{"id":"https://openalex.org/W2328538215","doi":"https://doi.org/10.1109/ieem.2013.6962597","title":"The quality control application for abnormal raw material early detection","display_name":"The quality control application for abnormal raw material early detection","publication_year":2013,"publication_date":"2013-12-01","ids":{"openalex":"https://openalex.org/W2328538215","doi":"https://doi.org/10.1109/ieem.2013.6962597","mag":"2328538215"},"language":"en","primary_location":{"id":"doi:10.1109/ieem.2013.6962597","doi":"https://doi.org/10.1109/ieem.2013.6962597","is_oa":false,"landing_page_url":"https://doi.org/10.1109/ieem.2013.6962597","pdf_url":null,"source":{"id":"https://openalex.org/S4363607822","display_name":"IEEE International Conference on Industrial Engineering and Engineering Management (IEEM)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2013 IEEE International Conference on Industrial Engineering and Engineering Management","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5010923225","display_name":"Violet Shang Guan","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210142504","display_name":"Semiconductor Manufacturing International (China)","ror":"https://ror.org/03tf9y485","country_code":"CN","type":"company","lineage":["https://openalex.org/I4210142504"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Violet Shang Guan","raw_affiliation_strings":["Department of Material Quality Engineering, SMIC, Shanghai, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Material Quality Engineering, SMIC, Shanghai, China","institution_ids":["https://openalex.org/I4210142504"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5017918732","display_name":"July Shui","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210142504","display_name":"Semiconductor Manufacturing International (China)","ror":"https://ror.org/03tf9y485","country_code":"CN","type":"company","lineage":["https://openalex.org/I4210142504"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"July Shui","raw_affiliation_strings":["Department of Material Quality Engineering, SMIC, Shanghai, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Material Quality Engineering, SMIC, Shanghai, China","institution_ids":["https://openalex.org/I4210142504"]}]},{"author_position":"last","author":{"id":null,"display_name":"Kevin Chang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210142504","display_name":"Semiconductor Manufacturing International (China)","ror":"https://ror.org/03tf9y485","country_code":"CN","type":"company","lineage":["https://openalex.org/I4210142504"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Kevin Chang","raw_affiliation_strings":["Department of Material Quality Engineering, SMIC, Shanghai, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Material Quality Engineering, SMIC, Shanghai, China","institution_ids":["https://openalex.org/I4210142504"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I4210142504"],"apc_list":null,"apc_paid":null,"fwci":3.0087,"has_fulltext":false,"cited_by_count":5,"citation_normalized_percentile":{"value":0.90697674,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":88,"max":95},"biblio":{"volume":"19","issue":null,"first_page":"1179","last_page":"1183"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11443","display_name":"Advanced Statistical Process Monitoring","score":0.8651999831199646,"subfield":{"id":"https://openalex.org/subfields/1804","display_name":"Statistics, Probability and Uncertainty"},"field":{"id":"https://openalex.org/fields/18","display_name":"Decision Sciences"},"domain":{"id":"https://openalex.org/domains/2","display_name":"Social Sciences"}},"topics":[{"id":"https://openalex.org/T11443","display_name":"Advanced Statistical Process Monitoring","score":0.8651999831199646,"subfield":{"id":"https://openalex.org/subfields/1804","display_name":"Statistics, Probability and Uncertainty"},"field":{"id":"https://openalex.org/fields/18","display_name":"Decision Sciences"},"domain":{"id":"https://openalex.org/domains/2","display_name":"Social Sciences"}},{"id":"https://openalex.org/T10164","display_name":"Quality and Supply Management","score":0.03999999910593033,"subfield":{"id":"https://openalex.org/subfields/1404","display_name":"Management Information Systems"},"field":{"id":"https://openalex.org/fields/14","display_name":"Business, Management and Accounting"},"domain":{"id":"https://openalex.org/domains/2","display_name":"Social Sciences"}},{"id":"https://openalex.org/T12905","display_name":"Management Systems and Quality Improvement","score":0.03840000182390213,"subfield":{"id":"https://openalex.org/subfields/1408","display_name":"Strategy and Management"},"field":{"id":"https://openalex.org/fields/14","display_name":"Business, Management and Accounting"},"domain":{"id":"https://openalex.org/domains/2","display_name":"Social Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/raw-material-quality-control","display_name":"raw material quality control","score":0.953000009059906},{"id":"https://openalex.org/keywords/foundry-manufacturing","display_name":"foundry manufacturing","score":0.8230000138282776},{"id":"https://openalex.org/keywords/incoming-inspection","display_name":"incoming inspection","score":0.6620000004768372},{"id":"https://openalex.org/keywords/semiconductor-manufacturing","display_name":"semiconductor manufacturing","score":0.6520000100135803},{"id":"https://openalex.org/keywords/supplier-quality-management","display_name":"supplier quality management","score":0.718999981880188}],"concepts":[{"id":"https://openalex.org/C206139338","wikidata":"https://www.wikidata.org/wiki/Q192355","display_name":"Raw material","level":2,"score":0.7011386156082153},{"id":"https://openalex.org/C117671659","wikidata":"https://www.wikidata.org/wiki/Q11049265","display_name":"Manufacturing engineering","level":1,"score":0.6758105754852295},{"id":"https://openalex.org/C2781087836","wikidata":"https://www.wikidata.org/wiki/Q13883136","display_name":"Foundry","level":2,"score":0.6606674790382385},{"id":"https://openalex.org/C2779530757","wikidata":"https://www.wikidata.org/wiki/Q1207505","display_name":"Quality (philosophy)","level":2,"score":0.5913798809051514},{"id":"https://openalex.org/C155386361","wikidata":"https://www.wikidata.org/wiki/Q1649571","display_name":"Process control","level":3,"score":0.5059055685997009},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.48193812370300293},{"id":"https://openalex.org/C2775924081","wikidata":"https://www.wikidata.org/wiki/Q55608371","display_name":"Control (management)","level":2,"score":0.47831466794013977},{"id":"https://openalex.org/C2778348673","wikidata":"https://www.wikidata.org/wiki/Q739302","display_name":"Production (economics)","level":2,"score":0.4751208424568176},{"id":"https://openalex.org/C66018809","wikidata":"https://www.wikidata.org/wiki/Q1570432","display_name":"Semiconductor device fabrication","level":3,"score":0.4218525290489197},{"id":"https://openalex.org/C21880701","wikidata":"https://www.wikidata.org/wiki/Q2144042","display_name":"Process engineering","level":1,"score":0.380703866481781},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.3426014184951782},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.3385566473007202},{"id":"https://openalex.org/C78519656","wikidata":"https://www.wikidata.org/wiki/Q101333","display_name":"Mechanical engineering","level":1,"score":0.09215676784515381},{"id":"https://openalex.org/C111472728","wikidata":"https://www.wikidata.org/wiki/Q9471","display_name":"Epistemology","level":1,"score":0.0},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.0},{"id":"https://openalex.org/C138885662","wikidata":"https://www.wikidata.org/wiki/Q5891","display_name":"Philosophy","level":0,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.0},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.0},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.0},{"id":"https://openalex.org/C139719470","wikidata":"https://www.wikidata.org/wiki/Q39680","display_name":"Macroeconomics","level":1,"score":0.0},{"id":"https://openalex.org/C162324750","wikidata":"https://www.wikidata.org/wiki/Q8134","display_name":"Economics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/ieem.2013.6962597","doi":"https://doi.org/10.1109/ieem.2013.6962597","is_oa":false,"landing_page_url":"https://doi.org/10.1109/ieem.2013.6962597","pdf_url":null,"source":{"id":"https://openalex.org/S4363607822","display_name":"IEEE International Conference on Industrial Engineering and Engineering Management (IEEM)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2013 IEEE International Conference on Industrial Engineering and Engineering Management","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":11,"referenced_works":["https://openalex.org/W32592534","https://openalex.org/W2032239507","https://openalex.org/W2074691986","https://openalex.org/W2118737629","https://openalex.org/W2126830673","https://openalex.org/W2382471244","https://openalex.org/W2418663396","https://openalex.org/W2791126911","https://openalex.org/W2799020652","https://openalex.org/W6678118505","https://openalex.org/W6750623418"],"related_works":["https://openalex.org/W7095468477","https://openalex.org/W2898774347","https://openalex.org/W2246712987","https://openalex.org/W2919750336","https://openalex.org/W4232258840","https://openalex.org/W1573325901","https://openalex.org/W2380831315","https://openalex.org/W2358125511","https://openalex.org/W4300639140","https://openalex.org/W3181664100"],"abstract_inverted_index":{"Raw":[0],"material":[1,36,92,106],"quality":[2,67,87],"control":[3,68,88],"is":[4,77],"one":[5,44],"of":[6,18,34,66,102],"the":[7,16,31,64,85,99],"most":[8],"important":[9],"subjects":[10],"for":[11],"foundry":[12,54,80,111],"manufacturing":[13,55,81,93],"process":[14,94],"with":[15],"advancing":[17],"semiconductor":[19],"technology":[20],"into":[21],"nanometer":[22],"nodes.":[23],"Therefore,":[24],"how":[25],"to":[26,78],"effectively":[27],"detect":[28],"abnormality":[29],"at":[30,40,95,110],"early":[32,50,100],"stage":[33,109],"raw":[35,91,105],"incoming":[37,107],"or":[38],"even":[39],"supplier":[41,96],"sites":[42],"become":[43],"more":[45],"challenge":[46],"topic.":[47],"The":[48,75],"successful":[49],"detection":[51,101],"can":[52],"reduce":[53,79],"risk":[56,82],"and":[57,73,98],"cost.":[58],"This":[59],"paper":[60],"will":[61],"focus":[62],"on":[63,70,90],"application":[65],"method":[69],"both":[71],"suppliers":[72],"foundry.":[74],"purpose":[76],"by":[83],"implementing":[84],"best":[86],"methodology":[89],"site":[97],"nonconformance":[103],"in":[104],"inspection":[108],"site.":[112]},"counts_by_year":[{"year":2024,"cited_by_count":1},{"year":2022,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2015,"cited_by_count":2}],"updated_date":"2026-11-03T10:50:19.383937","created_date":"2016-06-24T00:00:00"}