{"id":"https://openalex.org/W2334425459","doi":"https://doi.org/10.1166/sam.2014.2072","title":"Substrate Temperature Effects on Structural and Optical Properties of Radio Frequency Sputtered CdS Thin Films","display_name":"Substrate Temperature Effects on Structural and Optical Properties of Radio Frequency Sputtered CdS Thin Films","publication_year":2014,"publication_date":"2014-10-01","ids":{"openalex":"https://openalex.org/W2334425459","doi":"https://doi.org/10.1166/sam.2014.2072","mag":"2334425459"},"language":"en","primary_location":{"id":"doi:10.1166/sam.2014.2072","doi":"https://doi.org/10.1166/sam.2014.2072","is_oa":false,"landing_page_url":"https://doi.org/10.1166/sam.2014.2072","pdf_url":null,"source":{"id":"https://openalex.org/S2500547560","display_name":"Science of Advanced Materials","issn_l":"1947-2935","issn":["1947-2935","1947-2943"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","poland-40"],"host_organization":"https://openalex.org/P4310321646","host_organization_name":"American Scientific Publishers","host_organization_lineage":["https://openalex.org/P4310321646"],"host_organization_lineage_names":["American Scientific Publishers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Science of Advanced Materials","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5067633383","display_name":"Dong Hyun Hwang","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Dong Hyun Hwang","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5065169920","display_name":"Kwun Nam Hui","orcid":"https://orcid.org/0000-0002-3008-8571","observed_orcids":["https://orcid.org/0000-0002-3008-8571"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Kwun Nam Hui","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5052784343","display_name":"Jung Kyu Choi","orcid":"https://orcid.org/0000-0001-5176-0534","observed_orcids":["https://orcid.org/0000-0001-5176-0534"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Jung Kyu Choi","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"last","author":{"id":"https://openalex.org/A5111867453","display_name":"Young-Guk Son","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Young Guk Son","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.3243,"has_fulltext":false,"cited_by_count":3,"citation_normalized_percentile":{"value":0.62059765,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":96},"biblio":{"volume":"6","issue":"10","first_page":"2233","last_page":"2237"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10590","display_name":"Chalcogenide Semiconductor Thin Films","score":0.9761000275611877,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10590","display_name":"Chalcogenide Semiconductor Thin Films","score":0.9761000275611877,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13889","display_name":"Advanced Materials and Semiconductor Technologies","score":0.008799999952316284,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10090","display_name":"ZnO doping and properties","score":0.008500000461935997,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/cds-thin-films","display_name":"CdS thin films","score":0.8799999952316284},{"id":"https://openalex.org/keywords/substrate-temperature","display_name":"substrate temperature","score":0.9750000238418579},{"id":"https://openalex.org/keywords/rf-sputtering","display_name":"RF sputtering","score":0.9629999995231628},{"id":"https://openalex.org/keywords/structural-properties","display_name":"structural properties","score":0.9350000023841858},{"id":"https://openalex.org/keywords/optical-properties","display_name":"optical properties","score":0.9539999961853027},{"id":"https://openalex.org/keywords/cadmium-sulfide","display_name":"cadmium sulfide","score":0.8420000076293945}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.9213074445724487},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.7128068804740906},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.706786036491394},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.6246451139450073},{"id":"https://openalex.org/C74064498","wikidata":"https://www.wikidata.org/wiki/Q3396184","display_name":"Radio frequency","level":2,"score":0.5419512391090393},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.27847960591316223},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.09773725271224976},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.04136621952056885},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1166/sam.2014.2072","doi":"https://doi.org/10.1166/sam.2014.2072","is_oa":false,"landing_page_url":"https://doi.org/10.1166/sam.2014.2072","pdf_url":null,"source":{"id":"https://openalex.org/S2500547560","display_name":"Science of Advanced Materials","issn_l":"1947-2935","issn":["1947-2935","1947-2943"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","poland-40"],"host_organization":"https://openalex.org/P4310321646","host_organization_name":"American Scientific Publishers","host_organization_lineage":["https://openalex.org/P4310321646"],"host_organization_lineage_names":["American Scientific Publishers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Science of Advanced Materials","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2340403654","https://openalex.org/W2617299042","https://openalex.org/W2992854760","https://openalex.org/W2005241013","https://openalex.org/W2889347898","https://openalex.org/W4413226611","https://openalex.org/W4214776567","https://openalex.org/W2729356786","https://openalex.org/W2251319140","https://openalex.org/W2318678982"],"abstract_inverted_index":null,"counts_by_year":[{"year":2022,"cited_by_count":1},{"year":2016,"cited_by_count":2}],"updated_date":"2026-09-25T08:18:29.962427","created_date":"2016-06-24T00:00:00"}