{"id":"https://openalex.org/W2531717549","doi":"https://doi.org/10.1007/s10854-016-5821-6","title":"Physical properties of SnO2 thin films prepared by isothermal oxidation of vacuum evaporated Sn","display_name":"Physical properties of SnO2 thin films prepared by isothermal oxidation of vacuum evaporated Sn","publication_year":2016,"publication_date":"2016-10-12","ids":{"openalex":"https://openalex.org/W2531717549","doi":"https://doi.org/10.1007/s10854-016-5821-6","mag":"2531717549"},"language":"en","primary_location":{"id":"doi:10.1007/s10854-016-5821-6","doi":"https://doi.org/10.1007/s10854-016-5821-6","is_oa":false,"landing_page_url":"https://doi.org/10.1007/s10854-016-5821-6","pdf_url":null,"source":{"id":"https://openalex.org/S189509794","display_name":"Journal of Materials Science Materials in Electronics","issn_l":"0957-4522","issn":["0957-4522","1573-482X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310319900","host_organization_name":"Springer Science+Business Media","host_organization_lineage":["https://openalex.org/P4310319900","https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Science+Business Media","Springer Nature"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Materials Science: Materials in Electronics","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5007997532","display_name":"A. Kabir","orcid":"https://orcid.org/0000-0002-9400-8681","observed_orcids":["https://orcid.org/0000-0002-9400-8681"]},"institutions":[{"id":"https://openalex.org/I98962006","display_name":"University of Skikda","ror":"https://ror.org/02571vj15","country_code":"DZ","type":"education","lineage":["https://openalex.org/I98962006"]}],"countries":["DZ"],"is_corresponding":true,"raw_author_name":"A. Kabir","raw_affiliation_strings":["Laboratoire de Recherche sur la Physico-Chimie des Surfaces et Interfaces (LRPCSI), Facult\u00e9 des Sciences, Universit\u00e9 20 ao\u00fbt 1955-Skikda, B.P. 26, Route d\u2019El-Hadaiek, 21000, Skikda, Algeria"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laboratoire de Recherche sur la Physico-Chimie des Surfaces et Interfaces (LRPCSI), Facult\u00e9 des Sciences, Universit\u00e9 20 ao\u00fbt 1955-Skikda, B.P. 26, Route d\u2019El-Hadaiek, 21000, Skikda, Algeria","institution_ids":["https://openalex.org/I98962006"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5053530859","display_name":"D. Boulainine","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I98962006","display_name":"University of Skikda","ror":"https://ror.org/02571vj15","country_code":"DZ","type":"education","lineage":["https://openalex.org/I98962006"]}],"countries":["DZ"],"is_corresponding":false,"raw_author_name":"D. Boulainine","raw_affiliation_strings":["Laboratoire de Recherche sur la Physico-Chimie des Surfaces et Interfaces (LRPCSI), Facult\u00e9 des Sciences, Universit\u00e9 20 ao\u00fbt 1955-Skikda, B.P. 26, Route d\u2019El-Hadaiek, 21000, Skikda, Algeria"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laboratoire de Recherche sur la Physico-Chimie des Surfaces et Interfaces (LRPCSI), Facult\u00e9 des Sciences, Universit\u00e9 20 ao\u00fbt 1955-Skikda, B.P. 26, Route d\u2019El-Hadaiek, 21000, Skikda, Algeria","institution_ids":["https://openalex.org/I98962006"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5057980593","display_name":"I. Bouanane","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I98962006","display_name":"University of Skikda","ror":"https://ror.org/02571vj15","country_code":"DZ","type":"education","lineage":["https://openalex.org/I98962006"]}],"countries":["DZ"],"is_corresponding":false,"raw_author_name":"I. Bouanane","raw_affiliation_strings":["Laboratoire de Recherche sur la Physico-Chimie des Surfaces et Interfaces (LRPCSI), Facult\u00e9 des Sciences, Universit\u00e9 20 ao\u00fbt 1955-Skikda, B.P. 26, Route d\u2019El-Hadaiek, 21000, Skikda, Algeria"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laboratoire de Recherche sur la Physico-Chimie des Surfaces et Interfaces (LRPCSI), Facult\u00e9 des Sciences, Universit\u00e9 20 ao\u00fbt 1955-Skikda, B.P. 26, Route d\u2019El-Hadaiek, 21000, Skikda, Algeria","institution_ids":["https://openalex.org/I98962006"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5027225534","display_name":"G. Schmerber","orcid":"https://orcid.org/0000-0001-9523-0746","observed_orcids":["https://orcid.org/0000-0001-9523-0746"]},"institutions":[{"id":"https://openalex.org/I1294671590","display_name":"Centre National de la Recherche Scientifique","ror":"https://ror.org/02feahw73","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},{"id":"https://openalex.org/I4210123402","display_name":"Institut de Physique et Chimie des Mat\u00e9riaux de Strasbourg","ror":"https://ror.org/02za18p66","country_code":"FR","type":"facility","lineage":["https://openalex.org/I1294671590","https://openalex.org/I4210098836","https://openalex.org/I4210123402","https://openalex.org/I68947357"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"G. Schmerber","raw_affiliation_strings":["IPCMS, UMR 7504 CNRS-UdS, 23 rue du Loess, B.P. 43, 67034, Strasbourg Cedex 2, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"IPCMS, UMR 7504 CNRS-UdS, 23 rue du Loess, B.P. 43, 67034, Strasbourg Cedex 2, France","institution_ids":["https://openalex.org/I1294671590","https://openalex.org/I4210123402"]}]},{"author_position":"last","author":{"id":null,"display_name":"B. Boudjema","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I98962006","display_name":"University of Skikda","ror":"https://ror.org/02571vj15","country_code":"DZ","type":"education","lineage":["https://openalex.org/I98962006"]}],"countries":["DZ"],"is_corresponding":false,"raw_author_name":"B. Boudjema","raw_affiliation_strings":["Laboratoire de Recherche sur la Physico-Chimie des Surfaces et Interfaces (LRPCSI), Facult\u00e9 des Sciences, Universit\u00e9 20 ao\u00fbt 1955-Skikda, B.P. 26, Route d\u2019El-Hadaiek, 21000, Skikda, Algeria"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laboratoire de Recherche sur la Physico-Chimie des Surfaces et Interfaces (LRPCSI), Facult\u00e9 des Sciences, Universit\u00e9 20 ao\u00fbt 1955-Skikda, B.P. 26, Route d\u2019El-Hadaiek, 21000, Skikda, Algeria","institution_ids":["https://openalex.org/I98962006"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5007997532"],"corresponding_institution_ids":["https://openalex.org/I98962006"],"apc_list":{"value":3990,"currency":"USD","value_usd":3990},"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":4,"citation_normalized_percentile":{"value":0.08059023,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":96},"biblio":{"volume":"28","issue":"3","first_page":"2481","last_page":"2486"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10090","display_name":"ZnO doping and properties","score":0.7875999808311462,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10090","display_name":"ZnO doping and properties","score":0.7875999808311462,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11128","display_name":"Transition Metal Oxide Nanomaterials","score":0.05380000174045563,"subfield":{"id":"https://openalex.org/subfields/2507","display_name":"Polymers and Plastics"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13889","display_name":"Advanced Materials and Semiconductor Technologies","score":0.03480000048875809,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/sno2-thin-films","display_name":"SnO2 thin films","score":0.8899999856948853},{"id":"https://openalex.org/keywords/tin-dioxide","display_name":"tin dioxide","score":0.6359999775886536},{"id":"https://openalex.org/keywords/thermal-oxidation","display_name":"thermal oxidation","score":0.7870000004768372},{"id":"https://openalex.org/keywords/vacuum-evaporation","display_name":"vacuum evaporation","score":0.6610000133514404},{"id":"https://openalex.org/keywords/annealing-time","display_name":"annealing time","score":0.9150000214576721},{"id":"https://openalex.org/keywords/grain-size","display_name":"grain size","score":0.9169999957084656},{"id":"https://openalex.org/keywords/crystallographic-texture","display_name":"crystallographic texture","score":0.800000011920929},{"id":"https://openalex.org/keywords/band-gap","display_name":"band gap","score":0.5529999732971191},{"id":"https://openalex.org/keywords/electrical-resistivity","display_name":"electrical resistivity","score":0.9020000100135803},{"id":"https://openalex.org/keywords/si-111-substrate","display_name":"Si(111) substrate","score":0.7170000076293945},{"id":"https://openalex.org/keywords/crystallinity","display_name":"crystallinity","score":0.3619999885559082}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7374382019042969},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.7223135828971863},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.6531461477279663},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.6411948204040527},{"id":"https://openalex.org/C192191005","wikidata":"https://www.wikidata.org/wiki/Q466491","display_name":"Grain size","level":2,"score":0.5975372195243835},{"id":"https://openalex.org/C2779192298","wikidata":"https://www.wikidata.org/wiki/Q7908061","display_name":"Vacuum evaporation","level":3,"score":0.5591922402381897},{"id":"https://openalex.org/C181966813","wikidata":"https://www.wikidata.org/wiki/Q806352","display_name":"Band gap","level":2,"score":0.5500046014785767},{"id":"https://openalex.org/C69990965","wikidata":"https://www.wikidata.org/wiki/Q65402698","display_name":"Electrical resistivity and conductivity","level":2,"score":0.4642200469970703},{"id":"https://openalex.org/C2776873873","wikidata":"https://www.wikidata.org/wiki/Q3044964","display_name":"Vacuum deposition","level":3,"score":0.46246451139450073},{"id":"https://openalex.org/C160892712","wikidata":"https://www.wikidata.org/wiki/Q901559","display_name":"Fourier transform infrared spectroscopy","level":2,"score":0.4379880726337433},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.1967453956604004},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.1734129786491394},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.17010372877120972},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.12954559922218323},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.07737302780151367},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1007/s10854-016-5821-6","doi":"https://doi.org/10.1007/s10854-016-5821-6","is_oa":false,"landing_page_url":"https://doi.org/10.1007/s10854-016-5821-6","pdf_url":null,"source":{"id":"https://openalex.org/S189509794","display_name":"Journal of Materials Science Materials in Electronics","issn_l":"0957-4522","issn":["0957-4522","1573-482X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310319900","host_organization_name":"Springer Science+Business Media","host_organization_lineage":["https://openalex.org/P4310319900","https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Science+Business Media","Springer Nature"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Materials Science: Materials in Electronics","raw_type":"journal-article"},{"id":"pmh:oai:HAL:hal-03406554v1","doi":null,"is_oa":false,"landing_page_url":"https://hal.science/hal-03406554","pdf_url":null,"source":{"id":"https://openalex.org/S4306402512","display_name":"HAL","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I4405252976","host_organization_name":"Centre pour la Communication Scientifique Directe","host_organization_lineage":["https://openalex.org/I4405252976"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Journal of Materials Science: Materials in Electronics, 2017, 28 (3), pp.2481-2486. ⟨10.1007/s10854-016-5821-6⟩","raw_type":"info:eu-repo/semantics/article"}],"best_oa_location":null,"sustainable_development_goals":[],"sustainable_development_goals_aurora":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":46,"referenced_works":["https://openalex.org/W991972889","https://openalex.org/W1639830844","https://openalex.org/W1669505904","https://openalex.org/W1966567850","https://openalex.org/W1975518304","https://openalex.org/W1983738650","https://openalex.org/W1985026660","https://openalex.org/W1987918046","https://openalex.org/W1989798833","https://openalex.org/W2000906319","https://openalex.org/W2007016946","https://openalex.org/W2007735178","https://openalex.org/W2008437093","https://openalex.org/W2016468595","https://openalex.org/W2016951643","https://openalex.org/W2017272438","https://openalex.org/W2017403602","https://openalex.org/W2022823089","https://openalex.org/W2023108294","https://openalex.org/W2025059970","https://openalex.org/W2036139089","https://openalex.org/W2041827694","https://openalex.org/W2051188860","https://openalex.org/W2052011725","https://openalex.org/W2054310056","https://openalex.org/W2057337977","https://openalex.org/W2058015925","https://openalex.org/W2059735475","https://openalex.org/W2060231102","https://openalex.org/W2061966026","https://openalex.org/W2066257495","https://openalex.org/W2071978551","https://openalex.org/W2074178914","https://openalex.org/W2075634327","https://openalex.org/W2086281597","https://openalex.org/W2094538061","https://openalex.org/W2104807217","https://openalex.org/W2120773659","https://openalex.org/W2149285175","https://openalex.org/W2165022842","https://openalex.org/W2250219171","https://openalex.org/W2296964292","https://openalex.org/W2324673636","https://openalex.org/W2443197735","https://openalex.org/W2516320447","https://openalex.org/W4230382318"],"related_works":["https://openalex.org/W2462067268","https://openalex.org/W1975505678","https://openalex.org/W2183654673","https://openalex.org/W3045887822","https://openalex.org/W7133885742","https://openalex.org/W3013663924","https://openalex.org/W2782996376","https://openalex.org/W2088027787","https://openalex.org/W2146334528","https://openalex.org/W2011314913"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2024,"cited_by_count":1},{"year":2020,"cited_by_count":2}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-10-21T00:00:00"}