{"id":"https://openalex.org/W2497342256","doi":"https://doi.org/10.1007/978-4-431-68266-0_219","title":"Dry Etching of BiSrCaCuO Thin Films using C2H6 and O2","display_name":"Dry Etching of BiSrCaCuO Thin Films using C2H6 and O2","publication_year":1994,"publication_date":"1994-01-01","ids":{"openalex":"https://openalex.org/W2497342256","doi":"https://doi.org/10.1007/978-4-431-68266-0_219","mag":"2497342256"},"language":"en","primary_location":{"id":"doi:10.1007/978-4-431-68266-0_219","doi":"https://doi.org/10.1007/978-4-431-68266-0_219","is_oa":false,"landing_page_url":"https://doi.org/10.1007/978-4-431-68266-0_219","pdf_url":null,"source":{"id":"https://openalex.org/S4306463937","display_name":"Springer eBooks","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310319965","host_organization_name":"Springer Nature","host_organization_lineage":["https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Nature"],"type":"ebook platform"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Advances in Superconductivity VI","raw_type":"book-chapter"},"volume":{"id":"https://openalex.org/W2499651322","display_name":"Advances in Superconductivity VI"},"type":"book-chapter","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5019594842","display_name":"Toshiyuki Oishi","orcid":"https://orcid.org/0000-0002-0812-1670","observed_orcids":["https://orcid.org/0000-0002-0812-1670"]},"institutions":[{"id":"https://openalex.org/I4210133125","display_name":"Mitsubishi Electric (Japan)","ror":"https://ror.org/033y26782","country_code":"JP","type":"company","lineage":["https://openalex.org/I1306287861","https://openalex.org/I4210133125"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Toshiyuki Oishi","raw_affiliation_strings":["Semiconductor Research Laboratory, Mitsubishi Electric Corporation, 1-1, Tsukaguchi Honmachi 8-chome, Amagasaki, Hyogo 661, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Research Laboratory, Mitsubishi Electric Corporation, 1-1, Tsukaguchi Honmachi 8-chome, Amagasaki, Hyogo 661, Japan","institution_ids":["https://openalex.org/I4210133125"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5075307261","display_name":"Tetsuya Takami","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210133125","display_name":"Mitsubishi Electric (Japan)","ror":"https://ror.org/033y26782","country_code":"JP","type":"company","lineage":["https://openalex.org/I1306287861","https://openalex.org/I4210133125"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Tetsuya Takami","raw_affiliation_strings":["Semiconductor Research Laboratory, Mitsubishi Electric Corporation, 1-1, Tsukaguchi Honmachi 8-chome, Amagasaki, Hyogo 661, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Research Laboratory, Mitsubishi Electric Corporation, 1-1, Tsukaguchi Honmachi 8-chome, Amagasaki, Hyogo 661, Japan","institution_ids":["https://openalex.org/I4210133125"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Ken\u2019ichi Kuroda","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210133125","display_name":"Mitsubishi Electric (Japan)","ror":"https://ror.org/033y26782","country_code":"JP","type":"company","lineage":["https://openalex.org/I1306287861","https://openalex.org/I4210133125"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Ken\u2019ichi Kuroda","raw_affiliation_strings":["Semiconductor Research Laboratory, Mitsubishi Electric Corporation, 1-1, Tsukaguchi Honmachi 8-chome, Amagasaki, Hyogo 661, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Research Laboratory, Mitsubishi Electric Corporation, 1-1, Tsukaguchi Honmachi 8-chome, Amagasaki, Hyogo 661, Japan","institution_ids":["https://openalex.org/I4210133125"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109985068","display_name":"Kazuyoshi Kojima","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210133125","display_name":"Mitsubishi Electric (Japan)","ror":"https://ror.org/033y26782","country_code":"JP","type":"company","lineage":["https://openalex.org/I1306287861","https://openalex.org/I4210133125"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kazuyoshi Kojima","raw_affiliation_strings":["Semiconductor Research Laboratory, Mitsubishi Electric Corporation, 1-1, Tsukaguchi Honmachi 8-chome, Amagasaki, Hyogo 661, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Research Laboratory, Mitsubishi Electric Corporation, 1-1, Tsukaguchi Honmachi 8-chome, Amagasaki, Hyogo 661, Japan","institution_ids":["https://openalex.org/I4210133125"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101476774","display_name":"Osamu Wada","orcid":"https://orcid.org/0000-0001-6918-3499","observed_orcids":["https://orcid.org/0000-0001-6918-3499"]},"institutions":[{"id":"https://openalex.org/I4210133125","display_name":"Mitsubishi Electric (Japan)","ror":"https://ror.org/033y26782","country_code":"JP","type":"company","lineage":["https://openalex.org/I1306287861","https://openalex.org/I4210133125"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Osamu Wada","raw_affiliation_strings":["Materials & Electronic Device Laboratory, Mitsubishi Electric Corporation, 1-1, Tsukaguchi Honmachi 8-chome, Amagasaki, Hyogo 661, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Materials & Electronic Device Laboratory, Mitsubishi Electric Corporation, 1-1, Tsukaguchi Honmachi 8-chome, Amagasaki, Hyogo 661, Japan","institution_ids":["https://openalex.org/I4210133125"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5113869663","display_name":"Masahiro Nunoshita","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210133125","display_name":"Mitsubishi Electric (Japan)","ror":"https://ror.org/033y26782","country_code":"JP","type":"company","lineage":["https://openalex.org/I1306287861","https://openalex.org/I4210133125"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Masahiro Nunoshita","raw_affiliation_strings":["Semiconductor Research Laboratory, Mitsubishi Electric Corporation, 1-1, Tsukaguchi Honmachi 8-chome, Amagasaki, Hyogo 661, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Research Laboratory, Mitsubishi Electric Corporation, 1-1, Tsukaguchi Honmachi 8-chome, Amagasaki, Hyogo 661, Japan","institution_ids":["https://openalex.org/I4210133125"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I4210133125"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.52039381,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"965","last_page":"968"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10037","display_name":"Physics of Superconductivity and Magnetism","score":0.4147999882698059,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10037","display_name":"Physics of Superconductivity and Magnetism","score":0.4147999882698059,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10781","display_name":"Plasma Diagnostics and Applications","score":0.18649999797344208,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12588","display_name":"Electronic and Structural Properties of Oxides","score":0.10769999772310257,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/reactive-ion-etching","display_name":"reactive ion etching","score":0.8820000290870667},{"id":"https://openalex.org/keywords/bi-sr-ca-cu-o","display_name":"Bi-Sr-Ca-Cu-O","score":0.8610000014305115},{"id":"https://openalex.org/keywords/high-temperature-superconducting-films","display_name":"high-temperature superconducting thin films","score":0.9139999747276306},{"id":"https://openalex.org/keywords/ethane","display_name":"ethane","score":0.7179999947547913},{"id":"https://openalex.org/keywords/oxygen-plasma","display_name":"oxygen plasma","score":0.8679999709129333},{"id":"https://openalex.org/keywords/etch-selectivity","display_name":"etch selectivity","score":0.7429999709129333},{"id":"https://openalex.org/keywords/mgo","display_name":"MgO","score":0.7789999842643738},{"id":"https://openalex.org/keywords/surface-morphology","display_name":"surface morphology","score":0.7519999742507935},{"id":"https://openalex.org/keywords/electrical-resistivity","display_name":"electrical resistivity","score":0.765999972820282},{"id":"https://openalex.org/keywords/film-damage","display_name":"film damage","score":0.7129999995231628}],"concepts":[{"id":"https://openalex.org/C130472188","wikidata":"https://www.wikidata.org/wiki/Q1640159","display_name":"Reactive-ion etching","level":4,"score":0.7992699146270752},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.7958672046661377},{"id":"https://openalex.org/C1291036","wikidata":"https://www.wikidata.org/wiki/Q1191918","display_name":"Dry etching","level":4,"score":0.7541215419769287},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.74925297498703},{"id":"https://openalex.org/C69990965","wikidata":"https://www.wikidata.org/wiki/Q65402698","display_name":"Electrical resistivity and conductivity","level":2,"score":0.628173291683197},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.5490359663963318},{"id":"https://openalex.org/C540031477","wikidata":"https://www.wikidata.org/wiki/Q629","display_name":"Oxygen","level":2,"score":0.476493775844574},{"id":"https://openalex.org/C2779679103","wikidata":"https://www.wikidata.org/wiki/Q5251805","display_name":"Degradation (telecommunications)","level":2,"score":0.45241639018058777},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.36389344930648804},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.31842947006225586},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.1831924319267273},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.1785479485988617},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.08290347456932068},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.06606325507164001},{"id":"https://openalex.org/C107872376","wikidata":"https://www.wikidata.org/wiki/Q321355","display_name":"Environmental chemistry","level":1,"score":0.04606565833091736},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1007/978-4-431-68266-0_219","doi":"https://doi.org/10.1007/978-4-431-68266-0_219","is_oa":false,"landing_page_url":"https://doi.org/10.1007/978-4-431-68266-0_219","pdf_url":null,"source":{"id":"https://openalex.org/S4306463937","display_name":"Springer eBooks","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310319965","host_organization_name":"Springer Nature","host_organization_lineage":["https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Nature"],"type":"ebook platform"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Advances in Superconductivity VI","raw_type":"book-chapter"}],"best_oa_location":null,"sustainable_development_goals":[],"sustainable_development_goals_aurora":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":4,"referenced_works":["https://openalex.org/W1985771048","https://openalex.org/W1993346744","https://openalex.org/W2064263264","https://openalex.org/W2126371571"],"related_works":["https://openalex.org/W2048017995","https://openalex.org/W112177171","https://openalex.org/W1985771048","https://openalex.org/W642138192","https://openalex.org/W2050547495","https://openalex.org/W1982663923","https://openalex.org/W2063679071","https://openalex.org/W2007711804","https://openalex.org/W1991889698","https://openalex.org/W2049169518"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-10-14T16:39:01.820549","created_date":"2016-08-23T00:00:00"}