{"id":"https://openalex.org/W2329909710","doi":"https://doi.org/10.3131/jvsj.43.992","title":"Micromachining of Optical Fiber by Reactive Ion Etching.","display_name":"Micromachining of Optical Fiber by Reactive Ion Etching.","publication_year":2000,"publication_date":"2000-01-01","ids":{"openalex":"https://openalex.org/W2329909710","doi":"https://doi.org/10.3131/jvsj.43.992","mag":"2329909710"},"language":"en","primary_location":{"id":"doi:10.3131/jvsj.43.992","doi":"https://doi.org/10.3131/jvsj.43.992","is_oa":true,"landing_page_url":"https://doi.org/10.3131/jvsj.43.992","pdf_url":"https://www.jstage.jst.go.jp/article/jvsj1958/43/10/43_10_992/_pdf","source":{"id":"https://openalex.org/S29101911","display_name":"Shinku","issn_l":"0559-8516","issn":["0559-8516","1880-9413"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4320800726","host_organization_name":"The Vacuum Society of Japan","host_organization_lineage":["https://openalex.org/P4320800726"],"host_organization_lineage_names":["The Vacuum Society of Japan"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SHINKU","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"bronze","oa_url":"https://www.jstage.jst.go.jp/article/jvsj1958/43/10/43_10_992/_pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5042801017","display_name":"Hironori Kumazaki","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210113483","display_name":"National Institute of Technology, Gifu College","ror":"https://ror.org/025b2hx26","country_code":"JP","type":"education","lineage":["https://openalex.org/I4210113483","https://openalex.org/I4210120810"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Hironori KUMAZAKI","raw_affiliation_strings":["Department of Electrical Engineering, Gifu National College of Technology"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering, Gifu National College of Technology","institution_ids":["https://openalex.org/I4210113483"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5103907228","display_name":"Yoshihisa Yamada","orcid":"https://orcid.org/0000-0003-2702-4160","observed_orcids":["https://orcid.org/0000-0003-2702-4160"]},"institutions":[{"id":"https://openalex.org/I4210113483","display_name":"National Institute of Technology, Gifu College","ror":"https://ror.org/025b2hx26","country_code":"JP","type":"education","lineage":["https://openalex.org/I4210113483","https://openalex.org/I4210120810"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yoshihisa YAMADA","raw_affiliation_strings":["Department of Electrical Engineering, Gifu National College of Technology"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering, Gifu National College of Technology","institution_ids":["https://openalex.org/I4210113483"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5014810752","display_name":"Seiki Inaba","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210113483","display_name":"National Institute of Technology, Gifu College","ror":"https://ror.org/025b2hx26","country_code":"JP","type":"education","lineage":["https://openalex.org/I4210113483","https://openalex.org/I4210120810"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Seiki INABA","raw_affiliation_strings":["Department of Electrical Engineering, Gifu National College of Technology"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical Engineering, Gifu National College of Technology","institution_ids":["https://openalex.org/I4210113483"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5060173388","display_name":"Kazuhiro Hane","orcid":"https://orcid.org/0000-0002-4417-2571","observed_orcids":["https://orcid.org/0000-0002-4417-2571"]},"institutions":[{"id":"https://openalex.org/I201537933","display_name":"Tohoku University","ror":"https://ror.org/01dq60k83","country_code":"JP","type":"education","lineage":["https://openalex.org/I201537933"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kazuhiro HANE","raw_affiliation_strings":["Department of Mechatronics and Precision Engineering, Faculty of Engineering, Tohoku University"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Mechatronics and Precision Engineering, Faculty of Engineering, Tohoku University","institution_ids":["https://openalex.org/I201537933"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":true,"cited_by_count":1,"citation_normalized_percentile":{"value":0.31261724,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"43","issue":"10","first_page":"992","last_page":"995"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.5336999893188477,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.5336999893188477,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10781","display_name":"Plasma Diagnostics and Applications","score":0.35350000858306885,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11451","display_name":"Advanced Machining and Optimization Techniques","score":0.028300000354647636,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/reactive-ion-etching","display_name":"reactive ion etching","score":0.9980000257492065},{"id":"https://openalex.org/keywords/cf4-plasma","display_name":"CF4 plasma","score":0.996999979019165},{"id":"https://openalex.org/keywords/fiber-diameter-reduction","display_name":"fiber diameter reduction","score":0.7910000085830688},{"id":"https://openalex.org/keywords/parallel-plate-electrodes","display_name":"parallel plate electrodes","score":0.6819999814033508}],"concepts":[{"id":"https://openalex.org/C130472188","wikidata":"https://www.wikidata.org/wiki/Q1640159","display_name":"Reactive-ion etching","level":4,"score":0.8459855318069458},{"id":"https://openalex.org/C2777303812","wikidata":"https://www.wikidata.org/wiki/Q5441253","display_name":"Feedthrough","level":2,"score":0.7981123924255371},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7378125190734863},{"id":"https://openalex.org/C145667562","wikidata":"https://www.wikidata.org/wiki/Q7646003","display_name":"Surface micromachining","level":4,"score":0.6118807792663574},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.5691074728965759},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.5660574436187744},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5224998593330383},{"id":"https://openalex.org/C519885992","wikidata":"https://www.wikidata.org/wiki/Q161","display_name":"Fiber","level":2,"score":0.5148205161094666},{"id":"https://openalex.org/C124634506","wikidata":"https://www.wikidata.org/wiki/Q486936","display_name":"Deep reactive-ion etching","level":5,"score":0.49097326397895813},{"id":"https://openalex.org/C194232370","wikidata":"https://www.wikidata.org/wiki/Q162","display_name":"Optical fiber","level":2,"score":0.48884838819503784},{"id":"https://openalex.org/C2781137444","wikidata":"https://www.wikidata.org/wiki/Q237105","display_name":"Sharpening","level":2,"score":0.44188374280929565},{"id":"https://openalex.org/C49110097","wikidata":"https://www.wikidata.org/wiki/Q175233","display_name":"Cathode","level":2,"score":0.42517024278640747},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.3170280456542969},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.2007579207420349},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.19959577918052673},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.1428101658821106},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.1276596486568451},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.09601664543151855},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.0},{"id":"https://openalex.org/C31972630","wikidata":"https://www.wikidata.org/wiki/Q844240","display_name":"Computer vision","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.3131/jvsj.43.992","doi":"https://doi.org/10.3131/jvsj.43.992","is_oa":true,"landing_page_url":"https://doi.org/10.3131/jvsj.43.992","pdf_url":"https://www.jstage.jst.go.jp/article/jvsj1958/43/10/43_10_992/_pdf","source":{"id":"https://openalex.org/S29101911","display_name":"Shinku","issn_l":"0559-8516","issn":["0559-8516","1880-9413"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4320800726","host_organization_name":"The Vacuum Society of Japan","host_organization_lineage":["https://openalex.org/P4320800726"],"host_organization_lineage_names":["The Vacuum Society of Japan"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SHINKU","raw_type":"journal-article"}],"best_oa_location":{"id":"doi:10.3131/jvsj.43.992","doi":"https://doi.org/10.3131/jvsj.43.992","is_oa":true,"landing_page_url":"https://doi.org/10.3131/jvsj.43.992","pdf_url":"https://www.jstage.jst.go.jp/article/jvsj1958/43/10/43_10_992/_pdf","source":{"id":"https://openalex.org/S29101911","display_name":"Shinku","issn_l":"0559-8516","issn":["0559-8516","1880-9413"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4320800726","host_organization_name":"The Vacuum Society of Japan","host_organization_lineage":["https://openalex.org/P4320800726"],"host_organization_lineage_names":["The Vacuum Society of Japan"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SHINKU","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":true,"grobid_xml":true},"content_urls":{"pdf":"https://content.openalex.org/works/W2329909710.pdf","grobid_xml":"https://content.openalex.org/works/W2329909710.grobid-xml"},"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2117575784","https://openalex.org/W1985510271","https://openalex.org/W2164679251","https://openalex.org/W2166704471","https://openalex.org/W2059850884","https://openalex.org/W2039979593","https://openalex.org/W7128519033","https://openalex.org/W2066481167","https://openalex.org/W2606067694","https://openalex.org/W2086495731"],"abstract_inverted_index":{"Micromachining":[0],"of":[1,18,50,61,75,96,112],"an":[2],"optical":[3,63,78],"fiber":[4,64,79,114],"was":[5,29,39,80],"carried":[6],"out":[7],"in":[8,45],"CF4":[9],"plasma":[10],"by":[11,31,88],"reactive":[12],"ion":[13],"etching":[14],"(RIE)":[15],"system":[16],"consisting":[17],"two":[19],"parallel-plate":[20],"electrodes":[21],"and":[22,38,100],"a":[23,32,42],"rotary":[24],"motion":[25],"feedthrough.":[26],"The":[27,73,105],"cathode":[28],"powered":[30],"rf":[33,103],"generator":[34],"at":[35],"13.56":[36],"MHz":[37],"covered":[40],"with":[41],"quartz":[43],"plate":[44],"order":[46],"to":[47,85],"prevent":[48],"sputtering":[49],"nonvolatile":[51],"compounds":[52],"from":[53,68,82],"the":[54,57,59,62,70,76,94,110,113],"cathode.":[55],"During":[56],"etching,":[58],"rotation":[60],"could":[65],"be":[66],"controlled":[67],"outside":[69],"vacuum":[71],"chamber.":[72],"diameter":[74],"etched":[77],"reduced":[81],"125":[83],"pm":[84,87],"50":[86],"RIE":[89],"for":[90],"8":[91],"hours":[92],"under":[93],"condition":[95],"13":[97],"Pa":[98],"pressure":[99],"150":[101],"W":[102],"power.":[104],"other":[106],"processes":[107],"such":[108],"as":[109],"sharpening":[111],"tip":[115],"were":[116],"also":[117],"described.":[118]},"counts_by_year":[],"updated_date":"2026-08-08T07:41:36.138363","created_date":"2016-06-24T00:00:00"}