{"id":"https://openalex.org/W2789463520","doi":"https://doi.org/10.1016/j.jallcom.2018.01.384","title":"Low emissivity double sides antireflection coatings for silicon wafer at infrared region","display_name":"Low emissivity double sides antireflection coatings for silicon wafer at infrared region","publication_year":2018,"publication_date":"2018-02-01","ids":{"openalex":"https://openalex.org/W2789463520","doi":"https://doi.org/10.1016/j.jallcom.2018.01.384","mag":"2789463520"},"language":"en","primary_location":{"id":"doi:10.1016/j.jallcom.2018.01.384","doi":"https://doi.org/10.1016/j.jallcom.2018.01.384","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.jallcom.2018.01.384","pdf_url":null,"source":{"id":"https://openalex.org/S67716761","display_name":"Journal of Alloys and Compounds","issn_l":"0925-8388","issn":["0925-8388","1873-4669"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Alloys and Compounds","raw_type":"journal-article"},"parent_works":[],"lineage":["https://openalex.org/W2789463520"],"child_works_count":0,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":null,"display_name":"Chao Dong","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I75955062","display_name":"Henan Normal University","ror":"https://ror.org/00s13br28","country_code":"CN","type":"education","lineage":["https://openalex.org/I75955062"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Chao Dong","raw_affiliation_strings":["Engineering Laboratory for Optoelectronic Technology and Advanced Manufacturing, Henan Normal University, Xinxiang, 453007, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Engineering Laboratory for Optoelectronic Technology and Advanced Manufacturing, Henan Normal University, Xinxiang, 453007, China","institution_ids":["https://openalex.org/I75955062"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Hai Lu","orcid":"https://orcid.org/0000-0002-5910-6411","observed_orcids":["https://orcid.org/0000-0002-5910-6411"]},"institutions":[{"id":"https://openalex.org/I75955062","display_name":"Henan Normal University","ror":"https://ror.org/00s13br28","country_code":"CN","type":"education","lineage":["https://openalex.org/I75955062"]}],"countries":["CN"],"is_corresponding":true,"raw_author_name":"Hai Lu","raw_affiliation_strings":["Engineering Laboratory for Optoelectronic Technology and Advanced Manufacturing, Henan Normal University, Xinxiang, 453007, China","Xinxiang Baihe O.E. Co., Ltd., Xinxiang, 453731, China"],"raw_orcid":"https://orcid.org/0000-0002-5910-6411","affiliations":[{"raw_affiliation_string":"Engineering Laboratory for Optoelectronic Technology and Advanced Manufacturing, Henan Normal University, Xinxiang, 453007, China","institution_ids":["https://openalex.org/I75955062"]},{"raw_affiliation_string":"Xinxiang Baihe O.E. Co., Ltd., Xinxiang, 453731, China","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5018322940","display_name":"Kun Yu","orcid":"https://orcid.org/0000-0001-6578-1336","observed_orcids":["https://orcid.org/0000-0001-6578-1336"]},"institutions":[{"id":"https://openalex.org/I75955062","display_name":"Henan Normal University","ror":"https://ror.org/00s13br28","country_code":"CN","type":"education","lineage":["https://openalex.org/I75955062"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Kun Yu","raw_affiliation_strings":["Engineering Laboratory for Optoelectronic Technology and Advanced Manufacturing, Henan Normal University, Xinxiang, 453007, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Engineering Laboratory for Optoelectronic Technology and Advanced Manufacturing, Henan Normal University, Xinxiang, 453007, China","institution_ids":["https://openalex.org/I75955062"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Ke-Sheng Shen","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I75955062","display_name":"Henan Normal University","ror":"https://ror.org/00s13br28","country_code":"CN","type":"education","lineage":["https://openalex.org/I75955062"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Ke-Sheng Shen","raw_affiliation_strings":["Engineering Laboratory for Optoelectronic Technology and Advanced Manufacturing, Henan Normal University, Xinxiang, 453007, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Engineering Laboratory for Optoelectronic Technology and Advanced Manufacturing, Henan Normal University, Xinxiang, 453007, China","institution_ids":["https://openalex.org/I75955062"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100433232","display_name":"Jun Zhang","orcid":"https://orcid.org/0000-0002-9831-6796","observed_orcids":["https://orcid.org/0000-0002-9831-6796","https://orcid.org/0000-0003-3607-213X"]},"institutions":[{"id":"https://openalex.org/I75955062","display_name":"Henan Normal University","ror":"https://ror.org/00s13br28","country_code":"CN","type":"education","lineage":["https://openalex.org/I75955062"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Jun Zhang","raw_affiliation_strings":["Engineering Laboratory for Optoelectronic Technology and Advanced Manufacturing, Henan Normal University, Xinxiang, 453007, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Engineering Laboratory for Optoelectronic Technology and Advanced Manufacturing, Henan Normal University, Xinxiang, 453007, China","institution_ids":["https://openalex.org/I75955062"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5042907598","display_name":"Shiqiang Xia","orcid":"https://orcid.org/0000-0001-9707-509X","observed_orcids":["https://orcid.org/0000-0001-9707-509X"]},"institutions":[{"id":"https://openalex.org/I75955062","display_name":"Henan Normal University","ror":"https://ror.org/00s13br28","country_code":"CN","type":"education","lineage":["https://openalex.org/I75955062"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Shi-Qiang Xia","raw_affiliation_strings":["Engineering Laboratory for Optoelectronic Technology and Advanced Manufacturing, Henan Normal University, Xinxiang, 453007, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Engineering Laboratory for Optoelectronic Technology and Advanced Manufacturing, Henan Normal University, Xinxiang, 453007, China","institution_ids":["https://openalex.org/I75955062"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5070999840","display_name":"Zong-Gang Xiong","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I75955062","display_name":"Henan Normal University","ror":"https://ror.org/00s13br28","country_code":"CN","type":"education","lineage":["https://openalex.org/I75955062"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Zong-Gang Xiong","raw_affiliation_strings":["Engineering Laboratory for Optoelectronic Technology and Advanced Manufacturing, Henan Normal University, Xinxiang, 453007, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Engineering Laboratory for Optoelectronic Technology and Advanced Manufacturing, Henan Normal University, Xinxiang, 453007, China","institution_ids":["https://openalex.org/I75955062"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109296732","display_name":"Xiaoyu Liu","orcid":"https://orcid.org/0000-0002-9488-1640","observed_orcids":["https://orcid.org/0000-0002-9488-1640"]},"institutions":[{"id":"https://openalex.org/I75955062","display_name":"Henan Normal University","ror":"https://ror.org/00s13br28","country_code":"CN","type":"education","lineage":["https://openalex.org/I75955062"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Xiao-Yu Liu","raw_affiliation_strings":["Engineering Laboratory for Optoelectronic Technology and Advanced Manufacturing, Henan Normal University, Xinxiang, 453007, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Engineering Laboratory for Optoelectronic Technology and Advanced Manufacturing, Henan Normal University, Xinxiang, 453007, China","institution_ids":["https://openalex.org/I75955062"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100335409","display_name":"Bo Zhang","orcid":"https://orcid.org/0000-0002-6509-4103","observed_orcids":["https://orcid.org/0000-0002-6509-4103","https://orcid.org/0000-0003-4979-9952"]},"institutions":[{"id":"https://openalex.org/I75955062","display_name":"Henan Normal University","ror":"https://ror.org/00s13br28","country_code":"CN","type":"education","lineage":["https://openalex.org/I75955062"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Bo Zhang","raw_affiliation_strings":["Engineering Laboratory for Optoelectronic Technology and Advanced Manufacturing, Henan Normal University, Xinxiang, 453007, China","Xinxiang Baihe O.E. Co., Ltd., Xinxiang, 453731, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Engineering Laboratory for Optoelectronic Technology and Advanced Manufacturing, Henan Normal University, Xinxiang, 453007, China","institution_ids":["https://openalex.org/I75955062"]},{"raw_affiliation_string":"Xinxiang Baihe O.E. Co., Ltd., Xinxiang, 453731, China","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100437348","display_name":"Zhijun Wang","orcid":"https://orcid.org/0000-0002-3574-3985","observed_orcids":["https://orcid.org/0000-0002-3574-3985"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Zhi-Jun Wang","raw_affiliation_strings":["Xinxiang Baihe O.E. Co., Ltd., Xinxiang, 453731, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Xinxiang Baihe O.E. Co., Ltd., Xinxiang, 453731, China","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5103256810","display_name":"Peng Wu","orcid":"https://orcid.org/0009-0006-2496-3364","observed_orcids":["https://orcid.org/0009-0006-2496-3364"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Peng Wu","raw_affiliation_strings":["Xinxiang Baihe O.E. Co., Ltd., Xinxiang, 453731, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Xinxiang Baihe O.E. Co., Ltd., Xinxiang, 453731, China","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100761343","display_name":"Yufang Liu","orcid":"https://orcid.org/0000-0003-1896-8864","observed_orcids":["https://orcid.org/0000-0003-1896-8864"]},"institutions":[{"id":"https://openalex.org/I75955062","display_name":"Henan Normal University","ror":"https://ror.org/00s13br28","country_code":"CN","type":"education","lineage":["https://openalex.org/I75955062"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yu-Fang Liu","raw_affiliation_strings":["Engineering Laboratory for Optoelectronic Technology and Advanced Manufacturing, Henan Normal University, Xinxiang, 453007, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Engineering Laboratory for Optoelectronic Technology and Advanced Manufacturing, Henan Normal University, Xinxiang, 453007, China","institution_ids":["https://openalex.org/I75955062"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5065569352","display_name":"Xianzhou Zhang","orcid":"https://orcid.org/0000-0003-2643-7430","observed_orcids":["https://orcid.org/0000-0003-2643-7430"]},"institutions":[{"id":"https://openalex.org/I75955062","display_name":"Henan Normal University","ror":"https://ror.org/00s13br28","country_code":"CN","type":"education","lineage":["https://openalex.org/I75955062"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Xian-Zhou Zhang","raw_affiliation_strings":["Engineering Laboratory for Optoelectronic Technology and Advanced Manufacturing, Henan Normal University, Xinxiang, 453007, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Engineering Laboratory for Optoelectronic Technology and Advanced Manufacturing, Henan Normal University, Xinxiang, 453007, China","institution_ids":["https://openalex.org/I75955062"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I75955062"],"apc_list":{"value":3660,"currency":"USD","value_usd":3660},"apc_paid":null,"fwci":0.7686,"has_fulltext":false,"cited_by_count":19,"citation_normalized_percentile":{"value":0.62807497,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":98},"biblio":{"volume":"742","issue":null,"first_page":"729","last_page":"735"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.9945999979972839,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.9945999979972839,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12442","display_name":"Thermal Radiation and Cooling Technologies","score":0.004999999888241291,"subfield":{"id":"https://openalex.org/subfields/2205","display_name":"Civil and Structural Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10299","display_name":"Photonic and Optical Devices","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/antireflection-coatings","display_name":"antireflection coatings","score":0.8849999904632568},{"id":"https://openalex.org/keywords/silicon-wafers","display_name":"silicon wafers","score":0.8569999933242798},{"id":"https://openalex.org/keywords/admittance-matching","display_name":"admittance matching","score":0.8330000042915344},{"id":"https://openalex.org/keywords/low-reflectance","display_name":"low reflectance","score":0.6399999856948853},{"id":"https://openalex.org/keywords/infrared-emissivity","display_name":"infrared emissivity","score":0.8270000219345093},{"id":"https://openalex.org/keywords/radiation-thermometry","display_name":"radiation thermometry","score":0.6990000009536743},{"id":"https://openalex.org/keywords/infrared-detection","display_name":"infrared detection","score":0.5139999985694885}],"concepts":[{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.8514230251312256},{"id":"https://openalex.org/C163651212","wikidata":"https://www.wikidata.org/wiki/Q899670","display_name":"Emissivity","level":2,"score":0.8461676239967346},{"id":"https://openalex.org/C158355884","wikidata":"https://www.wikidata.org/wiki/Q11388","display_name":"Infrared","level":2,"score":0.750834584236145},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.7152909636497498},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6903709769248962},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.6679295301437378},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.6267287731170654},{"id":"https://openalex.org/C123537908","wikidata":"https://www.wikidata.org/wiki/Q17102737","display_name":"Low emissivity","level":3,"score":0.5682550668716431},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.09183633327484131}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/j.jallcom.2018.01.384","doi":"https://doi.org/10.1016/j.jallcom.2018.01.384","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.jallcom.2018.01.384","pdf_url":null,"source":{"id":"https://openalex.org/S67716761","display_name":"Journal of Alloys and Compounds","issn_l":"0925-8388","issn":["0925-8388","1873-4669"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Alloys and Compounds","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":29,"referenced_works":["https://openalex.org/W1481738182","https://openalex.org/W1503819694","https://openalex.org/W1976151352","https://openalex.org/W2021833822","https://openalex.org/W2027638693","https://openalex.org/W2029689415","https://openalex.org/W2032916732","https://openalex.org/W2042167266","https://openalex.org/W2048490541","https://openalex.org/W2052969813","https://openalex.org/W2068024235","https://openalex.org/W2077429408","https://openalex.org/W2079427306","https://openalex.org/W2081245687","https://openalex.org/W2086734904","https://openalex.org/W2118783923","https://openalex.org/W2129651326","https://openalex.org/W2164280110","https://openalex.org/W2169824026","https://openalex.org/W2175134369","https://openalex.org/W2291234385","https://openalex.org/W2332726794","https://openalex.org/W2428542943","https://openalex.org/W2537291256","https://openalex.org/W2620159083","https://openalex.org/W2753637949","https://openalex.org/W2778846222","https://openalex.org/W4241569932","https://openalex.org/W6823428662"],"related_works":["https://openalex.org/W2738316290","https://openalex.org/W2944988676","https://openalex.org/W2683449198","https://openalex.org/W1531333446","https://openalex.org/W7217253186","https://openalex.org/W2369796719","https://openalex.org/W2461347736","https://openalex.org/W1993791097","https://openalex.org/W3118129106","https://openalex.org/W2018344244"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":4},{"year":2025,"cited_by_count":3},{"year":2023,"cited_by_count":3},{"year":2022,"cited_by_count":2},{"year":2021,"cited_by_count":3},{"year":2020,"cited_by_count":3},{"year":2019,"cited_by_count":1}],"updated_date":"2026-10-13T10:08:12.033832","created_date":"2018-03-29T00:00:00"}