{"id":"https://openalex.org/W2167699079","doi":"https://doi.org/10.1109/cpem.2004.305459","title":"Direct Resistance Comparisons from the QHR to 100 Megohm using a Cryogemic Current Comparator","display_name":"Direct Resistance Comparisons from the QHR to 100 Megohm using a Cryogemic Current Comparator","publication_year":2004,"publication_date":"2004-06-01","ids":{"openalex":"https://openalex.org/W2167699079","doi":"https://doi.org/10.1109/cpem.2004.305459","mag":"2167699079"},"language":"en","primary_location":{"id":"doi:10.1109/cpem.2004.305459","doi":"https://doi.org/10.1109/cpem.2004.305459","is_oa":false,"landing_page_url":"https://doi.org/10.1109/cpem.2004.305459","pdf_url":null,"source":{"id":"https://openalex.org/S4306418090","display_name":"Conference on Precision Electromagnetic Measurements","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2004 Conference on Precision Electromagnetic Measurements","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5078951512","display_name":"Randolph E. Elmquist","orcid":"https://orcid.org/0000-0001-9041-7966","observed_orcids":["https://orcid.org/0000-0001-9041-7966"]},"institutions":[{"id":"https://openalex.org/I1321296531","display_name":"National Institute of Standards and Technology","ror":"https://ror.org/05xpvk416","country_code":"US","type":"government","lineage":["https://openalex.org/I1321296531","https://openalex.org/I1343035065"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"R Elmquist","raw_affiliation_strings":["National Institute for Standards and Technology, Gaithersburg, MD, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Institute for Standards and Technology, Gaithersburg, MD, USA","institution_ids":["https://openalex.org/I1321296531"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5023213632","display_name":"Emmanouel Hourdakis","orcid":"https://orcid.org/0000-0002-1009-6689","observed_orcids":["https://orcid.org/0000-0002-1009-6689"]},"institutions":[{"id":"https://openalex.org/I1321296531","display_name":"National Institute of Standards and Technology","ror":"https://ror.org/05xpvk416","country_code":"US","type":"government","lineage":["https://openalex.org/I1321296531","https://openalex.org/I1343035065"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"E. Hourdakis","raw_affiliation_strings":["National Institute for Standards and Technology, Gaithersburg, MD, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Institute for Standards and Technology, Gaithersburg, MD, USA","institution_ids":["https://openalex.org/I1321296531"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5043286311","display_name":"Dean G. Jarrett","orcid":"https://orcid.org/0000-0003-1392-423X","observed_orcids":["https://orcid.org/0000-0003-1392-423X"]},"institutions":[{"id":"https://openalex.org/I1321296531","display_name":"National Institute of Standards and Technology","ror":"https://ror.org/05xpvk416","country_code":"US","type":"government","lineage":["https://openalex.org/I1321296531","https://openalex.org/I1343035065"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"D. Jarrett","raw_affiliation_strings":["National Institute for Standards and Technology, Gaithersburg, MD, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Institute for Standards and Technology, Gaithersburg, MD, USA","institution_ids":["https://openalex.org/I1321296531"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5055178988","display_name":"Neil M. Zimmerman","orcid":"https://orcid.org/0000-0002-7129-1883","observed_orcids":["https://orcid.org/0000-0002-7129-1883"]},"institutions":[{"id":"https://openalex.org/I1321296531","display_name":"National Institute of Standards and Technology","ror":"https://ror.org/05xpvk416","country_code":"US","type":"government","lineage":["https://openalex.org/I1321296531","https://openalex.org/I1343035065"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"N. Zimmerman","raw_affiliation_strings":["National Institute for Standards and Technology, Gaithersburg, MD, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Institute for Standards and Technology, Gaithersburg, MD, USA","institution_ids":["https://openalex.org/I1321296531"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I1321296531"],"apc_list":null,"apc_paid":null,"fwci":0.4152,"has_fulltext":false,"cited_by_count":19,"citation_normalized_percentile":{"value":0.62414184,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":96},"biblio":{"volume":null,"issue":null,"first_page":"97","last_page":"98"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12300","display_name":"Advanced Electrical Measurement Techniques","score":0.986299991607666,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12300","display_name":"Advanced Electrical Measurement Techniques","score":0.986299991607666,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11890","display_name":"Scientific Measurement and Uncertainty Evaluation","score":0.010300000198185444,"subfield":{"id":"https://openalex.org/subfields/3105","display_name":"Instrumentation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12019","display_name":"Calibration and Measurement Techniques","score":0.00139999995008111,"subfield":{"id":"https://openalex.org/subfields/2202","display_name":"Aerospace Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/cryogenic-current-comparator","display_name":"cryogenic current comparator","score":0.9539999961853027},{"id":"https://openalex.org/keywords/quantized-hall-resistance","display_name":"quantized Hall resistance","score":0.8709999918937683},{"id":"https://openalex.org/keywords/resistance-standard","display_name":"resistance standard","score":0.4740000069141388},{"id":"https://openalex.org/keywords/high-resistance-measurement","display_name":"high resistance measurement","score":0.5440000295639038},{"id":"https://openalex.org/keywords/thin-film-resistors","display_name":"thin film resistors","score":0.8029999732971191},{"id":"https://openalex.org/keywords/resistance-comparison","display_name":"resistance comparison","score":0.4169999957084656},{"id":"https://openalex.org/keywords/low-voltage-measurement","display_name":"low-voltage measurement","score":0.4440000057220459}],"concepts":[{"id":"https://openalex.org/C137488568","wikidata":"https://www.wikidata.org/wiki/Q5321","display_name":"Resistor","level":3,"score":0.9192657470703125},{"id":"https://openalex.org/C155745195","wikidata":"https://www.wikidata.org/wiki/Q1164179","display_name":"Comparator","level":3,"score":0.843505859375},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.5809929370880127},{"id":"https://openalex.org/C104713690","wikidata":"https://www.wikidata.org/wiki/Q245133","display_name":"Wheatstone bridge","level":4,"score":0.5759726166725159},{"id":"https://openalex.org/C148043351","wikidata":"https://www.wikidata.org/wiki/Q4456944","display_name":"Current (fluid)","level":2,"score":0.5308272242546082},{"id":"https://openalex.org/C21200559","wikidata":"https://www.wikidata.org/wiki/Q7451068","display_name":"Sensitivity (control systems)","level":2,"score":0.46945756673812866},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.44159257411956787},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.36018723249435425},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.3441859483718872},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.3396451473236084},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.3105565309524536}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/cpem.2004.305459","doi":"https://doi.org/10.1109/cpem.2004.305459","is_oa":false,"landing_page_url":"https://doi.org/10.1109/cpem.2004.305459","pdf_url":null,"source":{"id":"https://openalex.org/S4306418090","display_name":"Conference on Precision Electromagnetic Measurements","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2004 Conference on Precision Electromagnetic Measurements","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":13,"referenced_works":["https://openalex.org/W1973830521","https://openalex.org/W1992708211","https://openalex.org/W1997898072","https://openalex.org/W2039794774","https://openalex.org/W2073150862","https://openalex.org/W2103189207","https://openalex.org/W2115111420","https://openalex.org/W2128132573","https://openalex.org/W2131713531","https://openalex.org/W2135438117","https://openalex.org/W2143506261","https://openalex.org/W2158712375","https://openalex.org/W2169426387"],"related_works":["https://openalex.org/W2118537821","https://openalex.org/W2985914920","https://openalex.org/W3150918391","https://openalex.org/W1579308253","https://openalex.org/W2135045220","https://openalex.org/W2948653684","https://openalex.org/W1991385489","https://openalex.org/W1700602553","https://openalex.org/W2137258581","https://openalex.org/W1492504724"],"abstract_inverted_index":{"We":[0],"describe":[1],"the":[2],"operation":[3],"of":[4,22,26],"a":[5,20,45],"cryogenic":[6,32],"current":[7,14],"comparator":[8],"(CCC)":[9],"bridge":[10],"that":[11],"attains":[12],"high":[13],"sensitivity":[15],"while":[16],"maintaining":[17],"stability":[18],"under":[19],"range":[21],"measurement":[23],"conditions.":[24],"Measurements":[25],"100":[27],"MCI":[28],"standard":[29,50],"resistors":[30,34],"and":[31],"thin-film":[33],"have":[35],"been":[36],"made":[37],"at":[38],"low":[39],"voltage":[40],"levels,":[41],"based":[42],"directly":[43],"on":[44],"quantized":[46],"Hall":[47],"resistance":[48],"(QHR)":[49]},"counts_by_year":[{"year":2020,"cited_by_count":3},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":1},{"year":2013,"cited_by_count":1},{"year":2012,"cited_by_count":2}],"updated_date":"2026-10-05T09:50:58.205359","created_date":"2016-06-24T00:00:00"}