{"id":"https://openalex.org/W2741410773","doi":null,"title":"Fabrication of adaptive mirrors for extreme ultraviolet lithography","display_name":"Fabrication of adaptive mirrors for extreme ultraviolet lithography","publication_year":2012,"publication_date":"2012-09-30","ids":{"openalex":"https://openalex.org/W2741410773","mag":"2741410773"},"language":"en","primary_location":{"id":"pmh:oai:ris.utwente.nl:openaire_cris_publications/5eafe5bc-3f64-42b7-a53c-29dd62e8dfca","doi":null,"is_oa":false,"landing_page_url":"https://research.utwente.nl/en/publications/5eafe5bc-3f64-42b7-a53c-29dd62e8dfca","pdf_url":null,"source":{"id":"https://openalex.org/S4406922991","display_name":"University of Twente Research Information","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Bayraktar, M, Chopra, A, Wessels, W A, Lee, C J, van Goor, F A, Koster, G, Rijnders, A J H M & Bijkerk, F 2012, 'Fabrication of adaptive mirrors for extreme ultraviolet lithography', 2012 International Symposium on Extreme Ultraviolet Lithography, Brussels, Belgium, 30/09/12 - 4/10/12 pp. -.","raw_type":"info:eu-repo/semantics/conferenceObject"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":[],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5004179651","display_name":"Muharrem Bayraktar","orcid":"https://orcid.org/0000-0002-8339-2091","observed_orcids":["https://orcid.org/0000-0002-8339-2091"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Bayraktar, Muharrem; id_orcid 0000-0002-8339-2091","raw_affiliation_strings":["Laser Physics & Nonlinear Optics"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laser Physics & Nonlinear Optics","institution_ids":[]}]},{"author_position":"middle","author":{"id":null,"display_name":"Chopra, A.","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Chopra, A.","raw_affiliation_strings":["Inorganic Materials Science"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Inorganic Materials Science","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5017062813","display_name":"W.A. Wessels","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Wessels, W.A.","raw_affiliation_strings":["Inorganic Materials Science"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Inorganic Materials Science","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5039950841","display_name":"Chris Lee","orcid":"https://orcid.org/0000-0001-7020-2036","observed_orcids":["https://orcid.org/0000-0001-7020-2036"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Lee, Christopher James","raw_affiliation_strings":["Laser Physics & Nonlinear Optics"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laser Physics & Nonlinear Optics","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113676068","display_name":"F.A. van Goor","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"van Goor, F.A.","raw_affiliation_strings":["Laser Physics & Nonlinear Optics"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laser Physics & Nonlinear Optics","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5060923565","display_name":"Gertjan Koster","orcid":"https://orcid.org/0000-0001-5478-7329","observed_orcids":["https://orcid.org/0000-0001-5478-7329","https://orcid.org/0000-0002-8927-3077","https://orcid.org/0000-0002-5406-2202"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Koster, Gertjan; id_orcid 0000-0001-5478-7329","raw_affiliation_strings":["Inorganic Materials Science"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Inorganic Materials Science","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5021167068","display_name":"Augustinus J.H.M. Rijnders","orcid":"https://orcid.org/0000-0002-4638-0630","observed_orcids":["https://orcid.org/0000-0002-4638-0630"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Rijnders, Augustinus J.H.M.","raw_affiliation_strings":["Inorganic Materials Science"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Inorganic Materials Science","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5110509010","display_name":"Frederik Bijkerk","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Bijkerk, Frederik","raw_affiliation_strings":["Laser Physics & Nonlinear Optics"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laser Physics & Nonlinear Optics","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.34489789,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9688000082969666,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9688000082969666,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","score":0.008500000461935997,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.00559999980032444,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/euv-lithography","display_name":"EUV lithography","score":0.9160000085830688},{"id":"https://openalex.org/keywords/adaptive-mirrors","display_name":"adaptive mirrors","score":0.8140000104904175},{"id":"https://openalex.org/keywords/multilayer-mirrors","display_name":"multilayer mirrors","score":0.8100000023841858},{"id":"https://openalex.org/keywords/mo-si-multilayers","display_name":"Mo/Si multilayers","score":0.824999988079071},{"id":"https://openalex.org/keywords/wavefront-correction","display_name":"wavefront correction","score":0.8930000066757202},{"id":"https://openalex.org/keywords/heat-load","display_name":"heat load","score":0.6790000200271606},{"id":"https://openalex.org/keywords/surface-roughness","display_name":"surface roughness","score":0.8830000162124634},{"id":"https://openalex.org/keywords/thin-film-deposition","display_name":"thin film deposition","score":0.9909999966621399},{"id":"https://openalex.org/keywords/surface-figure-error","display_name":"surface figure error","score":0.5989999771118164},{"id":"https://openalex.org/keywords/reflectivity","display_name":"reflectivity","score":0.6520000100135803}],"concepts":[{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.9226045608520508},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.7796227931976318},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.7107048034667969},{"id":"https://openalex.org/C165699331","wikidata":"https://www.wikidata.org/wiki/Q461533","display_name":"Wavefront","level":2,"score":0.6730512976646423},{"id":"https://openalex.org/C146024833","wikidata":"https://www.wikidata.org/wiki/Q1385457","display_name":"Extreme ultraviolet","level":3,"score":0.5939701795578003},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5890675783157349},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.5572251677513123},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.5555063486099243},{"id":"https://openalex.org/C132771110","wikidata":"https://www.wikidata.org/wiki/Q506922","display_name":"Adaptive optics","level":2,"score":0.5426530838012695},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5235535502433777},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.49175313115119934},{"id":"https://openalex.org/C99407587","wikidata":"https://www.wikidata.org/wiki/Q2845270","display_name":"Wavefront sensor","level":3,"score":0.4675416350364685},{"id":"https://openalex.org/C71597924","wikidata":"https://www.wikidata.org/wiki/Q2890543","display_name":"Optical coating","level":3,"score":0.44017571210861206},{"id":"https://openalex.org/C41794268","wikidata":"https://www.wikidata.org/wiki/Q1408939","display_name":"X-ray lithography","level":4,"score":0.4307664632797241},{"id":"https://openalex.org/C136872047","wikidata":"https://www.wikidata.org/wiki/Q5251695","display_name":"Deformable mirror","level":3,"score":0.4253408908843994},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.2488800585269928},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.2317267656326294},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.1554250419139862},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.08217066526412964},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.06747573614120483},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"pmh:oai:ris.utwente.nl:openaire_cris_publications/5eafe5bc-3f64-42b7-a53c-29dd62e8dfca","doi":null,"is_oa":false,"landing_page_url":"https://research.utwente.nl/en/publications/5eafe5bc-3f64-42b7-a53c-29dd62e8dfca","pdf_url":null,"source":{"id":"https://openalex.org/S4406922991","display_name":"University of Twente Research Information","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Bayraktar, M, Chopra, A, Wessels, W A, Lee, C J, van Goor, F A, Koster, G, Rijnders, A J H M & Bijkerk, F 2012, 'Fabrication of adaptive mirrors for extreme ultraviolet lithography', 2012 International Symposium on Extreme Ultraviolet Lithography, Brussels, Belgium, 30/09/12 - 4/10/12 pp. -.","raw_type":"info:eu-repo/semantics/conferenceObject"},{"id":"pmh:ut:oai:ris.utwente.nl:publications/5eafe5bc-3f64-42b7-a53c-29dd62e8dfca","doi":null,"is_oa":false,"landing_page_url":"https://research.utwente.nl/en/publications/fabrication-of-adaptive-mirrors-for-extreme-ultraviolet-lithography(5eafe5bc-3f64-42b7-a53c-29dd62e8dfca).html","pdf_url":null,"source":{"id":"https://openalex.org/S4406922991","display_name":"University of Twente Research Information","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"TITLE=2012 International Symposium on Extreme Ultraviolet Lithography","raw_type":"info:eu-repo/semantics/conferencepaper"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2159876433","https://openalex.org/W2520822311","https://openalex.org/W2555866224","https://openalex.org/W2120560731","https://openalex.org/W2155502647","https://openalex.org/W2075148302","https://openalex.org/W114962245","https://openalex.org/W2042564440","https://openalex.org/W2013184992","https://openalex.org/W2088009928"],"abstract_inverted_index":{"Extreme":[0],"ultraviolet":[1],"lithography":[2,10,71],"(EUVL)":[3],"will":[4],"push":[5],"the":[6,19,22,27,41,45,54,66,70,93,96,125,132,137,147,168,180,184,191,198],"resolution":[7,68,94],"limit":[8],"of":[9,30,40,65,69,95,152,179,190],"systems":[11],"to":[12,86,98,130,141,197],"22":[13],"nm":[14],"and":[15,44,79,91,140,156,187],"below":[16],"assisted":[17],"by":[18,117],"advances":[20],"in":[21,62,124,136,150,183],"multilayer":[23,36,126,138],"mirror":[24],"technology.":[25],"At":[26],"EUVL":[28,97,148],"wavelength":[29],"13.5":[31],"nm,":[32],"commonly":[33],"used":[34],"Mo/Si":[35],"mirrors":[37,144],"reflect":[38],"70%":[39],"incoming":[42],"radiation":[43],"absorbed":[46],"30%":[47],"may":[48,57,80],"create":[49],"significant":[50],"heat":[51],"load":[52],"on":[53],"mirror,":[55,139],"which":[56],"introduce":[58],"wavefront":[59,74,89,115],"distortions,":[60,90],"resulting":[61],"a":[63,102],"decrease":[64],"overall":[67],"system.":[72],"The":[73,110],"distortions":[75],"are":[76],"usually":[77],"non-uniform":[78],"change":[81],"with":[82,146],"time.":[83],"In":[84,128],"order":[85,129],"correct":[87],"these":[88,143],"extend":[92],"even":[99],"smaller":[100],"dimensions,":[101],"novel":[103],"adaptive":[104,111],"optics":[105,112],"approach":[106,113],"has":[107],"been":[108,165],"developed.":[109],"enables":[114],"correction":[116],"integrating":[118],"dynamically":[119],"controllable":[120],"piezo-electric":[121,133,193],"thin":[122,134,160,172,194],"films":[123,135,195],"mirror.":[127],"integrate":[131],"make":[142],"compatible":[145],"requirements":[149],"terms":[151],"reflectance,":[153],"surface":[154,181],"roughness":[155,182],"figure":[157],"error,":[158],"several":[159],"film":[161,173],"deposition":[162,185],"techniques":[163],"have":[164],"explored":[166],"including":[167],"interaction":[169],"at":[170],"each":[171],"interface.":[174],"Here,":[175],"we":[176],"present":[177],"evolution":[178],"process":[186],"successful":[188],"fabrication":[189],"first":[192],"integrated":[196],"mirrors.":[199]},"counts_by_year":[],"updated_date":"2026-11-01T11:40:01.658920","created_date":"2017-08-08T00:00:00"}