{"id":"https://openalex.org/W2189070710","doi":null,"title":"Power System Requirements for Enhanced Mid-Frequency Process Stability","display_name":"Power System Requirements for Enhanced Mid-Frequency Process Stability","publication_year":2003,"publication_date":"2003-01-01","ids":{"openalex":"https://openalex.org/W2189070710","mag":"2189070710"},"language":"en","primary_location":{"id":"mag:2189070710","doi":null,"is_oa":false,"landing_page_url":"http://www.advanced-energy.com/upload/File/Reprints/Pwr%20Syst%20Require%20Enhan%20Mid-Freq%20Proc%20Stab.pdf","pdf_url":null,"source":null,"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":null},"volume":null,"type":"article","is_traditional":true,"indexed_in":[],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5064511087","display_name":"David J. Christie","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"D.J. Christie","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"last","author":{"id":"https://openalex.org/A5035174156","display_name":"Eric Seymour","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"E. Seymour","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.25865856,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.6298999786376953,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.6298999786376953,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12077","display_name":"Vacuum and Plasma Arcs","score":0.3167000114917755,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11920","display_name":"Pulsed Power Technology Applications","score":0.00860000029206276,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/process-stability","display_name":"process stability","score":0.781000018119812},{"id":"https://openalex.org/keywords/plasma-stability","display_name":"plasma stability","score":0.871999979019165},{"id":"https://openalex.org/keywords/power-supply-configuration","display_name":"power supply configuration","score":0.6179999709129333},{"id":"https://openalex.org/keywords/arc-detection","display_name":"arc detection","score":0.6340000033378601},{"id":"https://openalex.org/keywords/process-simulation-model","display_name":"process simulation model","score":0.640999972820282}],"concepts":[{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.5444139838218689},{"id":"https://openalex.org/C108755667","wikidata":"https://www.wikidata.org/wiki/Q1930258","display_name":"AC power","level":3,"score":0.5101661682128906},{"id":"https://openalex.org/C68463220","wikidata":"https://www.wikidata.org/wiki/Q27165","display_name":"Partial pressure","level":3,"score":0.5074638724327087},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.46517372131347656},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.4548233151435852},{"id":"https://openalex.org/C163258240","wikidata":"https://www.wikidata.org/wiki/Q25342","display_name":"Power (physics)","level":2,"score":0.4463450610637665},{"id":"https://openalex.org/C114375839","wikidata":"https://www.wikidata.org/wiki/Q207456","display_name":"Electric arc","level":3,"score":0.4434363842010498},{"id":"https://openalex.org/C116915560","wikidata":"https://www.wikidata.org/wiki/Q83504","display_name":"Nuclear engineering","level":1,"score":0.4397537112236023},{"id":"https://openalex.org/C112972136","wikidata":"https://www.wikidata.org/wiki/Q7595718","display_name":"Stability (learning theory)","level":2,"score":0.4344331622123718},{"id":"https://openalex.org/C47446073","wikidata":"https://www.wikidata.org/wiki/Q5165890","display_name":"Control theory (sociology)","level":3,"score":0.43367624282836914},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.4166209399700165},{"id":"https://openalex.org/C57879066","wikidata":"https://www.wikidata.org/wiki/Q41217","display_name":"Mechanics","level":1,"score":0.3666747808456421},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.254472017288208},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.23264384269714355},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.2272644340991974},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.16311109066009521},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.14786911010742188},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.1071678102016449},{"id":"https://openalex.org/C540031477","wikidata":"https://www.wikidata.org/wiki/Q629","display_name":"Oxygen","level":2,"score":0.08733785152435303},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.0},{"id":"https://openalex.org/C2775924081","wikidata":"https://www.wikidata.org/wiki/Q55608371","display_name":"Control (management)","level":2,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C17525397","wikidata":"https://www.wikidata.org/wiki/Q176140","display_name":"Electrode","level":2,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C119857082","wikidata":"https://www.wikidata.org/wiki/Q2539","display_name":"Machine learning","level":1,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"mag:2189070710","doi":null,"is_oa":false,"landing_page_url":"http://www.advanced-energy.com/upload/File/Reprints/Pwr%20Syst%20Require%20Enhan%20Mid-Freq%20Proc%20Stab.pdf","pdf_url":null,"source":null,"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":null}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":6,"referenced_works":["https://openalex.org/W1993085228","https://openalex.org/W2002787266","https://openalex.org/W2029856062","https://openalex.org/W2035114728","https://openalex.org/W2040870129","https://openalex.org/W2798566718"],"related_works":["https://openalex.org/W7128481148","https://openalex.org/W1965201208","https://openalex.org/W2028446087","https://openalex.org/W2187010932","https://openalex.org/W4395962514","https://openalex.org/W7163149778","https://openalex.org/W2755781404","https://openalex.org/W1994809831","https://openalex.org/W4243409127","https://openalex.org/W2035114728"],"abstract_inverted_index":{"Mid-frequency":[0],"processes":[1,59],"are":[2],"commonly":[3],"used":[4],"for":[5,57,110,170],"deposition":[6],"of":[7,44,94,118],"compounds":[8],"by":[9,41],"dual":[10],"magnetron":[11],"reactive":[12,26,89,120],"sputtering.":[13],"However,":[14],"process":[15,36,76,157],"stability":[16,24,30,37],"has":[17],"been":[18],"an":[19,131,140],"ongoing":[20],"issue.":[21],"Both":[22],"plasma":[23,86],"and":[25,51,67,160,165],"gas":[27,65,121,137],"partial":[28,116,147],"pressure":[29,66,117,138,148],"need":[31],"to":[32,83,97,122,127,130,135],"be":[33,80,151],"considered.":[34],"Short-term":[35],"is":[38,100,125],"strongly":[39],"affected":[40],"the":[42,45,92,104,115,119,146],"characteristics":[43,56],"power":[46,77,105],"system,":[47],"including":[48],"generator,":[49],"cabling,":[50],"arc":[52,111,132,163],"handling":[53],"method.":[54],"Plasma":[55],"sputtering":[58,90],"vary":[60],"wildly":[61],"with":[62,153],"changes":[63],"in":[64,72,133],"content,":[68],"exhibiting":[69],"extreme":[70],"hysteresis":[71],"some":[73],"cases.":[74],"The":[75],"system":[78],"must":[79],"carefully":[81],"configured":[82],"provide":[84],"short-term":[85],"stability.":[87],"In":[88],"processes,":[91],"flux":[93],"target":[95],"atoms":[96],"chamber":[98],"surfaces":[99],"shut":[101],"off":[102,109],"when":[103],"supply":[106],"output":[107],"turns":[108],"handling.":[112],"This":[113],"causes":[114],"rise.":[123],"It":[124],"necessary":[126],"respond":[128],"quickly":[129],"order":[134],"maintain":[136],"within":[139],"acceptable":[141],"range.":[142],"We":[143],"show":[144],"how":[145],"variation":[149],"may":[150],"estimated":[152],"a":[154],"simple":[155],"dynamical":[156],"simulation":[158],"model,":[159],"further":[161],"develop":[162],"detection":[164],"response":[166],"time":[167],"scale":[168],"requirements":[169],"transition":[171],"mode":[172],"operation.":[173]},"counts_by_year":[],"updated_date":"2026-09-22T06:50:58.402377","created_date":"2016-06-24T00:00:00"}