{"id":"https://openalex.org/W2690904647","doi":"https://doi.org/10.2978/jsas.26.23","title":"Film deposition and annealing treatment of sputtered bismuth telluride based thin films","display_name":"Film deposition and annealing treatment of sputtered bismuth telluride based thin films","publication_year":2014,"publication_date":"2014-01-01","ids":{"openalex":"https://openalex.org/W2690904647","doi":"https://doi.org/10.2978/jsas.26.23","mag":"2690904647"},"language":"en","primary_location":{"id":"doi:10.2978/jsas.26.23","doi":"https://doi.org/10.2978/jsas.26.23","is_oa":true,"landing_page_url":"https://doi.org/10.2978/jsas.26.23","pdf_url":"https://www.jstage.jst.go.jp/article/jsas/26/3%2B4/26_150309700/_pdf","source":{"id":"https://openalex.org/S84158422","display_name":"Journal of Advanced Science","issn_l":"0915-5651","issn":["0915-5651","1881-3917","1884-0426"],"is_oa":true,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4363603741","host_organization_name":"Society of Advanced Science","host_organization_lineage":["https://openalex.org/P4363603741"],"host_organization_lineage_names":["Society of Advanced Science"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Advanced Science","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"diamond","oa_url":"https://www.jstage.jst.go.jp/article/jsas/26/3%2B4/26_150309700/_pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5026553349","display_name":"Yusuke Sasaki","orcid":"https://orcid.org/0000-0002-0286-0325","observed_orcids":["https://orcid.org/0000-0002-0286-0325"]},"institutions":[{"id":"https://openalex.org/I1314466530","display_name":"Tokai University","ror":"https://ror.org/01p7qe739","country_code":"JP","type":"education","lineage":["https://openalex.org/I1314466530"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yusuke SASAKI","raw_affiliation_strings":["Department of Materials Science, School of Engineering, Tokai University"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science, School of Engineering, Tokai University","institution_ids":["https://openalex.org/I1314466530"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5073079965","display_name":"Ken Takayama","orcid":"https://orcid.org/0000-0002-9159-7580","observed_orcids":["https://orcid.org/0000-0002-9159-7580"]},"institutions":[{"id":"https://openalex.org/I1314466530","display_name":"Tokai University","ror":"https://ror.org/01p7qe739","country_code":"JP","type":"education","lineage":["https://openalex.org/I1314466530"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Ken TAKAYAMA","raw_affiliation_strings":["Department of Materials Science, School of Engineering, Tokai University"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science, School of Engineering, Tokai University","institution_ids":["https://openalex.org/I1314466530"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5043751841","display_name":"Masayuki Takashiri","orcid":"https://orcid.org/0000-0001-7041-6595","observed_orcids":["https://orcid.org/0000-0001-7041-6595"]},"institutions":[{"id":"https://openalex.org/I1314466530","display_name":"Tokai University","ror":"https://ror.org/01p7qe739","country_code":"JP","type":"education","lineage":["https://openalex.org/I1314466530"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Masayuki TAKASHIRI","raw_affiliation_strings":["Department of Materials Science, School of Engineering, Tokai University"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science, School of Engineering, Tokai University","institution_ids":["https://openalex.org/I1314466530"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I1314466530"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":true,"cited_by_count":2,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"26","issue":"3+4","first_page":"23","last_page":"27"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10440","display_name":"Advanced Thermoelectric Materials and Devices","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10440","display_name":"Advanced Thermoelectric Materials and Devices","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10590","display_name":"Chalcogenide Semiconductor Thin Films","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13251","display_name":"Electrical and Thermal Properties of Materials","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/thermoelectric-generators","display_name":"thermoelectric generators","score":0.7820000052452087},{"id":"https://openalex.org/keywords/rf-magnetron-sputtering","display_name":"RF magnetron sputtering","score":0.8970000147819519},{"id":"https://openalex.org/keywords/annealing","display_name":"annealing","score":0.9559999704360962},{"id":"https://openalex.org/keywords/annealing-temperature","display_name":"annealing temperature","score":0.875},{"id":"https://openalex.org/keywords/seebeck-coefficient","display_name":"Seebeck coefficient","score":0.9340000152587891},{"id":"https://openalex.org/keywords/power-factor","display_name":"power factor","score":0.9190000295639038},{"id":"https://openalex.org/keywords/electrical-conductivity","display_name":"electrical conductivity","score":0.9750000238418579},{"id":"https://openalex.org/keywords/defect-density","display_name":"defect density","score":0.6880000233650208},{"id":"https://openalex.org/keywords/surface-morphology","display_name":"surface morphology","score":0.8429999947547913}],"concepts":[{"id":"https://openalex.org/C2777038907","wikidata":"https://www.wikidata.org/wiki/Q415256","display_name":"Bismuth telluride","level":4,"score":0.862419605255127},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.8081739544868469},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7683548927307129},{"id":"https://openalex.org/C112625512","wikidata":"https://www.wikidata.org/wiki/Q1091448","display_name":"Seebeck coefficient","level":3,"score":0.7289592027664185},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.6906291842460632},{"id":"https://openalex.org/C63024428","wikidata":"https://www.wikidata.org/wiki/Q552456","display_name":"Thermoelectric effect","level":2,"score":0.5629713535308838},{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.4977612793445587},{"id":"https://openalex.org/C26771246","wikidata":"https://www.wikidata.org/wiki/Q321095","display_name":"Scanning electron microscope","level":2,"score":0.49019914865493774},{"id":"https://openalex.org/C538181303","wikidata":"https://www.wikidata.org/wiki/Q1100","display_name":"Tellurium","level":2,"score":0.4725646376609802},{"id":"https://openalex.org/C533668322","wikidata":"https://www.wikidata.org/wiki/Q942","display_name":"Bismuth","level":2,"score":0.4177982211112976},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.37598925828933716},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.36626362800598145},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.349903404712677},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.26046425104141235},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.223503977060318},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.21272307634353638},{"id":"https://openalex.org/C97346530","wikidata":"https://www.wikidata.org/wiki/Q487005","display_name":"Thermal conductivity","level":2,"score":0.15154394507408142},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.11179783940315247},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.2978/jsas.26.23","doi":"https://doi.org/10.2978/jsas.26.23","is_oa":true,"landing_page_url":"https://doi.org/10.2978/jsas.26.23","pdf_url":"https://www.jstage.jst.go.jp/article/jsas/26/3%2B4/26_150309700/_pdf","source":{"id":"https://openalex.org/S84158422","display_name":"Journal of Advanced Science","issn_l":"0915-5651","issn":["0915-5651","1881-3917","1884-0426"],"is_oa":true,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4363603741","host_organization_name":"Society of Advanced Science","host_organization_lineage":["https://openalex.org/P4363603741"],"host_organization_lineage_names":["Society of Advanced Science"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Advanced Science","raw_type":"journal-article"}],"best_oa_location":{"id":"doi:10.2978/jsas.26.23","doi":"https://doi.org/10.2978/jsas.26.23","is_oa":true,"landing_page_url":"https://doi.org/10.2978/jsas.26.23","pdf_url":"https://www.jstage.jst.go.jp/article/jsas/26/3%2B4/26_150309700/_pdf","source":{"id":"https://openalex.org/S84158422","display_name":"Journal of Advanced Science","issn_l":"0915-5651","issn":["0915-5651","1881-3917","1884-0426"],"is_oa":true,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4363603741","host_organization_name":"Society of Advanced Science","host_organization_lineage":["https://openalex.org/P4363603741"],"host_organization_lineage_names":["Society of Advanced Science"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Advanced Science","raw_type":"journal-article"},"sustainable_development_goals":[{"display_name":"Affordable and clean energy","score":0.75,"id":"https://metadata.un.org/sdg/7"}],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":true,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W2690904647.pdf","grobid_xml":"https://content.openalex.org/works/W2690904647.grobid-xml"},"referenced_works_count":7,"referenced_works":["https://openalex.org/W389868541","https://openalex.org/W1986576442","https://openalex.org/W1998136353","https://openalex.org/W2051901868","https://openalex.org/W2099258625","https://openalex.org/W2148596493","https://openalex.org/W4252319468"],"related_works":["https://openalex.org/W2022856310","https://openalex.org/W2662452375","https://openalex.org/W1976911483","https://openalex.org/W166974715","https://openalex.org/W3016711835","https://openalex.org/W2206374849","https://openalex.org/W2018736224","https://openalex.org/W2082404621","https://openalex.org/W1983304888","https://openalex.org/W2012060687"],"abstract_inverted_index":{"In":[0],"an":[1],"effort":[2],"to":[3,116,129],"fabricate":[4],"thin":[5,18,49,94,126],"film":[6],"thermoelectric":[7,141],"generators,":[8],"we":[9,136],"prepared":[10],"p-type":[11],"antimony":[12,149],"telluride":[13,17],"and":[14,41,60,75,128,155],"n-type":[15],"bismuth":[16,156],"films":[19,95],"by":[20,56],"using":[21],"a":[22,28,84],"RF":[23],"magnetron":[24],"sputtering,":[25],"after":[26],"which":[27,68],"thermal":[29],"annealing":[30,39,101,145],"was":[31],"implemented.":[32],"We":[33],"investigated":[34],"the":[35,38,42,48,70,86,93,100,107,118,125,139,144],"relationship":[36],"between":[37],"temperatures":[40],"properties":[43,53,142],"of":[44,47,89,92,106,109,121,124,147],"both":[45,90,122],"types":[46,91,123],"films.":[50],"The":[51,64],"structural":[52],"were":[54,69,78],"analyzed":[55],"x-ray":[57],"diffraction":[58],"patterns":[59],"scanning":[61],"electron":[62],"microscope.":[63],"in-plane":[65],"electrical":[66,71,133],"properties,":[67],"conductivity,":[72],"Seebeck":[73],"coefficient":[74],"power":[76],"factor,":[77],"estimated":[79],"at":[80,143],"room":[81],"temperature.":[82],"As":[83],"result,":[85],"surface":[87],"morphology":[88],"exhibited":[96],"nano-sized":[97],"pores":[98],"as":[99],"temperature":[102,146],"increased":[103],"possibly":[104],"because":[105],"evaporation":[108,113],"tellurium":[110],"atoms.":[111],"This":[112],"also":[114],"induced":[115],"increase":[117],"defect":[119],"density":[120],"films,":[127],"be":[130],"degraded":[131],"their":[132],"properties.":[134],"Therefore,":[135],"resulted":[137],"in":[138],"higher":[140],"300\u00b0C;":[148],"telluride:":[150,157],"\u03c3S2":[151,158],"=":[152,159],"18.8":[153],"\u03bcW\u2044(cm\u2219K2)":[154],"20.9":[160],"\u03bcW\u2044(cm\u2219K2).":[161]},"counts_by_year":[{"year":2022,"cited_by_count":1},{"year":2020,"cited_by_count":1}],"updated_date":"2026-08-08T01:25:22.217667","created_date":"2017-06-30T00:00:00"}