{"id":"https://openalex.org/W2323816144","doi":"https://doi.org/10.1149/05201.0251ecst","title":"Robust Trilayer Patterning Technique","display_name":"Robust Trilayer Patterning Technique","publication_year":2013,"publication_date":"2013-03-08","ids":{"openalex":"https://openalex.org/W2323816144","doi":"https://doi.org/10.1149/05201.0251ecst","mag":"2323816144"},"language":"en","primary_location":{"id":"doi:10.1149/05201.0251ecst","doi":"https://doi.org/10.1149/05201.0251ecst","is_oa":false,"landing_page_url":"https://doi.org/10.1149/05201.0251ecst","pdf_url":null,"source":{"id":"https://openalex.org/S4210205149","display_name":"ECS Transactions","issn_l":"1938-5862","issn":["1938-5862","1938-6737","2151-2051"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":["norway-1","poland-20"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"ECS Transactions","raw_type":"journal-article"},"volume":null,"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5100846901","display_name":"Zhimin Zhu","orcid":"https://orcid.org/0009-0004-3840-9685","observed_orcids":["https://orcid.org/0009-0004-3840-9685"]},"institutions":[{"id":"https://openalex.org/I4210158290","display_name":"Brewer Science (United States)","ror":"https://ror.org/04xmnv894","country_code":"US","type":"company","lineage":["https://openalex.org/I4210158290"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Zhimin Zhu","raw_affiliation_strings":["Brewer Science Inc"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Brewer Science Inc","institution_ids":["https://openalex.org/I4210158290"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5061271567","display_name":"Micheal Weigand","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210158290","display_name":"Brewer Science (United States)","ror":"https://ror.org/04xmnv894","country_code":"US","type":"company","lineage":["https://openalex.org/I4210158290"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Micheal Weigand","raw_affiliation_strings":["Brewer Science Inc"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Brewer Science Inc","institution_ids":["https://openalex.org/I4210158290"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5011057787","display_name":"Vandana N. Krishnamurthy","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210158290","display_name":"Brewer Science (United States)","ror":"https://ror.org/04xmnv894","country_code":"US","type":"company","lineage":["https://openalex.org/I4210158290"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Vandana Krishnamurthy","raw_affiliation_strings":["Brewer Science Inc"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Brewer Science Inc","institution_ids":["https://openalex.org/I4210158290"]}]},{"author_position":"last","author":{"id":null,"display_name":"Daniel Sullivan","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210158290","display_name":"Brewer Science (United States)","ror":"https://ror.org/04xmnv894","country_code":"US","type":"company","lineage":["https://openalex.org/I4210158290"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Daniel Sullivan","raw_affiliation_strings":["Brewer Science Inc"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Brewer Science Inc","institution_ids":["https://openalex.org/I4210158290"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I4210158290"],"apc_list":null,"apc_paid":null,"fwci":0.8117,"has_fulltext":false,"cited_by_count":2,"citation_normalized_percentile":{"value":0.71476464,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":94},"biblio":{"volume":"52","issue":"1","first_page":"251","last_page":"257"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.00019999999494757503,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11471","display_name":"Block Copolymer Self-Assembly","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/process-window","display_name":"process window","score":0.8069999814033508},{"id":"https://openalex.org/keywords/critical-dimension","display_name":"critical dimension","score":0.6790000200271606},{"id":"https://openalex.org/keywords/line-edge-roughness","display_name":"line edge roughness","score":0.8980000019073486},{"id":"https://openalex.org/keywords/line-width-roughness","display_name":"line width roughness","score":0.9919999837875366},{"id":"https://openalex.org/keywords/depth-of-focus","display_name":"depth of focus","score":0.9100000262260437},{"id":"https://openalex.org/keywords/optical-proximity-correction","display_name":"optical proximity correction","score":0.843999981880188},{"id":"https://openalex.org/keywords/source-mask-optimization","display_name":"source mask optimization","score":0.996999979019165},{"id":"https://openalex.org/keywords/optical-simulation","display_name":"optical simulation","score":0.5339999794960022}],"concepts":[{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.8138719797134399},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.7774213552474976},{"id":"https://openalex.org/C2777441419","wikidata":"https://www.wikidata.org/wiki/Q16969460","display_name":"Process window","level":3,"score":0.7090104818344116},{"id":"https://openalex.org/C207789793","wikidata":"https://www.wikidata.org/wiki/Q3028070","display_name":"Critical dimension","level":2,"score":0.696804404258728},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6500358581542969},{"id":"https://openalex.org/C71039073","wikidata":"https://www.wikidata.org/wiki/Q3439090","display_name":"Surface finish","level":2,"score":0.5677309036254883},{"id":"https://openalex.org/C177409738","wikidata":"https://www.wikidata.org/wiki/Q1917460","display_name":"Multiple patterning","level":4,"score":0.5648693442344666},{"id":"https://openalex.org/C192209626","wikidata":"https://www.wikidata.org/wiki/Q190909","display_name":"Focus (optics)","level":2,"score":0.5577373504638672},{"id":"https://openalex.org/C94263209","wikidata":"https://www.wikidata.org/wiki/Q1076175","display_name":"Immersion lithography","level":4,"score":0.5480690598487854},{"id":"https://openalex.org/C89002693","wikidata":"https://www.wikidata.org/wiki/Q1538481","display_name":"Depth of focus (tectonics)","level":4,"score":0.5435339212417603},{"id":"https://openalex.org/C9395851","wikidata":"https://www.wikidata.org/wiki/Q177929","display_name":"Stack (abstract data type)","level":2,"score":0.5357235074043274},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.5106621384620667},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.4983072280883789},{"id":"https://openalex.org/C162307627","wikidata":"https://www.wikidata.org/wiki/Q204833","display_name":"Enhanced Data Rates for GSM Evolution","level":2,"score":0.47502046823501587},{"id":"https://openalex.org/C107365816","wikidata":"https://www.wikidata.org/wiki/Q114817","display_name":"Surface roughness","level":2,"score":0.45206698775291443},{"id":"https://openalex.org/C2777289219","wikidata":"https://www.wikidata.org/wiki/Q7632154","display_name":"Substrate (aquarium)","level":2,"score":0.4375150799751282},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.4352300465106964},{"id":"https://openalex.org/C2777953097","wikidata":"https://www.wikidata.org/wiki/Q7252868","display_name":"Proximity effect (electron beam lithography)","level":5,"score":0.4155391454696655},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.379840612411499},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3488049805164337},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.28349190950393677},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.17476582527160645},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.10618755221366882},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0},{"id":"https://openalex.org/C58097730","wikidata":"https://www.wikidata.org/wiki/Q176318","display_name":"Subduction","level":3,"score":0.0},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C111368507","wikidata":"https://www.wikidata.org/wiki/Q43518","display_name":"Oceanography","level":1,"score":0.0},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.0},{"id":"https://openalex.org/C77928131","wikidata":"https://www.wikidata.org/wiki/Q193343","display_name":"Tectonics","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1149/05201.0251ecst","doi":"https://doi.org/10.1149/05201.0251ecst","is_oa":false,"landing_page_url":"https://doi.org/10.1149/05201.0251ecst","pdf_url":null,"source":{"id":"https://openalex.org/S4210205149","display_name":"ECS Transactions","issn_l":"1938-5862","issn":["1938-5862","1938-6737","2151-2051"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":["norway-1","poland-20"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"ECS Transactions","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"sustainable_development_goals_aurora":[{"score":0.44999998807907104,"display_name":"Sustainable cities and communities","id":"https://metadata.un.org/sdg/11"}],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W1994462330","https://openalex.org/W1589144636","https://openalex.org/W2039921045","https://openalex.org/W2425110006","https://openalex.org/W2791370716","https://openalex.org/W2002559421","https://openalex.org/W7130686104","https://openalex.org/W2319097141","https://openalex.org/W2002379066","https://openalex.org/W2791040643"],"abstract_inverted_index":{"This":[0],"paper":[1],"presents":[2],"the":[3,95,126],"results":[4,128,133],"of":[5,48,90,97,125],"efforts":[6],"to":[7,69,114,136],"achieve":[8],"a":[9,16,83],"very":[10],"wide":[11,73,88],"processing":[12,24,63],"window":[13,64],"lithography":[14,127],"using":[15],"spin-on":[17],"trilayer":[18],"patterning":[19,116],"stack.":[20],"Materials":[21],"design":[22],"and":[23,29,38,45,59,79,109,131],"are":[25,129,134],"based":[26],"on":[27,40],"physical":[28],"chemical":[30],"properties":[31],"as":[32,34],"well":[33],"optical":[35,105,137],"field":[36],"distribution":[37],"focus":[39,91],"molecular":[41],"forces":[42],"between":[43],"resist":[44],"substrate.":[46],"All":[47],"these":[49,132],"factors":[50],"closely":[51],"affect":[52],"line":[53],"edge":[54],"roughness/line":[55],"width":[56],"roughness":[57],"(LER/LWR)":[58],"critical":[60],"dimension":[61],"(CD)":[62],"(PW).":[65],"The":[66,87],"technique":[67],"aims":[68],"provide":[70],"an":[71],"extremely":[72],"CD":[74],"PW":[75],"for":[76],"producing":[77],"lines":[78],"contact":[80],"patterns":[81,99],"in":[82],"single":[84],"lithographic":[85],"process.":[86],"depth":[89],"(DOF)":[92],"performance":[93],"allows":[94],"printing":[96],"difficult":[98],"having":[100],"low":[101],"image":[102],"contrast,":[103],"simplifying":[104],"proximity":[106],"correction":[107],"(OPC)":[108],"source":[110],"mask":[111],"optimization":[112],"(SMO)":[113],"make":[115],"more":[117],"robust.":[118],"Scanning":[119],"electron":[120],"microscope":[121],"(SEM)":[122],"cross":[123],"sections":[124],"presented,":[130],"compared":[135],"simulations.":[138]},"counts_by_year":[{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":1}],"updated_date":"2026-09-27T08:07:27.782135","created_date":"2016-06-24T00:00:00"}