{"id":"https://openalex.org/W2199309019","doi":null,"title":"Self-assembly of Fine Particles Applied to the Production of Antireflective Surfaces","display_name":"Self-assembly of Fine Particles Applied to the Production of Antireflective Surfaces","publication_year":2008,"publication_date":"2008-01-01","ids":{"openalex":"https://openalex.org/W2199309019","mag":"2199309019"},"language":"en","primary_location":{"id":"pmh:oai:irdb.nii.ac.jp:00891:0002903245","doi":null,"is_oa":true,"landing_page_url":"https://tokyo-metro-u.repo.nii.ac.jp/records/6870","pdf_url":null,"source":{"id":"https://openalex.org/S7407056385","display_name":"Institutional Repositories DataBase (IRDB)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I184597095","host_organization_name":"National Institute of Informatics","host_organization_lineage":["https://openalex.org/I184597095"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"acceptedVersion","is_accepted":true,"is_published":false,"raw_source_name":"International Journal of Precision Engineering and Manufacturing","raw_type":"journal article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":[],"open_access":{"is_oa":true,"oa_status":"green","oa_url":"https://tokyo-metro-u.repo.nii.ac.jp/records/6870","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5081113258","display_name":"Hayato Kobayashi","orcid":"https://orcid.org/0000-0003-3919-2188","observed_orcids":["https://orcid.org/0000-0003-3919-2188"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Hayato Kobayashi","raw_affiliation_strings":[],"raw_orcid":"https://orcid.org/0000-0003-3919-2188","affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5089416460","display_name":"Nobuyuki MORONUKI","orcid":"https://orcid.org/0000-0002-2427-7608","observed_orcids":["https://orcid.org/0000-0002-2427-7608"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Nobuyuki MORONUKI","raw_affiliation_strings":[],"raw_orcid":"https://orcid.org/0000-0002-2427-7608","affiliations":[]},{"author_position":"last","author":{"id":"https://openalex.org/A5067494297","display_name":"Arata Kaneko","orcid":"https://orcid.org/0000-0001-8331-9356","observed_orcids":["https://orcid.org/0000-0001-8331-9356"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Arata Kaneko","raw_affiliation_strings":[],"raw_orcid":"https://orcid.org/0000-0001-8331-9356","affiliations":[]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":1.3048,"has_fulltext":false,"cited_by_count":19,"citation_normalized_percentile":{"value":0.75051305,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":98},"biblio":{"volume":"9","issue":"1","first_page":"25","last_page":"29"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.788100004196167,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.788100004196167,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.1348000019788742,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10666","display_name":"Photonic Crystals and Applications","score":0.03099999949336052,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/anti-reflective-surfaces","display_name":"anti-reflective surfaces","score":0.8769999742507935},{"id":"https://openalex.org/keywords/self-assembly","display_name":"self-assembly","score":0.859000027179718},{"id":"https://openalex.org/keywords/silica-particles","display_name":"silica particles","score":0.9139999747276306},{"id":"https://openalex.org/keywords/hexagonal-monolayer","display_name":"hexagonal monolayer","score":0.8510000109672546},{"id":"https://openalex.org/keywords/reactive-ion-etching","display_name":"reactive ion etching","score":0.9419999718666077},{"id":"https://openalex.org/keywords/nanocone-arrays","display_name":"nanocone arrays","score":0.6259999871253967},{"id":"https://openalex.org/keywords/silicon-wafers","display_name":"silicon wafers","score":0.5989999771118164},{"id":"https://openalex.org/keywords/antireflection","display_name":"antireflection","score":0.6050000190734863},{"id":"https://openalex.org/keywords/side-etching","display_name":"side etching","score":0.5860000252723694},{"id":"https://openalex.org/keywords/structured-surfaces","display_name":"structured surfaces","score":0.3709999918937683}],"concepts":[{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.8510534763336182},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7778776288032532},{"id":"https://openalex.org/C108406538","wikidata":"https://www.wikidata.org/wiki/Q583040","display_name":"Anti-reflective coating","level":3,"score":0.7196411490440369},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.7055227756500244},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.51765376329422},{"id":"https://openalex.org/C130472188","wikidata":"https://www.wikidata.org/wiki/Q1640159","display_name":"Reactive-ion etching","level":4,"score":0.498964786529541},{"id":"https://openalex.org/C7070889","wikidata":"https://www.wikidata.org/wiki/Q902488","display_name":"Monolayer","level":2,"score":0.4983103275299072},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.49496597051620483},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.49224844574928284},{"id":"https://openalex.org/C105341887","wikidata":"https://www.wikidata.org/wiki/Q1307987","display_name":"Suspension (topology)","level":3,"score":0.49160581827163696},{"id":"https://openalex.org/C77066764","wikidata":"https://www.wikidata.org/wiki/Q178674","display_name":"Nanometre","level":2,"score":0.4730849862098694},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4597035348415375},{"id":"https://openalex.org/C1291036","wikidata":"https://www.wikidata.org/wiki/Q1191918","display_name":"Dry etching","level":4,"score":0.4488428831100464},{"id":"https://openalex.org/C124634506","wikidata":"https://www.wikidata.org/wiki/Q486936","display_name":"Deep reactive-ion etching","level":5,"score":0.4448525607585907},{"id":"https://openalex.org/C2780357685","wikidata":"https://www.wikidata.org/wiki/Q154357","display_name":"Nano-","level":2,"score":0.4352731704711914},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.4012998342514038},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.25185859203338623},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.23430722951889038},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C5961521","wikidata":"https://www.wikidata.org/wiki/Q746083","display_name":"Homotopy","level":2,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.0},{"id":"https://openalex.org/C202444582","wikidata":"https://www.wikidata.org/wiki/Q837863","display_name":"Pure mathematics","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"pmh:oai:irdb.nii.ac.jp:00891:0002903245","doi":null,"is_oa":true,"landing_page_url":"https://tokyo-metro-u.repo.nii.ac.jp/records/6870","pdf_url":null,"source":{"id":"https://openalex.org/S7407056385","display_name":"Institutional Repositories DataBase (IRDB)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I184597095","host_organization_name":"National Institute of Informatics","host_organization_lineage":["https://openalex.org/I184597095"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"acceptedVersion","is_accepted":true,"is_published":false,"raw_source_name":"International Journal of Precision Engineering and Manufacturing","raw_type":"journal article"},{"id":"mag:2199309019","doi":null,"is_oa":false,"landing_page_url":"http://www.dbpia.co.kr/Journal/ArticleDetail/NODE00932552?q=(%5BSEER%C2%A7coldb%C2%A72%C2%A751%C2%A73%5D)&fCategory=76%5E_ND02%5E_%EA%B8%B0%EA%B3%84%EA%B3%B5%ED%95%99&fRegister=79%5E_065002%5E_SCIE&Multimedia=0&SearchAll=SEER&isFullText=0&specificParam=0&SearchMethod=0&Sort=1&SortType=desc","pdf_url":null,"source":{"id":"https://openalex.org/S130039360","display_name":"International Journal of Precision Engineering and Manufacturing","issn_l":"1229-8557","issn":["1229-8557","2005-4602","2234-7593"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-d","jufo-1","kci-registered","poland-70","russia-white-list-2"],"host_organization":"https://openalex.org/P4310319900","host_organization_name":"Springer Science+Business Media","host_organization_lineage":["https://openalex.org/P4310319900","https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Science+Business Media","Springer Nature"],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":"International Journal of Precision Engineering and Manufacturing","raw_type":null}],"best_oa_location":{"id":"pmh:oai:irdb.nii.ac.jp:00891:0002903245","doi":null,"is_oa":true,"landing_page_url":"https://tokyo-metro-u.repo.nii.ac.jp/records/6870","pdf_url":null,"source":{"id":"https://openalex.org/S7407056385","display_name":"Institutional Repositories DataBase (IRDB)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I184597095","host_organization_name":"National Institute of Informatics","host_organization_lineage":["https://openalex.org/I184597095"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"acceptedVersion","is_accepted":true,"is_published":false,"raw_source_name":"International Journal of Precision Engineering and Manufacturing","raw_type":"journal article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":2,"referenced_works":["https://openalex.org/W1519537114","https://openalex.org/W2207924089"],"related_works":["https://openalex.org/W1966383465","https://openalex.org/W3125367110","https://openalex.org/W2335718291","https://openalex.org/W1982408643","https://openalex.org/W2063467201","https://openalex.org/W2021936670","https://openalex.org/W2020440394","https://openalex.org/W2023728031","https://openalex.org/W1993415429","https://openalex.org/W2081615829"],"abstract_inverted_index":{"We":[0,123],"introduce":[1],"a":[2,17,25,37,70,138,157],"new":[3],"fabrication":[4],"process":[5],"for":[6,72,170],"antireflective":[7],"structured":[8],"surfaces.":[9],"A":[10],"4-inch":[11],"silicon":[12],"wafer":[13,30,49],"was":[14,31,137,154,167],"dipped":[15],"in":[16,24,172],"suspension":[18],"of":[19,34,42,80,120,127,144,164],"300-nm-diameter":[20],"silica":[21,66],"particles":[22,43,67,96],"dispersed":[23],"toluene":[26],"solution.":[27],"When":[28],"the":[29,35,47,53,73,87,92,104,125,134,165,173],"drawn":[32],"out":[33],"suspension,":[36],"hexagonally":[38],"packed":[39],"monolayer":[40],"structure":[41],"self-assembled":[44,65],"on":[45,130,156],"almost":[46],"complete":[48],"surface.":[50],"Due":[51],"to":[52,60,91,114,116],"simple":[54],"process,":[55],"this":[56],"could":[57,83],"be":[58,84],"applied":[59],"micro-":[61],"and":[62,108,133,142,147],"nano-patterning.":[63],"The":[64,162],"worked":[68],"as":[69],"mask":[71],"subsequent":[74],"reactive":[75],"ion":[76],"etching.":[77],"An":[78],"array":[79,119],"nanometer-sized":[81],"pits":[82,105,112],"fabricated":[85],"since":[86],"regions":[88],"that":[89],"correspond":[90],"small":[93],"gaps":[94],"between":[95],"were":[97],"selectively":[98],"etched":[99],"off.":[100],"As":[101],"etching":[102,128],"progressed,":[103],"became":[106],"deeper":[107],"combined":[109],"with":[110,140],"neighboring":[111],"due":[113],"side-etching":[115],"produce":[117],"an":[118],"cone-like":[121],"structures.":[122],"investigated":[124],"effect":[126],"conditions":[129],"antireflection":[131],"properties,":[132],"optimum":[135],"shape":[136],"nano-cone":[139],"height":[141],"spacing":[143],"500":[145],"nm":[146],"300":[148],"nm,":[149],"respectively.":[150],"This":[151],"nano-structured":[152],"surface":[153,166],"prepared":[155],"30":[158],"\u00d7":[159],"10-nm":[160],"area.":[161],"reflectivity":[163],"reduced":[168],"97%":[169],"wavelengths":[171],"range":[174],"400-700":[175],"nm.":[176]},"counts_by_year":[{"year":2022,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2016,"cited_by_count":2},{"year":2015,"cited_by_count":1},{"year":2014,"cited_by_count":1},{"year":2012,"cited_by_count":5}],"updated_date":"2025-10-10T17:16:08.811792","created_date":"2016-06-24T00:00:00"}