physics","issn_l":"0021-4922","issn":["0021-4922","1347-4065"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Japanese Journal of Applied Physics","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"bronze","oa_url":"https://iopscience.iop.org/article/10.7567/JJAP.57.04FS01/pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5029779344","display_name":"Kosuke O. Hara","orcid":"https://orcid.org/0000-0001-6463-6540","observed_orcids":["https://orcid.org/0000-0001-6463-6540"]},"institutions":[{"id":"https://openalex.org/I66906201","display_name":"University of Yamanashi","ror":"https://ror.org/059x21724","country_code":"JP","type":"education","lineage":["https://openalex.org/I66906201"]}],"countries":["JP"],"is_corresponding":true,"raw_author_name":"Kosuke O. Hara","raw_affiliation_strings":["Center for Crystal Science and Technology, University of Yamanashi, Kofu 400-8511, Japan"],"raw_orcid":"https://orcid.org/0000-0001-6463-6540","affiliations":[{"raw_affiliation_string":"Center for Crystal Science and Technology, University of Yamanashi, Kofu 400-8511, Japan","institution_ids":["https://openalex.org/I66906201"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5003967228","display_name":"Chiaya Yamamoto","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I66906201","display_name":"University of Yamanashi","ror":"https://ror.org/059x21724","country_code":"JP","type":"education","lineage":["https://openalex.org/I66906201"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Chiaya Yamamoto","raw_affiliation_strings":["Center for Creative Technology, University of Yamanashi, Kofu 400-8510, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Center for Creative Technology, University of Yamanashi, Kofu 400-8510, Japan","institution_ids":["https://openalex.org/I66906201"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5035587305","display_name":"Junji Yamanaka","orcid":"https://orcid.org/0000-0003-1500-6969","observed_orcids":["https://orcid.org/0000-0003-1500-6969"]},"institutions":[{"id":"https://openalex.org/I66906201","display_name":"University of Yamanashi","ror":"https://ror.org/059x21724","country_code":"JP","type":"education","lineage":["https://openalex.org/I66906201"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Junji Yamanaka","raw_affiliation_strings":["Center for Instrumental Analysis, University of Yamanashi, Kofu 400-8510, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Center for Instrumental Analysis, University of Yamanashi, Kofu 400-8510, Japan","institution_ids":["https://openalex.org/I66906201"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5026366957","display_name":"Keisuke Arimoto","orcid":"https://orcid.org/0000-0002-3766-4324","observed_orcids":["https://orcid.org/0000-0002-3766-4324"]},"institutions":[{"id":"https://openalex.org/I66906201","display_name":"University of Yamanashi","ror":"https://ror.org/059x21724","country_code":"JP","type":"education","lineage":["https://openalex.org/I66906201"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Keisuke Arimoto","raw_affiliation_strings":["Center for Crystal Science and Technology, University of Yamanashi, Kofu 400-8511, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Center for Crystal Science and Technology, University of Yamanashi, Kofu 400-8511, Japan","institution_ids":["https://openalex.org/I66906201"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110076398","display_name":"Kiyokazu Nakagawa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I66906201","display_name":"University of Yamanashi","ror":"https://ror.org/059x21724","country_code":"JP","type":"education","lineage":["https://openalex.org/I66906201"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kiyokazu Nakagawa","raw_affiliation_strings":["Center for Crystal Science and Technology, University of Yamanashi, Kofu 400-8511, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Center for Crystal Science and Technology, University of Yamanashi, Kofu 400-8511, Japan","institution_ids":["https://openalex.org/I66906201"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5020769673","display_name":"Noritaka Usami","orcid":"https://orcid.org/0000-0002-0602-2847","observed_orcids":["https://orcid.org/0000-0002-0602-2847"]},"institutions":[{"id":"https://openalex.org/I60134161","display_name":"Nagoya University","ror":"https://ror.org/04chrp450","country_code":"JP","type":"education","lineage":["https://openalex.org/I60134161"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Noritaka Usami","raw_affiliation_strings":["Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan","institution_ids":["https://openalex.org/I60134161"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5029779344"],"corresponding_institution_ids":["https://openalex.org/I66906201"],"apc_list":{"value":2210,"currency":"USD","value_usd":2210},"apc_paid":null,"fwci":1.8496,"has_fulltext":true,"cited_by_count":23,"citation_normalized_percentile":{"value":0.86137403,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":98},"biblio":{"volume":"57","issue":"4S","first_page":"04FS01","last_page":"04FS01"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.9639000296592712,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.9639000296592712,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13889","display_name":"Advanced Materials and Semiconductor Technologies","score":0.009700000286102295,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.006500000134110451,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/basi2","display_name":"BaSi2","score":0.8539999723434448},{"id":"https://openalex.org/keywords/thermal-evaporation","display_name":"thermal evaporation","score":0.8769999742507935},{"id":"https://openalex.org/keywords/epitaxial-growth","display_name":"epitaxial growth","score":0.878000020980835},{"id":"https://openalex.org/keywords/formation-mechanism","display_name":"formation mechanism","score":0.7680000066757202},{"id":"https://openalex.org/keywords/oxygen-impurities","display_name":"oxygen impurities","score":0.5019999742507935},{"id":"https://openalex.org/keywords/oxygen-incorporation","display_name":"oxygen incorporation","score":0.7059999704360962},{"id":"https://openalex.org/keywords/a-axis-orientation","display_name":"a-axis orientation","score":0.5509999990463257},{"id":"https://openalex.org/keywords/microstructure","display_name":"microstructure","score":0.6600000262260437}],"concepts":[{"id":"https://openalex.org/C110738630","wikidata":"https://www.wikidata.org/wiki/Q1135540","display_name":"Epitaxy","level":3,"score":0.7097469568252563},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.683991551399231},{"id":"https://openalex.org/C71987851","wikidata":"https://www.wikidata.org/wiki/Q7216430","display_name":"Impurity","level":2,"score":0.6425312757492065},{"id":"https://openalex.org/C540031477","wikidata":"https://www.wikidata.org/wiki/Q629","display_name":"Oxygen","level":2,"score":0.587436318397522},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5528457164764404},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.5461337566375732},{"id":"https://openalex.org/C146088050","wikidata":"https://www.wikidata.org/wiki/Q744818","display_name":"Transmission electron microscopy","level":2,"score":0.5190437436103821},{"id":"https://openalex.org/C69357855","wikidata":"https://www.wikidata.org/wiki/Q163214","display_name":"Diffusion","level":2,"score":0.5174272656440735},{"id":"https://openalex.org/C77557913","wikidata":"https://www.wikidata.org/wiki/Q864822","display_name":"Electron diffraction","level":3,"score":0.5083968043327332},{"id":"https://openalex.org/C61441594","wikidata":"https://www.wikidata.org/wiki/Q132814","display_name":"Evaporation","level":2,"score":0.49719956517219543},{"id":"https://openalex.org/C2779192298","wikidata":"https://www.wikidata.org/wiki/Q7908061","display_name":"Vacuum evaporation","level":3,"score":0.4891362488269806},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.4646318554878235},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.4117337167263031},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.3968239426612854},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.37506335973739624},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.2996198832988739},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.2935282588005066},{"id":"https://openalex.org/C207114421","wikidata":"https://www.wikidata.org/wiki/Q133900","display_name":"Diffraction","level":2,"score":0.2914416790008545},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.08758264780044556},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.0},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.7567/jjap.57.04fs01","doi":"https://doi.org/10.7567/jjap.57.04fs01","is_oa":true,"landing_page_url":"https://doi.org/10.7567/jjap.57.04fs01","pdf_url":"https://iopscience.iop.org/article/10.7567/JJAP.57.04FS01/pdf","source":{"id":"https://openalex.org/S143744711","display_name":"Japanese Journal of Applied Physics","issn_l":"0021-4922","issn":["0021-4922","1347-4065"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Japanese Journal of Applied Physics","raw_type":"journal-article"}],"best_oa_location":{"id":"doi:10.7567/jjap.57.04fs01","doi":"https://doi.org/10.7567/jjap.57.04fs01","is_oa":true,"landing_page_url":"https://doi.org/10.7567/jjap.57.04fs01","pdf_url":"https://iopscience.iop.org/article/10.7567/JJAP.57.04FS01/pdf","source":{"id":"https://openalex.org/S143744711","display_name":"Japanese Journal of Applied Physics","issn_l":"0021-4922","issn":["0021-4922","1347-4065"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Japanese Journal of Applied Physics","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[{"id":"https://openalex.org/G4417756712","display_name":"Realization of a high-efficiency thin-film solar cell using ionic BaSi2 semiconductor","funder_award_id":"15K18040","funder_id":"https://openalex.org/F4320334764","funder_display_name":"Japan Society for the Promotion of Science"},{"id":"https://openalex.org/G6424081482","display_name":"Electrical characterization of the BaSi2/Si heterojunction fabricated by rapid thermal evaporation","funder_award_id":"17K14657","funder_id":"https://openalex.org/F4320334764","funder_display_name":"Japan Society for the Promotion of Science"},{"id":"https://openalex.org/G8754442349","display_name":"Quantification of electrical properties of defects in semiconductor crystals from a luminescence image","funder_award_id":"16H03856","funder_id":"https://openalex.org/F4320334764","funder_display_name":"Japan Society for the Promotion of Science"}],"funders":[{"id":"https://openalex.org/F4320334764","display_name":"Japan Society for the Promotion of Science","ror":"https://ror.org/00hhkn466"}],"has_content":{"pdf":true,"grobid_xml":true},"content_urls":{"pdf":"https://content.openalex.org/works/W2791486576.pdf","grobid_xml":"https://content.openalex.org/works/W2791486576.grobid-xml"},"referenced_works_count":25,"referenced_works":["https://openalex.org/W353567199","https://openalex.org/W357953990","https://openalex.org/W588054863","https://openalex.org/W638346539","https://openalex.org/W1515197474","https://openalex.org/W1724451582","https://openalex.org/W1909319105","https://openalex.org/W1971536547","https://openalex.org/W1981896543","https://openalex.org/W2012755000","https://openalex.org/W2026451268","https://openalex.org/W2057516850","https://openalex.org/W2086779288","https://openalex.org/W2197183983","https://openalex.org/W2294265238","https://openalex.org/W2296528413","https://openalex.org/W2313692971","https://openalex.org/W2317948384","https://openalex.org/W2483483689","https://openalex.org/W2485545508","https://openalex.org/W2510507871","https://openalex.org/W2600392696","https://openalex.org/W2618942051","https://openalex.org/W2672833946","https://openalex.org/W2763427605"],"related_works":["https://openalex.org/W2294265238","https://openalex.org/W3165105302","https://openalex.org/W3010088307","https://openalex.org/W2783259965","https://openalex.org/W2748637711","https://openalex.org/W2608272335","https://openalex.org/W2729560915","https://openalex.org/W1792107559","https://openalex.org/W2296528413","https://openalex.org/W2616824326"],"abstract_inverted_index":{"Abstract":[0],"Thermal":[1],"evaporation":[2,36],"is":[3,48,60,127,136,158,204],"a":[4,28,242],"simple":[5],"and":[6,102,185,217],"rapid":[7],"method":[8],"to":[9,18,50,88,109,139,237],"fabricate":[10],"semiconducting":[11],"BaSi":[12,21,29,45,74,110,118,142,164,169],"2":[13,22,30,46,75,111,119,143,165,170],"films.":[14],"In":[15,70,223],"this":[16,200],"study,":[17],"elucidate":[19],"the":[20,25,71,78,84,89,94,97,106,114,117,128,145,149,159,168,181,191,197,208,212,221,230],"formation":[23,120],"mechanism,":[24,121],"microstructure":[26],"of":[27,52,67,80,100,116,152,175,180,199,211,220,241],"epitaxial":[31,133,150],"film":[32,47,68,87,107],"fabricated":[33],"by":[34,40,63,190,206,218],"thermal":[35],"has":[37],"been":[38],"investigated":[39],"transmission":[41],"electron":[42],"microscopy.":[43],"The":[44,155],"found":[49,137],"consist":[51],"three":[53],"layers":[54],"with":[55],"different":[56],"microstructural":[57],"characteristics,":[58],"which":[59],"well":[61],"explained":[62],"assuming":[64],"two":[65,122],"stages":[66],"deposition.":[69],"first":[72,146],"stage,":[73,96],"forms":[76],"through":[77],"diffusion":[79,99],"Ba":[81,101],"atoms":[82,104],"from":[83],"deposited":[85,187],"Ba-rich":[86,188],"Si":[90,103,182],"substrate":[91,183,213],"while":[92],"in":[93,105,144,163,232],"second":[95],"mutual":[98],"leads":[108],"formation.":[112],"On":[113,196],"basis":[115,198],"issues":[123],"are":[124,194],"addressed.":[125],"One":[126],"as-yet":[129],"unclarified":[130],"reason":[131],"for":[132,148],"growth.":[134],"It":[135],"important":[138],"quickly":[140],"form":[141],"stage":[147],"growth":[151],"upper":[153],"layers.":[154],"other":[156],"issue":[157],"high":[160,215],"oxygen":[161,176,202,233],"concentration":[162,203,234],"films":[166],"around":[167],"\u2013Si":[171],"interface.":[172],"Two":[173],"routes":[174],"incorporation,":[177],"i.e.,":[178],"oxidation":[179],"surface":[184],"initially":[186],"layer":[189],"residual":[192],"gas,":[193],"identified.":[195],"knowledge,":[201],"decreased":[205],"reducing":[207],"holding":[209],"time":[210],"at":[214],"temperatures":[216],"premelting":[219],"source.":[222],"addition,":[224],"X-ray":[225],"diffraction":[226],"results":[227],"show":[228],"that":[229],"decrease":[231],"can":[235],"lead":[236],"an":[238],"increased":[239],"proportion":[240],"-axis-oriented":[243],"grains.":[244]},"counts_by_year":[{"year":2025,"cited_by_count":2},{"year":2023,"cited_by_count":1},{"year":2022,"cited_by_count":4},{"year":2021,"cited_by_count":6},{"year":2020,"cited_by_count":4},{"year":2019,"cited_by_count":4},{"year":2018,"cited_by_count":2}],"updated_date":"2026-08-21T09:56:20.448147","created_date":"2018-03-29T00:00:00"}