{"id":"https://openalex.org/W221242288","doi":null,"title":"High Power Impulse Magnetron Sputtering Discharges and Thin Film Growth: A Brief Review","display_name":"High Power Impulse Magnetron Sputtering Discharges and Thin Film Growth: A Brief Review","publication_year":2005,"publication_date":"2005-01-01","ids":{"openalex":"https://openalex.org/W221242288","mag":"221242288"},"language":"en","primary_location":{"id":"mag:221242288","doi":null,"is_oa":false,"landing_page_url":"http://www.diva-portal.org/smash/record.jsf?pid=diva2:251735","pdf_url":null,"source":null,"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":null},"volume":null,"type":"review","is_traditional":true,"indexed_in":[],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5034910199","display_name":"Ulf Helmersson","orcid":"https://orcid.org/0000-0002-1744-7322","observed_orcids":["https://orcid.org/0000-0002-1744-7322"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Ulf Helmersson","raw_affiliation_strings":[],"raw_orcid":"https://orcid.org/0000-0002-1744-7322","affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5025479661","display_name":"Martina Lattemann","orcid":"https://orcid.org/0000-0003-3500-8144","observed_orcids":["https://orcid.org/0000-0003-3500-8144"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Martina Lattemann","raw_affiliation_strings":[],"raw_orcid":"https://orcid.org/0000-0003-3500-8144","affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5048208257","display_name":"Jones Alami","orcid":"https://orcid.org/0000-0002-4919-5350","observed_orcids":["https://orcid.org/0000-0002-4919-5350"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Jones Alami","raw_affiliation_strings":[],"raw_orcid":"https://orcid.org/0000-0002-4919-5350","affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5004363811","display_name":"Johan B\u00f6hlmark","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Johan B\u00f6hlmark","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5005636385","display_name":"Arutiun Papken Ehiasarian","orcid":"https://orcid.org/0000-0001-6080-3946","observed_orcids":["https://orcid.org/0000-0001-6080-3946"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Arutiun P. Ehiasarian","raw_affiliation_strings":[],"raw_orcid":"https://orcid.org/0000-0001-6080-3946","affiliations":[]},{"author_position":"last","author":{"id":"https://openalex.org/A5033303813","display_name":"J\u00f3n T\u00f3mas Gu\u00f0mundsson","orcid":"https://orcid.org/0000-0002-8153-3209","observed_orcids":["https://orcid.org/0000-0002-8153-3209"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"J\u00f3n T\u00f3mas Gu\u00f0mundsson","raw_affiliation_strings":[],"raw_orcid":"https://orcid.org/0000-0002-8153-3209","affiliations":[]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0758,"has_fulltext":false,"cited_by_count":14,"citation_normalized_percentile":{"value":0.11940299,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":95},"biblio":{"volume":null,"issue":null,"first_page":"458","last_page":"464"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12077","display_name":"Vacuum and Plasma Arcs","score":0.25589999556541443,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12077","display_name":"Vacuum and Plasma Arcs","score":0.25589999556541443,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11920","display_name":"Pulsed Power Technology Applications","score":0.24660000205039978,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.21850000321865082,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/high-power-impulse-magnetron-sputtering","display_name":"high power impulse magnetron sputtering","score":1.0},{"id":"https://openalex.org/keywords/thin-film-growth","display_name":"thin film growth","score":0.8360000252723694},{"id":"https://openalex.org/keywords/degree-of-ionization","display_name":"degree of ionization","score":0.6909999847412109},{"id":"https://openalex.org/keywords/ion-energy-control","display_name":"ion energy control","score":0.6629999876022339},{"id":"https://openalex.org/keywords/magnetic-field-control","display_name":"magnetic field control","score":0.5109999775886536},{"id":"https://openalex.org/keywords/pvd-coatings","display_name":"PVD coatings","score":0.7139999866485596}],"concepts":[{"id":"https://openalex.org/C97892325","wikidata":"https://www.wikidata.org/wiki/Q1621956","display_name":"High-power impulse magnetron sputtering","level":5,"score":0.9854961037635803},{"id":"https://openalex.org/C198291218","wikidata":"https://www.wikidata.org/wiki/Q190382","display_name":"Ionization","level":3,"score":0.5885799527168274},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5880306363105774},{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.5686509013175964},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.49636322259902954},{"id":"https://openalex.org/C61696701","wikidata":"https://www.wikidata.org/wiki/Q770766","display_name":"Engineering physics","level":1,"score":0.4769764840602875},{"id":"https://openalex.org/C51576277","wikidata":"https://www.wikidata.org/wiki/Q900134","display_name":"Physical vapor deposition","level":3,"score":0.4728853106498718},{"id":"https://openalex.org/C123408415","wikidata":"https://www.wikidata.org/wiki/Q194154","display_name":"Cavity magnetron","level":4,"score":0.4728147089481354},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.46529731154441833},{"id":"https://openalex.org/C70836080","wikidata":"https://www.wikidata.org/wiki/Q837940","display_name":"Impulse (physics)","level":2,"score":0.4575577974319458},{"id":"https://openalex.org/C2781448156","wikidata":"https://www.wikidata.org/wiki/Q1570182","display_name":"Coating","level":2,"score":0.44629132747650146},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.44126665592193604},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.4410057067871094},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.3493250608444214},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.24970874190330505},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.1919509768486023},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.17928317189216614},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"mag:221242288","doi":null,"is_oa":false,"landing_page_url":"http://www.diva-portal.org/smash/record.jsf?pid=diva2:251735","pdf_url":null,"source":null,"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":null}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":34,"referenced_works":["https://openalex.org/W5212686","https://openalex.org/W1784681197","https://openalex.org/W1971319331","https://openalex.org/W1981206693","https://openalex.org/W2003044025","https://openalex.org/W2004691564","https://openalex.org/W2004982340","https://openalex.org/W2010378341","https://openalex.org/W2012761187","https://openalex.org/W2014080023","https://openalex.org/W2016724048","https://openalex.org/W2023301340","https://openalex.org/W2023715252","https://openalex.org/W2025801567","https://openalex.org/W2029460333","https://openalex.org/W2030999196","https://openalex.org/W2032750731","https://openalex.org/W2035332527","https://openalex.org/W2049373275","https://openalex.org/W2051944828","https://openalex.org/W2052948173","https://openalex.org/W2053871808","https://openalex.org/W2055057073","https://openalex.org/W2073405483","https://openalex.org/W2078109349","https://openalex.org/W2080367517","https://openalex.org/W2083454971","https://openalex.org/W2084210225","https://openalex.org/W2088310394","https://openalex.org/W2102970728","https://openalex.org/W2116747218","https://openalex.org/W2137879896","https://openalex.org/W2171095408","https://openalex.org/W2324938202"],"related_works":["https://openalex.org/W2226363397","https://openalex.org/W2207445862","https://openalex.org/W2090071143","https://openalex.org/W2160430137","https://openalex.org/W51152275","https://openalex.org/W2112295128","https://openalex.org/W7037979330","https://openalex.org/W2893900612","https://openalex.org/W582639562","https://openalex.org/W4242710635"],"abstract_inverted_index":{"High":[0],"power":[1],"impulse":[2],"magnetron":[3,78],"sputtering":[4],"(HIPIMS)":[5],"is":[6,46,89],"a":[7,24,133],"promising":[8],"technique":[9],"for":[10,132],"utilizing":[11],"ionized":[12],"PVD":[13],"in":[14,23,77,102],"many":[15,103],"industrial":[16],"coating":[17],"processes.":[18],"The":[19],"HIPIMS":[20,97,123],"process":[21,98],"results":[22],"high":[25],"degree":[26],"of":[27,29,35,47,109,118,121,136],"ionization":[28,36],"the":[30,69,82,96,107,115,119,122,137],"deposition":[31],"material.":[32],"Reported":[33],"values":[34],"range":[37],"from":[38,87],"4.5%":[39],"up":[40,74],"to":[41,56,84,91,100],"more":[42],"than":[43],"90%.":[44],"This":[45,72,94],"immense":[48],"interest":[49],"since":[50],"ions":[51],"are":[52,130],"controllable":[53],"with":[54],"respect":[55],"energy":[57],"and":[58,85,124],"direction,":[59],"using":[60],"electric":[61],"or":[62],"magnetic":[63],"fields,":[64],"as":[65],"they":[66],"arrive":[67],"at":[68],"growth":[70],"surface.":[71],"opens":[73],"new":[75],"avenues":[76],"sputtering.":[79],"Furthermore,":[80],"guiding":[81],"material":[83],"away":[86],"surfaces":[88],"obtainable":[90],"some":[92],"degree.":[93],"makes":[95],"similar":[99],"arc-evaporations":[101],"respects,":[104],"however,":[105],"without":[106],"drawback":[108],"macro-particle":[110],"generation.":[111],"Here":[112],"we":[113],"review":[114],"present":[116],"status":[117],"development":[120],"discuss":[125],"areas":[126],"where":[127],"further":[128],"improvements":[129],"needed":[131],"successful":[134],"application":[135],"technique.":[138]},"counts_by_year":[{"year":2022,"cited_by_count":1},{"year":2019,"cited_by_count":2},{"year":2018,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2015,"cited_by_count":1},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2026-10-16T09:59:22.235173","created_date":"2016-06-24T00:00:00"}