{"id":"https://openalex.org/W2517413331","doi":"https://doi.org/10.4139/sfj.44.490","title":"Special Issue/Recent Trend and Future of Photoresists for Microlithography. Recent Photoresist for Bump Plating.","display_name":"Special Issue/Recent Trend and Future of Photoresists for Microlithography. Recent Photoresist for Bump Plating.","publication_year":1993,"publication_date":"1993-01-01","ids":{"openalex":"https://openalex.org/W2517413331","doi":"https://doi.org/10.4139/sfj.44.490","mag":"2517413331"},"language":"en","primary_location":{"id":"doi:10.4139/sfj.44.490","doi":"https://doi.org/10.4139/sfj.44.490","is_oa":true,"landing_page_url":"https://doi.org/10.4139/sfj.44.490","pdf_url":"https://www.jstage.jst.go.jp/article/sfj1989/44/6/44_6_490/_pdf","source":{"id":"https://openalex.org/S198132698","display_name":"Journal of The Surface Finishing Society of Japan","issn_l":"0026-0614","issn":["0026-0614","0915-1869","1884-3395","1884-3409"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4322697819","host_organization_name":"The Surface Finishing Society of Japan","host_organization_lineage":["https://openalex.org/P4322697819"],"host_organization_lineage_names":["The Surface Finishing Society of Japan"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of the Surface Finishing Society of Japan","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"bronze","oa_url":"https://www.jstage.jst.go.jp/article/sfj1989/44/6/44_6_490/_pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5111805199","display_name":"Hiroshi Komano","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210097131","display_name":"Tokyo Ohka Kogyo (Japan)","ror":"https://ror.org/00zrr9158","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210097131"]}],"countries":["JP"],"is_corresponding":true,"raw_author_name":"Hiroshi KOMANO","raw_affiliation_strings":["Tokyo Ohka Kogyo CO., Ltd"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Ohka Kogyo CO., Ltd","institution_ids":["https://openalex.org/I4210097131"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5111805199"],"corresponding_institution_ids":["https://openalex.org/I4210097131"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":true,"cited_by_count":1,"citation_normalized_percentile":{"value":0.38990943,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"44","issue":"6","first_page":"490","last_page":"494"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11200","display_name":"Electrodeposition and Electroless Coatings","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12570","display_name":"Photopolymerization techniques and applications","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/1605","display_name":"Organic Chemistry"},"field":{"id":"https://openalex.org/fields/16","display_name":"Chemistry"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/photoresist","display_name":"photoresist","score":0.9890000224113464},{"id":"https://openalex.org/keywords/microlithography","display_name":"microlithography","score":0.875},{"id":"https://openalex.org/keywords/electroplating","display_name":"electroplating","score":0.5350000262260437},{"id":"https://openalex.org/keywords/photoresist-patterning","display_name":"photoresist patterning","score":0.5170000195503235}],"concepts":[{"id":"https://openalex.org/C134406635","wikidata":"https://www.wikidata.org/wiki/Q1439684","display_name":"Photoresist","level":3,"score":0.9587975740432739},{"id":"https://openalex.org/C2776985018","wikidata":"https://www.wikidata.org/wiki/Q7202314","display_name":"Plating (geology)","level":2,"score":0.7714793682098389},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.6652260422706604},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.5510908365249634},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5393658876419067},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.4861711859703064},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.23285043239593506},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.11319112777709961},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C8058405","wikidata":"https://www.wikidata.org/wiki/Q46255","display_name":"Geophysics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.4139/sfj.44.490","doi":"https://doi.org/10.4139/sfj.44.490","is_oa":true,"landing_page_url":"https://doi.org/10.4139/sfj.44.490","pdf_url":"https://www.jstage.jst.go.jp/article/sfj1989/44/6/44_6_490/_pdf","source":{"id":"https://openalex.org/S198132698","display_name":"Journal of The Surface Finishing Society of Japan","issn_l":"0026-0614","issn":["0026-0614","0915-1869","1884-3395","1884-3409"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4322697819","host_organization_name":"The Surface Finishing Society of Japan","host_organization_lineage":["https://openalex.org/P4322697819"],"host_organization_lineage_names":["The Surface Finishing Society of Japan"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of the Surface Finishing Society of Japan","raw_type":"journal-article"}],"best_oa_location":{"id":"doi:10.4139/sfj.44.490","doi":"https://doi.org/10.4139/sfj.44.490","is_oa":true,"landing_page_url":"https://doi.org/10.4139/sfj.44.490","pdf_url":"https://www.jstage.jst.go.jp/article/sfj1989/44/6/44_6_490/_pdf","source":{"id":"https://openalex.org/S198132698","display_name":"Journal of The Surface Finishing Society of Japan","issn_l":"0026-0614","issn":["0026-0614","0915-1869","1884-3395","1884-3409"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4322697819","host_organization_name":"The Surface Finishing Society of Japan","host_organization_lineage":["https://openalex.org/P4322697819"],"host_organization_lineage_names":["The Surface Finishing Society of Japan"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of the Surface Finishing Society of Japan","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":true,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W2517413331.pdf","grobid_xml":"https://content.openalex.org/works/W2517413331.grobid-xml"},"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2512708516","https://openalex.org/W2507507300","https://openalex.org/W2513181024","https://openalex.org/W2515023296","https://openalex.org/W2316368158","https://openalex.org/W2766293016","https://openalex.org/W2973070580","https://openalex.org/W2319641435","https://openalex.org/W6996619359","https://openalex.org/W2993305140"],"abstract_inverted_index":null,"counts_by_year":[{"year":2018,"cited_by_count":1}],"updated_date":"2026-09-06T09:10:53.072986","created_date":"2016-09-16T00:00:00"}