{"id":"https://openalex.org/W2167989082","doi":"https://doi.org/10.1016/s0167-9317(97)00150-0","title":"Epitaxial CoSi2 formation by Co/Hf bilayers on Si(100)","display_name":"Epitaxial CoSi2 formation by Co/Hf bilayers on Si(100)","publication_year":1997,"publication_date":"1997-11-01","ids":{"openalex":"https://openalex.org/W2167989082","doi":"https://doi.org/10.1016/s0167-9317(97)00150-0","mag":"2167989082"},"language":"en","primary_location":{"id":"doi:10.1016/s0167-9317(97)00150-0","doi":"https://doi.org/10.1016/s0167-9317(97)00150-0","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0167-9317(97)00150-0","pdf_url":null,"source":{"id":"https://openalex.org/S158028765","display_name":"Microelectronic Engineering","issn_l":"0167-9317","issn":["0167-9317","1873-5568"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Microelectronic Engineering","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5079770386","display_name":"B. Gebhardt","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2610724","display_name":"Chemnitz University of Technology","ror":"https://ror.org/00a208s56","country_code":"DE","type":"education","lineage":["https://openalex.org/I2610724"]}],"countries":["DE"],"is_corresponding":true,"raw_author_name":"B. Gebhardt","raw_affiliation_strings":["Institute of Physics, Technical University of Chemnitz, D-09107 Chemnitz, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Physics, Technical University of Chemnitz, D-09107 Chemnitz, Germany","institution_ids":["https://openalex.org/I2610724"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102878205","display_name":"M. Falke","orcid":"https://orcid.org/0000-0002-5639-493X","observed_orcids":["https://orcid.org/0000-0002-5639-493X"]},"institutions":[{"id":"https://openalex.org/I2610724","display_name":"Chemnitz University of Technology","ror":"https://ror.org/00a208s56","country_code":"DE","type":"education","lineage":["https://openalex.org/I2610724"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"M. Falke","raw_affiliation_strings":["Institute of Physics, Technical University of Chemnitz, D-09107 Chemnitz, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Physics, Technical University of Chemnitz, D-09107 Chemnitz, Germany","institution_ids":["https://openalex.org/I2610724"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5068358655","display_name":"H. Giesler","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2610724","display_name":"Chemnitz University of Technology","ror":"https://ror.org/00a208s56","country_code":"DE","type":"education","lineage":["https://openalex.org/I2610724"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"H. Giesler","raw_affiliation_strings":["Institute of Physics, Technical University of Chemnitz, D-09107 Chemnitz, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Physics, Technical University of Chemnitz, D-09107 Chemnitz, Germany","institution_ids":["https://openalex.org/I2610724"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5010832704","display_name":"Steffen Teichert","orcid":"https://orcid.org/0000-0002-0977-880X","observed_orcids":["https://orcid.org/0000-0002-0977-880X"]},"institutions":[{"id":"https://openalex.org/I2610724","display_name":"Chemnitz University of Technology","ror":"https://ror.org/00a208s56","country_code":"DE","type":"education","lineage":["https://openalex.org/I2610724"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"S. Teichert","raw_affiliation_strings":["Institute of Physics, Technical University of Chemnitz, D-09107 Chemnitz, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Physics, Technical University of Chemnitz, D-09107 Chemnitz, Germany","institution_ids":["https://openalex.org/I2610724"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5037316387","display_name":"Gunter Beddies","orcid":"https://orcid.org/0009-0001-5928-5202","observed_orcids":["https://orcid.org/0009-0001-5928-5202"]},"institutions":[{"id":"https://openalex.org/I2610724","display_name":"Chemnitz University of Technology","ror":"https://ror.org/00a208s56","country_code":"DE","type":"education","lineage":["https://openalex.org/I2610724"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"G. Beddies","raw_affiliation_strings":["Institute of Physics, Technical University of Chemnitz, D-09107 Chemnitz, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Physics, Technical University of Chemnitz, D-09107 Chemnitz, Germany","institution_ids":["https://openalex.org/I2610724"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5110028908","display_name":"H.\u2010J. Hinneberg","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2610724","display_name":"Chemnitz University of Technology","ror":"https://ror.org/00a208s56","country_code":"DE","type":"education","lineage":["https://openalex.org/I2610724"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"H.-J. Hinneberg","raw_affiliation_strings":["Institute of Physics, Technical University of Chemnitz, D-09107 Chemnitz, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Physics, Technical University of Chemnitz, D-09107 Chemnitz, Germany","institution_ids":["https://openalex.org/I2610724"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5079770386"],"corresponding_institution_ids":["https://openalex.org/I2610724"],"apc_list":{"value":2860,"currency":"USD","value_usd":2860},"apc_paid":null,"fwci":0.9109,"has_fulltext":false,"cited_by_count":5,"citation_normalized_percentile":{"value":0.74236627,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"37-38","issue":null,"first_page":"483","last_page":"490"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.00019999999494757503,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13531","display_name":"Surface and Thin Film Phenomena","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/cobalt-silicide","display_name":"cobalt silicide","score":0.8479999899864197},{"id":"https://openalex.org/keywords/si-100","display_name":"Si(100)","score":0.8640000224113464},{"id":"https://openalex.org/keywords/annealing","display_name":"annealing","score":0.6110000014305115},{"id":"https://openalex.org/keywords/crystalline-quality","display_name":"crystal quality","score":0.7609999775886536},{"id":"https://openalex.org/keywords/electrical-resistivity","display_name":"electrical resistivity","score":0.7599999904632568},{"id":"https://openalex.org/keywords/hall-coefficient","display_name":"Hall coefficient","score":0.9760000109672546}],"concepts":[{"id":"https://openalex.org/C110738630","wikidata":"https://www.wikidata.org/wiki/Q1135540","display_name":"Epitaxy","level":3,"score":0.7973474264144897},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.7577282190322876},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7437337040901184},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.5295934081077576},{"id":"https://openalex.org/C64452783","wikidata":"https://www.wikidata.org/wiki/Q1524945","display_name":"Ternary operation","level":2,"score":0.5237193703651428},{"id":"https://openalex.org/C69990965","wikidata":"https://www.wikidata.org/wiki/Q65402698","display_name":"Electrical resistivity and conductivity","level":2,"score":0.500239372253418},{"id":"https://openalex.org/C39353612","wikidata":"https://www.wikidata.org/wiki/Q5283759","display_name":"Atmospheric temperature range","level":2,"score":0.45874840021133423},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.43392571806907654},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.17773184180259705},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.17644724249839783},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.16340762376785278},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C153294291","wikidata":"https://www.wikidata.org/wiki/Q25261","display_name":"Meteorology","level":1,"score":0.0},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.0},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/s0167-9317(97)00150-0","doi":"https://doi.org/10.1016/s0167-9317(97)00150-0","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0167-9317(97)00150-0","pdf_url":null,"source":{"id":"https://openalex.org/S158028765","display_name":"Microelectronic Engineering","issn_l":"0167-9317","issn":["0167-9317","1873-5568"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Microelectronic Engineering","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":15,"referenced_works":["https://openalex.org/W654908678","https://openalex.org/W1983329315","https://openalex.org/W1985020328","https://openalex.org/W2003062556","https://openalex.org/W2013596019","https://openalex.org/W2026234087","https://openalex.org/W2055825977","https://openalex.org/W2058695233","https://openalex.org/W2085996895","https://openalex.org/W2145876471","https://openalex.org/W2319526650","https://openalex.org/W2472540076","https://openalex.org/W2562039948","https://openalex.org/W6720548655","https://openalex.org/W6814886856"],"related_works":["https://openalex.org/W1973862470","https://openalex.org/W2170064377","https://openalex.org/W2082188894","https://openalex.org/W2058695233","https://openalex.org/W2055825977","https://openalex.org/W2099791877","https://openalex.org/W1991514086","https://openalex.org/W2085226102","https://openalex.org/W2317474904","https://openalex.org/W2027974734"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-09-22T06:50:58.402377","created_date":"2016-06-24T00:00:00"}