{"id":"https://openalex.org/W2616466451","doi":null,"title":"Depth Profiles of P and H atom at a-Si/c-Si Interface by Plasma Ion Implantation","display_name":"Depth Profiles of P and H atom at a-Si/c-Si Interface by Plasma Ion Implantation","publication_year":2017,"publication_date":"2017-02-03","ids":{"openalex":"https://openalex.org/W2616466451","mag":"2616466451"},"language":"en","primary_location":{"id":"mag:2616466451","doi":null,"is_oa":false,"landing_page_url":"https://confit.atlas.jp/guide/event/jsap2017s/subject/17p-211-3/detail","pdf_url":null,"source":{"id":"https://openalex.org/S2764860693","display_name":"The Japan Society of Applied Physics","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310313292","host_organization_name":"Japan Society of Applied Physics","host_organization_lineage":["https://openalex.org/P4310313292"],"host_organization_lineage_names":["Japan Society of Applied Physics"],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":"The Japan Society of Applied Physics","raw_type":null},"volume":null,"type":"article","is_traditional":true,"indexed_in":[],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5004611187","display_name":"Koichi Koyama","orcid":"https://orcid.org/0000-0002-4623-1416","observed_orcids":["https://orcid.org/0000-0002-4623-1416"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Koichi Koyama","raw_affiliation_strings":[],"raw_orcid":"https://orcid.org/0000-0002-4623-1416","affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101901192","display_name":"Noboru Yamaguchi","orcid":"https://orcid.org/0009-0006-0053-5226","observed_orcids":["https://orcid.org/0009-0006-0053-5226"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Noboru Yamaguchi","raw_affiliation_strings":[],"raw_orcid":"https://orcid.org/0009-0006-0053-5226","affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5028674692","display_name":"Miwa Tanaka","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Miwa Tanaka","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5029601551","display_name":"Hideo Suzuki","orcid":"https://orcid.org/0000-0003-2941-7726","observed_orcids":["https://orcid.org/0000-0003-2941-7726"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Hideo Suzuki","raw_affiliation_strings":[],"raw_orcid":"https://orcid.org/0000-0003-2941-7726","affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5017946287","display_name":"Keisuke Ohdaira","orcid":"https://orcid.org/0000-0003-0667-4922","observed_orcids":["https://orcid.org/0000-0003-0667-4922"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Keisuke Ohdaira","raw_affiliation_strings":[],"raw_orcid":"https://orcid.org/0000-0003-0667-4922","affiliations":[]},{"author_position":"last","author":{"id":"https://openalex.org/A5110054265","display_name":"Hideki Matsumura","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Hideki Matsumura","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","score":0.413100004196167,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","score":0.413100004196167,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10624","display_name":"Silicon and Solar Cell Technologies","score":0.3149000108242035,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.18850000202655792,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/hydrogen-depth-profile","display_name":"hydrogen depth profile","score":0.546999990940094},{"id":"https://openalex.org/keywords/plasma-ion-implantation","display_name":"plasma ion implantation","score":0.9660000205039978},{"id":"https://openalex.org/keywords/hydrogen-in-silicon","display_name":"hydrogen in silicon","score":0.3889999985694885},{"id":"https://openalex.org/keywords/dopant-distribution","display_name":"dopant distribution","score":0.35899999737739563}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8453657627105713},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.6223732233047485},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.6208932399749756},{"id":"https://openalex.org/C58312451","wikidata":"https://www.wikidata.org/wiki/Q4817200","display_name":"Atom (system on chip)","level":2,"score":0.5936081409454346},{"id":"https://openalex.org/C41823505","wikidata":"https://www.wikidata.org/wiki/Q1436752","display_name":"Ion implantation","level":3,"score":0.5931451320648193},{"id":"https://openalex.org/C113843644","wikidata":"https://www.wikidata.org/wiki/Q901882","display_name":"Interface (matter)","level":4,"score":0.5143479108810425},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.44646501541137695},{"id":"https://openalex.org/C184779094","wikidata":"https://www.wikidata.org/wiki/Q26383","display_name":"Atomic physics","level":1,"score":0.44218552112579346},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.2782820761203766},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.09679904580116272},{"id":"https://openalex.org/C149635348","wikidata":"https://www.wikidata.org/wiki/Q193040","display_name":"Embedded system","level":1,"score":0.05770978331565857},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.057086944580078125},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.05306604504585266},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.04410544037818909},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C196806460","wikidata":"https://www.wikidata.org/wiki/Q188603","display_name":"Capillary action","level":2,"score":0.0},{"id":"https://openalex.org/C28413391","wikidata":"https://www.wikidata.org/wiki/Q785542","display_name":"Capillary number","level":3,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"mag:2616466451","doi":null,"is_oa":false,"landing_page_url":"https://confit.atlas.jp/guide/event/jsap2017s/subject/17p-211-3/detail","pdf_url":null,"source":{"id":"https://openalex.org/S2764860693","display_name":"The Japan Society of Applied Physics","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310313292","host_organization_name":"Japan Society of Applied Physics","host_organization_lineage":["https://openalex.org/P4310313292"],"host_organization_lineage_names":["Japan Society of Applied Physics"],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":"The Japan Society of Applied Physics","raw_type":null}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W3027339130","https://openalex.org/W2169735171","https://openalex.org/W3107766242","https://openalex.org/W2027763270","https://openalex.org/W1990471338","https://openalex.org/W1648896169","https://openalex.org/W4249440046","https://openalex.org/W2138422080","https://openalex.org/W2748660135","https://openalex.org/W7033485782"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2025-10-10T17:16:08.811792","created_date":"2017-05-26T00:00:00"}
