{"id":"https://openalex.org/W2398077323","doi":null,"title":"\u8584\u819cBOX-SOI\u306b\u304a\u3051\u308b\u52d5\u7684\u30de\u30eb\u30c1Vth\u624b\u6cd5\u306e\u8a66\u4f5c\u3068\u8a55\u4fa1 (\u30b3\u30f3\u30d4\u30e5\u30fc\u30bf\u30b7\u30b9\u30c6\u30e0)","display_name":"\u8584\u819cBOX-SOI\u306b\u304a\u3051\u308b\u52d5\u7684\u30de\u30eb\u30c1Vth\u624b\u6cd5\u306e\u8a66\u4f5c\u3068\u8a55\u4fa1 (\u30b3\u30f3\u30d4\u30e5\u30fc\u30bf\u30b7\u30b9\u30c6\u30e0)","publication_year":2016,"publication_date":"2016-01-19","ids":{"openalex":"https://openalex.org/W2398077323","mag":"2398077323"},"language":"ja","primary_location":{"id":"mag:2398077323","doi":null,"is_oa":false,"landing_page_url":"http://ci.nii.ac.jp/naid/40020736653","pdf_url":null,"source":{"id":"https://openalex.org/S2764744134","display_name":"IEICE technical report. Speech","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core"],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":"IEICE technical report. Speech","raw_type":null},"volume":null,"type":"article","is_traditional":true,"indexed_in":[],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5006500281","display_name":"\u7fd4\u5e73 \u4e95\u5c3e","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u7fd4\u5e73 \u4e95\u5c3e","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5047254268","display_name":"\u82b1\u4e43 \u9234\u6728","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u82b1\u4e43 \u9234\u6728","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"last","author":{"id":"https://openalex.org/A5044258239","display_name":"\u660c\u5e73 \u4e2d\u6751","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u660c\u5e73 \u4e2d\u6751","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"115","issue":"399","first_page":"91","last_page":"96"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10363","display_name":"Low-power high-performance VLSI design","score":0.7523999810218811,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10363","display_name":"Low-power high-performance VLSI design","score":0.7523999810218811,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":0.1979999989271164,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.012000000104308128,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/thin-film-soi","display_name":"thin-film SOI","score":0.6439999938011169},{"id":"https://openalex.org/keywords/threshold-voltage","display_name":"threshold voltage","score":0.625},{"id":"https://openalex.org/keywords/soi-mosfet","display_name":"SOI MOSFET","score":0.5879999995231628},{"id":"https://openalex.org/keywords/device-fabrication","display_name":"device fabrication","score":0.42100000381469727},{"id":"https://openalex.org/keywords/equipment-evaluation","display_name":"device evaluation","score":0.5509999990463257}],"concepts":[{"id":"https://openalex.org/C53143962","wikidata":"https://www.wikidata.org/wiki/Q1478788","display_name":"Silicon on insulator","level":3,"score":0.7557188868522644},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.4465321898460388},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.22556015849113464},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.05550077557563782}],"mesh":[],"locations_count":1,"locations":[{"id":"mag:2398077323","doi":null,"is_oa":false,"landing_page_url":"http://ci.nii.ac.jp/naid/40020736653","pdf_url":null,"source":{"id":"https://openalex.org/S2764744134","display_name":"IEICE technical report. Speech","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core"],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":"IEICE technical report. Speech","raw_type":null}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2506345096","https://openalex.org/W2343099268","https://openalex.org/W3016336469","https://openalex.org/W2332001220","https://openalex.org/W378957453","https://openalex.org/W1593731753","https://openalex.org/W2619382142","https://openalex.org/W3119205194","https://openalex.org/W2737033582","https://openalex.org/W2918302359"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2025-10-10T17:16:08.811792","created_date":"2016-06-24T00:00:00"}