{"id":"https://openalex.org/W2319652015","doi":"https://doi.org/10.1021/la300256k","title":"A Simulation Study on the Effect of Cross-Linking Agent Concentration for Defect Tolerant Demolding in UV Nanoimprint Lithography","display_name":"A Simulation Study on the Effect of Cross-Linking Agent Concentration for Defect Tolerant Demolding in UV Nanoimprint Lithography","publication_year":2012,"publication_date":"2012-07-10","ids":{"openalex":"https://openalex.org/W2319652015","doi":"https://doi.org/10.1021/la300256k","mag":"2319652015","pmid":"https://pubmed.ncbi.nlm.nih.gov/22780100"},"language":"en","primary_location":{"id":"doi:10.1021/la300256k","doi":"https://doi.org/10.1021/la300256k","is_oa":false,"landing_page_url":"https://doi.org/10.1021/la300256k","pdf_url":null,"source":{"id":"https://openalex.org/S75741262","display_name":"Langmuir","issn_l":"0743-7463","issn":["0743-7463","1520-5827"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-d","doyens","jufo-2","ki-jl-1","medline","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320006","host_organization_name":"American Chemical Society","host_organization_lineage":["https://openalex.org/P4310320006"],"host_organization_lineage_names":["American Chemical Society"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Langmuir","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref","pubmed"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5011892570","display_name":"Alborz Amirsadeghi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I121820613","display_name":"Louisiana State University","ror":"https://ror.org/05ect4e57","country_code":"US","type":"education","lineage":["https://openalex.org/I121820613"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Alborz Amirsadeghi","raw_affiliation_strings":["Mechanical Engineering Department\rand Center of Bio-Modular and Multi-scale Systems, Louisiana State University, Baton Rouge, Louisiana 70803, United\rStates"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Mechanical Engineering Department\rand Center of Bio-Modular and Multi-scale Systems, Louisiana State University, Baton Rouge, Louisiana 70803, United\rStates","institution_ids":["https://openalex.org/I121820613"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5083755825","display_name":"Jaejong Lee","orcid":"https://orcid.org/0000-0001-7684-2667","observed_orcids":["https://orcid.org/0000-0001-7684-2667"]},"institutions":[{"id":"https://openalex.org/I4210111434","display_name":"Korea Institute of Machinery & Materials","ror":"https://ror.org/01qcq9d74","country_code":"KR","type":"facility","lineage":["https://openalex.org/I2801339556","https://openalex.org/I4210111434","https://openalex.org/I4210144908","https://openalex.org/I4387152098"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jae Jong Lee","raw_affiliation_strings":["Nano-Mechanical\rSystems Research\rDivision, Korea Institute of Machinery and Materials, 104 Sinseongno, Yuseong-Gu, Daejeon 305-343,\rKorea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Nano-Mechanical\rSystems Research\rDivision, Korea Institute of Machinery and Materials, 104 Sinseongno, Yuseong-Gu, Daejeon 305-343,\rKorea","institution_ids":["https://openalex.org/I4210111434"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5083652053","display_name":"Sunggook Park","orcid":"https://orcid.org/0000-0003-0424-6318","observed_orcids":["https://orcid.org/0000-0003-0424-6318"]},"institutions":[{"id":"https://openalex.org/I121820613","display_name":"Louisiana State University","ror":"https://ror.org/05ect4e57","country_code":"US","type":"education","lineage":["https://openalex.org/I121820613"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Sunggook Park","raw_affiliation_strings":["Mechanical Engineering Department\rand Center of Bio-Modular and Multi-scale Systems, Louisiana State University, Baton Rouge, Louisiana 70803, United\rStates"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Mechanical Engineering Department\rand Center of Bio-Modular and Multi-scale Systems, Louisiana State University, Baton Rouge, Louisiana 70803, United\rStates","institution_ids":["https://openalex.org/I121820613"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5083652053"],"corresponding_institution_ids":["https://openalex.org/I121820613"],"apc_list":{"value":4500,"currency":"USD","value_usd":4500},"apc_paid":null,"fwci":2.1857,"has_fulltext":false,"cited_by_count":33,"citation_normalized_percentile":{"value":0.86754528,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":93,"max":99},"biblio":{"volume":"28","issue":"31","first_page":"11546","last_page":"11554"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.9932000041007996,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.9932000041007996,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.0010999999940395355,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11471","display_name":"Block Copolymer Self-Assembly","score":0.0008999999845400453,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/uv-nanoimprint-lithography","display_name":"UV nanoimprint lithography","score":0.9990000128746033},{"id":"https://openalex.org/keywords/demolding","display_name":"demolding","score":0.7110000252723694},{"id":"https://openalex.org/keywords/defect-tolerance","display_name":"defect tolerance","score":0.9160000085830688},{"id":"https://openalex.org/keywords/uv-curing","display_name":"UV curing","score":0.7390000224113464},{"id":"https://openalex.org/keywords/friction","display_name":"friction","score":0.414000004529953},{"id":"https://openalex.org/keywords/fracture-strength","display_name":"fracture strength","score":0.9589999914169312},{"id":"https://openalex.org/keywords/debonding-energy","display_name":"debonding energy","score":0.8989999890327454},{"id":"https://openalex.org/keywords/young-s-modulus","display_name":"Young's modulus","score":0.8180000185966492},{"id":"https://openalex.org/keywords/crack-initiation-stress","display_name":"crack initiation stress","score":0.8629999756813049},{"id":"https://openalex.org/keywords/stress-simulation","display_name":"stress simulation","score":0.41499999165534973}],"concepts":[{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.98430335521698},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8229398727416992},{"id":"https://openalex.org/C180145272","wikidata":"https://www.wikidata.org/wiki/Q7504144","display_name":"Shrinkage","level":2,"score":0.7406262159347534},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.7153981328010559},{"id":"https://openalex.org/C132976073","wikidata":"https://www.wikidata.org/wiki/Q2991861","display_name":"Curing (chemistry)","level":2,"score":0.6642268896102905},{"id":"https://openalex.org/C2777046567","wikidata":"https://www.wikidata.org/wiki/Q1540138","display_name":"Nanoimprint lithography","level":4,"score":0.6191422939300537},{"id":"https://openalex.org/C21036866","wikidata":"https://www.wikidata.org/wiki/Q181767","display_name":"Stress (linguistics)","level":2,"score":0.4770999550819397},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.4303666353225708},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.061722248792648315},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.0},{"id":"https://openalex.org/C138885662","wikidata":"https://www.wikidata.org/wiki/Q5891","display_name":"Philosophy","level":0,"score":0.0},{"id":"https://openalex.org/C41895202","wikidata":"https://www.wikidata.org/wiki/Q8162","display_name":"Linguistics","level":1,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0}],"mesh":[],"locations_count":3,"locations":[{"id":"doi:10.1021/la300256k","doi":"https://doi.org/10.1021/la300256k","is_oa":false,"landing_page_url":"https://doi.org/10.1021/la300256k","pdf_url":null,"source":{"id":"https://openalex.org/S75741262","display_name":"Langmuir","issn_l":"0743-7463","issn":["0743-7463","1520-5827"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-d","doyens","jufo-2","ki-jl-1","medline","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320006","host_organization_name":"American Chemical Society","host_organization_lineage":["https://openalex.org/P4310320006"],"host_organization_lineage_names":["American Chemical Society"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Langmuir","raw_type":"journal-article"},{"id":"pmid:22780100","doi":null,"is_oa":false,"landing_page_url":"https://pubmed.ncbi.nlm.nih.gov/22780100","pdf_url":null,"source":{"id":"https://openalex.org/S4306525036","display_name":"PubMed","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I1299303238","host_organization_name":"National Institutes of Health","host_organization_lineage":["https://openalex.org/I1299303238"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Langmuir : the ACS journal of surfaces and colloids","raw_type":"Journal Article"},{"id":"pmh:oai:repository.lsu.edu:mechanical_engineering_pubs-1479","doi":null,"is_oa":false,"landing_page_url":"https://repository.lsu.edu/mechanical_engineering_pubs/480","pdf_url":null,"source":{"id":"https://openalex.org/S4210169993","display_name":"Civil War Book Review","issn_l":"1528-6592","issn":["1528-6592"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310315936","host_organization_name":"Louisiana State University","host_organization_lineage":["https://openalex.org/P4310315936"],"host_organization_lineage_names":["Louisiana State University"],"type":"journal"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Faculty Publications","raw_type":"text"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":61,"referenced_works":["https://openalex.org/W1515073388","https://openalex.org/W1970459697","https://openalex.org/W1972019410","https://openalex.org/W1973220732","https://openalex.org/W1973504755","https://openalex.org/W1975737665","https://openalex.org/W1976555299","https://openalex.org/W1979557007","https://openalex.org/W1983874432","https://openalex.org/W1984431257","https://openalex.org/W1986561204","https://openalex.org/W1989297207","https://openalex.org/W1991178406","https://openalex.org/W1991753814","https://openalex.org/W1997476216","https://openalex.org/W1998795303","https://openalex.org/W2005767865","https://openalex.org/W2006730584","https://openalex.org/W2013398712","https://openalex.org/W2013998680","https://openalex.org/W2015967876","https://openalex.org/W2019948105","https://openalex.org/W2023300175","https://openalex.org/W2026554498","https://openalex.org/W2029939151","https://openalex.org/W2030199863","https://openalex.org/W2031593867","https://openalex.org/W2033887300","https://openalex.org/W2035432717","https://openalex.org/W2036951758","https://openalex.org/W2047805172","https://openalex.org/W2055215546","https://openalex.org/W2055379954","https://openalex.org/W2055608478","https://openalex.org/W2055864012","https://openalex.org/W2059835816","https://openalex.org/W2062047511","https://openalex.org/W2062074587","https://openalex.org/W2062253436","https://openalex.org/W2063527592","https://openalex.org/W2068276297","https://openalex.org/W2071556235","https://openalex.org/W2072264922","https://openalex.org/W2074885628","https://openalex.org/W2075452337","https://openalex.org/W2077044700","https://openalex.org/W2078177619","https://openalex.org/W2079393274","https://openalex.org/W2079423422","https://openalex.org/W2082983861","https://openalex.org/W2090894317","https://openalex.org/W2091631730","https://openalex.org/W2093409462","https://openalex.org/W2094291780","https://openalex.org/W2096733817","https://openalex.org/W2110127019","https://openalex.org/W2141864528","https://openalex.org/W2150307559","https://openalex.org/W2326855477","https://openalex.org/W4234109392","https://openalex.org/W4245574547"],"related_works":["https://openalex.org/W2757890779","https://openalex.org/W2063527592","https://openalex.org/W2017102381","https://openalex.org/W2150307559","https://openalex.org/W7111495858","https://openalex.org/W4386318839","https://openalex.org/W3015513491","https://openalex.org/W2087564915","https://openalex.org/W2901731467","https://openalex.org/W2055864012"],"abstract_inverted_index":{"The":[0,30],"chemistry":[1],"and":[2,23,50,53,110,133,173],"composition":[3,97],"of":[4,27,42,66,78,86,95,107,205],"UV-sensitive":[5],"resists":[6],"are":[7],"key":[8],"factors":[9],"determining":[10],"the":[11,14,25,28,33,43,46,56,60,67,76,79,84,93,99,108,118,144,149,163,171,177,190,196,202,206,216,223],"stress":[12,31,68,100,168,187,200,204],"in":[13,18,32,45,59,70,113,182],"molded":[15,34],"resist":[16,44,96,122,141,164,191,240],"structure":[17,35],"UV":[19,47,88],"nanoimprint":[20],"lithography":[21],"(UV-NIL)":[22],"thus":[24],"success":[26],"process.":[29],"is":[36,73,160,212,229],"mainly":[37],"generated":[38,69],"due":[39,169],"to":[40,75,162,170,222],"shrinkage":[41,167],"curing":[48,109,172],"step":[49],"also":[51,152,174,230],"adhesion":[52,175],"friction":[54,128],"at":[55,176],"stamp/resist":[57,178],"interface":[58,179],"subsequent":[61],"demolding":[62,111],"step.":[63],"Thus,":[64],"understanding":[65],"these":[71],"steps":[72,112],"critical":[74],"improvement":[77],"process":[80],"as":[81,83,121,156],"well":[82],"development":[85],"new":[87],"resists.":[89],"In":[90,154],"this":[91],"paper":[92],"effect":[94],"on":[98,192],"generation":[101],"was":[102],"studied":[103],"by":[104,189,201,232],"numerical":[105],"simulations":[106],"UV-NIL.":[114],"Parameters":[115],"required":[116],"for":[117,139,215,236],"simulation,":[119],"such":[120],"shrinkage,":[123],"Young's":[124],"modulus,":[125],"fracture":[126,150,203],"strength,":[127],"coefficient,":[129],"crack":[130],"initiation":[131],"stress,":[132],"debonding":[134],"energy,":[135],"were":[136],"determined":[137],"experimentally":[138],"different":[140],"compositions.":[142,241],"As":[143],"cross-linking":[145,158,217],"agent":[146,159,218],"concentration":[147,219],"increases":[148],"strength":[151],"improves.":[153],"addition,":[155],"more":[157],"added":[161],"composition,":[165],"both":[166],"increase":[180],"resulting":[181],"a":[183],"larger":[184],"maximum":[185,198],"local":[186,199],"experienced":[188],"demolding.":[193],"By":[194],"normalizing":[195],"overall":[197],"resist,":[207],"we":[208],"found":[209],"that":[210,220],"there":[211],"an":[213],"optimum":[214],"leads":[221],"most":[224],"successful":[225],"imprinting.":[226],"Our":[227],"finding":[228],"corroborated":[231],"qualitative":[233],"experimentations":[234],"performed":[235],"UV-NIL":[237],"with":[238],"various":[239]},"counts_by_year":[{"year":2026,"cited_by_count":4},{"year":2024,"cited_by_count":2},{"year":2023,"cited_by_count":2},{"year":2022,"cited_by_count":3},{"year":2018,"cited_by_count":4},{"year":2017,"cited_by_count":2},{"year":2016,"cited_by_count":4},{"year":2015,"cited_by_count":3},{"year":2014,"cited_by_count":7},{"year":2013,"cited_by_count":2}],"updated_date":"2026-10-16T09:59:22.235173","created_date":"2016-06-24T00:00:00"}