{"id":"https://openalex.org/W263833972","doi":null,"title":"SIA\u306e\u30ed\u30fc\u30c9\u30de\u30c3\u30d7\u306b\u3088\u308b\u534a\u5c0e\u4f53\u6280\u8853\u4e88\u6e2c(3)\u30d5\u30ed\u30f3\u30c8\u30a8\u30f3\u30c9\u30d7\u30ed\u30bb\u30b9","display_name":"SIA\u306e\u30ed\u30fc\u30c9\u30de\u30c3\u30d7\u306b\u3088\u308b\u534a\u5c0e\u4f53\u6280\u8853\u4e88\u6e2c(3)\u30d5\u30ed\u30f3\u30c8\u30a8\u30f3\u30c9\u30d7\u30ed\u30bb\u30b9","publication_year":1999,"publication_date":"1999-05-01","ids":{"openalex":"https://openalex.org/W263833972","mag":"263833972"},"language":"ja","primary_location":{"id":"mag:263833972","doi":null,"is_oa":false,"landing_page_url":"http://ci.nii.ac.jp/naid/40002546714","pdf_url":null,"source":{"id":"https://openalex.org/S4306559802","display_name":"\u96fb\u5b50\u6750\u6599","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":"\u96fb\u5b50\u6750\u6599","raw_type":null},"volume":null,"type":"article","is_traditional":true,"indexed_in":[],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5033906994","display_name":"\u6587\u9ebf \u5ddd\u52dd","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u6587\u9ebf \u5ddd\u52dd","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5034589699","display_name":"\u9686\u592b \u4e95\u4e0a","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u9686\u592b \u4e95\u4e0a","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"last","author":{"id":null,"display_name":"\u5b88 \u68ee\u7530","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u5b88 \u68ee\u7530","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.02876149,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"38","issue":"5","first_page":"145","last_page":"157"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.4004000127315521,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.4004000127315521,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":0.3962000012397766,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.04089999943971634,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/semiconductor-technology-roadmap","display_name":"semiconductor technology roadmap","score":0.6729999780654907},{"id":"https://openalex.org/keywords/front-end-process","display_name":"front-end process","score":0.6729999780654907},{"id":"https://openalex.org/keywords/semiconductor-manufacturing","display_name":"semiconductor manufacturing","score":0.6240000128746033},{"id":"https://openalex.org/keywords/technological-forecasting","display_name":"technology forecasting","score":0.8050000071525574}],"concepts":[{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.32168304920196533}],"mesh":[],"locations_count":1,"locations":[{"id":"mag:263833972","doi":null,"is_oa":false,"landing_page_url":"http://ci.nii.ac.jp/naid/40002546714","pdf_url":null,"source":{"id":"https://openalex.org/S4306559802","display_name":"\u96fb\u5b50\u6750\u6599","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":"\u96fb\u5b50\u6750\u6599","raw_type":null}],"best_oa_location":null,"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/9","display_name":"Industry, innovation and infrastructure","score":0.7207000255584717}],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W351398943","https://openalex.org/W3216971837","https://openalex.org/W591774949","https://openalex.org/W3108489373","https://openalex.org/W400152314","https://openalex.org/W405919127","https://openalex.org/W3112606484","https://openalex.org/W1969714","https://openalex.org/W261532455","https://openalex.org/W2255527903"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-09-29T14:09:16.559479","created_date":"2016-06-24T00:00:00"}