{"id":"https://openalex.org/W2486839293","doi":"https://doi.org/10.1117/3.769214.ch3","title":"EUV Source Technology","display_name":"EUV Source Technology","publication_year":2009,"publication_date":"2009-12-04","ids":{"openalex":"https://openalex.org/W2486839293","doi":"https://doi.org/10.1117/3.769214.ch3","mag":"2486839293"},"language":"en","primary_location":{"id":"doi:10.1117/3.769214.ch3","doi":"https://doi.org/10.1117/3.769214.ch3","is_oa":false,"landing_page_url":"https://doi.org/10.1117/3.769214.ch3","pdf_url":null,"source":{"id":"https://openalex.org/S4306463935","display_name":"SPIE eBooks","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"ebook platform"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"EUV Lithography","raw_type":"book-chapter"},"volume":{"id":"https://openalex.org/W4249963095","display_name":"EUV Lithography"},"type":"book-chapter","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5113004046","display_name":"Vivek Bakshi","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":true,"raw_author_name":"Vivek Bakshi","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":["https://openalex.org/A5113004046"],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":1.0978,"has_fulltext":false,"cited_by_count":3,"citation_normalized_percentile":{"value":0.79836904,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":94},"biblio":{"volume":null,"issue":null,"first_page":"103","last_page":"131"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9922000169754028,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9922000169754028,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.000699999975040555,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11920","display_name":"Pulsed Power Technology Applications","score":0.000699999975040555,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/euv-lithography","display_name":"EUV lithography","score":0.9279999732971191},{"id":"https://openalex.org/keywords/euv-light-source","display_name":"EUV light source","score":0.8759999871253967},{"id":"https://openalex.org/keywords/13-5-nm-radiation","display_name":"13.5 nm radiation","score":0.8130000233650208},{"id":"https://openalex.org/keywords/discharge-produced-plasma","display_name":"discharge-produced plasma","score":0.7820000052452087},{"id":"https://openalex.org/keywords/laser-produced-plasma","display_name":"laser-produced plasma","score":1.0},{"id":"https://openalex.org/keywords/high-volume-manufacturing","display_name":"high-volume manufacturing","score":0.5950000286102295}],"concepts":[{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.9877707958221436},{"id":"https://openalex.org/C146024833","wikidata":"https://www.wikidata.org/wiki/Q1385457","display_name":"Extreme ultraviolet","level":3,"score":0.5971264243125916},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.5599027872085571},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5290645360946655},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5203263759613037},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.5158916711807251},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.5093752145767212},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.47373664379119873},{"id":"https://openalex.org/C548442186","wikidata":"https://www.wikidata.org/wiki/Q1106","display_name":"Xenon","level":2,"score":0.45380595326423645},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.4279968738555908},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.24671924114227295},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.1830800175666809},{"id":"https://openalex.org/C184779094","wikidata":"https://www.wikidata.org/wiki/Q26383","display_name":"Atomic physics","level":1,"score":0.07781189680099487},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/3.769214.ch3","doi":"https://doi.org/10.1117/3.769214.ch3","is_oa":false,"landing_page_url":"https://doi.org/10.1117/3.769214.ch3","pdf_url":null,"source":{"id":"https://openalex.org/S4306463935","display_name":"SPIE eBooks","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"ebook platform"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"EUV Lithography","raw_type":"book-chapter"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2495778926","https://openalex.org/W3132539984","https://openalex.org/W3203273004","https://openalex.org/W2497881431","https://openalex.org/W2539502069","https://openalex.org/W2312337632","https://openalex.org/W2124948794","https://openalex.org/W2039292693","https://openalex.org/W4386863789","https://openalex.org/W1980923519"],"abstract_inverted_index":{"EUV":[0,37,118,130,150,169,191,229],"lithography":[1],"(EUVL)":[2],"is":[3,39,46,187,209,223],"the":[4,15,52,74,147,163,183,201,206,217,224,239],"leading":[5,164,225],"technology,":[6],"beyond":[7],"193-nm-based":[8],"optical":[9],"lithography,":[10],"for":[11,88,112,129,166,227],"printing":[12],"circuits":[13],"at":[14,49,171],"32-nm":[16],"node":[17],"and":[18,63,84,92,158,249],"below":[19],"in":[20,59,149],"a":[21,30,60,97,212],"high":[22],"volume":[23],"manufacturing":[24],"(HVM)":[25],"environment":[26],"fab.":[27],"In":[28,174,193,204],"EUVL,":[29],"13.5-nm":[31],"radiation":[32,170],"wavelength":[33],"generated":[34],"by":[35,139,211],"an":[36],"source":[38,151],"used":[40,236],"to":[41,102,215,237],"print":[42],"circuits.":[43],"Because":[44],"light":[45],"strongly":[47],"absorbed":[48],"this":[50],"wavelength,":[51],"entire":[53],"EUVL":[54,114,141],"scanner":[55,142],"system":[56,86],"must":[57,66,120],"be":[58,67],"vacuum":[61],"environment,":[62],"all":[64],"optics":[65],"reflective":[68],"instead":[69],"of":[70,77,100,179,182,197,243],"refractive.":[71],"Based":[72],"on":[73,106],"HVM":[75,113],"requirements":[76,87,128,152,242],"100":[78],"wafers":[79],"per":[80],"hour":[81],"(WPH)":[82],"throughput":[83],"other":[85],"optics,":[89],"resist":[90,107],"sensitivity,":[91,108],"overhead":[93],"(see":[94],"Sec.":[95],"3.2.3),":[96],"power":[98,241],"requirement":[99],"115":[101],"180":[103],"W,":[104],"based":[105],"has":[109],"been":[110,135],"specified":[111],"scanners.":[115,251],"Besides":[116],"power,":[117],"sources":[119,131],"meet":[121,238],"additional":[122],"specifications":[123],"(Sec.":[124],"3.2.2).":[125],"The":[126],"production-level":[127],"(Table":[132],"3.1)":[133],"have":[134],"jointly":[136],"agreed":[137],"upon":[138],"major":[140],"manufacturers.":[143],"Table":[144],"3.2":[145],"shows":[146],"change":[148],"over":[153],"time.":[154],"Discharge-produced":[155],"plasma":[156,160,178,199],"(DPP)":[157],"laser-produced":[159],"(LPP)":[161],"are":[162],"technologies":[165],"generating":[167],"high-power":[168],"13.5":[172],"nm.":[173],"both":[175],"technologies,":[176],"hot":[177],"~30":[180],"eV":[181],"chosen":[184],"fuel":[185,226],"material":[186,208],"generated,":[188],"which":[189],"produces":[190],"radiation.":[192],"DPP,":[194],"magnetic":[195],"pinching":[196],"low-temperature":[198],"generates":[200],"high-temperature":[202,218],"plasma.":[203,219],"LPP,":[205],"target":[207],"heated":[210],"laser":[213],"pulse":[214],"generate":[216],"Today,":[220],"tin":[221],"(Sn)":[222],"HVM-level":[228],"sources,":[230,245],"with":[231],"xenon":[232],"(Xe)":[233],"still":[234],"being":[235],"lower":[240],"metrology":[244],"microexposure":[246],"tools":[247],"(METs),":[248],"alpha-level":[250]},"counts_by_year":[{"year":2017,"cited_by_count":1},{"year":2016,"cited_by_count":1}],"updated_date":"2026-10-16T09:59:22.235173","created_date":"2016-08-23T00:00:00"}