{"id":"https://openalex.org/W2787014331","doi":"https://doi.org/10.1116/1.5008464","title":"Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors","display_name":"Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors","publication_year":2018,"publication_date":"2018-02-14","ids":{"openalex":"https://openalex.org/W2787014331","doi":"https://doi.org/10.1116/1.5008464","mag":"2787014331"},"language":"en","primary_location":{"id":"doi:10.1116/1.5008464","doi":"https://doi.org/10.1116/1.5008464","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.5008464","pdf_url":null,"source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"green","oa_url":"https://research.tue.nl/en/publications/b126e38b-80fb-4b03-b897-3af7441fdb90","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5084683157","display_name":"A. Illiberi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210153656","display_name":"Holst Centre (Netherlands)","ror":"https://ror.org/04abpa862","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210153656"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Andrea Illiberi","raw_affiliation_strings":["Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I4210153656"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5072599011","display_name":"Ilias Katsouras","orcid":"https://orcid.org/0000-0003-2413-695X","observed_orcids":["https://orcid.org/0000-0003-2413-695X"]},"institutions":[{"id":"https://openalex.org/I4210153656","display_name":"Holst Centre (Netherlands)","ror":"https://ror.org/04abpa862","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210153656"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Ilias Katsouras","raw_affiliation_strings":["Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I4210153656"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5050837888","display_name":"Sa\u0161a Gazibegovi\u0107","orcid":"https://orcid.org/0000-0002-2740-9688","observed_orcids":["https://orcid.org/0000-0002-2740-9688"]},"institutions":[{"id":"https://openalex.org/I4210153656","display_name":"Holst Centre (Netherlands)","ror":"https://ror.org/04abpa862","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210153656"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Sasa Gazibegovic","raw_affiliation_strings":["Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I4210153656"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5073567726","display_name":"Brian Cobb","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210153656","display_name":"Holst Centre (Netherlands)","ror":"https://ror.org/04abpa862","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210153656"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Brian Cobb","raw_affiliation_strings":["Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I4210153656"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5000684954","display_name":"Elida Nekovic","orcid":"https://orcid.org/0000-0003-0135-6829","observed_orcids":["https://orcid.org/0000-0003-0135-6829"]},"institutions":[{"id":"https://openalex.org/I4210153656","display_name":"Holst Centre (Netherlands)","ror":"https://ror.org/04abpa862","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210153656"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Elida Nekovic","raw_affiliation_strings":["Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I4210153656"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5008873957","display_name":"Willem van Boekel","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210153656","display_name":"Holst Centre (Netherlands)","ror":"https://ror.org/04abpa862","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210153656"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Willem van Boekel","raw_affiliation_strings":["Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I4210153656"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5055967294","display_name":"Corn\u00e9 H. Frijters","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210153656","display_name":"Holst Centre (Netherlands)","ror":"https://ror.org/04abpa862","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210153656"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Corne Frijters","raw_affiliation_strings":["Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I4210153656"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5059738153","display_name":"Joris Maas","orcid":"https://orcid.org/0000-0002-1707-1126","observed_orcids":["https://orcid.org/0000-0002-1707-1126"]},"institutions":[{"id":"https://openalex.org/I4210153656","display_name":"Holst Centre (Netherlands)","ror":"https://ror.org/04abpa862","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210153656"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Joris Maas","raw_affiliation_strings":["Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I4210153656"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5058463930","display_name":"Fred Roozeboom","orcid":"https://orcid.org/0000-0003-3925-7041","observed_orcids":["https://orcid.org/0000-0003-3925-7041"]},"institutions":[{"id":"https://openalex.org/I148297040","display_name":"Netherlands Organisation for Applied Scientific Research","ror":"https://ror.org/01bnjb948","country_code":"NL","type":"nonprofit","lineage":["https://openalex.org/I148297040"]},{"id":"https://openalex.org/I4210153656","display_name":"Holst Centre (Netherlands)","ror":"https://ror.org/04abpa862","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210153656"]},{"id":"https://openalex.org/I83019370","display_name":"Eindhoven University of Technology","ror":"https://ror.org/02c2kyt77","country_code":"NL","type":"education","lineage":["https://openalex.org/I83019370"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Fred Roozeboom","raw_affiliation_strings":["Department of Applied Physics, Eindhoven University of Technology , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands and , 5600 MB Eindhoven, The Netherlands","Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands and , 5600 MB Eindhoven, The Netherlands","Holst Centre/TNO, High Tech Campus 31, 5600 AE Eindhoven, The Netherlands and Department of Applied Physics, Eindhoven University of Technology, 5600 MB Eindhoven, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Applied Physics, Eindhoven University of Technology , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands and , 5600 MB Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I83019370"]},{"raw_affiliation_string":"Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands and , 5600 MB Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I4210153656"]},{"raw_affiliation_string":"Holst Centre/TNO, High Tech Campus 31, 5600 AE Eindhoven, The Netherlands and Department of Applied Physics, Eindhoven University of Technology, 5600 MB Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I148297040","https://openalex.org/I4210153656","https://openalex.org/I83019370"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108608409","display_name":"Yves Creyghton","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210153656","display_name":"Holst Centre (Netherlands)","ror":"https://ror.org/04abpa862","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210153656"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Yves Creyghton","raw_affiliation_strings":["Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I4210153656"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5085189333","display_name":"Paul Poodt","orcid":"https://orcid.org/0000-0002-1149-4312","observed_orcids":["https://orcid.org/0000-0002-1149-4312"]},"institutions":[{"id":"https://openalex.org/I4210153656","display_name":"Holst Centre (Netherlands)","ror":"https://ror.org/04abpa862","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210153656"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Paul Poodt","raw_affiliation_strings":["Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I4210153656"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5091660545","display_name":"Gerwin H. Gelinck","orcid":"https://orcid.org/0000-0003-3150-0211","observed_orcids":["https://orcid.org/0000-0003-3150-0211"]},"institutions":[{"id":"https://openalex.org/I148297040","display_name":"Netherlands Organisation for Applied Scientific Research","ror":"https://ror.org/01bnjb948","country_code":"NL","type":"nonprofit","lineage":["https://openalex.org/I148297040"]},{"id":"https://openalex.org/I4210153656","display_name":"Holst Centre (Netherlands)","ror":"https://ror.org/04abpa862","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210153656"]},{"id":"https://openalex.org/I83019370","display_name":"Eindhoven University of Technology","ror":"https://ror.org/02c2kyt77","country_code":"NL","type":"education","lineage":["https://openalex.org/I83019370"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"Gerwin Gelinck","raw_affiliation_strings":["Department of Applied Physics, Eindhoven University of Technology , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands and , 5600 MB Eindhoven, The Netherlands","Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands and , 5600 MB Eindhoven, The Netherlands","Holst Centre/TNO, High Tech Campus 31, 5600 AE Eindhoven, The Netherlands and Department of Applied Physics, Eindhoven University of Technology, 5600 MB Eindhoven, The Netherlands"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Applied Physics, Eindhoven University of Technology , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands and , 5600 MB Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I83019370"]},{"raw_affiliation_string":"Holst Centre/TNO , High Tech Campus 31, 5600 AE Eindhoven, The Netherlands and , 5600 MB Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I4210153656"]},{"raw_affiliation_string":"Holst Centre/TNO, High Tech Campus 31, 5600 AE Eindhoven, The Netherlands and Department of Applied Physics, Eindhoven University of Technology, 5600 MB Eindhoven, The Netherlands","institution_ids":["https://openalex.org/I148297040","https://openalex.org/I4210153656","https://openalex.org/I83019370"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":1.3374,"has_fulltext":false,"cited_by_count":39,"citation_normalized_percentile":{"value":0.79181094,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":93,"max":98},"biblio":{"volume":"36","issue":"4","first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.9945999979972839,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.9945999979972839,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.002300000051036477,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10090","display_name":"ZnO doping and properties","score":0.0010000000474974513,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/indium-zinc-oxide","display_name":"indium zinc oxide","score":0.9789999723434448},{"id":"https://openalex.org/keywords/spatial-atomic-layer-deposition","display_name":"spatial atomic layer deposition","score":0.9459999799728394},{"id":"https://openalex.org/keywords/atmospheric-pressure-deposition","display_name":"atmospheric pressure deposition","score":0.8259999752044678},{"id":"https://openalex.org/keywords/thin-film-transistors","display_name":"thin-film transistors","score":0.8999999761581421},{"id":"https://openalex.org/keywords/field-effect-mobility","display_name":"field-effect mobility","score":0.8709999918937683},{"id":"https://openalex.org/keywords/diethylzinc","display_name":"diethylzinc","score":0.9330000281333923},{"id":"https://openalex.org/keywords/trimethylindium","display_name":"trimethylindium","score":0.9879999756813049},{"id":"https://openalex.org/keywords/ring-oscillator","display_name":"ring oscillator","score":0.9290000200271606},{"id":"https://openalex.org/keywords/display-electronics","display_name":"display electronics","score":0.36000001430511475}],"concepts":[{"id":"https://openalex.org/C2775895354","wikidata":"https://www.wikidata.org/wiki/Q4463086","display_name":"Trimethylindium","level":5,"score":0.7914907336235046},{"id":"https://openalex.org/C69544855","wikidata":"https://www.wikidata.org/wiki/Q757625","display_name":"Atomic layer deposition","level":3,"score":0.7741172909736633},{"id":"https://openalex.org/C87359718","wikidata":"https://www.wikidata.org/wiki/Q1271916","display_name":"Thin-film transistor","level":3,"score":0.7423305511474609},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.706708550453186},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.667766809463501},{"id":"https://openalex.org/C543292547","wikidata":"https://www.wikidata.org/wiki/Q1094","display_name":"Indium","level":2,"score":0.5501752495765686},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.5287472605705261},{"id":"https://openalex.org/C172385210","wikidata":"https://www.wikidata.org/wiki/Q5339","display_name":"Transistor","level":3,"score":0.5052712559700012},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.4982340335845947},{"id":"https://openalex.org/C57410435","wikidata":"https://www.wikidata.org/wiki/Q505668","display_name":"Chemical vapor deposition","level":2,"score":0.4458167552947998},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.42832285165786743},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.423493891954422},{"id":"https://openalex.org/C535196362","wikidata":"https://www.wikidata.org/wiki/Q758","display_name":"Zinc","level":2,"score":0.419961541891098},{"id":"https://openalex.org/C2781194912","wikidata":"https://www.wikidata.org/wiki/Q420423","display_name":"Diethylzinc","level":4,"score":0.4178636074066162},{"id":"https://openalex.org/C106782819","wikidata":"https://www.wikidata.org/wiki/Q6501076","display_name":"Electron mobility","level":2,"score":0.4146757125854492},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.347485214471817},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.1683143973350525},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.12561145424842834},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.1109004020690918},{"id":"https://openalex.org/C175665537","wikidata":"https://www.wikidata.org/wiki/Q1924991","display_name":"Metalorganic vapour phase epitaxy","level":4,"score":0.10839593410491943},{"id":"https://openalex.org/C110738630","wikidata":"https://www.wikidata.org/wiki/Q1135540","display_name":"Epitaxy","level":3,"score":0.1066354513168335},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.0982653796672821},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C161790260","wikidata":"https://www.wikidata.org/wiki/Q82264","display_name":"Catalysis","level":2,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C55493867","wikidata":"https://www.wikidata.org/wiki/Q7094","display_name":"Biochemistry","level":1,"score":0.0},{"id":"https://openalex.org/C146686406","wikidata":"https://www.wikidata.org/wiki/Q898628","display_name":"Enantioselective synthesis","level":3,"score":0.0}],"mesh":[],"locations_count":13,"locations":[{"id":"doi:10.1116/1.5008464","doi":"https://doi.org/10.1116/1.5008464","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.5008464","pdf_url":null,"source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"},{"id":"pmh:oai:pure.tue.nl:openaire/b126e38b-80fb-4b03-b897-3af7441fdb90","doi":null,"is_oa":true,"landing_page_url":"https://research.tue.nl/en/publications/b126e38b-80fb-4b03-b897-3af7441fdb90","pdf_url":null,"source":{"id":"https://openalex.org/S4406922641","display_name":"TU/e Research Portal","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":"other-oa","license_id":"https://openalex.org/licenses/other-oa","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Illiberi, A, Katsouras, I, Gazibegovic, S, Cobb, B, Nekovic, E, van Boekel, W, Frijters, C H, Maas, J W J, Roozeboom, F, Creyghton, Y L M, Poodt, P & Gelinck, G H 2018, 'Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors', Journal of Vacuum Science and Technology A, vol. 36, no. 4, 04F401. https://doi.org/10.1116/1.5008464","raw_type":"info:eu-repo/semantics/article"},{"id":"pmh:873055","doi":null,"is_oa":false,"landing_page_url":"http://library.tue.nl/csp/dare/LinkToRepository.csp?recordnumber=873055","pdf_url":null,"source":{"id":"https://openalex.org/S4406922641","display_name":"TU/e Research Portal","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"ISSN:0734-2101","raw_type":"Article / Letter to the editor"},{"id":"pmh:876476","doi":null,"is_oa":false,"landing_page_url":"http://library.tue.nl/csp/dare/LinkToRepository.csp?recordnumber=876476","pdf_url":null,"source":{"id":"https://openalex.org/S4406922641","display_name":"TU/e Research Portal","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"ISSN:0734-2101","raw_type":"Article / Letter to the editor"},{"id":"pmh:oai:library.tue.nl:873055","doi":null,"is_oa":false,"landing_page_url":"http://repository.tue.nl/873055","pdf_url":null,"source":{"id":"https://openalex.org/S4406922641","display_name":"TU/e Research Portal","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"ISSN:0734-2101","raw_type":"Article / Letter to the editor"},{"id":"pmh:oai:library.tue.nl:876476","doi":null,"is_oa":false,"landing_page_url":"http://repository.tue.nl/876476","pdf_url":null,"source":{"id":"https://openalex.org/S4406922641","display_name":"TU/e Research Portal","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"ISSN:0734-2101","raw_type":"Article / Letter to the editor"},{"id":"pmh:oai:oai-pmh.tno.nl:48185","doi":null,"is_oa":false,"landing_page_url":"https://resolver.tno.nl/uuid:91dc1e3b-763b-459e-bcf3-b3620b8ff06d","pdf_url":null,"source":{"id":"https://openalex.org/S7407055233","display_name":"TNO Repository","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 36(4)","raw_type":"info:eu-repo/semantics/article"},{"id":"pmh:oai:tudelft.nl:uuid:91dc1e3b-763b-459e-bcf3-b3620b8ff06d","doi":null,"is_oa":false,"landing_page_url":"http://resolver.tudelft.nl/uuid:91dc1e3b-763b-459e-bcf3-b3620b8ff06d","pdf_url":null,"source":{"id":"https://openalex.org/S4306402238","display_name":"Repository hosted by TU Delft Library (TU Delft)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I98358874","host_organization_name":"Delft University of Technology","host_organization_lineage":["https://openalex.org/I98358874"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 4, 36","raw_type":"article"},{"id":"pmh:tno:oai:tudelft.nl:uuid:91dc1e3b-763b-459e-bcf3-b3620b8ff06d","doi":null,"is_oa":false,"landing_page_url":"http://resolver.tudelft.nl/uuid:91dc1e3b-763b-459e-bcf3-b3620b8ff06d","pdf_url":null,"source":{"id":"https://openalex.org/S4306401843","display_name":"Data Archiving and Networked Services (DANS)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I1322597698","host_organization_name":"Royal Netherlands Academy of Arts and Sciences","host_organization_lineage":["https://openalex.org/I1322597698"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"","raw_type":"info:eu-repo/semantics/article"},{"id":"pmh:tue:oai:library.tue.nl:873055","doi":null,"is_oa":false,"landing_page_url":"http://repository.tue.nl/873055","pdf_url":null,"source":{"id":"https://openalex.org/S4406922641","display_name":"TU/e Research Portal","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Journal of Vacuum Science and Technology. A: Vacuum, Surfaces, and Films Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 36(4)","raw_type":"info:eu-repo/semantics/article"},{"id":"pmh:tue:oai:library.tue.nl:876476","doi":null,"is_oa":false,"landing_page_url":"http://repository.tue.nl/876476","pdf_url":null,"source":{"id":"https://openalex.org/S4406922641","display_name":"TU/e Research Portal","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Journal of Vacuum Science and Technology. A: Vacuum, Surfaces, and Films Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 36(4)","raw_type":"info:eu-repo/semantics/article"},{"id":"pmh:tue:oai:pure.tue.nl:publications/b126e38b-80fb-4b03-b897-3af7441fdb90","doi":null,"is_oa":true,"landing_page_url":"https://research.tue.nl/nl/publications/b126e38b-80fb-4b03-b897-3af7441fdb90","pdf_url":null,"source":{"id":"https://openalex.org/S4406922641","display_name":"TU/e Research Portal","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":"other-oa","license_id":"https://openalex.org/licenses/other-oa","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, 36(4):04F401. AVS Science and Technology Society","raw_type":"info:eu-repo/semantics/article"},{"id":"mag:3106744259","doi":null,"is_oa":false,"landing_page_url":"https://jglobal.jst.go.jp/detail?JGLOBAL_ID=201802248099220640","pdf_url":null,"source":{"id":"https://openalex.org/S52593085","display_name":"Journal of Vacuum Science and Technology","issn_l":"0022-5355","issn":["0022-5355","2331-1754"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":"Journal of Vacuum Science and Technology","raw_type":null}],"best_oa_location":{"id":"pmh:oai:pure.tue.nl:openaire/b126e38b-80fb-4b03-b897-3af7441fdb90","doi":null,"is_oa":true,"landing_page_url":"https://research.tue.nl/en/publications/b126e38b-80fb-4b03-b897-3af7441fdb90","pdf_url":null,"source":{"id":"https://openalex.org/S4406922641","display_name":"TU/e Research Portal","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":"other-oa","license_id":"https://openalex.org/licenses/other-oa","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Illiberi, A, Katsouras, I, Gazibegovic, S, Cobb, B, Nekovic, E, van Boekel, W, Frijters, C H, Maas, J W J, Roozeboom, F, Creyghton, Y L M, Poodt, P & Gelinck, G H 2018, 'Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors', Journal of Vacuum Science and Technology A, vol. 36, no. 4, 04F401. https://doi.org/10.1116/1.5008464","raw_type":"info:eu-repo/semantics/article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":38,"referenced_works":["https://openalex.org/W14772009","https://openalex.org/W645011244","https://openalex.org/W1938947502","https://openalex.org/W1965378127","https://openalex.org/W1982968328","https://openalex.org/W1984543679","https://openalex.org/W1994277498","https://openalex.org/W1998534931","https://openalex.org/W1999589524","https://openalex.org/W2008362094","https://openalex.org/W2008731073","https://openalex.org/W2016644788","https://openalex.org/W2039498840","https://openalex.org/W2042985887","https://openalex.org/W2045015326","https://openalex.org/W2061114932","https://openalex.org/W2077450297","https://openalex.org/W2077780244","https://openalex.org/W2079096155","https://openalex.org/W2087303001","https://openalex.org/W2090036810","https://openalex.org/W2095003661","https://openalex.org/W2104920043","https://openalex.org/W2115119476","https://openalex.org/W2122848454","https://openalex.org/W2123519452","https://openalex.org/W2125248798","https://openalex.org/W2130396351","https://openalex.org/W2147732359","https://openalex.org/W2161464362","https://openalex.org/W2321631602","https://openalex.org/W2323561876","https://openalex.org/W2323914905","https://openalex.org/W2329168199","https://openalex.org/W2336040706","https://openalex.org/W2465650157","https://openalex.org/W2550692454","https://openalex.org/W2581469233"],"related_works":["https://openalex.org/W7064207550","https://openalex.org/W2907348787","https://openalex.org/W2928778839","https://openalex.org/W4408985714","https://openalex.org/W2122848454","https://openalex.org/W2947515279","https://openalex.org/W4402739139","https://openalex.org/W4398975049","https://openalex.org/W2550692454","https://openalex.org/W4313477334"],"abstract_inverted_index":{"In":[0,77],"this":[1],"manuscript,":[2],"the":[3,6,43,50,56,63,99,115,123],"authors":[4,93],"investigate":[5],"growth":[7],"of":[8,45,55,81,101,118,126],"indium":[9,12,70],"zinc":[10,13,67],"oxide,":[11],"oxide":[14,68],"(InZnO,":[15],"IZO)":[16],"as":[17],"a":[18,31],"channel":[19],"material":[20],"for":[21,128],"thin-film":[22],"transistors.":[23],"IZO":[24],"is":[25],"grown":[26],"at":[27,106],"atmospheric":[28],"pressure":[29],"and":[30,47],"high":[32,84],"deposition":[33,39],"rate":[34],"using":[35],"spatial":[36],"atomic":[37,119],"layer":[38,120],"(S-ALD).":[40],"By":[41],"varying":[42],"ratio":[44,54,80],"diethylzinc":[46],"trimethylindium":[48],"vapor,":[49],"In/(In":[51],"+":[52],"Zn)":[53],"film":[57,73],"can":[58],"be":[59],"accurately":[60],"tuned":[61],"in":[62,98,112],"entire":[64],"range":[65],"from":[66],"to":[69,78],"oxide.":[71],"Thin":[72],"transistors":[74],"with":[75,114],"an":[76],"Zn":[79],"2:1":[82],"show":[83],"field-effect":[85],"mobility\u2014exceeding":[86],"30":[87],"cm2/V":[88],"s\u2014and":[89],"excellent":[90],"stability.":[91],"The":[92],"demonstrate":[94,122],"large":[95],"scale":[96],"integration":[97],"form":[100],"19-stage":[102],"ring":[103],"oscillators":[104],"operating":[105],"110":[107],"kHz.":[108],"These":[109],"electrical":[110],"characteristics,":[111],"combination":[113],"intrinsic":[116],"advantages":[117],"deposition,":[121],"great":[124],"potential":[125],"S-ALD":[127],"future":[129],"display":[130],"production.":[131]},"counts_by_year":[{"year":2026,"cited_by_count":3},{"year":2025,"cited_by_count":4},{"year":2024,"cited_by_count":7},{"year":2023,"cited_by_count":6},{"year":2022,"cited_by_count":5},{"year":2021,"cited_by_count":4},{"year":2020,"cited_by_count":3},{"year":2019,"cited_by_count":5},{"year":2018,"cited_by_count":2}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2018-02-23T00:00:00"}