{"id":"https://openalex.org/W2175127359","doi":"https://doi.org/10.1007/3-540-29303-5_35","title":"EUVA\u2019s challenges toward 0.1nm accuracy in EUV at-wavelength interferometry","display_name":"EUVA\u2019s challenges toward 0.1nm accuracy in EUV at-wavelength interferometry","publication_year":2006,"publication_date":"2006-01-18","ids":{"openalex":"https://openalex.org/W2175127359","doi":"https://doi.org/10.1007/3-540-29303-5_35","mag":"2175127359"},"language":"en","primary_location":{"id":"doi:10.1007/3-540-29303-5_35","doi":"https://doi.org/10.1007/3-540-29303-5_35","is_oa":false,"landing_page_url":"https://doi.org/10.1007/3-540-29303-5_35","pdf_url":null,"source":{"id":"https://openalex.org/S4306463937","display_name":"Springer eBooks","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310319965","host_organization_name":"Springer Nature","host_organization_lineage":["https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Nature"],"type":"ebook platform"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Fringe 2005","raw_type":"book-chapter"},"volume":{"id":"https://openalex.org/W4237301642","display_name":"Fringe 2005"},"type":"book-chapter","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5087091790","display_name":"Katsumi Sugisaki","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Katsumi Sugisaki","raw_affiliation_strings":["The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5030840278","display_name":"Masanobu Hasegawa","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Masanobu Hasegawa","raw_affiliation_strings":["The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":null,"display_name":"Masashi Okada","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Masashi Okada","raw_affiliation_strings":["The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101195701","display_name":"Yucong Zhu","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Zhu Yucong","raw_affiliation_strings":["The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5071079559","display_name":"Katsura Otaki","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Katsura Otaki","raw_affiliation_strings":["The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100415093","display_name":"Zhi-Qiang Liu","orcid":"https://orcid.org/0000-0002-1883-2871","observed_orcids":["https://orcid.org/0000-0002-1883-2871"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Zhiqiang Liu","raw_affiliation_strings":["The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5084092106","display_name":"Mikihiko Ishii","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Mikihiko Ishii","raw_affiliation_strings":["The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5009266428","display_name":"Jun Kawakami","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Jun Kawakami","raw_affiliation_strings":["The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5062033510","display_name":"Katsuhiko Murakami","orcid":"https://orcid.org/0000-0002-1923-4259","observed_orcids":["https://orcid.org/0000-0002-1923-4259"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Katsuhiko Murakami","raw_affiliation_strings":["The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108722709","display_name":"Jun Saito","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Jun Saito","raw_affiliation_strings":["The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111887662","display_name":"Seima Kato","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Seima Kato","raw_affiliation_strings":["The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5005743728","display_name":"Chidane Ouchi","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Chidane Ouchi","raw_affiliation_strings":["The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5042301565","display_name":"Akinori Ohkubo","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Akinori Ohkubo","raw_affiliation_strings":["The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5088886812","display_name":"Yoshiyuki Sekine","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Yoshiyuki Sekine","raw_affiliation_strings":["The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":null,"display_name":"Takayuki Hasegawa","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Takayuki Hasegawa","raw_affiliation_strings":["The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109087342","display_name":"Akiyoshi Suzuki","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Akiyoshi Suzuki","raw_affiliation_strings":["The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Extreme Ultraviolet Lithography System Development Association, (EUVA)3-23 Kanda Nishiki-cho Chiyoda-ku, Tokyo, 101-0054, Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5027025411","display_name":"Masahito Niibe","orcid":"https://orcid.org/0000-0001-7609-9199","observed_orcids":["https://orcid.org/0000-0001-7609-9199"]},"institutions":[{"id":"https://openalex.org/I180941496","display_name":"University of Hyogo","ror":"https://ror.org/0151bmh98","country_code":"JP","type":"education","lineage":["https://openalex.org/I180941496"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Masahito Niibe","raw_affiliation_strings":["University of Hyogo, 3-1-2 Kouto, Kamigori-cho, Ako-gun, Hyogo, 678-1205, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Hyogo, 3-1-2 Kouto, Kamigori-cho, Ako-gun, Hyogo, 678-1205, Japan","institution_ids":["https://openalex.org/I180941496"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5103064892","display_name":"Mitsuo Takeda","orcid":"https://orcid.org/0009-0002-5020-9315","observed_orcids":["https://orcid.org/0009-0002-5020-9315"]},"institutions":[{"id":"https://openalex.org/I20529979","display_name":"University of Electro-Communications","ror":"https://ror.org/02x73b849","country_code":"JP","type":"education","lineage":["https://openalex.org/I20529979"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Mitsuo Takeda","raw_affiliation_strings":["University of Electro-Communications, 1-5-1, Chofugaoka, Chofu, 182-8585, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Electro-Communications, 1-5-1, Chofugaoka, Chofu, 182-8585, Japan","institution_ids":["https://openalex.org/I20529979"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":6,"citation_normalized_percentile":{"value":0.10379492,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":null,"issue":null,"first_page":"252","last_page":"266"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11583","display_name":"Advanced Measurement and Metrology Techniques","score":0.6820999979972839,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11583","display_name":"Advanced Measurement and Metrology Techniques","score":0.6820999979972839,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10638","display_name":"Optical measurement and interference techniques","score":0.23999999463558197,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.04670000076293945,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/euv-lithography","display_name":"EUV lithography","score":0.8270000219345093},{"id":"https://openalex.org/keywords/wavefront-sensing","display_name":"wavefront sensing","score":0.6990000009536743},{"id":"https://openalex.org/keywords/interferometer-calibration","display_name":"interferometer calibration","score":0.8690000176429749}],"concepts":[{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.9754223227500916},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.7347389459609985},{"id":"https://openalex.org/C166689943","wikidata":"https://www.wikidata.org/wiki/Q850283","display_name":"Interferometry","level":2,"score":0.6756657361984253},{"id":"https://openalex.org/C195766429","wikidata":"https://www.wikidata.org/wiki/Q394","display_name":"Metrology","level":2,"score":0.615533709526062},{"id":"https://openalex.org/C165838908","wikidata":"https://www.wikidata.org/wiki/Q736777","display_name":"Calibration","level":2,"score":0.6153863072395325},{"id":"https://openalex.org/C165699331","wikidata":"https://www.wikidata.org/wiki/Q461533","display_name":"Wavefront","level":2,"score":0.5782186388969421},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.5378434062004089},{"id":"https://openalex.org/C6260449","wikidata":"https://www.wikidata.org/wiki/Q41364","display_name":"Wavelength","level":2,"score":0.5275706052780151},{"id":"https://openalex.org/C132771110","wikidata":"https://www.wikidata.org/wiki/Q506922","display_name":"Adaptive optics","level":2,"score":0.4644247591495514},{"id":"https://openalex.org/C202799725","wikidata":"https://www.wikidata.org/wiki/Q272035","display_name":"Accuracy and precision","level":2,"score":0.45180973410606384},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.41038402915000916},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1007/3-540-29303-5_35","doi":"https://doi.org/10.1007/3-540-29303-5_35","is_oa":false,"landing_page_url":"https://doi.org/10.1007/3-540-29303-5_35","pdf_url":null,"source":{"id":"https://openalex.org/S4306463937","display_name":"Springer eBooks","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310319965","host_organization_name":"Springer Nature","host_organization_lineage":["https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Nature"],"type":"ebook platform"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Fringe 2005","raw_type":"book-chapter"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":18,"referenced_works":["https://openalex.org/W160743765","https://openalex.org/W1649590900","https://openalex.org/W1969765508","https://openalex.org/W2001543265","https://openalex.org/W2023545939","https://openalex.org/W2044785336","https://openalex.org/W2064176573","https://openalex.org/W2065013540","https://openalex.org/W2068281673","https://openalex.org/W2078243939","https://openalex.org/W2080433527","https://openalex.org/W2082394705","https://openalex.org/W2125624206","https://openalex.org/W2127276282","https://openalex.org/W2166560970","https://openalex.org/W4237930338","https://openalex.org/W4253867788","https://openalex.org/W4321133471"],"related_works":["https://openalex.org/W2055145971","https://openalex.org/W1658771667","https://openalex.org/W1988627834","https://openalex.org/W2010379907","https://openalex.org/W2111704234","https://openalex.org/W2001543265","https://openalex.org/W2063023619","https://openalex.org/W1975720565","https://openalex.org/W2545547345","https://openalex.org/W2077561332"],"abstract_inverted_index":null,"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2026-10-14T16:39:01.820549","created_date":"2016-06-24T00:00:00"}