{"id":"https://openalex.org/W2319601902","doi":"https://doi.org/10.3788/cjl201542.0103007","title":"Fabrication of High-Aspect-Ratio All-Silicon Grooves Using Femtosecond Laser Irradiation and Wet Etching","display_name":"Fabrication of High-Aspect-Ratio All-Silicon Grooves Using Femtosecond Laser Irradiation and Wet Etching","publication_year":2015,"publication_date":"2015-01-01","ids":{"openalex":"https://openalex.org/W2319601902","doi":"https://doi.org/10.3788/cjl201542.0103007","mag":"2319601902"},"language":"en","primary_location":{"id":"doi:10.3788/cjl201542.0103007","doi":"https://doi.org/10.3788/cjl201542.0103007","is_oa":false,"landing_page_url":"http://doi.org/10.3788/cjl201542.0103007","pdf_url":null,"source":{"id":"https://openalex.org/S4210218867","display_name":"Chinese Journal of Lasers","issn_l":"0258-7025","issn":["0258-7025","1004-2822"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":["norway-1","poland-40","russia-white-list-3"],"host_organization":"https://openalex.org/P4310319982","host_organization_name":"Science Press","host_organization_lineage":["https://openalex.org/P4310319982"],"host_organization_lineage_names":["Science Press"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Chinese Journal of Lasers","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5003927797","display_name":"\u674e\u8273\u5a1c LI Yan-na","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u674e\u8273\u5a1c Li Yanna","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5025135491","display_name":"\u9648\u6d9b Chen Tao","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u9648\u6d9b Chen Tao","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5009588108","display_name":"\u6f58\u5b89 PAN An","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u6f58\u5b89 Pan An","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5034405877","display_name":"\u53f8\u91d1\u6d77 Si Jinhai","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u53f8\u91d1\u6d77 Si Jinhai","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"last","author":{"id":"https://openalex.org/A5030523413","display_name":"\u4faf\u6d35 Hou Xun","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u4faf\u6d35 Hou Xun","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.26062435,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"42","issue":"1","first_page":"0103007","last_page":"0103007"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10566","display_name":"Laser-Matter Interactions and Applications","score":0.00019999999494757503,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/femtosecond-laser-irradiation","display_name":"femtosecond laser irradiation","score":0.9330000281333923},{"id":"https://openalex.org/keywords/wet-etching","display_name":"wet etching","score":0.9160000085830688},{"id":"https://openalex.org/keywords/silicon-micromachining","display_name":"silicon micromachining","score":0.7760000228881836},{"id":"https://openalex.org/keywords/laser-assisted-etching","display_name":"laser-induced etching","score":0.41499999165534973}],"concepts":[{"id":"https://openalex.org/C167735695","wikidata":"https://www.wikidata.org/wiki/Q1777507","display_name":"Femtosecond","level":3,"score":0.7947218418121338},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7881999015808105},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.7440347671508789},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.7163424491882324},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.6861798763275146},{"id":"https://openalex.org/C111337013","wikidata":"https://www.wikidata.org/wiki/Q2737837","display_name":"Irradiation","level":2,"score":0.6614604592323303},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.6219748854637146},{"id":"https://openalex.org/C82558694","wikidata":"https://www.wikidata.org/wiki/Q1545619","display_name":"Aspect ratio (aeronautics)","level":2,"score":0.5596926808357239},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5173513293266296},{"id":"https://openalex.org/C33220542","wikidata":"https://www.wikidata.org/wiki/Q6086567","display_name":"Isotropic etching","level":4,"score":0.4200224280357361},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.3512771725654602},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.31562885642051697},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.054840803146362305},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.3788/cjl201542.0103007","doi":"https://doi.org/10.3788/cjl201542.0103007","is_oa":false,"landing_page_url":"http://doi.org/10.3788/cjl201542.0103007","pdf_url":null,"source":{"id":"https://openalex.org/S4210218867","display_name":"Chinese Journal of Lasers","issn_l":"0258-7025","issn":["0258-7025","1004-2822"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":["norway-1","poland-40","russia-white-list-3"],"host_organization":"https://openalex.org/P4310319982","host_organization_name":"Science Press","host_organization_lineage":["https://openalex.org/P4310319982"],"host_organization_lineage_names":["Science Press"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Chinese Journal of Lasers","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2519768913","https://openalex.org/W1971679235","https://openalex.org/W2093563734","https://openalex.org/W1980560020","https://openalex.org/W3153657560","https://openalex.org/W2070197608","https://openalex.org/W2735045567","https://openalex.org/W3033637260","https://openalex.org/W3150720445","https://openalex.org/W1617713705"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-09-26T08:19:03.415552","created_date":"2016-06-24T00:00:00"}