{"id":"https://openalex.org/W2319956325","doi":"https://doi.org/10.1557/proc-610-b8.2","title":"Transient Enhanced Diffusion of Arsenic by Self-Implantation \u2014The role of As-I clusters\u2014","display_name":"Transient Enhanced Diffusion of Arsenic by Self-Implantation \u2014The role of As-I clusters\u2014","publication_year":2000,"publication_date":"2000-01-01","ids":{"openalex":"https://openalex.org/W2319956325","doi":"https://doi.org/10.1557/proc-610-b8.2","mag":"2319956325"},"language":"en","primary_location":{"id":"doi:10.1557/proc-610-b8.2","doi":"https://doi.org/10.1557/proc-610-b8.2","is_oa":false,"landing_page_url":"https://doi.org/10.1557/proc-610-b8.2","pdf_url":null,"source":{"id":"https://openalex.org/S2530005873","display_name":"MRS Proceedings","issn_l":"0272-9172","issn":["0272-9172","1946-4274"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4310311721","host_organization_name":"Cambridge University Press","host_organization_lineage":["https://openalex.org/P4310311721","https://openalex.org/P4310311702"],"host_organization_lineage_names":["Cambridge University Press","University of Cambridge"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"MRS Proceedings","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5041031577","display_name":"Ryangsu Kim","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":true,"raw_author_name":"Ryangsu Kim","raw_affiliation_strings":["Osaka University, Osaka, 565-0871, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Osaka University, Osaka, 565-0871, Japan","institution_ids":["https://openalex.org/I98285908"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5103735202","display_name":"Takenori Aoki","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takenori Aoki","raw_affiliation_strings":["Osaka University, Osaka, 565-0871, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Osaka University, Osaka, 565-0871, Japan","institution_ids":["https://openalex.org/I98285908"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110023650","display_name":"Yoshikazu Furuta","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yoshikazu Furuta","raw_affiliation_strings":["Osaka University, Osaka, 565-0871, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Osaka University, Osaka, 565-0871, Japan","institution_ids":["https://openalex.org/I98285908"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5083065439","display_name":"Hiroyuki Kobyashi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Hiroyuki Kobyashi","raw_affiliation_strings":["Osaka University, Osaka, 565-0871, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Osaka University, Osaka, 565-0871, Japan","institution_ids":["https://openalex.org/I98285908"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5103556423","display_name":"Jianxin Xia","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Jianxin Xia","raw_affiliation_strings":["Osaka University, Osaka, 565-0871, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Osaka University, Osaka, 565-0871, Japan","institution_ids":["https://openalex.org/I98285908"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5064845805","display_name":"Tomoya Saito","orcid":"https://orcid.org/0000-0002-8349-4872","observed_orcids":["https://orcid.org/0000-0002-8349-4872"]},"institutions":[{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Tomoya Saito","raw_affiliation_strings":["Osaka University, Osaka, 565-0871, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Osaka University, Osaka, 565-0871, Japan","institution_ids":["https://openalex.org/I98285908"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111430338","display_name":"Yoshinari Kamakura","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yoshinari Kamakura","raw_affiliation_strings":["Osaka University, Osaka, 565-0871, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Osaka University, Osaka, 565-0871, Japan","institution_ids":["https://openalex.org/I98285908"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5082049451","display_name":"Kenji Taniguchi","orcid":"https://orcid.org/0000-0001-5980-1943","observed_orcids":["https://orcid.org/0000-0001-5980-1943"]},"institutions":[{"id":"https://openalex.org/I98285908","display_name":"The University of Osaka","ror":"https://ror.org/035t8zc32","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kenji Taniguchi","raw_affiliation_strings":["Osaka University, Osaka, 565-0871, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Osaka University, Osaka, 565-0871, Japan","institution_ids":["https://openalex.org/I98285908"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5041031577"],"corresponding_institution_ids":["https://openalex.org/I98285908"],"apc_list":null,"apc_paid":null,"fwci":0.2591,"has_fulltext":false,"cited_by_count":5,"citation_normalized_percentile":{"value":0.45631336,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"610","issue":null,"first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.7782999873161316,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.7782999873161316,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.1671999990940094,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10624","display_name":"Silicon and Solar Cell Technologies","score":0.030899999663233757,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/transient-enhanced-diffusion","display_name":"transient enhanced diffusion","score":0.996999979019165},{"id":"https://openalex.org/keywords/arsenic-diffusion","display_name":"arsenic diffusion","score":0.796999990940094},{"id":"https://openalex.org/keywords/self-implantation","display_name":"self-implantation","score":0.871999979019165},{"id":"https://openalex.org/keywords/self-interstitials","display_name":"self-interstitials","score":0.8069999814033508},{"id":"https://openalex.org/keywords/silicon-ion-implantation","display_name":"silicon ion implantation","score":0.7419999837875366},{"id":"https://openalex.org/keywords/annealing","display_name":"annealing","score":0.6600000262260437}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8351626396179199},{"id":"https://openalex.org/C502230775","wikidata":"https://www.wikidata.org/wiki/Q871","display_name":"Arsenic","level":2,"score":0.8341691493988037},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.7795015573501587},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.6265836954116821},{"id":"https://openalex.org/C41823505","wikidata":"https://www.wikidata.org/wiki/Q1436752","display_name":"Ion implantation","level":3,"score":0.5478583574295044},{"id":"https://openalex.org/C69357855","wikidata":"https://www.wikidata.org/wiki/Q163214","display_name":"Diffusion","level":2,"score":0.5434825420379639},{"id":"https://openalex.org/C2780799671","wikidata":"https://www.wikidata.org/wiki/Q17087362","display_name":"Transient (computer programming)","level":2,"score":0.4551626443862915},{"id":"https://openalex.org/C159467904","wikidata":"https://www.wikidata.org/wiki/Q2001702","display_name":"Chemical physics","level":1,"score":0.34656763076782227},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.2244478464126587},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.17181396484375},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.16753879189491272},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.09596720337867737},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1557/proc-610-b8.2","doi":"https://doi.org/10.1557/proc-610-b8.2","is_oa":false,"landing_page_url":"https://doi.org/10.1557/proc-610-b8.2","pdf_url":null,"source":{"id":"https://openalex.org/S2530005873","display_name":"MRS Proceedings","issn_l":"0272-9172","issn":["0272-9172","1946-4274"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4310311721","host_organization_name":"Cambridge University Press","host_organization_lineage":["https://openalex.org/P4310311721","https://openalex.org/P4310311702"],"host_organization_lineage_names":["Cambridge University Press","University of Cambridge"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"MRS Proceedings","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":19,"referenced_works":["https://openalex.org/W1966430536","https://openalex.org/W1981896719","https://openalex.org/W1983582989","https://openalex.org/W1986482959","https://openalex.org/W1992377300","https://openalex.org/W1999848689","https://openalex.org/W2012978931","https://openalex.org/W2019976417","https://openalex.org/W2021805518","https://openalex.org/W2025241552","https://openalex.org/W2036793327","https://openalex.org/W2038475770","https://openalex.org/W2044119593","https://openalex.org/W2055084674","https://openalex.org/W2069144385","https://openalex.org/W2081904199","https://openalex.org/W2089364126","https://openalex.org/W2134270922","https://openalex.org/W2316447128"],"related_works":["https://openalex.org/W1667593688","https://openalex.org/W1977193912","https://openalex.org/W2322981136","https://openalex.org/W2078870122","https://openalex.org/W3188807926","https://openalex.org/W2044035030","https://openalex.org/W1987884245","https://openalex.org/W2026109148","https://openalex.org/W2049554570","https://openalex.org/W2063103177"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-07-29T09:40:50.615796","created_date":"2016-06-24T00:00:00"}