{"id":"https://openalex.org/W2334820366","doi":"https://doi.org/10.1557/proc-697-p5.7","title":"A Novel Silicon-Carbon Precursor for Oligomer Chemical Vapor Deposition of Silicon Carbide for Harsh Environmental Applications","display_name":"A Novel Silicon-Carbon Precursor for Oligomer Chemical Vapor Deposition of Silicon Carbide for Harsh Environmental Applications","publication_year":2001,"publication_date":"2001-01-01","ids":{"openalex":"https://openalex.org/W2334820366","doi":"https://doi.org/10.1557/proc-697-p5.7","mag":"2334820366"},"language":"en","primary_location":{"id":"doi:10.1557/proc-697-p5.7","doi":"https://doi.org/10.1557/proc-697-p5.7","is_oa":false,"landing_page_url":"https://doi.org/10.1557/proc-697-p5.7","pdf_url":null,"source":{"id":"https://openalex.org/S2530005873","display_name":"MRS Proceedings","issn_l":"0272-9172","issn":["0272-9172","1946-4274"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4310311721","host_organization_name":"Cambridge University Press","host_organization_lineage":["https://openalex.org/P4310311721","https://openalex.org/P4310311702"],"host_organization_lineage_names":["Cambridge University Press","University of Cambridge"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"MRS Proceedings","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5089304271","display_name":"Ulrike Futschik","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I392282","display_name":"University at Albany, State University of New York","ror":"https://ror.org/012zs8222","country_code":"US","type":"education","lineage":["https://openalex.org/I392282"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Ulrike Futschik","raw_affiliation_strings":["School of Nanosciences and Nanoengineering, The University at Albany-SUNY, Albany, New York, 1222, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of Nanosciences and Nanoengineering, The University at Albany-SUNY, Albany, New York, 1222, USA","institution_ids":["https://openalex.org/I392282"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5056017100","display_name":"Harry Efstathiadis","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I392282","display_name":"University at Albany, State University of New York","ror":"https://ror.org/012zs8222","country_code":"US","type":"education","lineage":["https://openalex.org/I392282"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Harry Efstathiadis","raw_affiliation_strings":["School of Nanosciences and Nanoengineering, The University at Albany-SUNY, Albany, New York, 1222, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of Nanosciences and Nanoengineering, The University at Albany-SUNY, Albany, New York, 1222, USA","institution_ids":["https://openalex.org/I392282"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5055059104","display_name":"James Castracane","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I392282","display_name":"University at Albany, State University of New York","ror":"https://ror.org/012zs8222","country_code":"US","type":"education","lineage":["https://openalex.org/I392282"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"James Castracane","raw_affiliation_strings":["School of Nanosciences and Nanoengineering, The University at Albany-SUNY, Albany, New York, 1222, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of Nanosciences and Nanoengineering, The University at Albany-SUNY, Albany, New York, 1222, USA","institution_ids":["https://openalex.org/I392282"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5023624056","display_name":"Alain E. Kaloyeros","orcid":"https://orcid.org/0000-0002-6872-1707","observed_orcids":["https://orcid.org/0000-0002-6872-1707"]},"institutions":[{"id":"https://openalex.org/I392282","display_name":"University at Albany, State University of New York","ror":"https://ror.org/012zs8222","country_code":"US","type":"education","lineage":["https://openalex.org/I392282"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Alain E. Kaloyeros","raw_affiliation_strings":["School of Nanosciences and Nanoengineering, The University at Albany-SUNY, Albany, New York, 1222, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of Nanosciences and Nanoengineering, The University at Albany-SUNY, Albany, New York, 1222, USA","institution_ids":["https://openalex.org/I392282"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5044711672","display_name":"Leo Macdonald","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210160673","display_name":"Starfire Systems (United States)","ror":"https://ror.org/04fd8ks75","country_code":"US","type":"company","lineage":["https://openalex.org/I4210160673"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Leo Macdonald","raw_affiliation_strings":["Starfire Systems Inc, Watervliet, New York, 1218, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Starfire Systems Inc, Watervliet, New York, 1218, USA","institution_ids":["https://openalex.org/I4210160673"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5104055295","display_name":"Susan E. Hayes","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210160673","display_name":"Starfire Systems (United States)","ror":"https://ror.org/04fd8ks75","country_code":"US","type":"company","lineage":["https://openalex.org/I4210160673"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Susan Hayes","raw_affiliation_strings":["Starfire Systems Inc, Watervliet, New York, 1218, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Starfire Systems Inc, Watervliet, New York, 1218, USA","institution_ids":["https://openalex.org/I4210160673"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5109952307","display_name":"Costas G. Fountzoulas","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I166416128","display_name":"DEVCOM Army Research Laboratory","ror":"https://ror.org/011hc8f90","country_code":"US","type":"government","lineage":["https://openalex.org/I1304082316","https://openalex.org/I1330347796","https://openalex.org/I166416128","https://openalex.org/I2802705668","https://openalex.org/I4210154437"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Costas Fountzoulas","raw_affiliation_strings":["Army research laboratory, Weapons Material Directorate, Aberdeen Proving Ground, MD, 21005, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Army research laboratory, Weapons Material Directorate, Aberdeen Proving Ground, MD, 21005, USA","institution_ids":["https://openalex.org/I166416128"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.32928611,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"697","issue":null,"first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10361","display_name":"Silicon Carbide Semiconductor Technologies","score":0.9965999722480774,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10361","display_name":"Silicon Carbide Semiconductor Technologies","score":0.9965999722480774,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10132","display_name":"Advanced ceramic materials synthesis","score":0.0017000000225380063,"subfield":{"id":"https://openalex.org/subfields/2503","display_name":"Ceramics and Composites"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13889","display_name":"Advanced Materials and Semiconductor Technologies","score":0.0006000000284984708,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/silicon-carbide-thin-films","display_name":"silicon carbide thin films","score":0.8759999871253967},{"id":"https://openalex.org/keywords/amorphous-sic","display_name":"amorphous SiC","score":0.6340000033378601},{"id":"https://openalex.org/keywords/polycrystalline-sic","display_name":"polycrystalline SiC","score":0.9070000052452087},{"id":"https://openalex.org/keywords/post-deposition-annealing","display_name":"post-deposition annealing","score":0.9629999995231628},{"id":"https://openalex.org/keywords/c-si-ratio","display_name":"C/Si ratio","score":0.8109999895095825}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8402994275093079},{"id":"https://openalex.org/C57410435","wikidata":"https://www.wikidata.org/wiki/Q505668","display_name":"Chemical vapor deposition","level":2,"score":0.623034656047821},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.5772014260292053},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.5019853115081787},{"id":"https://openalex.org/C2780722187","wikidata":"https://www.wikidata.org/wiki/Q412356","display_name":"Silicon carbide","level":2,"score":0.4924126863479614},{"id":"https://openalex.org/C160892712","wikidata":"https://www.wikidata.org/wiki/Q901559","display_name":"Fourier transform infrared spectroscopy","level":2,"score":0.47880181670188904},{"id":"https://openalex.org/C25442681","wikidata":"https://www.wikidata.org/wiki/Q28087","display_name":"Auger electron spectroscopy","level":2,"score":0.463248610496521},{"id":"https://openalex.org/C56052488","wikidata":"https://www.wikidata.org/wiki/Q103382","display_name":"Amorphous solid","level":2,"score":0.44880253076553345},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.4481840431690216},{"id":"https://openalex.org/C26771246","wikidata":"https://www.wikidata.org/wiki/Q321095","display_name":"Scanning electron microscope","level":2,"score":0.43486201763153076},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.38552239537239075},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.19251608848571777},{"id":"https://openalex.org/C8010536","wikidata":"https://www.wikidata.org/wiki/Q160398","display_name":"Crystallography","level":1,"score":0.15285581350326538},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.11452293395996094},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.11101055145263672},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.08326306939125061},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.07052332162857056},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1557/proc-697-p5.7","doi":"https://doi.org/10.1557/proc-697-p5.7","is_oa":false,"landing_page_url":"https://doi.org/10.1557/proc-697-p5.7","pdf_url":null,"source":{"id":"https://openalex.org/S2530005873","display_name":"MRS Proceedings","issn_l":"0272-9172","issn":["0272-9172","1946-4274"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4310311721","host_organization_name":"Cambridge University Press","host_organization_lineage":["https://openalex.org/P4310311721","https://openalex.org/P4310311702"],"host_organization_lineage_names":["Cambridge University Press","University of Cambridge"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"MRS Proceedings","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"sustainable_development_goals_aurora":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":13,"referenced_works":["https://openalex.org/W1651000842","https://openalex.org/W2000612496","https://openalex.org/W2008924171","https://openalex.org/W2041543389","https://openalex.org/W2064647912","https://openalex.org/W2065228506","https://openalex.org/W2068778618","https://openalex.org/W2074536718","https://openalex.org/W2081289441","https://openalex.org/W2083976024","https://openalex.org/W2089846483","https://openalex.org/W2160171310","https://openalex.org/W2164587836"],"related_works":["https://openalex.org/W2114485436","https://openalex.org/W290896076","https://openalex.org/W2129909489","https://openalex.org/W2235698409","https://openalex.org/W1926964702","https://openalex.org/W2077986582","https://openalex.org/W2036735431","https://openalex.org/W2107565542","https://openalex.org/W2088104719","https://openalex.org/W4223488919"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-08-21T09:56:20.448147","created_date":"2016-06-24T00:00:00"}